EP1425115A4 - Supercritical fluid delivery and recovery system for semiconductor wafer processing - Google Patents
Supercritical fluid delivery and recovery system for semiconductor wafer processingInfo
- Publication number
- EP1425115A4 EP1425115A4 EP01927173A EP01927173A EP1425115A4 EP 1425115 A4 EP1425115 A4 EP 1425115A4 EP 01927173 A EP01927173 A EP 01927173A EP 01927173 A EP01927173 A EP 01927173A EP 1425115 A4 EP1425115 A4 EP 1425115A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor wafer
- fluid delivery
- recovery system
- supercritical fluid
- wafer processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/008—Processes carried out under supercritical conditions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19751900P | 2000-04-18 | 2000-04-18 | |
US197519P | 2000-04-18 | ||
US26791601P | 2001-02-09 | 2001-02-09 | |
US267916P | 2001-02-09 | ||
PCT/US2001/012617 WO2001078911A1 (en) | 2000-04-18 | 2001-04-18 | Supercritical fluid delivery and recovery system for semiconductor wafer processing |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1425115A1 EP1425115A1 (en) | 2004-06-09 |
EP1425115A4 true EP1425115A4 (en) | 2006-03-01 |
Family
ID=26892922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01927173A Withdrawn EP1425115A4 (en) | 2000-04-18 | 2001-04-18 | Supercritical fluid delivery and recovery system for semiconductor wafer processing |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1425115A4 (en) |
JP (1) | JP2003531478A (en) |
AU (1) | AU2001253650A1 (en) |
WO (1) | WO2001078911A1 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6748960B1 (en) | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
JP3883929B2 (en) | 2001-09-25 | 2007-02-21 | 大日本スクリーン製造株式会社 | Thin film forming apparatus and thin film forming method |
CN1331562C (en) * | 2001-10-17 | 2007-08-15 | 普莱克斯技术有限公司 | Central carbon dioxide purifier |
US6846380B2 (en) | 2002-06-13 | 2005-01-25 | The Boc Group, Inc. | Substrate processing apparatus and related systems and methods |
JP4142357B2 (en) | 2002-07-04 | 2008-09-03 | 株式会社神戸製鋼所 | Waste high pressure fluid treatment method and apparatus |
US7282099B2 (en) | 2002-09-24 | 2007-10-16 | Air Products And Chemicals, Inc. | Dense phase processing fluids for microelectronic component manufacture |
US6960242B2 (en) * | 2002-10-02 | 2005-11-01 | The Boc Group, Inc. | CO2 recovery process for supercritical extraction |
US6880560B2 (en) | 2002-11-18 | 2005-04-19 | Techsonic | Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
US7018444B2 (en) * | 2003-05-07 | 2006-03-28 | Praxair Technology, Inc. | Process for carbon dioxide recovery from a process tool |
CN1816737B (en) | 2003-06-30 | 2012-02-01 | 格罗宁根大学医学中心 | Method for histoprocessing |
US20050006310A1 (en) * | 2003-07-10 | 2005-01-13 | Rajat Agrawal | Purification and recovery of fluids in processing applications |
US20050022850A1 (en) * | 2003-07-29 | 2005-02-03 | Supercritical Systems, Inc. | Regulation of flow of processing chemistry only into a processing chamber |
JP2005286105A (en) * | 2004-03-30 | 2005-10-13 | Hitachi Sci Syst Ltd | Fine structure drying method and apparatus thereof |
US20060065189A1 (en) * | 2004-09-30 | 2006-03-30 | Darko Babic | Method and system for homogenization of supercritical fluid in a high pressure processing system |
US7550075B2 (en) * | 2005-03-23 | 2009-06-23 | Tokyo Electron Ltd. | Removal of contaminants from a fluid |
US7767145B2 (en) | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
JP5491737B2 (en) * | 2009-01-27 | 2014-05-14 | 株式会社神戸製鋼所 | High pressure processing method and high pressure processing apparatus |
ITPD20110153A1 (en) * | 2011-05-13 | 2012-11-14 | Univ Padova | METHOD OF SYNTHESIS OF CARBON NANOTUBES FUNCTIONALIZED BY CYCLE ADDS IN CONTINUOUS FLOW AND APPARATUS FOR THE SAME |
JP6804278B2 (en) * | 2016-12-06 | 2020-12-23 | 東京エレクトロン株式会社 | Supercritical fluid manufacturing equipment and substrate processing equipment |
JP7146283B2 (en) * | 2017-08-10 | 2022-10-04 | 株式会社フジキン | Fluid supply device and fluid supply method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5417768A (en) * | 1993-12-14 | 1995-05-23 | Autoclave Engineers, Inc. | Method of cleaning workpiece with solvent and then with liquid carbon dioxide |
EP0791093B1 (en) * | 1994-11-09 | 2001-04-11 | R.R. STREET & CO., INC. | Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates |
US5908510A (en) * | 1996-10-16 | 1999-06-01 | International Business Machines Corporation | Residue removal by supercritical fluids |
-
2001
- 2001-04-18 WO PCT/US2001/012617 patent/WO2001078911A1/en not_active Application Discontinuation
- 2001-04-18 JP JP2001576202A patent/JP2003531478A/en active Pending
- 2001-04-18 AU AU2001253650A patent/AU2001253650A1/en not_active Abandoned
- 2001-04-18 EP EP01927173A patent/EP1425115A4/en not_active Withdrawn
Non-Patent Citations (2)
Title |
---|
No further relevant documents disclosed * |
See also references of WO0178911A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP1425115A1 (en) | 2004-06-09 |
AU2001253650A1 (en) | 2001-10-30 |
WO2001078911A1 (en) | 2001-10-25 |
JP2003531478A (en) | 2003-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20030311 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20060113 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B08B 3/00 20060101AFI20011101BHEP Ipc: H01L 21/00 20060101ALI20060109BHEP |
|
17Q | First examination report despatched |
Effective date: 20060807 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20070220 |