AU6893600A - Inverted pressure vessel with horizontal through loading - Google Patents

Inverted pressure vessel with horizontal through loading

Info

Publication number
AU6893600A
AU6893600A AU68936/00A AU6893600A AU6893600A AU 6893600 A AU6893600 A AU 6893600A AU 68936/00 A AU68936/00 A AU 68936/00A AU 6893600 A AU6893600 A AU 6893600A AU 6893600 A AU6893600 A AU 6893600A
Authority
AU
Australia
Prior art keywords
loading
horizontal
pressure vessel
inverted pressure
inverted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU68936/00A
Inventor
Mohan Chandra
Robert Farmer
Ijaz Jafri
Heiko Moritz
Jonathan Talbot
James Tseronis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SC Fluids Inc
Original Assignee
SC Fluids Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SC Fluids Inc filed Critical SC Fluids Inc
Publication of AU6893600A publication Critical patent/AU6893600A/en
Abandoned legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/008—Processes carried out under supercritical conditions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
  • Closures For Containers (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
AU68936/00A 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading Abandoned AU6893600A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14725199P 1999-08-05 1999-08-05
US60147251 1999-08-05
US15545499P 1999-09-20 1999-09-20
US60155454 1999-09-20
PCT/US2000/021338 WO2001010733A1 (en) 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading

Publications (1)

Publication Number Publication Date
AU6893600A true AU6893600A (en) 2001-03-05

Family

ID=26844748

Family Applications (1)

Application Number Title Priority Date Filing Date
AU68936/00A Abandoned AU6893600A (en) 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading

Country Status (7)

Country Link
EP (1) EP1208047A4 (en)
JP (1) JP2003506646A (en)
KR (1) KR20020061589A (en)
CN (1) CN1204024C (en)
AU (1) AU6893600A (en)
IL (1) IL147986A0 (en)
WO (1) WO2001010733A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
AU2001290171A1 (en) * 2000-07-26 2002-02-05 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
WO2002011911A1 (en) * 2000-08-04 2002-02-14 S. C. Fluids, Inc. Inverted pressure vessel with shielded closure mechanism
US6722642B1 (en) * 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
CN110410498A (en) * 2018-04-28 2019-11-05 重庆海扶医疗科技股份有限公司 Hoop component and pressure vessel
RU2766224C1 (en) 2018-07-25 2022-02-10 Графтек Интернэшнл Холдингз Инк. Extrusion press and method of application thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3744660A (en) * 1970-12-30 1973-07-10 Combustion Eng Shield for nuclear reactor vessel
US4789077A (en) * 1988-02-24 1988-12-06 Public Service Electric & Gas Company Closure apparatus for a high pressure vessel
US4823976A (en) * 1988-05-04 1989-04-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Quick actuating closure
US5236669A (en) * 1990-09-12 1993-08-17 E. I. Du Pont De Nemours And Company Pressure vessel
US5221019A (en) * 1991-11-07 1993-06-22 Hahn & Clay Remotely operable vessel cover positioner
JP2548062B2 (en) * 1992-11-13 1996-10-30 日本エー・エス・エム株式会社 Load lock chamber for vertical heat treatment equipment
US5556497A (en) * 1995-01-09 1996-09-17 Essef Corporation Fitting installation process
JP2969087B2 (en) * 1996-11-06 1999-11-02 日本エー・エス・エム株式会社 Semiconductor substrate processing method

Also Published As

Publication number Publication date
EP1208047A1 (en) 2002-05-29
EP1208047A4 (en) 2004-03-31
CN1204024C (en) 2005-06-01
JP2003506646A (en) 2003-02-18
IL147986A0 (en) 2002-09-12
KR20020061589A (en) 2002-07-24
WO2001010733A1 (en) 2001-02-15
CN1368928A (en) 2002-09-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase