IL147986A0 - Inverted pressure vessel with horizontal throug loading - Google Patents
Inverted pressure vessel with horizontal throug loadingInfo
- Publication number
- IL147986A0 IL147986A0 IL14798600A IL14798600A IL147986A0 IL 147986 A0 IL147986 A0 IL 147986A0 IL 14798600 A IL14798600 A IL 14798600A IL 14798600 A IL14798600 A IL 14798600A IL 147986 A0 IL147986 A0 IL 147986A0
- Authority
- IL
- Israel
- Prior art keywords
- throug
- loading
- horizontal
- pressure vessel
- inverted pressure
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/008—Processes carried out under supercritical conditions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Closures For Containers (AREA)
- Pressure Vessels And Lids Thereof (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14725199P | 1999-08-05 | 1999-08-05 | |
US15545499P | 1999-09-20 | 1999-09-20 | |
PCT/US2000/021338 WO2001010733A1 (en) | 1999-08-05 | 2000-08-04 | Inverted pressure vessel with horizontal through loading |
Publications (1)
Publication Number | Publication Date |
---|---|
IL147986A0 true IL147986A0 (en) | 2002-09-12 |
Family
ID=26844748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL14798600A IL147986A0 (en) | 1999-08-05 | 2000-08-04 | Inverted pressure vessel with horizontal throug loading |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1208047A4 (en) |
JP (1) | JP2003506646A (en) |
KR (1) | KR20020061589A (en) |
CN (1) | CN1204024C (en) |
AU (1) | AU6893600A (en) |
IL (1) | IL147986A0 (en) |
WO (1) | WO2001010733A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6748960B1 (en) | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
KR100750018B1 (en) * | 2000-07-26 | 2007-08-16 | 동경 엘렉트론 주식회사 | High pressure processing chamber for semiconductor substrate |
KR20030026333A (en) * | 2000-08-04 | 2003-03-31 | 에스.씨. 플루이즈, 아이엔씨. | Inverted Pressure Vessel with Shielded Closure Mechanism |
US6722642B1 (en) * | 2002-11-06 | 2004-04-20 | Tokyo Electron Limited | High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism |
US7767145B2 (en) | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
CN110410498A (en) * | 2018-04-28 | 2019-11-05 | 重庆海扶医疗科技股份有限公司 | Hoop component and pressure vessel |
US20210260636A1 (en) * | 2018-07-25 | 2021-08-26 | Graftech International Holdings Inc. | Extrusion press and method of using |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3744660A (en) * | 1970-12-30 | 1973-07-10 | Combustion Eng | Shield for nuclear reactor vessel |
US4789077A (en) * | 1988-02-24 | 1988-12-06 | Public Service Electric & Gas Company | Closure apparatus for a high pressure vessel |
US4823976A (en) * | 1988-05-04 | 1989-04-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Quick actuating closure |
US5236669A (en) * | 1990-09-12 | 1993-08-17 | E. I. Du Pont De Nemours And Company | Pressure vessel |
US5221019A (en) * | 1991-11-07 | 1993-06-22 | Hahn & Clay | Remotely operable vessel cover positioner |
JP2548062B2 (en) * | 1992-11-13 | 1996-10-30 | 日本エー・エス・エム株式会社 | Load lock chamber for vertical heat treatment equipment |
US5556497A (en) * | 1995-01-09 | 1996-09-17 | Essef Corporation | Fitting installation process |
JP2969087B2 (en) * | 1996-11-06 | 1999-11-02 | 日本エー・エス・エム株式会社 | Semiconductor substrate processing method |
-
2000
- 2000-08-04 IL IL14798600A patent/IL147986A0/en unknown
- 2000-08-04 CN CNB008113327A patent/CN1204024C/en not_active Expired - Fee Related
- 2000-08-04 AU AU68936/00A patent/AU6893600A/en not_active Abandoned
- 2000-08-04 WO PCT/US2000/021338 patent/WO2001010733A1/en active Application Filing
- 2000-08-04 EP EP00957297A patent/EP1208047A4/en not_active Withdrawn
- 2000-08-04 JP JP2001515214A patent/JP2003506646A/en active Pending
- 2000-08-04 KR KR1020027001586A patent/KR20020061589A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2001010733A1 (en) | 2001-02-15 |
AU6893600A (en) | 2001-03-05 |
JP2003506646A (en) | 2003-02-18 |
CN1204024C (en) | 2005-06-01 |
EP1208047A1 (en) | 2002-05-29 |
CN1368928A (en) | 2002-09-11 |
EP1208047A4 (en) | 2004-03-31 |
KR20020061589A (en) | 2002-07-24 |
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