JP2009117877A - 露光装置及びデバイス製造方法 - Google Patents
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/20—Exposure; Apparatus therefor
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- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
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- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
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- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
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- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
【解決手段】 露光済みのウエハWを保持したウエハテーブルTB1のステージ52上での−Y方向への移動と、マーク検出動作が終了したウエハWを保持するウエハテーブルTB2のステージ171からステージ52への移動とが、両テーブルがY軸方向に関して近接又は接触した状態を維持して並行して行われる結果、水圧パッド32の下方及び投影光学系PL直下には、常にいずれかのウエハテーブルが存在し、そのウエハテーブル上のウエハW又は補助プレート24との間に液浸領域が形成された状態が維持され、投影光学系PLを構成する最も像面側の光学部材とウエハ又は補助プレート24との間に液体(水)を保持することができ、その液体(水)の流出を防止することが可能となる。
【選択図】図10
Description
δ=k2・λ/NA2 ……(2)
以下、第1の実施形態について、図1〜図6に基づいて説明する。
これまでの説明では、水圧パッド32が鏡筒40に固定され、投影光学系PLと水圧パッド32との位置関係が一定に維持されている場合について説明したが、これに限らず、例えば、投影光学系PLを構成する最も像面側の光学部材として、図8に示されるような上下に2分割された分割レンズ(Divided Lens)を用いることとしても良い。この図8に示される分割レンズ150は、下側の半球状の第1部分レンズ152aと、その第1部分レンズの外表面(球面の一部)と同一の点を中心とする曲率半径が僅かに大きな曲率半径の球面をその内面(内表面)として有し、前記第1部分レンズ152aの中心とは異なる点を中心とする球面を外面(外表面)として有する第2部分レンズ152bとによって構成されている。この場合、第1部分レンズ152aは平凸レンズであり、第2部分レンズ152bは、凹メニスカスレンズである。
次に、図9及び図10に基づいて第2の実施形態の露光装置について説明する。図9には、第2の実施形態の露光装置を構成するウエハステージ装置300の構成が、平面図にて示されている。ここで、重複説明を避ける観点から、前述の第1の実施形態と同一の構成部分には、同一の符号を用いるとともに、その説明を省略するものとする。
次に上述した露光装置をリソグラフィ工程で使用したデバイスの製造方法の実施形態について説明する。
Claims (7)
- 投影光学系と基板との間に液体を供給し、エネルギビームによりパターンを照明し、前記パターンを前記投影光学系及び前記液体を介して前記基板上に転写する露光装置であって、
基板の載置領域が形成され、該載置領域の周囲の領域の表面が前記載置領域に載置された基板の表面とほぼ面一となるように設定され、前記液体が供給される前記投影光学系直下の位置を含む第1領域と該第1領域の一軸方向の一側に位置する第2領域とを含む所定範囲の領域内で移動可能な第1テーブルと;
表面がほぼ面一となるように設定され、前記第1領域と前記第2領域とを含む領域内で前記第1テーブルとは独立して移動可能な第2テーブルと;
前記第1、第2テーブルを駆動するとともに、一方のテーブルが前記第1領域に位置する第1の状態から他方のテーブルが前記第1領域に位置する第2の状態に遷移させる際に、両テーブルが前記一軸方向に関して近接又は接触した状態を維持して両テーブルを同時に前記一軸方向の前記第2領域側から第1領域側へ向かう方向に駆動するステージ駆動系と;を備える露光装置。 - 請求項1に記載の露光装置において、
前記第2テーブルは、基板の載置領域が形成され、該載置領域に載置された基板の表面を含めて表面がほぼ面一となるように設定されていることを特徴とする露光装置。 - 請求項1又は2に記載の露光装置において、
基板上のアライメントマークを検出するアライメント系をさらに備え、
前記遷移動作中に、前記一方のテーブルには露光後の基板が載置され、前記他方のテーブルには前記アライメント系よるマーク検出後の基板が載置されていることを特徴とする露光装置。 - 請求項3に記載の露光装置において、
複数の基板の露光処理シーケンスの実行中、前記第1テーブル及び前記第2テーブルの少なくとも一方が、常に、前記液体を介して前記投影光学系と対向していることを特徴とする露光装置。 - 請求項1〜4のいずれか一項に記載の露光装置において、
前記第1テーブルと前記第2テーブルの二次元的な位置はそれぞれ計測されていることを特徴とする露光装置。 - 請求項1〜5のいずれか一項に記載の露光装置において、
前記投影光学系の像面側に配置され、前記第1、第2テーブルのいずれかが、前記第1領域にあるとき、その第1領域にあるテーブル上の基板に対向する軸受面と前記基板との間に液体を供給して該液体の静圧により前記軸受面と前記基板の表面との間隔を維持する少なくとも1つの液体静圧軸受を含む液体静圧軸受装置を更に備える露光装置。 - リソグラフィ工程を含むデバイス製造方法であって、
前記リソグラフィ工程では、請求項1〜6のいずれか一項に記載の露光装置を用いて基板上にデバイスパターンを転写することを特徴とするデバイス製造方法。
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