EP2507174B1 - Verfahren zur herstellung von halogenierten polysilanen - Google Patents

Verfahren zur herstellung von halogenierten polysilanen Download PDF

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Publication number
EP2507174B1
EP2507174B1 EP10793199.0A EP10793199A EP2507174B1 EP 2507174 B1 EP2507174 B1 EP 2507174B1 EP 10793199 A EP10793199 A EP 10793199A EP 2507174 B1 EP2507174 B1 EP 2507174B1
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EP
European Patent Office
Prior art keywords
process according
halogenated
siloxane
compounds
polysilanes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
EP10793199.0A
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German (de)
English (en)
French (fr)
Other versions
EP2507174A1 (de
Inventor
Christian Bauch
Sven Holl
Rumen Deltschew
Seyed-Javad Mohsseni-Ala
Andrey Lubentsov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nagarjuna Fertilizers and Chemicals Ltd
Original Assignee
Spawnt Private SARL
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Publication date
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00—Compounds of germanium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
    • C08G79/14—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing two or more elements other than carbon, oxygen, nitrogen, sulfur and silicon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/582—Recycling of unreacted starting or intermediate materials

Definitions

  • the present invention relates to a process for producing halogenated polysilanes as a pure compound or mixture of compounds, which has a particular purity with respect to, inter alia, boron-containing compounds.
  • Halogenated polysilanes are used, for example, to produce high-purity silicon in semiconductor technology, for example in the solar cell industry. For this reason, very high purities for halogenated polysilanes are often required.
  • the PCT application WO 2009/047238 A1 describes a process for the preparation of high-purity hexachlorodisilane in which water is present during the distillation of a hexachlorodisilane-containing mixture in quantities of at most 10 ppbw ( p arts p er b illion per w eight). This document describes that, inter alia, the reaction of water with chlorosilanes can lead to the formation of disiloxanes which adversely affect the purity of the desired hexachlorodisilane.
  • boron-containing impurities in the halogenated polysilanes with siloxanes forms compounds, for example boric acids whose volatility and / or solubility differs from the halogenated polysilanes the consequence that these formed boron-containing compounds in a subsequent process step b) of the halogenated polysilane can be separated so that a halogenated polysilane results in increased purity.
  • a maximum of 1 ppmw of water is present during the process according to the invention. This can be achieved, for example, by drying the halogenated polysilane mixtures introduced or the starting materials for forming the halogenated polysilanes, it being possible for the drying to be carried out by any desired, previously known process for drying gases and liquids.
  • the siloxane-forming oxidants for example, release reactive oxygen species, which can primarily attack bonds between two Si atoms to form siloxanes.
  • siloxanes for example, compounds of the following general formula R 1 R 2 R 3 Si-O-SiR 9 R 5 R 6 , where R 1 to R 6 independently of one another can be Cl, F, Br, I, H, SiR 1 R 2 R 3 and -O-SiR 1 R 2 R 3 , be used.
  • These siloxanes can also comprise disiloxanes, for example hexachlorodisiloxane, which can be formed, for example, by reaction of oxygen or reactive oxygen species with hexachlorodisilane.
  • siloxane compound and the trichlorosilyl-pentachlorodisiloxane is possible, which can be formed for example by reaction of octachlorotrisilane with oxygen.
  • the general formula also includes siloles which have an Si-OH group. Also possible are siloxanes with more than one Si-OS bond.
  • siloxanes or siloxane-forming oxidants, on the other hand, are not prone to moisture, such as water, to undergo uncontrolled polymerizations with halogenated polysilanes that favor the formation of "poppy gels" or solid silica-like deposits in the equipment.
  • Siloxanes can also be added in process step a), for example, by adding halogenated polysilanes which already contain relatively large amounts of siloxanes.
  • oxidizing agent which promotes the formation of siloxane for example, dry oxygen, dry air, ozone, phosphine oxides and combinations thereof can be used.
  • Phosphine oxides are particularly useful for removing boron-containing halogenated polysilane impurities which are later used to produce high purity Silicon to be doped with phosphorus.
  • boron-containing impurities stoichiometric amounts of siloxanes or siloxane-forming oxidants.
  • siloxanes or siloxane-forming oxidants preferably at least 10 ppbw, more preferably at least 100 ppbw of siloxane, or siloxane-forming oxidizing agent in process step a) are added.
  • a significant oxygen content in the halogenated polysilanes for many applications for example, in the photovoltaic technology is not desirable, so still preferably a maximum of 10 ppmw ( p arts p er m illon per w eight) of a siloxane-forming oxidizing agent or siloxane can be added to prevent that after the reaction of the siloxane-forming oxidizing agent or the siloxane itself with the boron-containing impurities too large an excess of oxygen-containing compounds in the halogenated polysilanes remains.
  • the halogenated polysilanes can be produced in a mixture in which the siloxanes or the siloxane-forming oxidizing agents are also added.
  • the halogenated polysilanes can be subject to partial degradation by means of chlorination resulting in particularly kinetically stable halogenated polysilanes having a large number of branches in the main chain, the chlorine gas used for the chlorination simultaneously containing at least 1 ppbw siloxane or Siloxane-forming oxidizing agent, so that the halogenated polysilanes formed by the chlorination can be cleaned very easily at the same time by the reaction of the siloxanes with the boron-containing impurities.
  • metal-containing impurities may additionally be present in the halogenated polysilane which, with the siloxane-forming oxidizing agent or siloxane itself, likewise form compounds which have a different volatility and / or solubility than the halogenated polysilanes.
  • impurities may be present, for example, titanium, iron, tin, and / or aluminum-containing impurities or combinations thereof which can form with the siloxanes
  • Polyoximetallate for example Heteropolymetallate easily separated, for example by distillation or other methods of the halogenated polysilanes can be.
  • Phosphorus-containing impurities can also form compounds with the siloxanes.
  • any contaminated mixtures of halogenated polysilanes or even individual compounds of halogenated polysilanes for example hexachlorodisilane, octachlorotrisilane or dodecachloroneopentasilane, or any other silanes provided only with the impurities.
  • monosilanes can be converted to the halogenated polysilanes, for example with inert gases, such as nitrogen or together with reducing agents, such as hydrogen, for example by thermal or plasma-chemical processes.
  • inert gases such as nitrogen
  • reducing agents such as hydrogen
  • process step a) it is possible to work in process step a) at temperatures from room temperature to 150 ° C. Some of the halogenated polysilanes dissolve only at elevated temperatures.
  • halogenated polysilanes In comparison to the short-chain halogenated polysilanes with chain lengths n between 3 and 10, which can be separated particularly well by distillation from mixtures, the compounds formed by reaction of the siloxanes with the boron-containing impurities are often difficult to dissolve and / or hardly volatile, so that particularly easily by means of distillation, the halogenated polysilanes can be separated from the impurities, resulting in halogenated polysilanes with an increased purity.
  • halogenated polysilanes from a chain length of 5 Si atoms and crystallization methods for separation can be used.
  • separation of the impurities from the halogenated polysilanes can also be carried out in process step b) by means of sublimation, crystallization and / or zone melting.
  • zone melting the boron-containing compounds preferably concentrate in the melt, so that they can be easily separated from the halogenated polysilanes.
  • Separation of the compounds formed by the reaction of siloxanes with boron-containing impurities can also be carried out by crystallization in some short-chain polysilanes, for example dodecachlorneopentasilane and / or neo-Si 6 Cl 14 , since these halogenated polysilanes are particularly readily crystallized from mixtures of halogenated polysilanes.
  • HCl is present in quantities of up to 10% by mass, preferably up to 1% by mass, during the separation of the polysilanes, since hydrogen chloride can favor the formation of compounds by reaction of the siloxanes with the boron- and / or metal-containing impurities , HCl can also originate from the production process of the halogenated polysilanes or be added separately.
  • no water is present, so that the formation of friction-sensitive decomposition products, the "poppy gels" and the insoluble solids, such as the silica-like deposits can be largely avoided.
  • alcohols and / or armines can be present in quantities of at most 1 ppmw.
  • Amines as well as alcohols can lead to reactions and rearrangements and should therefore be avoided if possible.
  • process step b) the formation of further siloxanes can be avoided.
  • This can be particularly advantageous if, in process step a), it is already ensured that sufficient quantities of siloxanes are formed, so that after reaction of the siloxanes with the boron- and metal-containing impurities only minute amounts of the siloxanes remain in the halogenated polysilane mixtures.
  • the hydrogen content of the halogenated polysilanes may be less than 2 atomic%, in particular less than 1 Be atomic%.
  • the halogenated polysilanes may also contain halogen substituents of several different halogens.
  • the substituents of the halogenated polysilane can consist exclusively of halogen.
  • the halogenated polysilanes can be obtained as fine chemicals with a very high degree of purity of at least 99.5%.
  • the impurities can be less than 10 ppm.
  • the iron content goes from ⁇ 100 ⁇ g / kg in SiCl 4 to ⁇ 10 ⁇ g / kg in Si 2 Cl 6 and the content of aluminum goes from ⁇ 100 ⁇ g / kg in SiCl 4 to ⁇ 20 ⁇ g / kg in Si 2 Cl 6 back.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Silicon Polymers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Chemical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Catalysts (AREA)
EP10793199.0A 2009-12-04 2010-12-06 Verfahren zur herstellung von halogenierten polysilanen Revoked EP2507174B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009056731A DE102009056731A1 (de) 2009-12-04 2009-12-04 Halogenierte Polysilane und Polygermane
PCT/EP2010/068993 WO2011067416A1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von halogenierten polysilanen

Publications (2)

Publication Number Publication Date
EP2507174A1 EP2507174A1 (de) 2012-10-10
EP2507174B1 true EP2507174B1 (de) 2013-11-06

Family

ID=43499339

Family Applications (7)

Application Number Title Priority Date Filing Date
EP10793199.0A Revoked EP2507174B1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von halogenierten polysilanen
EP10787448A Withdrawn EP2507169A1 (de) 2009-12-04 2010-12-06 Verfahren zum entfernen von verunreinigungen aus silicium
EP10787451A Withdrawn EP2507299A2 (de) 2009-12-04 2010-12-06 Chlorierte oligogermane und verfahren zu deren herstellung
EP10788316A Withdrawn EP2507171A1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von hydriertem polygermasilan und hydriertes polygermasilan
EP10787123A Withdrawn EP2507317A1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von hydriertem polygerman und hydriertes polygerman
EP10792879.8A Not-in-force EP2507172B1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von oligosilanen
EP10787124.6A Revoked EP2507296B1 (de) 2009-12-04 2010-12-06 Kinetisch stabile chlorierte polysilane und deren herstellung und verwendung

Family Applications After (6)

Application Number Title Priority Date Filing Date
EP10787448A Withdrawn EP2507169A1 (de) 2009-12-04 2010-12-06 Verfahren zum entfernen von verunreinigungen aus silicium
EP10787451A Withdrawn EP2507299A2 (de) 2009-12-04 2010-12-06 Chlorierte oligogermane und verfahren zu deren herstellung
EP10788316A Withdrawn EP2507171A1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von hydriertem polygermasilan und hydriertes polygermasilan
EP10787123A Withdrawn EP2507317A1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von hydriertem polygerman und hydriertes polygerman
EP10792879.8A Not-in-force EP2507172B1 (de) 2009-12-04 2010-12-06 Verfahren zur herstellung von oligosilanen
EP10787124.6A Revoked EP2507296B1 (de) 2009-12-04 2010-12-06 Kinetisch stabile chlorierte polysilane und deren herstellung und verwendung

Country Status (9)

Country Link
US (7) US9458294B2 (enrdf_load_stackoverflow)
EP (7) EP2507174B1 (enrdf_load_stackoverflow)
JP (6) JP2013512844A (enrdf_load_stackoverflow)
CN (3) CN102666381B (enrdf_load_stackoverflow)
BR (2) BR112012013500A2 (enrdf_load_stackoverflow)
CA (2) CA2782247A1 (enrdf_load_stackoverflow)
DE (1) DE102009056731A1 (enrdf_load_stackoverflow)
TW (7) TW201134764A (enrdf_load_stackoverflow)
WO (7) WO2011067418A1 (enrdf_load_stackoverflow)

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DE102013207444A1 (de) 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen
US9174853B2 (en) 2013-12-06 2015-11-03 Gelest Technologies, Inc. Method for producing high purity germane by a continuous or semi-continuous process
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DE102014007767B4 (de) * 2014-05-21 2025-08-28 Christian Bauch Verfahren zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan
DE102014007768B4 (de) 2014-05-21 2025-07-03 Sven Holl Verfahren zur Herstellung von Mischungen chlorierter Silane mit erhöhten Anteilen von Si4Cl10 und/oder Si5Cl12
DE102014007685B4 (de) 2014-05-21 2022-04-07 Sven Holl Verfahren zur Herstellung von Hexachlordisilan
KR20170035981A (ko) * 2014-07-22 2017-03-31 모멘티브 퍼포먼스 머티리얼즈 게엠베하 모노실란, 폴리실란, 및/또는 올리고실란에서 규소-규소 결합 및/또는 규소-염소 결합의 분해 방법
DE102014013250B4 (de) * 2014-09-08 2021-11-25 Christian Bauch Verfahren zur Aufreinigung halogenierter Oligosilane
JP2018502817A (ja) * 2014-12-15 2018-02-01 ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド 塩素化オリゴシランの製造方法
DE102016014900A1 (de) * 2016-12-15 2018-06-21 Psc Polysilane Chemicals Gmbh Verfahren zur Erhöhung der Reinheit von Oligosilanen und Oligosilanverbindungen
DE102016225872A1 (de) * 2016-12-21 2018-06-21 Evonik Degussa Gmbh Verfahren zur Trennung von Gemischen höherer Silane
WO2018170464A1 (en) 2017-03-17 2018-09-20 The Johns Hopkins University Targeted epigenetic therapy against distal regulatory element of tgfb2 expression
JP7429685B2 (ja) * 2018-05-02 2024-02-08 イシラブズ サス 水素の生成のための方法
JP7125062B2 (ja) * 2019-01-25 2022-08-24 株式会社東芝 判定方法及び処理方法
CN117247018A (zh) * 2023-09-22 2023-12-19 新疆大全新能源股份有限公司 一种回收新鲜料系统重杂的方法和装置

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