TWI561559B - Process for producing hydrogenated polygermasilane and polygermasilane - Google Patents
Process for producing hydrogenated polygermasilane and polygermasilaneInfo
- Publication number
- TWI561559B TWI561559B TW099142323A TW99142323A TWI561559B TW I561559 B TWI561559 B TW I561559B TW 099142323 A TW099142323 A TW 099142323A TW 99142323 A TW99142323 A TW 99142323A TW I561559 B TWI561559 B TW I561559B
- Authority
- TW
- Taiwan
- Prior art keywords
- polygermasilane
- producing hydrogenated
- hydrogenated
- producing
- hydrogenated polygermasilane
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
- C08G79/14—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing two or more elements other than carbon, oxygen, nitrogen, sulfur and silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009056731A DE102009056731A1 (de) | 2009-12-04 | 2009-12-04 | Halogenierte Polysilane und Polygermane |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201132682A TW201132682A (en) | 2011-10-01 |
TWI561559B true TWI561559B (en) | 2016-12-11 |
Family
ID=43499339
Family Applications (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099142320A TW201132587A (en) | 2009-12-04 | 2010-12-06 | Method of removing impurities from silicon |
TW099142326A TW201139283A (en) | 2009-12-04 | 2010-12-06 | Chlorinated oligogermane and method of manufacturing the same |
TW099142328A TWI580710B (zh) | 2009-12-04 | 2010-12-06 | 鹵化聚矽烷的製備方法 |
TW099142322A TWI589527B (zh) | 2009-12-04 | 2010-12-06 | 氫化鍺烷之生產方法以及氫化鍺烷 |
TW099142323A TWI561559B (en) | 2009-12-04 | 2010-12-06 | Process for producing hydrogenated polygermasilane and polygermasilane |
TW099142324A TW201134764A (en) | 2009-12-04 | 2010-12-06 | Method of producing oligosilane |
TW099142321A TW201132708A (en) | 2009-12-04 | 2010-12-06 | Kinetically stable chlorinated polysilane, method of manufacturing the same, and use of the same |
Family Applications Before (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099142320A TW201132587A (en) | 2009-12-04 | 2010-12-06 | Method of removing impurities from silicon |
TW099142326A TW201139283A (en) | 2009-12-04 | 2010-12-06 | Chlorinated oligogermane and method of manufacturing the same |
TW099142328A TWI580710B (zh) | 2009-12-04 | 2010-12-06 | 鹵化聚矽烷的製備方法 |
TW099142322A TWI589527B (zh) | 2009-12-04 | 2010-12-06 | 氫化鍺烷之生產方法以及氫化鍺烷 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099142324A TW201134764A (en) | 2009-12-04 | 2010-12-06 | Method of producing oligosilane |
TW099142321A TW201132708A (en) | 2009-12-04 | 2010-12-06 | Kinetically stable chlorinated polysilane, method of manufacturing the same, and use of the same |
Country Status (9)
Country | Link |
---|---|
US (7) | US9458294B2 (zh) |
EP (7) | EP2507171A1 (zh) |
JP (6) | JP5731531B2 (zh) |
CN (3) | CN102639644A (zh) |
BR (2) | BR112012013500A2 (zh) |
CA (2) | CA2782247A1 (zh) |
DE (1) | DE102009056731A1 (zh) |
TW (7) | TW201132587A (zh) |
WO (7) | WO2011067417A1 (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
CN102918684B (zh) | 2010-05-28 | 2016-09-14 | 巴斯夫欧洲公司 | 膨胀石墨在锂/硫电池组中的用途 |
KR101250172B1 (ko) * | 2012-08-20 | 2013-04-05 | 오씨아이머티리얼즈 주식회사 | 고수율로 모노 게르만 가스를 제조하는 방법 |
DE102012224202A1 (de) * | 2012-12-21 | 2014-07-10 | Evonik Industries Ag | Verfahren zum Hydrieren höherer Halogen-haltiger Silanverbindungen |
DE102013207447A1 (de) * | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan |
DE102013207444A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen |
US9174853B2 (en) | 2013-12-06 | 2015-11-03 | Gelest Technologies, Inc. | Method for producing high purity germane by a continuous or semi-continuous process |
DE102014007685B4 (de) | 2014-05-21 | 2022-04-07 | Sven Holl | Verfahren zur Herstellung von Hexachlordisilan |
DE102014007766A1 (de) * | 2014-05-21 | 2015-11-26 | Psc Polysilane Chemicals Gmbh | Verfahren zur plasmachemischen Herstellung halogenierter Oligosilane aus Tetrachlorsilan |
DE102014007767A1 (de) * | 2014-05-21 | 2015-11-26 | Psc Polysilane Chemicals Gmbh | Verfahren und Vorrichtung zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan |
DE102014007768A1 (de) | 2014-05-21 | 2015-11-26 | Psc Polysilane Chemicals Gmbh | Verfahren zur Herstellung von Mischungen chlorierter Silane mit erhöhten Anteilen von Si4Cl10 und/oder Si5Cl12 |
CN106604924B (zh) * | 2014-07-22 | 2020-04-03 | 迈图高新材料有限责任公司 | 用于裂解单硅烷、聚硅烷和/或低聚硅烷中的硅-硅键和/或硅-氯键的方法 |
DE102014013250B4 (de) * | 2014-09-08 | 2021-11-25 | Christian Bauch | Verfahren zur Aufreinigung halogenierter Oligosilane |
JP2018502817A (ja) * | 2014-12-15 | 2018-02-01 | ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド | 塩素化オリゴシランの製造方法 |
DE102016014900A1 (de) * | 2016-12-15 | 2018-06-21 | Psc Polysilane Chemicals Gmbh | Verfahren zur Erhöhung der Reinheit von Oligosilanen und Oligosilanverbindungen |
DE102016225872A1 (de) * | 2016-12-21 | 2018-06-21 | Evonik Degussa Gmbh | Verfahren zur Trennung von Gemischen höherer Silane |
EP3596117A4 (en) | 2017-03-17 | 2021-01-13 | The Johns Hopkins University | TARGETED EPIGENETIC THERAPY AGAINST THE DISTAL EXPRESSION REGULATORY ELEMENT OF TGFB2 |
WO2019211301A1 (en) * | 2018-05-02 | 2019-11-07 | Hysilabs, Sas | Process for producing and regenerating hydrogen carrier compounds |
JP7125062B2 (ja) * | 2019-01-25 | 2022-08-24 | 株式会社東芝 | 判定方法及び処理方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008110386A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte synthese |
US7485691B1 (en) * | 2004-10-08 | 2009-02-03 | Kovio, Inc | Polysilane compositions, methods for their synthesis and films formed therefrom |
US7498015B1 (en) * | 2004-02-27 | 2009-03-03 | Kovio, Inc. | Method of making silane compositions |
CN101522759A (zh) * | 2006-07-20 | 2009-09-02 | Rev可再生能源投资公司 | 聚硅烷的处理和用途 |
Family Cites Families (105)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE108077C (zh) | ||||
DE1049835B (de) | 1959-02-05 | Kali-Chemie Aktiengesellschaft, Hannover | Verfahren zur Herstellung von Siliciumhydriden | |
DE340912C (de) | 1916-04-15 | 1921-09-21 | Frank Robert Mc Berty | Einrichtung fuer Fernsprechanlagen |
GB778383A (en) * | 1953-10-02 | 1957-07-03 | Standard Telephones Cables Ltd | Improvements in or relating to the production of material for semi-conductors |
GB793718A (en) | 1955-08-16 | 1958-04-23 | Standard Telephones Cables Ltd | Improvements in or relating to methods of producing silicon of high purity |
GB832333A (en) | 1956-09-28 | 1960-04-06 | Standard Telephones Cables Ltd | Improvements in methods of producing silane of high purity |
DE1034159B (de) | 1956-11-03 | 1958-07-17 | Kali Chemie Ag | Verfahren zur Herstellung von Siliciumhydriden |
DE1061302B (de) | 1956-12-12 | 1959-07-16 | Kali Chemie Ag | Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. und V. Gruppe des Periodischen Systems |
DE1055511B (de) | 1956-12-15 | 1959-04-23 | Kali Chemie Ag | Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. Hauptgruppe des Periodischen Systems mit den Ordnungszahlen 14 bis 50 |
GB823496A (en) | 1957-12-27 | 1959-11-11 | Metal Hydrides Inc | Improvements in method of preparing high purity silicon |
GB851962A (en) | 1958-06-09 | 1960-10-19 | Allied Chem | Production of pure silane |
DE1098931B (de) | 1958-07-03 | 1961-02-09 | Wacker Chemie Gmbh | Verfahren zur Reinigung von geschmolzenem Silicium |
US3050366A (en) | 1959-07-15 | 1962-08-21 | Du Pont | Production of silane by the use of a zinc catalyst |
DE1096341B (de) | 1959-10-15 | 1961-01-05 | Kali Chemie Ag | Verfahren zur Herstellung von Monosilan |
DE1187614B (de) | 1963-07-02 | 1965-02-25 | Bayer Ag | Verfahren zur Herstellung von vorzugsweise organisch substituierten Wasserstoffverbindungen der Elemente Bor und Silicium |
FR1429930A (fr) | 1964-04-17 | 1966-02-25 | Thomson Houston Comp Francaise | Perfectionnements aux méthodes de préparation des hydrures |
DE1568255A1 (de) | 1965-03-03 | 1970-03-19 | Ceskoslovenska Akademie Ved | Verfahren zur Reduktion von Halosiliciumverbindungen |
US3401183A (en) | 1965-12-23 | 1968-09-10 | Gen Electric | Method for preparing organo germanium, tin and silicon hydrides |
US3704261A (en) | 1971-10-18 | 1972-11-28 | Gen Electric | Preparation of silicon hydrides |
BE794871A (fr) | 1972-02-02 | 1973-08-01 | Rhone Poulenc Sa | Nouvelles sulfones isopreniques |
US3926833A (en) | 1973-03-21 | 1975-12-16 | Lithium Corp | Preparation of mixed chlorohydrides of aluminum |
FR2430917A1 (fr) | 1978-07-11 | 1980-02-08 | Comp Generale Electricite | Procede et dispositif d'elaboration de silicium polycristallin |
US4200621A (en) | 1978-07-18 | 1980-04-29 | Motorola, Inc. | Sequential purification and crystal growth |
US4295986A (en) | 1979-05-14 | 1981-10-20 | Gordon Roy G | Low temperature catalytic reduction |
US4309259A (en) | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
US4312849A (en) | 1980-09-09 | 1982-01-26 | Aluminum Company Of America | Phosphorous removal in silicon purification |
DE3034957C2 (de) | 1980-09-17 | 1983-01-13 | Degussa Ag, 6000 Frankfurt | Verfahren und Vorrichtung zum Innenbeschichten von Kontaktrohren |
US4374111A (en) | 1980-11-21 | 1983-02-15 | Allied Corporation | Production of silane |
EP0054650B1 (de) | 1980-12-24 | 1986-01-29 | Hüls Troisdorf Aktiengesellschaft | Verfahren zum Reinigen von Chlorsilanen |
US4374110A (en) | 1981-06-15 | 1983-02-15 | Motorola, Inc. | Purification of silicon source materials |
JPS58156522A (ja) | 1982-03-11 | 1983-09-17 | Mitsui Toatsu Chem Inc | ジシランの製造方法 |
JPS59500416A (ja) | 1982-03-18 | 1984-03-15 | ゼネラル・エレクトリック・カンパニイ | ハロゲン化けい素の精製法 |
US4755370A (en) | 1982-03-18 | 1988-07-05 | General Electric Company | Purification of silicon halides |
US4407783A (en) | 1982-08-16 | 1983-10-04 | Allied Corporation | Producing silane from silicon tetrafluoride |
FR2532293A1 (fr) | 1982-08-31 | 1984-03-02 | Rhone Poulenc Spec Chim | Procede continu de preparation de silane |
US4529707A (en) | 1982-09-21 | 1985-07-16 | General Electric Company | Detection of boron impurities in chlorosilanes |
FR2533906A1 (fr) | 1982-09-30 | 1984-04-06 | Rhone Poulenc Spec Chim | Procede et dispositif pour la preparation de silane pur par reaction de chlorosilanes avec l'hydrure de lithium |
US4632816A (en) * | 1982-12-13 | 1986-12-30 | Ethyl Corporation | Process for production of silane |
WO1984002332A1 (en) | 1982-12-13 | 1984-06-21 | Ethyl Corp | Process for production of silane |
DE3247362A1 (de) | 1982-12-22 | 1984-06-28 | Studiengesellschaft Kohle mbH, 4330 Mülheim | Verfahren zur herstellung von silicium-wasserstoff-verbindungen, insbesondere des silans |
DE3342496A1 (de) | 1983-11-24 | 1985-06-05 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum reinigen von mg-silicium |
JPS60176915A (ja) | 1984-02-21 | 1985-09-11 | Central Glass Co Ltd | ジシランの製造法 |
JPS60221322A (ja) * | 1984-04-13 | 1985-11-06 | Mitsui Toatsu Chem Inc | ゲルマン類の製法 |
FR2576902B1 (fr) | 1985-02-04 | 1987-02-13 | Rhone Poulenc Spec Chim | Procede de fabrication d'hydrogeno-silanes |
JPS61191512A (ja) | 1985-02-20 | 1986-08-26 | Toagosei Chem Ind Co Ltd | ジシランの製造方法 |
US4778692A (en) * | 1985-02-20 | 1988-10-18 | Canon Kabushiki Kaisha | Process for forming deposited film |
JPS61191022A (ja) * | 1985-02-20 | 1986-08-25 | Canon Inc | 堆積膜形成法 |
JPH0688773B2 (ja) | 1985-03-08 | 1994-11-09 | 三井東圧化学株式会社 | ヘキサクロロジシランの製造方法 |
US4725419A (en) | 1985-05-17 | 1988-02-16 | Ethyl Corporation | Silane production from magnesium hydride |
EP0316472A1 (en) | 1987-11-17 | 1989-05-24 | Ethyl Corporation | Silane production from magnesium hydride |
JPS6217004A (ja) * | 1985-07-12 | 1987-01-26 | Mitsui Toatsu Chem Inc | ゲルマン類の製造方法 |
US4824657A (en) | 1985-11-27 | 1989-04-25 | E. I. Du Pont De Nemours And Company | Process for reducing silicon, germanium and tin halides |
US4777023A (en) | 1986-02-18 | 1988-10-11 | Solarex Corporation | Preparation of silicon and germanium hydrides containing two different group 4A atoms |
US4792460A (en) * | 1986-07-15 | 1988-12-20 | Electric Power Research Institute, Inc. | Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium |
DE3635064A1 (de) | 1986-10-15 | 1988-04-21 | Bayer Ag | Verfahren zur raffination von silicium und derart gereinigtes silicium |
US4762808A (en) | 1987-06-22 | 1988-08-09 | Dow Corning Corporation | Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes |
US4847061A (en) | 1987-07-20 | 1989-07-11 | Ethyl Corporation | Process for preparation of silane |
JP2536027B2 (ja) | 1988-03-16 | 1996-09-18 | 東亞合成株式会社 | ジシランの製造方法 |
US4855120A (en) | 1988-10-24 | 1989-08-08 | Ethyl Corporation | Production of silane and useful coproducts |
DE3926595A1 (de) | 1989-08-11 | 1991-02-14 | Degussa | Verfahren zur hydrierung halogensubstituierter verbindungen |
JPH03205055A (ja) | 1990-01-04 | 1991-09-06 | Hara Herusu Kogyo Kk | 浴槽の気泡発生装置 |
US5061470A (en) | 1990-08-03 | 1991-10-29 | Ethyl Corporation | Silane production from hydridomagnesium chloride |
JPH04130010A (ja) | 1990-09-20 | 1992-05-01 | Toagosei Chem Ind Co Ltd | ジシランの製造方法 |
JP2965094B2 (ja) * | 1991-06-28 | 1999-10-18 | キヤノン株式会社 | 堆積膜形成方法 |
DE4239246C1 (de) * | 1992-11-21 | 1993-12-16 | Goldschmidt Ag Th | Verfahren zur Herstellung von SiH-Gruppen aufweisenden Organopolysiloxanen |
DE4306106A1 (de) | 1993-02-27 | 1994-09-01 | Thomas Dipl Chem Lobreyer | Verfahren zur Herstellung von Silylgermanen |
DE4313130C1 (de) | 1993-04-22 | 1994-05-26 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
JPH08231949A (ja) * | 1995-02-22 | 1996-09-10 | Osaka Gas Co Ltd | 有機電界発光素子 |
JPH09237927A (ja) * | 1995-12-26 | 1997-09-09 | Toshiba Corp | 半導体薄膜形成方法および太陽電池の製造方法 |
US5866471A (en) * | 1995-12-26 | 1999-02-02 | Kabushiki Kaisha Toshiba | Method of forming semiconductor thin film and method of fabricating solar cell |
DE19812587C1 (de) | 1998-03-23 | 1999-09-23 | Wolfgang Sundermeyer | Verfahren zur Hydrierung halogensubstituierter Siliziumverbindungen |
JP2002246384A (ja) | 2001-02-21 | 2002-08-30 | Jsr Corp | シリコン酸化膜の形成方法および形成用組成物 |
FR2827592B1 (fr) | 2001-07-23 | 2003-08-22 | Invensil | Silicium metallurgique de haute purete et procede d'elaboration |
KR100434698B1 (ko) * | 2001-09-05 | 2004-06-07 | 주식회사 하이닉스반도체 | 반도체소자의 선택적 에피성장법 |
TWI231750B (en) | 2002-07-17 | 2005-05-01 | Delta Tooling Co Ltd | Seat structure |
WO2005001902A2 (en) | 2003-06-13 | 2005-01-06 | Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University | Gesn alloys and ordered phases with direct tunable bandgaps grown directly on silicon |
US7879696B2 (en) * | 2003-07-08 | 2011-02-01 | Kovio, Inc. | Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom |
DE10337309A1 (de) | 2003-08-14 | 2005-03-10 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
US7314513B1 (en) * | 2004-09-24 | 2008-01-01 | Kovio, Inc. | Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions |
WO2006109427A1 (ja) | 2005-04-07 | 2006-10-19 | Toagosei Co., Ltd. | 六塩化二ケイ素の精製方法及び高純度六塩化二ケイ素 |
DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
WO2007044429A2 (en) | 2005-10-05 | 2007-04-19 | Nanogram Corporation | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
JP5265377B2 (ja) | 2005-11-23 | 2013-08-14 | アリゾナ ボード オブ リージェンツ ア ボディー コーポレート アクティング オン ビハーフ オブ アリゾナ ステイト ユニバーシティ | 新規な水素化シリコンゲルマニウム、その製造法および使用法 |
JP5265376B2 (ja) | 2005-11-23 | 2013-08-14 | アリゾナ ボード オブ リージェンツ ア ボディー コーポレート アクティング オン ビハーフ オブ アリゾナ ステイト ユニバーシティ | 新規な水素化シリコンゲルマニウム、その製造法および使用法 |
NO326254B1 (no) * | 2005-12-22 | 2008-10-27 | Sinvent As | Fremgangsmate for fremstilling av silan |
JP2007254593A (ja) * | 2006-03-23 | 2007-10-04 | Jsr Corp | ゲルマニウムポリマー、その製造法およびゲルマニウム膜の形成方法 |
KR101269201B1 (ko) * | 2006-06-30 | 2013-05-28 | 삼성전자주식회사 | 폐 루프 방식의 다중 안테나 시스템에서 데이터송/수신장치 및 방법 |
EP2072464A4 (en) | 2006-09-29 | 2010-09-01 | Shinetsu Chemical Co | PROCESS FOR CLEANING SILICON, SILICON AND SOLAR CELL |
EP2069368A4 (en) * | 2006-10-06 | 2011-06-22 | Kovio Inc | SILICON POLYMERS, METHODS FOR POLYMERIZING SILICON COMPOUNDS, AND METHODS FOR FORMING THIN FILMS OF SILICON POLYMERS |
JP5103480B2 (ja) | 2006-10-24 | 2012-12-19 | ダウ・コーニング・コーポレイション | ネオペンタシランを含む組成物及びその製造方法 |
DE102007007874A1 (de) * | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
CN101687651B (zh) * | 2007-03-30 | 2013-04-24 | 斯伯恩特私人有限公司 | 催化氢化 |
US8530589B2 (en) * | 2007-05-04 | 2013-09-10 | Kovio, Inc. | Print processing for patterned conductor, semiconductor and dielectric materials |
JP4714198B2 (ja) | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
DE102007000841A1 (de) | 2007-10-09 | 2009-04-16 | Wacker Chemie Ag | Verfahren zur Herstellung von hochreinem Hexachlordisilan |
DE102008025263B4 (de) | 2008-05-27 | 2015-08-06 | Spawnt Private S.À.R.L. | Verfahren zum Aufreinigen von metallurgischem Silicium |
DE102008025260B4 (de) | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und thermisches Verfahren zu dessen Herstellung |
DE102008025261B4 (de) | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung |
MY157133A (en) | 2008-05-27 | 2016-05-13 | Spawnt Private S À R L | Silicon containing halogenide, method for producing the same, and use of the same |
DE102008036143A1 (de) | 2008-08-01 | 2010-02-04 | Berlinsolar Gmbh | Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium |
JP6117471B2 (ja) | 2008-09-17 | 2017-04-19 | ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド | 第iii族ないし第v族典型元素のハロゲン化オリゴマーおよび/またはハロゲン化ポリマーの製造方法 |
JP5206334B2 (ja) | 2008-11-07 | 2013-06-12 | 東亞合成株式会社 | クロロポリシランの製造方法 |
DE102008054537A1 (de) * | 2008-12-11 | 2010-06-17 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
DE102009056437B4 (de) | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen |
DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
-
2009
- 2009-12-04 DE DE102009056731A patent/DE102009056731A1/de not_active Withdrawn
-
2010
- 2010-12-06 TW TW099142320A patent/TW201132587A/zh unknown
- 2010-12-06 US US13/513,611 patent/US9458294B2/en not_active Expired - Fee Related
- 2010-12-06 CN CN2010800551644A patent/CN102639644A/zh active Pending
- 2010-12-06 TW TW099142326A patent/TW201139283A/zh unknown
- 2010-12-06 EP EP10788316A patent/EP2507171A1/de not_active Withdrawn
- 2010-12-06 CA CA2782247A patent/CA2782247A1/en not_active Abandoned
- 2010-12-06 EP EP10787123A patent/EP2507317A1/de not_active Withdrawn
- 2010-12-06 EP EP10792879.8A patent/EP2507172B1/de not_active Not-in-force
- 2010-12-06 EP EP10793199.0A patent/EP2507174B1/de not_active Revoked
- 2010-12-06 BR BR112012013500A patent/BR112012013500A2/pt not_active IP Right Cessation
- 2010-12-06 EP EP10787448A patent/EP2507169A1/de not_active Withdrawn
- 2010-12-06 JP JP2012541537A patent/JP5731531B2/ja not_active Expired - Fee Related
- 2010-12-06 WO PCT/EP2010/068994 patent/WO2011067417A1/de active Application Filing
- 2010-12-06 TW TW099142328A patent/TWI580710B/zh not_active IP Right Cessation
- 2010-12-06 WO PCT/EP2010/068974 patent/WO2011067410A1/de active Application Filing
- 2010-12-06 TW TW099142322A patent/TWI589527B/zh not_active IP Right Cessation
- 2010-12-06 TW TW099142323A patent/TWI561559B/zh not_active IP Right Cessation
- 2010-12-06 TW TW099142324A patent/TW201134764A/zh unknown
- 2010-12-06 BR BR112012014106A patent/BR112012014106A2/pt not_active IP Right Cessation
- 2010-12-06 WO PCT/EP2010/068991 patent/WO2011067415A1/de active Application Filing
- 2010-12-06 US US13/513,217 patent/US20120315392A1/en not_active Abandoned
- 2010-12-06 WO PCT/EP2010/068979 patent/WO2011067411A1/de active Application Filing
- 2010-12-06 TW TW099142321A patent/TW201132708A/zh unknown
- 2010-12-06 CN CN201080054817.7A patent/CN102666381B/zh not_active Expired - Fee Related
- 2010-12-06 US US13/512,760 patent/US20130043429A1/en not_active Abandoned
- 2010-12-06 US US13/513,384 patent/US20120321540A1/en not_active Abandoned
- 2010-12-06 US US13/512,999 patent/US9139702B2/en not_active Expired - Fee Related
- 2010-12-06 WO PCT/EP2010/068986 patent/WO2011067413A2/de active Application Filing
- 2010-12-06 CA CA2782226A patent/CA2782226A1/en not_active Abandoned
- 2010-12-06 JP JP2012541539A patent/JP2013512845A/ja active Pending
- 2010-12-06 CN CN201080055163.XA patent/CN102639609B/zh not_active Expired - Fee Related
- 2010-12-06 EP EP10787451A patent/EP2507299A2/de not_active Withdrawn
- 2010-12-06 WO PCT/EP2010/068993 patent/WO2011067416A1/de active Application Filing
- 2010-12-06 US US13/513,018 patent/US9040009B2/en not_active Expired - Fee Related
- 2010-12-06 EP EP10787124.6A patent/EP2507296B1/de not_active Revoked
- 2010-12-06 JP JP2012541535A patent/JP2013512842A/ja active Pending
- 2010-12-06 JP JP2012541533A patent/JP6297778B2/ja not_active Expired - Fee Related
- 2010-12-06 JP JP2012541538A patent/JP2013512844A/ja not_active Ceased
- 2010-12-06 US US13/513,036 patent/US20130004666A1/en not_active Abandoned
- 2010-12-06 WO PCT/EP2010/068995 patent/WO2011067418A1/de active Application Filing
-
2016
- 2016-04-28 JP JP2016090381A patent/JP2016179935A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7498015B1 (en) * | 2004-02-27 | 2009-03-03 | Kovio, Inc. | Method of making silane compositions |
US7485691B1 (en) * | 2004-10-08 | 2009-02-03 | Kovio, Inc | Polysilane compositions, methods for their synthesis and films formed therefrom |
CN101522759A (zh) * | 2006-07-20 | 2009-09-02 | Rev可再生能源投资公司 | 聚硅烷的处理和用途 |
WO2008110386A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte synthese |
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI561559B (en) | Process for producing hydrogenated polygermasilane and polygermasilane | |
EP2455220A4 (en) | LAMINATE AND METHOD FOR ITS PRODUCTION | |
EP2448966A4 (en) | IMMUNOCONJUGATES AND THEIR PRODUCTION METHODS | |
EP2291419A4 (en) | POLYMACROMONOMER AND PROCESS FOR PRODUCING THE SAME | |
EP2451259A4 (en) | MODULE AND PRODUCTION METHOD THEREOF | |
EP2508473A4 (en) | HYDROGEN PRODUCTION APPARATUS AND METHOD FOR PRODUCING HYDROGEN | |
SG10201403566SA (en) | Composition and process for production thereof | |
EP2415435A4 (en) | ABSORBENT ARTICLE AND METHOD FOR PRODUCING THE SUCTIONABLE ARTICLE | |
IL216305A0 (en) | Solid forms and process for preparing | |
EP2431014A4 (en) | BUFFER AND MANUFACTURING METHOD THEREFOR | |
EP2437332A4 (en) | POSITIVE ELECTRODE AND METHOD OF MANUFACTURE THEREOF | |
EP2474560A4 (en) | METHOD OF PREPARING AN 11 SUGAR SIALYLOLIGOSACCHARIDE PEPTIDE | |
EP2492248A4 (en) | GLASS PLATE ABSORBING THERMAL RADIATION AND METHOD FOR MANUFACTURING THE SAME | |
HK1176825A1 (zh) | 方便麵及其製造方法 | |
EP2450419A4 (en) | IRON KOKS MANUFACTURING METHOD AND MANUFACTURER | |
EP2471475A4 (en) | CANNULA AND METHOD FOR PRODUCING THE SAME | |
ZA201106240B (en) | Method and means for producing tissues and tissues obtained | |
EP2404985A4 (en) | PROCESS FOR PRODUCING LIPID | |
EP2488604A4 (en) | METHOD AND APPARATUS FOR PRODUCING BIOCARBON | |
IL214287A0 (en) | Method for producing 2-aminobiphenylene | |
HK1204444A1 (zh) | 施用裝置和容器以及形成雙眼瞼的方法 | |
HK1171701A1 (zh) | 聚合物泡囊及製造方法 | |
IL210610A0 (en) | Process for producing 6-aryloxyquinoline derivative and intermediate thereof | |
SG175182A1 (en) | Highly selective process for producing organodiphosphites | |
EP2487150A4 (en) | PROCESS FOR PRODUCING 2 ALKYLCYCLOALCANONE |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |