TWI561559B - Process for producing hydrogenated polygermasilane and polygermasilane - Google Patents

Process for producing hydrogenated polygermasilane and polygermasilane

Info

Publication number
TWI561559B
TWI561559B TW099142323A TW99142323A TWI561559B TW I561559 B TWI561559 B TW I561559B TW 099142323 A TW099142323 A TW 099142323A TW 99142323 A TW99142323 A TW 99142323A TW I561559 B TWI561559 B TW I561559B
Authority
TW
Taiwan
Prior art keywords
polygermasilane
producing hydrogenated
hydrogenated
producing
hydrogenated polygermasilane
Prior art date
Application number
TW099142323A
Other languages
English (en)
Other versions
TW201132682A (en
Inventor
Norbert Auner
Sven Holl
Christian Bauch
Gerd Lippold
Rumen Deltschew
Seyed-Javad Mohsseni-Ala
Thoralf Gebel
Original Assignee
Spawnt Private Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=43499339&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI561559(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Spawnt Private Sarl filed Critical Spawnt Private Sarl
Publication of TW201132682A publication Critical patent/TW201132682A/zh
Application granted granted Critical
Publication of TWI561559B publication Critical patent/TWI561559B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/04Hydrides of silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00Compounds of germanium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G79/00Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
    • C08G79/14Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing two or more elements other than carbon, oxygen, nitrogen, sulfur and silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/582Recycling of unreacted starting or intermediate materials
TW099142323A 2009-12-04 2010-12-06 Process for producing hydrogenated polygermasilane and polygermasilane TWI561559B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009056731A DE102009056731A1 (de) 2009-12-04 2009-12-04 Halogenierte Polysilane und Polygermane

Publications (2)

Publication Number Publication Date
TW201132682A TW201132682A (en) 2011-10-01
TWI561559B true TWI561559B (en) 2016-12-11

Family

ID=43499339

Family Applications (7)

Application Number Title Priority Date Filing Date
TW099142320A TW201132587A (en) 2009-12-04 2010-12-06 Method of removing impurities from silicon
TW099142326A TW201139283A (en) 2009-12-04 2010-12-06 Chlorinated oligogermane and method of manufacturing the same
TW099142328A TWI580710B (zh) 2009-12-04 2010-12-06 鹵化聚矽烷的製備方法
TW099142322A TWI589527B (zh) 2009-12-04 2010-12-06 氫化鍺烷之生產方法以及氫化鍺烷
TW099142323A TWI561559B (en) 2009-12-04 2010-12-06 Process for producing hydrogenated polygermasilane and polygermasilane
TW099142324A TW201134764A (en) 2009-12-04 2010-12-06 Method of producing oligosilane
TW099142321A TW201132708A (en) 2009-12-04 2010-12-06 Kinetically stable chlorinated polysilane, method of manufacturing the same, and use of the same

Family Applications Before (4)

Application Number Title Priority Date Filing Date
TW099142320A TW201132587A (en) 2009-12-04 2010-12-06 Method of removing impurities from silicon
TW099142326A TW201139283A (en) 2009-12-04 2010-12-06 Chlorinated oligogermane and method of manufacturing the same
TW099142328A TWI580710B (zh) 2009-12-04 2010-12-06 鹵化聚矽烷的製備方法
TW099142322A TWI589527B (zh) 2009-12-04 2010-12-06 氫化鍺烷之生產方法以及氫化鍺烷

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW099142324A TW201134764A (en) 2009-12-04 2010-12-06 Method of producing oligosilane
TW099142321A TW201132708A (en) 2009-12-04 2010-12-06 Kinetically stable chlorinated polysilane, method of manufacturing the same, and use of the same

Country Status (9)

Country Link
US (7) US9458294B2 (zh)
EP (7) EP2507171A1 (zh)
JP (6) JP5731531B2 (zh)
CN (3) CN102639644A (zh)
BR (2) BR112012013500A2 (zh)
CA (2) CA2782247A1 (zh)
DE (1) DE102009056731A1 (zh)
TW (7) TW201132587A (zh)
WO (7) WO2011067417A1 (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009056731A1 (de) 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane
CN102918684B (zh) 2010-05-28 2016-09-14 巴斯夫欧洲公司 膨胀石墨在锂/硫电池组中的用途
KR101250172B1 (ko) * 2012-08-20 2013-04-05 오씨아이머티리얼즈 주식회사 고수율로 모노 게르만 가스를 제조하는 방법
DE102012224202A1 (de) * 2012-12-21 2014-07-10 Evonik Industries Ag Verfahren zum Hydrieren höherer Halogen-haltiger Silanverbindungen
DE102013207447A1 (de) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan
DE102013207444A1 (de) 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen
US9174853B2 (en) 2013-12-06 2015-11-03 Gelest Technologies, Inc. Method for producing high purity germane by a continuous or semi-continuous process
DE102014007685B4 (de) 2014-05-21 2022-04-07 Sven Holl Verfahren zur Herstellung von Hexachlordisilan
DE102014007766A1 (de) * 2014-05-21 2015-11-26 Psc Polysilane Chemicals Gmbh Verfahren zur plasmachemischen Herstellung halogenierter Oligosilane aus Tetrachlorsilan
DE102014007767A1 (de) * 2014-05-21 2015-11-26 Psc Polysilane Chemicals Gmbh Verfahren und Vorrichtung zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan
DE102014007768A1 (de) 2014-05-21 2015-11-26 Psc Polysilane Chemicals Gmbh Verfahren zur Herstellung von Mischungen chlorierter Silane mit erhöhten Anteilen von Si4Cl10 und/oder Si5Cl12
CN106604924B (zh) * 2014-07-22 2020-04-03 迈图高新材料有限责任公司 用于裂解单硅烷、聚硅烷和/或低聚硅烷中的硅-硅键和/或硅-氯键的方法
DE102014013250B4 (de) * 2014-09-08 2021-11-25 Christian Bauch Verfahren zur Aufreinigung halogenierter Oligosilane
JP2018502817A (ja) * 2014-12-15 2018-02-01 ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド 塩素化オリゴシランの製造方法
DE102016014900A1 (de) * 2016-12-15 2018-06-21 Psc Polysilane Chemicals Gmbh Verfahren zur Erhöhung der Reinheit von Oligosilanen und Oligosilanverbindungen
DE102016225872A1 (de) * 2016-12-21 2018-06-21 Evonik Degussa Gmbh Verfahren zur Trennung von Gemischen höherer Silane
EP3596117A4 (en) 2017-03-17 2021-01-13 The Johns Hopkins University TARGETED EPIGENETIC THERAPY AGAINST THE DISTAL EXPRESSION REGULATORY ELEMENT OF TGFB2
WO2019211301A1 (en) * 2018-05-02 2019-11-07 Hysilabs, Sas Process for producing and regenerating hydrogen carrier compounds
JP7125062B2 (ja) * 2019-01-25 2022-08-24 株式会社東芝 判定方法及び処理方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008110386A1 (de) * 2007-03-15 2008-09-18 Rev Renewable Energy Ventures, Inc. Plasmagestützte synthese
US7485691B1 (en) * 2004-10-08 2009-02-03 Kovio, Inc Polysilane compositions, methods for their synthesis and films formed therefrom
US7498015B1 (en) * 2004-02-27 2009-03-03 Kovio, Inc. Method of making silane compositions
CN101522759A (zh) * 2006-07-20 2009-09-02 Rev可再生能源投资公司 聚硅烷的处理和用途

Family Cites Families (105)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE108077C (zh)
DE1049835B (de) 1959-02-05 Kali-Chemie Aktiengesellschaft, Hannover Verfahren zur Herstellung von Siliciumhydriden
DE340912C (de) 1916-04-15 1921-09-21 Frank Robert Mc Berty Einrichtung fuer Fernsprechanlagen
GB778383A (en) * 1953-10-02 1957-07-03 Standard Telephones Cables Ltd Improvements in or relating to the production of material for semi-conductors
GB793718A (en) 1955-08-16 1958-04-23 Standard Telephones Cables Ltd Improvements in or relating to methods of producing silicon of high purity
GB832333A (en) 1956-09-28 1960-04-06 Standard Telephones Cables Ltd Improvements in methods of producing silane of high purity
DE1034159B (de) 1956-11-03 1958-07-17 Kali Chemie Ag Verfahren zur Herstellung von Siliciumhydriden
DE1061302B (de) 1956-12-12 1959-07-16 Kali Chemie Ag Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. und V. Gruppe des Periodischen Systems
DE1055511B (de) 1956-12-15 1959-04-23 Kali Chemie Ag Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. Hauptgruppe des Periodischen Systems mit den Ordnungszahlen 14 bis 50
GB823496A (en) 1957-12-27 1959-11-11 Metal Hydrides Inc Improvements in method of preparing high purity silicon
GB851962A (en) 1958-06-09 1960-10-19 Allied Chem Production of pure silane
DE1098931B (de) 1958-07-03 1961-02-09 Wacker Chemie Gmbh Verfahren zur Reinigung von geschmolzenem Silicium
US3050366A (en) 1959-07-15 1962-08-21 Du Pont Production of silane by the use of a zinc catalyst
DE1096341B (de) 1959-10-15 1961-01-05 Kali Chemie Ag Verfahren zur Herstellung von Monosilan
DE1187614B (de) 1963-07-02 1965-02-25 Bayer Ag Verfahren zur Herstellung von vorzugsweise organisch substituierten Wasserstoffverbindungen der Elemente Bor und Silicium
FR1429930A (fr) 1964-04-17 1966-02-25 Thomson Houston Comp Francaise Perfectionnements aux méthodes de préparation des hydrures
DE1568255A1 (de) 1965-03-03 1970-03-19 Ceskoslovenska Akademie Ved Verfahren zur Reduktion von Halosiliciumverbindungen
US3401183A (en) 1965-12-23 1968-09-10 Gen Electric Method for preparing organo germanium, tin and silicon hydrides
US3704261A (en) 1971-10-18 1972-11-28 Gen Electric Preparation of silicon hydrides
BE794871A (fr) 1972-02-02 1973-08-01 Rhone Poulenc Sa Nouvelles sulfones isopreniques
US3926833A (en) 1973-03-21 1975-12-16 Lithium Corp Preparation of mixed chlorohydrides of aluminum
FR2430917A1 (fr) 1978-07-11 1980-02-08 Comp Generale Electricite Procede et dispositif d'elaboration de silicium polycristallin
US4200621A (en) 1978-07-18 1980-04-29 Motorola, Inc. Sequential purification and crystal growth
US4295986A (en) 1979-05-14 1981-10-20 Gordon Roy G Low temperature catalytic reduction
US4309259A (en) 1980-05-09 1982-01-05 Motorola, Inc. High pressure plasma hydrogenation of silicon tetrachloride
US4312849A (en) 1980-09-09 1982-01-26 Aluminum Company Of America Phosphorous removal in silicon purification
DE3034957C2 (de) 1980-09-17 1983-01-13 Degussa Ag, 6000 Frankfurt Verfahren und Vorrichtung zum Innenbeschichten von Kontaktrohren
US4374111A (en) 1980-11-21 1983-02-15 Allied Corporation Production of silane
EP0054650B1 (de) 1980-12-24 1986-01-29 Hüls Troisdorf Aktiengesellschaft Verfahren zum Reinigen von Chlorsilanen
US4374110A (en) 1981-06-15 1983-02-15 Motorola, Inc. Purification of silicon source materials
JPS58156522A (ja) 1982-03-11 1983-09-17 Mitsui Toatsu Chem Inc ジシランの製造方法
JPS59500416A (ja) 1982-03-18 1984-03-15 ゼネラル・エレクトリック・カンパニイ ハロゲン化けい素の精製法
US4755370A (en) 1982-03-18 1988-07-05 General Electric Company Purification of silicon halides
US4407783A (en) 1982-08-16 1983-10-04 Allied Corporation Producing silane from silicon tetrafluoride
FR2532293A1 (fr) 1982-08-31 1984-03-02 Rhone Poulenc Spec Chim Procede continu de preparation de silane
US4529707A (en) 1982-09-21 1985-07-16 General Electric Company Detection of boron impurities in chlorosilanes
FR2533906A1 (fr) 1982-09-30 1984-04-06 Rhone Poulenc Spec Chim Procede et dispositif pour la preparation de silane pur par reaction de chlorosilanes avec l'hydrure de lithium
US4632816A (en) * 1982-12-13 1986-12-30 Ethyl Corporation Process for production of silane
WO1984002332A1 (en) 1982-12-13 1984-06-21 Ethyl Corp Process for production of silane
DE3247362A1 (de) 1982-12-22 1984-06-28 Studiengesellschaft Kohle mbH, 4330 Mülheim Verfahren zur herstellung von silicium-wasserstoff-verbindungen, insbesondere des silans
DE3342496A1 (de) 1983-11-24 1985-06-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zum reinigen von mg-silicium
JPS60176915A (ja) 1984-02-21 1985-09-11 Central Glass Co Ltd ジシランの製造法
JPS60221322A (ja) * 1984-04-13 1985-11-06 Mitsui Toatsu Chem Inc ゲルマン類の製法
FR2576902B1 (fr) 1985-02-04 1987-02-13 Rhone Poulenc Spec Chim Procede de fabrication d'hydrogeno-silanes
JPS61191512A (ja) 1985-02-20 1986-08-26 Toagosei Chem Ind Co Ltd ジシランの製造方法
US4778692A (en) * 1985-02-20 1988-10-18 Canon Kabushiki Kaisha Process for forming deposited film
JPS61191022A (ja) * 1985-02-20 1986-08-25 Canon Inc 堆積膜形成法
JPH0688773B2 (ja) 1985-03-08 1994-11-09 三井東圧化学株式会社 ヘキサクロロジシランの製造方法
US4725419A (en) 1985-05-17 1988-02-16 Ethyl Corporation Silane production from magnesium hydride
EP0316472A1 (en) 1987-11-17 1989-05-24 Ethyl Corporation Silane production from magnesium hydride
JPS6217004A (ja) * 1985-07-12 1987-01-26 Mitsui Toatsu Chem Inc ゲルマン類の製造方法
US4824657A (en) 1985-11-27 1989-04-25 E. I. Du Pont De Nemours And Company Process for reducing silicon, germanium and tin halides
US4777023A (en) 1986-02-18 1988-10-11 Solarex Corporation Preparation of silicon and germanium hydrides containing two different group 4A atoms
US4792460A (en) * 1986-07-15 1988-12-20 Electric Power Research Institute, Inc. Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium
DE3635064A1 (de) 1986-10-15 1988-04-21 Bayer Ag Verfahren zur raffination von silicium und derart gereinigtes silicium
US4762808A (en) 1987-06-22 1988-08-09 Dow Corning Corporation Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes
US4847061A (en) 1987-07-20 1989-07-11 Ethyl Corporation Process for preparation of silane
JP2536027B2 (ja) 1988-03-16 1996-09-18 東亞合成株式会社 ジシランの製造方法
US4855120A (en) 1988-10-24 1989-08-08 Ethyl Corporation Production of silane and useful coproducts
DE3926595A1 (de) 1989-08-11 1991-02-14 Degussa Verfahren zur hydrierung halogensubstituierter verbindungen
JPH03205055A (ja) 1990-01-04 1991-09-06 Hara Herusu Kogyo Kk 浴槽の気泡発生装置
US5061470A (en) 1990-08-03 1991-10-29 Ethyl Corporation Silane production from hydridomagnesium chloride
JPH04130010A (ja) 1990-09-20 1992-05-01 Toagosei Chem Ind Co Ltd ジシランの製造方法
JP2965094B2 (ja) * 1991-06-28 1999-10-18 キヤノン株式会社 堆積膜形成方法
DE4239246C1 (de) * 1992-11-21 1993-12-16 Goldschmidt Ag Th Verfahren zur Herstellung von SiH-Gruppen aufweisenden Organopolysiloxanen
DE4306106A1 (de) 1993-02-27 1994-09-01 Thomas Dipl Chem Lobreyer Verfahren zur Herstellung von Silylgermanen
DE4313130C1 (de) 1993-04-22 1994-05-26 Goldschmidt Ag Th Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide
JPH08231949A (ja) * 1995-02-22 1996-09-10 Osaka Gas Co Ltd 有機電界発光素子
JPH09237927A (ja) * 1995-12-26 1997-09-09 Toshiba Corp 半導体薄膜形成方法および太陽電池の製造方法
US5866471A (en) * 1995-12-26 1999-02-02 Kabushiki Kaisha Toshiba Method of forming semiconductor thin film and method of fabricating solar cell
DE19812587C1 (de) 1998-03-23 1999-09-23 Wolfgang Sundermeyer Verfahren zur Hydrierung halogensubstituierter Siliziumverbindungen
JP2002246384A (ja) 2001-02-21 2002-08-30 Jsr Corp シリコン酸化膜の形成方法および形成用組成物
FR2827592B1 (fr) 2001-07-23 2003-08-22 Invensil Silicium metallurgique de haute purete et procede d'elaboration
KR100434698B1 (ko) * 2001-09-05 2004-06-07 주식회사 하이닉스반도체 반도체소자의 선택적 에피성장법
TWI231750B (en) 2002-07-17 2005-05-01 Delta Tooling Co Ltd Seat structure
WO2005001902A2 (en) 2003-06-13 2005-01-06 Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University Gesn alloys and ordered phases with direct tunable bandgaps grown directly on silicon
US7879696B2 (en) * 2003-07-08 2011-02-01 Kovio, Inc. Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom
DE10337309A1 (de) 2003-08-14 2005-03-10 Goldschmidt Ag Th Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide
US7314513B1 (en) * 2004-09-24 2008-01-01 Kovio, Inc. Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions
WO2006109427A1 (ja) 2005-04-07 2006-10-19 Toagosei Co., Ltd. 六塩化二ケイ素の精製方法及び高純度六塩化二ケイ素
DE102005024041A1 (de) 2005-05-25 2006-11-30 City Solar Ag Verfahren zur Herstellung von Silicium aus Halogensilanen
WO2007044429A2 (en) 2005-10-05 2007-04-19 Nanogram Corporation Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions
JP5265377B2 (ja) 2005-11-23 2013-08-14 アリゾナ ボード オブ リージェンツ ア ボディー コーポレート アクティング オン ビハーフ オブ アリゾナ ステイト ユニバーシティ 新規な水素化シリコンゲルマニウム、その製造法および使用法
JP5265376B2 (ja) 2005-11-23 2013-08-14 アリゾナ ボード オブ リージェンツ ア ボディー コーポレート アクティング オン ビハーフ オブ アリゾナ ステイト ユニバーシティ 新規な水素化シリコンゲルマニウム、その製造法および使用法
NO326254B1 (no) * 2005-12-22 2008-10-27 Sinvent As Fremgangsmate for fremstilling av silan
JP2007254593A (ja) * 2006-03-23 2007-10-04 Jsr Corp ゲルマニウムポリマー、その製造法およびゲルマニウム膜の形成方法
KR101269201B1 (ko) * 2006-06-30 2013-05-28 삼성전자주식회사 폐 루프 방식의 다중 안테나 시스템에서 데이터송/수신장치 및 방법
EP2072464A4 (en) 2006-09-29 2010-09-01 Shinetsu Chemical Co PROCESS FOR CLEANING SILICON, SILICON AND SOLAR CELL
EP2069368A4 (en) * 2006-10-06 2011-06-22 Kovio Inc SILICON POLYMERS, METHODS FOR POLYMERIZING SILICON COMPOUNDS, AND METHODS FOR FORMING THIN FILMS OF SILICON POLYMERS
JP5103480B2 (ja) 2006-10-24 2012-12-19 ダウ・コーニング・コーポレイション ネオペンタシランを含む組成物及びその製造方法
DE102007007874A1 (de) * 2007-02-14 2008-08-21 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Silane
CN101687651B (zh) * 2007-03-30 2013-04-24 斯伯恩特私人有限公司 催化氢化
US8530589B2 (en) * 2007-05-04 2013-09-10 Kovio, Inc. Print processing for patterned conductor, semiconductor and dielectric materials
JP4714198B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 クロロシラン類の精製方法
DE102007000841A1 (de) 2007-10-09 2009-04-16 Wacker Chemie Ag Verfahren zur Herstellung von hochreinem Hexachlordisilan
DE102008025263B4 (de) 2008-05-27 2015-08-06 Spawnt Private S.À.R.L. Verfahren zum Aufreinigen von metallurgischem Silicium
DE102008025260B4 (de) 2008-05-27 2010-03-18 Rev Renewable Energy Ventures, Inc. Halogeniertes Polysilan und thermisches Verfahren zu dessen Herstellung
DE102008025261B4 (de) 2008-05-27 2010-03-18 Rev Renewable Energy Ventures, Inc. Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung
MY157133A (en) 2008-05-27 2016-05-13 Spawnt Private S À R L Silicon containing halogenide, method for producing the same, and use of the same
DE102008036143A1 (de) 2008-08-01 2010-02-04 Berlinsolar Gmbh Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium
JP6117471B2 (ja) 2008-09-17 2017-04-19 ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド 第iii族ないし第v族典型元素のハロゲン化オリゴマーおよび/またはハロゲン化ポリマーの製造方法
JP5206334B2 (ja) 2008-11-07 2013-06-12 東亞合成株式会社 クロロポリシランの製造方法
DE102008054537A1 (de) * 2008-12-11 2010-06-17 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration
DE102009056437B4 (de) 2009-12-02 2013-06-27 Spawnt Private S.À.R.L. Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen
DE102009056731A1 (de) 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7498015B1 (en) * 2004-02-27 2009-03-03 Kovio, Inc. Method of making silane compositions
US7485691B1 (en) * 2004-10-08 2009-02-03 Kovio, Inc Polysilane compositions, methods for their synthesis and films formed therefrom
CN101522759A (zh) * 2006-07-20 2009-09-02 Rev可再生能源投资公司 聚硅烷的处理和用途
WO2008110386A1 (de) * 2007-03-15 2008-09-18 Rev Renewable Energy Ventures, Inc. Plasmagestützte synthese

Also Published As

Publication number Publication date
US20130004666A1 (en) 2013-01-03
CA2782226A1 (en) 2011-06-09
TWI589527B (zh) 2017-07-01
TWI580710B (zh) 2017-05-01
JP2016179935A (ja) 2016-10-13
JP2013512843A (ja) 2013-04-18
EP2507299A2 (de) 2012-10-10
WO2011067413A2 (de) 2011-06-09
JP2013512842A (ja) 2013-04-18
EP2507174A1 (de) 2012-10-10
EP2507174B1 (de) 2013-11-06
CN102639644A (zh) 2012-08-15
TW201132708A (en) 2011-10-01
US20120321540A1 (en) 2012-12-20
US9040009B2 (en) 2015-05-26
EP2507169A1 (de) 2012-10-10
JP5731531B2 (ja) 2015-06-10
JP2013512844A (ja) 2013-04-18
EP2507296A1 (de) 2012-10-10
WO2011067415A1 (de) 2011-06-09
DE102009056731A1 (de) 2011-06-09
EP2507171A1 (de) 2012-10-10
TW201134764A (en) 2011-10-16
CN102639609A (zh) 2012-08-15
CN102639609B (zh) 2014-07-09
CN102666381A (zh) 2012-09-12
TW201130892A (en) 2011-09-16
TW201132587A (en) 2011-10-01
EP2507296B1 (de) 2013-10-23
TW201139283A (en) 2011-11-16
US20130039830A1 (en) 2013-02-14
WO2011067416A1 (de) 2011-06-09
BR112012014106A2 (pt) 2016-07-05
WO2011067413A3 (de) 2011-09-22
US20130043429A1 (en) 2013-02-21
US9139702B2 (en) 2015-09-22
JP2013512845A (ja) 2013-04-18
EP2507172A1 (de) 2012-10-10
JP6297778B2 (ja) 2018-03-20
CN102666381B (zh) 2014-12-31
US20120315392A1 (en) 2012-12-13
US9458294B2 (en) 2016-10-04
CA2782247A1 (en) 2011-06-09
US20130001467A1 (en) 2013-01-03
EP2507172B1 (de) 2015-04-08
EP2507317A1 (de) 2012-10-10
JP2013512841A (ja) 2013-04-18
TW201134767A (en) 2011-10-16
US20120319041A1 (en) 2012-12-20
TW201132682A (en) 2011-10-01
BR112012013500A2 (pt) 2018-02-06
WO2011067410A1 (de) 2011-06-09
WO2011067411A1 (de) 2011-06-09
WO2011067417A1 (de) 2011-06-09
WO2011067418A1 (de) 2011-06-09

Similar Documents

Publication Publication Date Title
TWI561559B (en) Process for producing hydrogenated polygermasilane and polygermasilane
EP2455220A4 (en) LAMINATE AND METHOD FOR ITS PRODUCTION
EP2448966A4 (en) IMMUNOCONJUGATES AND THEIR PRODUCTION METHODS
EP2291419A4 (en) POLYMACROMONOMER AND PROCESS FOR PRODUCING THE SAME
EP2451259A4 (en) MODULE AND PRODUCTION METHOD THEREOF
EP2508473A4 (en) HYDROGEN PRODUCTION APPARATUS AND METHOD FOR PRODUCING HYDROGEN
SG10201403566SA (en) Composition and process for production thereof
EP2415435A4 (en) ABSORBENT ARTICLE AND METHOD FOR PRODUCING THE SUCTIONABLE ARTICLE
IL216305A0 (en) Solid forms and process for preparing
EP2431014A4 (en) BUFFER AND MANUFACTURING METHOD THEREFOR
EP2437332A4 (en) POSITIVE ELECTRODE AND METHOD OF MANUFACTURE THEREOF
EP2474560A4 (en) METHOD OF PREPARING AN 11 SUGAR SIALYLOLIGOSACCHARIDE PEPTIDE
EP2492248A4 (en) GLASS PLATE ABSORBING THERMAL RADIATION AND METHOD FOR MANUFACTURING THE SAME
HK1176825A1 (zh) 方便麵及其製造方法
EP2450419A4 (en) IRON KOKS MANUFACTURING METHOD AND MANUFACTURER
EP2471475A4 (en) CANNULA AND METHOD FOR PRODUCING THE SAME
ZA201106240B (en) Method and means for producing tissues and tissues obtained
EP2404985A4 (en) PROCESS FOR PRODUCING LIPID
EP2488604A4 (en) METHOD AND APPARATUS FOR PRODUCING BIOCARBON
IL214287A0 (en) Method for producing 2-aminobiphenylene
HK1204444A1 (zh) 施用裝置和容器以及形成雙眼瞼的方法
HK1171701A1 (zh) 聚合物泡囊及製造方法
IL210610A0 (en) Process for producing 6-aryloxyquinoline derivative and intermediate thereof
SG175182A1 (en) Highly selective process for producing organodiphosphites
EP2487150A4 (en) PROCESS FOR PRODUCING 2 ALKYLCYCLOALCANONE

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees