SG116555A1 - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method.

Info

Publication number
SG116555A1
SG116555A1 SG200404063A SG200404063A SG116555A1 SG 116555 A1 SG116555 A1 SG 116555A1 SG 200404063 A SG200404063 A SG 200404063A SG 200404063 A SG200404063 A SG 200404063A SG 116555 A1 SG116555 A1 SG 116555A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200404063A
Other languages
English (en)
Inventor
Lof Joeri
Butler Hans
Nicolaas Lambertus Dond Sjoerd
Kolesnychenko Aleksey
Roelof Loopstra Erik
Johannes Maria Meije Hendricus
Catharinus Hubertus M Johannes
Aeilko Siebrand Ritsema Roelof
Van Schaik Frank
Franciscus Sengers Timotheus
Simon Klaus
Theodoor De Smit Joannes
Straaijer Alexander
Streefkerk Bob
Theodorus Maria Bijlaart Erik
Alexander Hoogendam Christiaan
Van Santen Helmar
Adrianus Kerkhof Marcus
Kroon Mark
Jeffrey Den Boef Arie
Jeroen Ottens Joost
Johannes Sophia Maria M Jeroen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03257068.1A external-priority patent/EP1429188B1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG116555A1 publication Critical patent/SG116555A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200404063A 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method. SG116555A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03253636 2003-06-09
EP03255395 2003-08-29
EP03257068.1A EP1429188B1 (en) 2002-11-12 2003-11-10 Lithographic projection apparatus

Publications (1)

Publication Number Publication Date
SG116555A1 true SG116555A1 (en) 2005-11-28

Family

ID=34108333

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200717763-7A SG152931A1 (en) 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method
SG200404063A SG116555A1 (en) 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200717763-7A SG152931A1 (en) 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (8) US7213963B2 (zh)
JP (7) JP4199699B2 (zh)
KR (1) KR100683263B1 (zh)
CN (2) CN102147574B (zh)
SG (2) SG152931A1 (zh)
TW (2) TWI424275B (zh)

Families Citing this family (139)

* Cited by examiner, † Cited by third party
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KR20040105621A (ko) 2004-12-16
US20070132979A1 (en) 2007-06-14
US20050264778A1 (en) 2005-12-01
US20110007285A1 (en) 2011-01-13
JP2007235179A (ja) 2007-09-13
TWI424275B (zh) 2014-01-21
US9081299B2 (en) 2015-07-14

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