JP7416742B2 - 粒子線治療における自動処置 - Google Patents
粒子線治療における自動処置 Download PDFInfo
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Description
11 超伝導磁石
12、13 超伝導コイル
14、15 磁気ヨーク
16 キャビティ
17 粒子源
20 抽出チャネル
21 シンクロサイクロトロン
22 走査構成要素
23 キャリッジ
24 走査磁石
25 イオンチャンバ
26 エネルギーディグレーダー
27 電流センサー
28 構成可能なコリメータ
29a、29b トラック
42 コイル
60 レンジモジュレーター
61 プレート
70 プレート
72 矢印
73 粒子線
80 内側ガントリー
81 ノズル
82 粒子線治療システム
84 処置台
85 ロボットアーム
86 部位撮像システム
88 衝突回避システム
90 内側ガントリー
91 外側ガントリー、ノズル
92 処置台
93 粒子加速器
94 外側ガントリー
95 矢印
96 アーム
100 ビーム野
101 照射目標
120 粒子線
121 照射目標
123 角度
124 角度
125 角度
127 周囲の組織
128 水平
140 制御システム
141 システム構成要素
142 TPS
150 ビーム野
151 粒子加速器
152 ビーム野
155 粒子線
159 目標
161、162 ビーム野
164、165 粒子線
166 重複領域
167 矢印
170 目標
Claims (42)
- 粒子線治療システムであって、
粒子線の出力の方向を定めるための粒子線出力デバイスと、
照射目標を含む患者を支持するための処置台であって、移動できるように構成された、処置台と、
前記粒子線出力デバイスが前記処置台に対して移動できるように設置された可動デバイスであって、前記粒子線出力デバイスの異なる位置が、第1のビーム野と第2のビーム野とを含む前記粒子線のためのビーム野を画定し、各ビーム野が、前記粒子線が前記照射目標に対して移動することができる最大範囲を定める平面を含む、可動デバイスと、
前記可動デバイスの自動制御を行って、前記第1のビーム野において前記粒子線による前記照射目標の処置ができるように前記粒子線出力デバイスを配置し、前記照射目標を前記粒子線によって処置した後、前記可動デバイスの自動制御を行って、前記第2のビーム野において前記粒子線による前記照射目標のさらなる処置ができるように前記粒子線出力デバイスの位置を変更するための制御システムと、
を備え、
前記第1のビーム野と前記第2のビーム野とは、重複領域において少なくとも部分的に重複し、
前記制御システムは、粒子加速器の自動制御を行って、前記重複領域における前記粒子線の累積強度が目標ビーム強度に達するか又は目標ビーム強度から規定量を超える量だけ逸脱しないように、前記第1のビーム野において前記粒子線が照射されるときおよび前記第2のビーム野において前記粒子線が照射されるときに前記粒子線の強度を制御するように構成される粒子線治療システム。 - 前記粒子線を前記照射目標に対して移動させるための構成要素を備える走査システムをさらに備え、
前記制御システムは、前記構成要素のうちの1つまたは複数の自動制御を行って前記粒子線による前記照射目標の前記処置ができるように前記粒子線を配置し、前記照射目標を前記粒子線によって処置した後、前記構成要素のうちの1つまたは複数の自動制御を行って、前記粒子線による前記照射目標の前記さらなる処置ができるように前記粒子線の位置を変更するように構成される、請求項1に記載の粒子線治療システム。 - 前記1つまたは複数の構成要素は、1つまたは複数の走査磁石を備える、請求項2に記載の粒子線治療システム。
- 前記1つまたは複数の構成要素は、エネルギーディグレーダーを備え、前記エネルギーディグレーダーは、前記粒子線の経路に対して進入し退避することが可能な1つまたは複数の構造を備える、請求項2に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記粒子加速器を備える、請求項1に記載の粒子線治療システム。
- 前記制御システムは、前記処置台を制御して並進運動を実現するように構成される、請求項1に記載の粒子線治療システム。
- 前記制御システムは、前記処置台を制御して回転運動を実現するように構成される、請求項1に記載の粒子線治療システム。
- 処置中に前記照射目標を撮像するための撮像システムをさらに備え、
前記制御システムは、前記粒子線出力デバイスを前記処置向けに配置した後、前記粒子線による前記照射目標の前記処置の前に、前記撮像システムを制御して患者の1つまたは複数の第1の画像を撮影するように構成され、前記制御システムは、前記さらなる処置向けに前記粒子線出力デバイスの位置を変更した後、前記さらなる処置の前に、前記撮像システムを制御して前記患者の1つまたは複数の第2の画像を撮影するように構成される、請求項1に記載の粒子線治療システム。 - 前記制御システムは、前記第1の画像を使用して、前記粒子線治療システムの処置空間内の前記照射目標の第1の場所を特定するように構成され、前記制御システムは、前記第2の画像を使用して、前記処置空間内の前記照射目標の第2の場所を特定するように構成される、請求項8に記載の粒子線治療システム。
- 前記制御システムは、処置計画システムから処置計画を受信し、前記処置計画を解釈して前記可動デバイスの制御を実現するように構成され、前記処置計画は、処置中に前記可動デバイスの位置を特定する情報を含む、請求項1に記載の粒子線治療システム。
- 前記制御システムは、前記粒子線治療システム内に画定されるアイソセンターとは無関係に前記可動デバイスの自動制御を行うように構成される、請求項1に記載の粒子線治療システム。
- 前記可動デバイスまたは前記処置台の自動制御は、人間の介入なしで実現される、請求項1に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記粒子加速器を備え、前記粒子加速器は、超伝導電磁石構造を有するシンクロサイクロトロンを備える、請求項1に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記粒子加速器を備え、前記粒子加速器は、超伝導電磁石構造を有する可変エネルギーシンクロサイクロトロンを備える、請求項1に記載の粒子線治療システム。
- 前記粒子線出力デバイスはビームスプレッダーを備える、請求項1に記載の粒子線治療システム。
- 前記ビームスプレッダーは、1つもしくは複数の走査磁石または1つもしくは複数の散乱箔を備える、請求項15に記載の粒子線治療システム。
- 前記粒子線出力デバイスと前記患者との間に、構成可能なコリメータをさらに備え、前記構成可能なコリメータは、前記粒子線の第1の部分が前記患者に到達するのを妨げる一方で前記患者に到達する前記粒子線の第2の部分をコリメートするようにエッジを画定するように制御可能なリーフを備え、前記構成可能なコリメータは、前記粒子線の単一スポットサイズほどの小さい領域をトリミングするように制御可能である、請求項1に記載の粒子線治療システム。
- 前記制御システムは、前記粒子線出力デバイスの運動に対する自動制御を行って、第1の場所から第2の場所への前記粒子線出力デバイスの並進運動を実現し、前記粒子線による前記照射目標の処置ができるように前記粒子線を配置し、前記粒子線による前記照射目標の前記処置の後で、前記粒子線出力デバイスのさらなる運動に対する自動制御を行って、前記第2の場所から第3の場所への前記粒子線出力デバイスの並進運動を実現し、前記粒子線による前記照射目標の処置ができるように前記粒子線の位置を変更するように構成される、請求項1に記載の粒子線治療システム。
- 前記制御システムは、前記粒子線出力デバイスの運動に対する自動制御を行って、前記粒子線出力デバイスを第1の配向から第2の配向に回動させ、前記粒子線による前記照射目標の処置ができるように前記粒子線を配置し、前記粒子線による前記照射目標の前記処置の後で、前記粒子線出力デバイスのさらなる運動に対する自動制御を行って、前記粒子線出力デバイスを前記第2の配向から第3の配向に回動させ、前記粒子線による前記照射目標の処置ができるように前記粒子線の位置を変更するように構成される、請求項1に記載の粒子線治療システム。
- 前記粒子線を前記照射目標に対して移動させるための構成要素を備える走査システムであって、前記構成要素の少なくともいくつかは、前記照射目標に向かう移動および前記照射目標から離れる移動ができるように設置される、走査システムをさらに備え、
前記制御システムは、前記構成要素のうちの前記少なくともいくつかの自動制御を行って、前記粒子線による前記照射目標の前記処置ができるように前記粒子線を配置し、前記粒子線による前記照射目標の前記処置の後で、前記構成要素のうちの前記少なくともいくつかの自動制御を行って、前記粒子線による前記照射目標の前記さらなる処置ができるように前記粒子線の位置を変更するように構成される、請求項1に記載の粒子線治療システム。 - 前記構成要素のうちの前記少なくともいくつかが設置されたキャリッジをさらに備え、前記キャリッジは、前記粒子線の経路に沿って移動することが可能になるように少なくとも1つのトラックに装着される、請求項20に記載の粒子線治療システム。
- 前記キャリッジは、前記少なくとも1つのトラックに沿って移動して、前記粒子線によって生成されるスポットのサイズを制御するように制御可能である、請求項21に記載の粒子線治療システム。
- 前記キャリッジは、前記可動デバイスまたは前記処置台の少なくとも一方の移動と連携して前記少なくとも1つのトラックに沿って移動するように制御可能である、請求項21に記載の粒子線治療システム。
- 前記可動デバイスは回転可能なガントリーを備える、請求項1に記載の粒子線治療システム。
- 前記可動デバイスは、1つまたは複数のロボットアームを備える、請求項1に記載の粒子線治療システム。
- 前記粒子線を前記照射目標に対して移動させるための走査構成要素を備える走査システムであって、前記走査構成要素は、前記粒子線のビームラインに沿って移動可能なキャリッジ上に設置される、走査システムをさらに備え、
前記制御システムは、前記キャリッジの自動制御を行って、前記粒子線による前記照射目標の前記処置ができるように前記粒子線を配置し、前記粒子線による前記照射目標の前記処置の後で、前記キャリッジの自動制御を行って、前記粒子線による前記照射目標の前記さらなる処置ができるように前記粒子線の位置を変更するように構成される、請求項1に記載の粒子線治療システム。 - 照射目標を含む患者を支持するための処置台であって、移動できるように構成された、処置台と、
粒子線の出力の方向を定めるための粒子線出力デバイスであって、前記処置台に対して移動できるように配置された、粒子線出力デバイスと、
前記粒子線出力デバイスが前記処置台に対して移動できるように設置された可動デバイスと、
前記粒子線出力デバイスおよび前記処置台のアイソセントリック回転を超える自由度を使用して前記粒子線出力デバイスおよび前記処置台の配置を制御するための制御システムと、
を備え、
前記制御システムは、前記可動デバイスの自動制御を行って、前記粒子線の第1のビーム野を使用して前記照射目標の第1の部分を処置し、前記照射目標の前記第1の部分を前記粒子線によって処置した後、前記可動デバイスの自動制御を行って、前記粒子線の位置を変更し、前記粒子線の第2のビーム野を使用して前記照射目標の第2の部分を処置するように構成され、
前記制御システムは、粒子加速器の自動制御を行って、重複領域における前記粒子線の累積強度が目標ビーム強度に達するか又は目標ビーム強度から規定量を超える量だけ逸脱しないように、前記第1のビーム野において前記粒子線が照射されるときおよび前記第2のビーム野において前記粒子線が照射されるときに前記粒子線の強度を制御するように構成される粒子線治療システム。 - 前記粒子線出力デバイスは、前記粒子線を前記照射目標に対して走査するための走査構成要素を備え、前記走査構成要素は1つまたは複数の走査磁石を備え、
前記制御システムは、前記走査構成要素のうちの1つまたは複数の動作を制御することによって前記粒子線の位置を制御するように構成される、請求項27に記載の粒子線治療システム。 - 前記制御システムは、ユーザ介入なしに前記粒子線出力デバイスおよび前記処置台の配置を制御するように構成される、請求項27に記載の粒子線治療システム。
- 前記制御システムは、前記粒子線出力デバイスおよび前記処置台の配置を複数のビーム野について自動的に制御するように構成される、請求項27に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、第1の位置と第2の位置との間を直線的に移動するように制御可能である、請求項27に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記処置台に対して回動するように制御可能である、請求項27に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記処置台に対して回転するように制御可能である、請求項27に記載の粒子線治療システム。
- 前記粒子線出力デバイスは粒子加速器を備える、請求項27に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、30cm×30cm以下のビーム野を生成するように構成される、請求項27に記載の粒子線治療システム。
- 粒子線の出力の方向を定めるための粒子線出力デバイスと、
照射目標を含む患者を支持するための処置台であって、移動できるように構成された、処置台と、
前記粒子線出力デバイスが前記処置台に対して移動できるように設置された可動デバイスであって、前記粒子線出力デバイスの異なる位置が、第1のビーム野と第2のビーム野とを含む前記粒子線のためのビーム野を画定し、各ビーム野が、前記粒子線が前記照射目標に対して移動することができる最大範囲を定める平面を含む、可動デバイスと、
前記可動デバイスの自動制御を行って、前記第1のビーム野において前記粒子線による前記照射目標の処置ができるように前記粒子線出力デバイスを配置し、前記照射目標を前記粒子線によって処置した後、前記可動デバイスの自動制御を行って、前記第2のビーム野において前記粒子線による前記照射目標のさらなる処置ができるように前記粒子線出力デバイスの位置を変更するための制御システムと、
を備え、
前記粒子線出力デバイスは、粒子加速器を備え、
前記第1のビーム野および前記第2のビーム野は、重複しない粒子線治療システム。 - 前記可動デバイスに対する前記自動制御は、並進運動を含む、請求項36に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、前記粒子線を伝送チャネルを介して供給するためのビームスプレッダーを備える、請求項36に記載の粒子線治療システム。
- 前記粒子加速器は、前記粒子線を生成するように構成されている、請求項36に記載の粒子線治療システム。
- 前記粒子線出力デバイスは、20cm×20cm以下のビーム野を生成するように前記可動デバイスに設置される、請求項36に記載の粒子線治療システム。
- 前記粒子加速器は、重量が5トン~30トンの範囲内であり、かつ4.5立方メートル未満の体積を占有するシンクロサイクロトロンを備える、請求項36に記載の粒子線治療システム。
- 前記粒子線治療システムの1つまたは複数の構成要素の位置を検出し、位置に関する情報を前記制御システムに提供するための衝突回避システムをさらに備え、
前記制御システムは、前記情報に基づいて前記1つまたは複数の構成要素の動作を制御するように構成される、請求項36に記載の粒子線治療システム。
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