ATE96552T1 - Lichtempfindliche waermehaertbare harzzusammensetzung und methode zur herstellung von loetstoppmasken damit. - Google Patents

Lichtempfindliche waermehaertbare harzzusammensetzung und methode zur herstellung von loetstoppmasken damit.

Info

Publication number
ATE96552T1
ATE96552T1 AT88119493T AT88119493T ATE96552T1 AT E96552 T1 ATE96552 T1 AT E96552T1 AT 88119493 T AT88119493 T AT 88119493T AT 88119493 T AT88119493 T AT 88119493T AT E96552 T1 ATE96552 T1 AT E96552T1
Authority
AT
Austria
Prior art keywords
resistance
resin composition
curing resin
photosensitive
excels
Prior art date
Application number
AT88119493T
Other languages
English (en)
Inventor
Yuichi Kamayachi
Kenji Sawazaki
Morio Suzuki
Shoji Inagaki
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17879137&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE96552(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Application granted granted Critical
Publication of ATE96552T1 publication Critical patent/ATE96552T1/de

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/025Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
AT88119493T 1987-11-30 1988-11-23 Lichtempfindliche waermehaertbare harzzusammensetzung und methode zur herstellung von loetstoppmasken damit. ATE96552T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62299967A JPH0717737B2 (ja) 1987-11-30 1987-11-30 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
EP88119493A EP0323563B1 (de) 1987-11-30 1988-11-23 Lichtempfindliche wärmehärtbare Harzzusammensetzung und Methode zur Herstellung von Lötstoppmasken damit

Publications (1)

Publication Number Publication Date
ATE96552T1 true ATE96552T1 (de) 1993-11-15

Family

ID=17879137

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88119493T ATE96552T1 (de) 1987-11-30 1988-11-23 Lichtempfindliche waermehaertbare harzzusammensetzung und methode zur herstellung von loetstoppmasken damit.

Country Status (9)

Country Link
US (1) US4943516A (de)
EP (1) EP0323563B1 (de)
JP (1) JPH0717737B2 (de)
KR (1) KR910008706B1 (de)
CN (2) CN1028535C (de)
AT (1) ATE96552T1 (de)
CA (1) CA1331711C (de)
DE (1) DE3885260T2 (de)
HK (1) HK104495A (de)

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US4943516A (en) 1990-07-24
DE3885260T2 (de) 1994-05-19
EP0323563A3 (en) 1989-09-06
HK104495A (en) 1995-07-07
CN1028535C (zh) 1995-05-24
EP0323563A2 (de) 1989-07-12
CN1033389A (zh) 1989-06-14
CN1036693C (zh) 1997-12-10
KR910008706B1 (ko) 1991-10-19
KR890008604A (ko) 1989-07-12
EP0323563B1 (de) 1993-10-27
CA1331711C (en) 1994-08-30
DE3885260D1 (de) 1993-12-02
US4943516B1 (de) 1994-01-11
CN1081557A (zh) 1994-02-02
JPH0717737B2 (ja) 1995-03-01
JPH01141904A (ja) 1989-06-02

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