US20080241805A1 - System and method for simulated dosimetry using a real time locating system - Google Patents

System and method for simulated dosimetry using a real time locating system Download PDF

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US20080241805A1
US20080241805A1 US11/897,100 US89710007A US2008241805A1 US 20080241805 A1 US20080241805 A1 US 20080241805A1 US 89710007 A US89710007 A US 89710007A US 2008241805 A1 US2008241805 A1 US 2008241805A1
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simulated
participant
dose
dose rate
training
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Hans Gregory Schantz
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Q Track Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
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    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus

Definitions

  • the present invention pertains generally to the field of real time simulation based training systems, more particularly to training systems for workers in nuclear or other hazardous environments.
  • the present invention pertains to a system for providing a simulated total dose exposure measurement during a nuclear facility training exercise by locating participants using a real time location system, modeling incremental exposure as a function of location and summing incremental exposure to produce a total dose for each of the participants.
  • Total dose may be displayed via a wireless link to a simulated dosimeter worn by each participant.
  • Radiation sources may also have location tags, and the exposure model may be modified in real time according to the tracked location of the radiation source.
  • the locating technology comprises near field locating technology based on comparing near field signal characteristics.
  • Alternative locating technologies may be used.
  • FIG. 1 illustrates an exemplary simulated dosimetry system in accordance with the present invention.
  • FIG. 2 illustrates an exemplary simulated dosimetry process in accordance with the present invention.
  • FIG. 3 illustrates an exemplary flow loop training facility.
  • FIG. 4 shows a flow section of the flow facility of FIG. 3 , which may be displayed to a trainer in a virtual radiation environment (VRE) display.
  • VRE virtual radiation environment
  • FIG. 5 shows the flow section of FIG. 4 with radiation sources placed in the VRE.
  • FIG. 6 illustrates the training facility of FIG. 3 with a system for simulated dosimetry installed in accordance with the present invention.
  • FIG. 7 shows a flow section of FIG. 6 with the VRE setup of FIG. 5 and including trainees 602 , one of which is wearing a locating tag and a simulated dosimeter display.
  • FIG. 8 illustrates a method for simulated dosimetry for multiple trainees using real time calculation of radiation for each point.
  • FIG. 9 illustrates a method for simulated dosimetry for multiple trainees using pre-calculated radiation for each point retrieved from a lookup table.
  • the present invention offers a solution to the problem of providing accurate simulated dosimetry to nuclear facility training programs by using a real-time-location-systems (RTLS) in combination with a radiation exposure model.
  • the RTLS may employ near-field electromagnetic ranging (NFER) technology, ultrawideband (UWB), time difference of arrival (TDOA), time-of-flight (ToF) or any other RTLS technology known by practitioners of the RF arts.
  • NFER near-field electromagnetic ranging
  • UWB ultrawideband
  • TDOA time difference of arrival
  • ToF time-of-flight
  • FIG. 1 illustrates an exemplary simulated dosimetry system 100 in accordance with the present invention.
  • a training facility 108 may include any number of different types of hardware as are necessary to provide the necessary training. Included in the training may be exercises directed to handling fault conditions including leaks or spills of radioactive materials. Such fault conditions may be modeled by computer 124 as set up by a trainer/operator. Multiple functions are shown performed by computer 124 ; however, the functional partitions and number of computers is for convenience of illustration and may be implemented many different ways according to the preference of the implementer.
  • Each participant may wear a simulated dosimeter 106 comprising a locator tag 102 a , for reporting the trainee's position, and a display 104 , for displaying computed simulated total dose.
  • the locator tag 102 a and display 104 may be housed in the same package 106 or may be separate, as desired.
  • the locator tag 102 a communicates with an array of locator receivers 126 for determining the location of the tag 102 a .
  • Receiver output signals are processed by a location computer 127 to determine the location coordinates of each trainee.
  • Location tags 102 b may also be placed on items, such as radiation sources 110 within the environment 108 .
  • Location coordinates for such items 110 as well as control inputs 112 which may be operated by the trainees may be used to vary the radiation dose rate model 114 for the environment 108 .
  • the dose rate model may also be configured by a system operator through operator inputs 116 . Trainee location coordinates together with the current real time radiation model 114 output are used to generate a dose rate 118 for the trainee at the measured location at the given time. Dose rate values are summed 120 over the time of the training exercise to provide a total dose value 120 .
  • the total dose value 122 may be displayed to the operator 116 and may be delivered to the trainee via a wireless link or network 128 .
  • the trainee may wear a simulated dosimeter device 104 similar in appearance to an actual radiation dosimeter that provides a display during simulation training showing simulated exposure to radiation based on the trainee's actual proximity and path through the simulated environment 108 .
  • the system further allows for the real time varying of the environment by the trainees and trainer as the training event unfolds. Real time, within this disclosure, refers to measurements or other events that occur and are acted upon during the original progress of the training event.
  • FIG. 2 illustrates an exemplary simulated dosimetry process 200 in accordance with the present invention.
  • the process 200 starts by setting initial conditions in the radiation model 202 and associating a locating tag/dosimeter with each participant 204 .
  • the training event starts, and during the event, participants are tracked and coordinates for the participants are mapped 206 .
  • the received dose rate from the radiation model is used to determine an incremental dose for the associated time interval at the mapped point of the participant 208 .
  • Dose increments are accumulated for each participant 210 .
  • continuous updates of total dose may be displayed to each participant via an RF link or network to a simulated dosimeter display worn by each participant 212 .
  • the process 200 may be further understood by considering an exemplary training process at an exemplary flow-loop training facility.
  • FIG. 3 illustrates an exemplary flow loop training facility.
  • the flow-loop training facility 302 contains a variety of pumps 308 , pipes 304 , valves 310 , tanks 306 , and other mechanical equipment similar to those used in actual nuclear facilities.
  • the present invention is described in terms of a flow-loop raining facility, the teachings of the present invention apply to any industrial, operational, simulation, or other environment in which one might chose to operate a simulated dosimetry system.
  • FIG. 4 shows a flow section of the flow facility of FIG. 3 which may be displayed to a trainer in a virtual radiation environment (VRE) display.
  • FIG. 3 shows various pumps 308 , pipes 304 , valves 310 , and a tank 306 .
  • FIG. 5 shows the flow section of FIG. 4 with radiation sources placed in the VRE.
  • a point source 502 is shown at the valve 310 .
  • a line source 506 is shown at pipe 304 , and a volume source 504 is shown near pump 308 a.
  • FIG. 6 illustrates the training facility of FIG. 3 with a system for simulated dosimetry installed in accordance with the present invention.
  • four locator receivers 126 are placed at the corners of the area or in other suitable locations to measure the position of a locating tag 102 on a trainee 602 .
  • Positioning signals 125 from the exemplary locating tag 102 are shown being received by all four receivers 126 .
  • Position information from the receivers 126 is sent to a computer 124 for processing via communication signals 129 , which may be a wireless network. Alternatively, a wired network may be used.
  • FIG. 7 shows a flow section of FIG. 6 with the VRE setup of FIG. 5 and including trainees 602 , one of which is wearing a locating tag 102 and a simulated dosimeter display 104 .
  • a trainer sets up one or more virtual radiation environment (VRE) configurations by defining simulated point, line, area, volume, and other sources of radiation throughout the training facility (see FIG. 5 ).
  • the trainer inputs the location, intensity, and geometry of the radiation sources.
  • a software application records the simulated sources defined by a trainer and calculates the radiation exposure (or dose rate) for the VRE at a suitable resolution for each location throughout the training facility.
  • the trainer may create multiple VRE's to capture time varying radiation characteristics. For instance during a training exercise, a trainer may switch to an alternate VRE to model changing plant characteristics, like opening or closing of valves, turning on or off pumps, variations of flow, or other operations that might impact radiation characteristics.
  • a worker-trainee 602 undergoes training in the training facility.
  • the worker-trainee 602 carries a locator tag 102 that enables a real-time locating system (RTLS) 126 and 127 to determine the worker-trainee's location.
  • RTLS real-time locating system
  • the tag 102 radiates localizing signals 125 that are picked up by a plurality of locator-receivers 126 .
  • the plurality of locator-receivers 126 then send data signals 129 to a computer 127 (part of 124 ).
  • the data signals 129 may be wireless data signals (e.g.
  • the computer 127 receives the data signals 129 and determines the location of the worker-trainee 602 (see FIG. 6 ).
  • the computer 124 updates the location of the worker-trainee 602 on a time scale appropriate to create a suitable simulation of the worker-trainee's radiation exposure.
  • the computer 124 uses the actual location of the worker-trainee 602 and the locations of the plurality of simulated radiation sources 502 , 504 , 506 , to calculate an instantaneous simulated dose rate based on the distance between the simulated source and the actual location of the worker-trainee (see FIG. 7 ).
  • the computer 124 monitors and records the instantaneous simulated dose rate.
  • the instantaneous simulated dose rate may be integrated over time to determine a cumulative simulated dose.
  • the computer 124 may also send signals to a simulated dosimeter 104 to cause the simulated dosimeter 104 to display a simulated dose rate and a cumulative simulated dose.
  • the simulated dosimeter 104 may flash, alarm, or otherwise convey information to a worker-trainee 602 in analogous fashion to the alerts of a real dosimeter in a real environment.
  • a simulated dosimeter may be a PDA or other device with a software application to enable the PDA to provide simulated dose and simulated dose rate and otherwise behave as a simulated dosimeter 104 .
  • FIG. 8 illustrates a method for simulated dosimetry for multiple trainees using real time calculation of radiation for each point.
  • the method begins at a start block 802 .
  • the first method continues with a training supervisor, health physicist, or other appropriate individual defining the VRE 804 .
  • the definition of a VRE includes defining appropriate point, line, area, or other sources of radiation.
  • the definition must include location and source strength.
  • Distributed sources like line or area sources must further include the geometry of the source distribution and the variation of source strength or concentration along, across or throughout the simulated source.
  • the VRE may also be defined so as to vary according to any appropriate health physics model including, for instance, the variation or distribution of airborne radiation sources in a plume, or radiation sources dissolved in a liquid spill.
  • the VRE may evolve in time, may vary in accord with activities in a training exercise or may change in accord with simulated changes in plant operations or other factors.
  • the VRE is captured, encompassed, and stored in particular source data.
  • the first method continues by determining a location of a worker-trainee 808 .
  • this step may be accomplished through use of an RTLS.
  • the first method recalls the source data for the first source 810 .
  • the first method determines the distance between the simulated radiation source and the actual location of the worker-trainee 812 .
  • this is the distance between the simulated point source and the actual location of the worker-trainee.
  • this may be the effective distance integrating along the line (accounting for any variation in source distribution along the line source).
  • an area source this may be the effective distance integrating across the area (accounting for any variation in source distribution across the source area).
  • the first method continues by determining the dose due to this source 814 . If the source in question is a point source, then dose (D) follows from point source strength (P) and distance (a) according to the formula:
  • both the line source strength and the distance d between the source point and the worker-trainee location depend upon the location (l) along the line.
  • the line integral is evaluated from one end of the line (e 1 ) to the other (e 2 ).
  • both the area source density and the distance between the source point and the worker-trainee location depend upon the location (x, y) within the area.
  • the area integral is evaluated for all locations within the area A.
  • volume source density ( ⁇ in source strength per unit volume) according to the formula:
  • volume source density and the distance between the source point and the worker-trainee location depend upon the location (x, y, z) within the volume.
  • the volume integral is evaluated for all locations within the volume V.
  • the first method continues with the instantaneous dose for the first source being added to the total instantaneous dose for the first worker-trainee 816 .
  • Total instantaneous dose is initially set to zero until the contribution of the first source is determined.
  • the first method continues with a decision block 818 . If all sources have not been accounted for, the first method continues by determining distance to the next source. Thus the first method loops through and accounts for dose contributions due to all simulated sources in the VRE. If all sources have been accounted for, then the first method continues by storing 820 the total simulated instantaneous dose for the first worker-trainee in a simulated dose data database 822 . In alternate embodiments, the first method may send the total simulated instantaneous dose to a simulated dosimeter or may add the total simulated instantaneous dose to a total simulated cumulative dose. In still further alternate embodiments the first method may send the total simulated cumulative dose to a simulated dosimeter.
  • the first method continues with a decision block 824 . If all worker-trainees have not been accounted for, the first method continues by finding the actual location of the next worker-trainee. Thus the first method loops through and determines the instantaneous simulated dose for every worker-trainee in the training exercise.
  • the first method continues with a decision block 826 . If the exercise is over, then the first method terminates in an end block 830 .
  • the first method continues back by determining the actual location of the first worker-trainee 828 .
  • FIG. 9 illustrates a method for simulated dosimetry for multiple trainees using pre-calculated radiation for each point retrieved from a lookup table.
  • the lookup table method referred to as a second method, begins at a start block 902 .
  • the second method continues with a training supervisor, health physicist, or other appropriate individual defining a VRE 904 as in the first method.
  • the VRE is used to create a dose rate look-up table for each location of interest within the training environment 906 - 916 .
  • the second method continues by determining the instantaneous dose rate at a first location due to a first source 906 .
  • the second method continues by adding the instantaneous dose rate due to a source to the total instantaneous dose rate at a location 908 .
  • the second method continues with a decision block 910 . If all sources have not yet been accounted for, then the second method continues by looping back to consider the contribution of the next source. Thus, the second method loops over all sources to determine the total instantaneous does rate due to all sources at a particular location. If all sources have been accounted for, then the second method continues by storing 912 the total dose rate at a particular location to a dose rate look-up table 914 .
  • the second method continues with a decision block 916 . If all locations have not yet been considered, then the second method continues by evaluating the dose rate due to the first source at the next location. If all locations have been accounted for, then the dose rate look-up table is completed, and the second method is ready to begin simulated dosimetry.
  • the second method continues by determining worker-trainee actual location 918 . Then, the second method continues by using the dose rate look-up table to look-up the dose rate at the worker-trainee's actual location 920 . Depending on the resolution of the dose rate look-up table, the second method may select the dose rate at the location closest to the worker-trainee's actual location or the second method may interpolate between a few of the closest locations in the dose rate look-up table.
  • the second method continues by storing 922 the total simulated instantaneous dose for the first worker-trainee in a simulated dose data database 924 .
  • the second method may send the total simulated instantaneous dose to a simulated dosimeter or may add the total simulated instantaneous dose to a total simulated cumulative dose.
  • the second method may send the total simulated cumulative dose to a simulated dosimeter.
  • the second method continues with a decision block 926 . If all worker-trainees have not been accounted for, the second method continues by determining actual location of the next worker-trainee. Thus the second method loops through and determines the instantaneous simulated dose for every worker-trainee in the training exercise.
  • the second method continues with a decision block 928 . If the exercise is over, then the second method terminates in an end block 932 . If the exercise is not over, then the second method continues back by determining the actual location of the first worker-trainee 930 .
  • Both the first method and the second method may be augmented by providing real-time feedback to worker-trainees and to a training supervisor. Both the first method and the second method may be further augmented by integrating real-time simulated dose data with video or other telemetry captured during the exercise.
  • the active location tag and locating receiver of the present invention are based on transmitting and receiving near field signals.
  • Location by near field signals is fully described in the US patents and patent applications incorporated by reference below.
  • near field signals are signals received within a near field of the transmitter. The near field is best within 1 ⁇ 6 wavelength, but the effects may be utilized out to one wavelength or so.
  • Near field signals show unique amplitude and phase changes with distance from the transmitter.
  • E field and H field antennas couple in different ways to the signal with different amplitude decay profiles and different signal phase changes with distance. These amplitude and phase profiles may be used to measure distance.
  • E field antenna is typically a whip antenna and may be on the order of a meter in length for a 1 MHz signal.
  • H field antenna is typically a coil and may include a ferrite core. The H field antenna may be on the order of a few centimeters in length, width, and height.
  • an often preferred configuration utilizes a magnetic antenna (H field antenna) for the mobile beacon transmitter (active location tag) and a vertically polarized E field antenna with two orthogonally oriented H field antennas for each of the fixed receiver locations.
  • the two H field antennas have the null axes in the horizontal plane.
  • An exemplary signal set from this arrangement includes:
  • multiple determinations of range may be made from this configuration by making different comparisons between E field and H field amplitude and phase.
  • a weighted average of available determinations is used based on the strongest or most reliable signals from the set.
  • receivers are positioned to allow triangulation based on multiple range measurements, i.e., to each location receiver from the active location tag. If height is desired, additional receivers may be deployed to improve the height resolution.
  • the receivers may be connected to a central computer for combining the measurements from all receivers to determine location. The connection may be by wired or wireless network or other methods as desired.
  • the area may be pre-measured to account for specific local propagation disturbances and to reduce errors from equipment variations.
  • a calibration set of measurements is made by placing an active location tag at known locations and measuring the signals and phases at all receivers.
  • a finer grid, or set of grids, of locations may be generated from extrapolation and interpolation from the measured locations.
  • an unknown location is determined by transmitting from the unknown location and comparing the set of measured data from all receivers with the stored calibration data to find a location having the best match. Best match may be determined by summing absolute value of the differences between each respective signal from each receiver, the best match being the lowest sum. In the sum, amplitudes and phases may be scaled to have similar effect on the sum. Weak signals may be ignored.
  • a location is determined as the centroid of a region having an error value above a predetermined threshold.
  • motion constraints such as walls and motion dynamics including momentum are used to improve position.

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