FR2727322B1 - Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede - Google Patents

Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede

Info

Publication number
FR2727322B1
FR2727322B1 FR9414613A FR9414613A FR2727322B1 FR 2727322 B1 FR2727322 B1 FR 2727322B1 FR 9414613 A FR9414613 A FR 9414613A FR 9414613 A FR9414613 A FR 9414613A FR 2727322 B1 FR2727322 B1 FR 2727322B1
Authority
FR
France
Prior art keywords
sublimating
carrying
solid material
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9414613A
Other languages
English (en)
Other versions
FR2727322A1 (fr
Inventor
Jean Jacques Edgar Garenne
Olivier Jean Christia Poncelet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR9414613A priority Critical patent/FR2727322B1/fr
Priority to EP95420314A priority patent/EP0714999A1/fr
Priority to JP30896395A priority patent/JPH08232069A/ja
Publication of FR2727322A1 publication Critical patent/FR2727322A1/fr
Application granted granted Critical
Publication of FR2727322B1 publication Critical patent/FR2727322B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D7/00—Sublimation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
FR9414613A 1994-11-30 1994-11-30 Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede Expired - Fee Related FR2727322B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR9414613A FR2727322B1 (fr) 1994-11-30 1994-11-30 Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede
EP95420314A EP0714999A1 (fr) 1994-11-30 1995-11-15 Procédé pour la sublimation d'un matériau solide et dispositif pour la mise en oeuvre du procédé
JP30896395A JPH08232069A (ja) 1994-11-30 1995-11-28 固体物質の昇華方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9414613A FR2727322B1 (fr) 1994-11-30 1994-11-30 Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede

Publications (2)

Publication Number Publication Date
FR2727322A1 FR2727322A1 (fr) 1996-05-31
FR2727322B1 true FR2727322B1 (fr) 1996-12-27

Family

ID=9469492

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9414613A Expired - Fee Related FR2727322B1 (fr) 1994-11-30 1994-11-30 Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede

Country Status (3)

Country Link
EP (1) EP0714999A1 (fr)
JP (1) JPH08232069A (fr)
FR (1) FR2727322B1 (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19643550A1 (de) * 1996-10-24 1998-05-14 Leybold Systems Gmbh Lichttransparentes, Wärmestrahlung reflektierendes Schichtensystem
EP1079001B1 (fr) * 1999-08-20 2005-06-15 Morton International, Inc. Barbotteur à double fritte
US6444038B1 (en) 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
DE10048759A1 (de) 2000-09-29 2002-04-11 Aixtron Gmbh Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
TWI271443B (en) * 2002-06-17 2007-01-21 Asm Int Method of producing vapor from solid precursor and substrate processing system using the same
US6921062B2 (en) 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
SG160401A1 (en) * 2005-03-16 2010-04-29 Advanced Tech Materials System for delivery of reagents from solid sources thereof
US8197898B2 (en) 2005-03-29 2012-06-12 Tokyo Electron Limited Method and system for depositing a layer from light-induced vaporization of a solid precursor
US7345184B2 (en) 2005-03-31 2008-03-18 Tokyo Electron Limited Method and system for refurbishing a metal carbonyl precursor
US7485338B2 (en) 2005-03-31 2009-02-03 Tokyo Electron Limited Method for precursor delivery
US7459395B2 (en) 2005-09-28 2008-12-02 Tokyo Electron Limited Method for purifying a metal carbonyl precursor
US7297719B2 (en) 2006-03-29 2007-11-20 Tokyo Electron Limited Method and integrated system for purifying and delivering a metal carbonyl precursor
US8603252B2 (en) 2006-04-26 2013-12-10 Advanced Technology Materials, Inc. Cleaning of semiconductor processing systems
US20080241805A1 (en) 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
JP5242140B2 (ja) * 2007-11-27 2013-07-24 大陽日酸株式会社 固体原料供給方法及び装置
KR101822779B1 (ko) 2008-02-11 2018-01-26 엔테그리스, 아이엔씨. 반도체 가공 시스템에서의 이온 공급원 세정법
CN109972119A (zh) 2012-05-31 2019-07-05 恩特格里斯公司 基于源试剂的用于批量沉积的高物质通量流体的输送
JP6026875B2 (ja) * 2012-12-03 2016-11-16 日本エア・リキード株式会社 固体材料の気化量モニタリングシステムおよびモニタリング方法
FR3038623B1 (fr) * 2015-07-10 2017-06-30 Fives Procede permettant de retirer les oxydes presents a la surface des nodules d'une poudre metallique avant l'utilisation de celle-ci dans un procede industriel
KR102576431B1 (ko) 2018-09-10 2023-09-08 삼성디스플레이 주식회사 유기물 제조장치 및 이를 이용한 제조방법
CN109499090A (zh) * 2018-12-25 2019-03-22 威格气体纯化科技（苏州）股份有限公司 一种具有控制材料处理环境功能的升华仪
US11661653B2 (en) 2019-12-18 2023-05-30 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Vapor delivery systems for solid and liquid materials
CN111549331B (zh) * 2020-05-08 2022-06-07 中材人工晶体研究院有限公司 一种掺硼金刚石薄膜制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2993684A (en) * 1984-02-17 1985-08-22 Stauffer Chemical Company Vapour deposition of pnictides
JPS60221395A (ja) * 1984-04-19 1985-11-06 Yoshio Imai ダイヤモンド薄膜の製造方法
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
US5227340A (en) * 1990-02-05 1993-07-13 Motorola, Inc. Process for fabricating semiconductor devices using a solid reactant source
EP0509875A1 (fr) * 1991-04-19 1992-10-21 Société dite CARBIONIC SYSTEME Procédé pour le dépôt sur au moins une pièce, notamment une pièce métallique, d'une couche dure à base de pseudo carbone diamant ainsi que pièce revêtue d'une telle couche

Also Published As

Publication number Publication date
JPH08232069A (ja) 1996-09-10
FR2727322A1 (fr) 1996-05-31
EP0714999A1 (fr) 1996-06-05

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