KR101673039B1 - 정전 척 - Google Patents

정전 척 Download PDF

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Publication number
KR101673039B1
KR101673039B1 KR1020107028501A KR20107028501A KR101673039B1 KR 101673039 B1 KR101673039 B1 KR 101673039B1 KR 1020107028501 A KR1020107028501 A KR 1020107028501A KR 20107028501 A KR20107028501 A KR 20107028501A KR 101673039 B1 KR101673039 B1 KR 101673039B1
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KR
South Korea
Prior art keywords
substrate
protrusions
electrostatic chuck
delete delete
layer
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KR1020107028501A
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English (en)
Korean (ko)
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KR20110020269A (ko
Inventor
리차드 에이 쿡
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엔테그리스, 아이엔씨.
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Publication of KR20110020269A publication Critical patent/KR20110020269A/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7614—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
KR1020107028501A 2008-05-19 2009-05-15 정전 척 Active KR101673039B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US5425908P 2008-05-19 2008-05-19
US61/054,259 2008-05-19
US9470008P 2008-09-05 2008-09-05
US61/094,700 2008-09-05
PCT/US2009/003015 WO2009142710A1 (en) 2008-05-19 2009-05-15 Electrostatic chuck

Publications (2)

Publication Number Publication Date
KR20110020269A KR20110020269A (ko) 2011-03-02
KR101673039B1 true KR101673039B1 (ko) 2016-11-04

Family

ID=40810870

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107028501A Active KR101673039B1 (ko) 2008-05-19 2009-05-15 정전 척

Country Status (8)

Country Link
US (2) US9543187B2 (enExample)
EP (1) EP2286448B1 (enExample)
JP (1) JP5492875B2 (enExample)
KR (1) KR101673039B1 (enExample)
CN (2) CN102067302B (enExample)
SG (1) SG190668A1 (enExample)
TW (1) TWI475594B (enExample)
WO (1) WO2009142710A1 (enExample)

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JP2007527625A (ja) * 2004-02-24 2007-09-27 アプライド　マテリアルズ　インコーポレイテッド 汚染物質削減基板移送およびサポートシステム
JP2008066707A (ja) * 2006-08-10 2008-03-21 Tokyo Electron Ltd 静電吸着電極、基板処理装置および静電吸着電極の製造方法

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EP2286448A1 (en) 2011-02-23
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CN103236413B (zh) 2016-09-07
EP2286448B1 (en) 2018-11-28
TW200949897A (en) 2009-12-01
JP5492875B2 (ja) 2014-05-14
CN103236413A (zh) 2013-08-07
TWI475594B (zh) 2015-03-01
CN102067302B (zh) 2013-06-05
US10395963B2 (en) 2019-08-27
US20090284894A1 (en) 2009-11-19
CN102067302A (zh) 2011-05-18
KR20110020269A (ko) 2011-03-02
JP2011521470A (ja) 2011-07-21
US20170098568A1 (en) 2017-04-06
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