KR101421915B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101421915B1
KR101421915B1 KR1020137023316A KR20137023316A KR101421915B1 KR 101421915 B1 KR101421915 B1 KR 101421915B1 KR 1020137023316 A KR1020137023316 A KR 1020137023316A KR 20137023316 A KR20137023316 A KR 20137023316A KR 101421915 B1 KR101421915 B1 KR 101421915B1
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KR
South Korea
Prior art keywords
liquid
substrate
measurement
exposure
optical system
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Expired - Fee Related
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KR1020137023316A
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English (en)
Korean (ko)
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KR20130103819A (ko
Inventor
겐이치 시라이시
Original Assignee
가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137023316A 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101421915B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004171115 2004-06-09
JPJP-P-2004-171115 2004-06-09
PCT/JP2005/010412 WO2005122218A1 (ja) 2004-06-09 2005-06-07 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020127000370A Division KR101422964B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20130103819A KR20130103819A (ko) 2013-09-24
KR101421915B1 true KR101421915B1 (ko) 2014-07-22

Family

ID=35503354

Family Applications (9)

Application Number Title Priority Date Filing Date
KR1020137023316A Expired - Fee Related KR101421915B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020177003247A Abandoned KR20170016532A (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020077000539A Expired - Fee Related KR101162128B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020147025197A Expired - Fee Related KR101561796B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020137023317A Expired - Fee Related KR101440746B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020157010305A Expired - Fee Related KR101747662B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127025606A Expired - Fee Related KR101433496B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127003719A Expired - Fee Related KR101512884B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127000370A Expired - Fee Related KR101422964B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법

Family Applications After (8)

Application Number Title Priority Date Filing Date
KR1020177003247A Abandoned KR20170016532A (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020077000539A Expired - Fee Related KR101162128B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020147025197A Expired - Fee Related KR101561796B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020137023317A Expired - Fee Related KR101440746B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020157010305A Expired - Fee Related KR101747662B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127025606A Expired - Fee Related KR101433496B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127003719A Expired - Fee Related KR101512884B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법
KR1020127000370A Expired - Fee Related KR101422964B1 (ko) 2004-06-09 2005-06-07 노광 장치 및 디바이스 제조 방법

Country Status (7)

Country Link
US (5) US8520184B2 (https=)
EP (3) EP3203498A1 (https=)
JP (12) JP4760708B2 (https=)
KR (9) KR101421915B1 (https=)
CN (8) CN108490741A (https=)
TW (7) TWI613529B (https=)
WO (1) WO2005122218A1 (https=)

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