JP3143307B2 - インクジェット記録ヘッドの製造方法 - Google Patents
インクジェット記録ヘッドの製造方法Info
- Publication number
- JP3143307B2 JP3143307B2 JP06010078A JP1007894A JP3143307B2 JP 3143307 B2 JP3143307 B2 JP 3143307B2 JP 06010078 A JP06010078 A JP 06010078A JP 1007894 A JP1007894 A JP 1007894A JP 3143307 B2 JP3143307 B2 JP 3143307B2
- Authority
- JP
- Japan
- Prior art keywords
- ink
- resin layer
- coating
- coating resin
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 97
- 239000011347 resin Substances 0.000 claims abstract description 97
- 239000011248 coating agent Substances 0.000 claims abstract description 67
- 238000000576 coating method Methods 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000003822 epoxy resin Substances 0.000 claims abstract description 18
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 18
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 239000007787 solid Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 49
- 239000003638 chemical reducing agent Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 10
- SBTSVTLGWRLWOD-UHFFFAOYSA-L copper(ii) triflate Chemical group [Cu+2].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F SBTSVTLGWRLWOD-UHFFFAOYSA-L 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 7
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 6
- 238000012663 cationic photopolymerization Methods 0.000 claims description 6
- 229910001431 copper ion Inorganic materials 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 5
- 238000000206 photolithography Methods 0.000 claims description 5
- 238000001312 dry etching Methods 0.000 claims description 4
- -1 aromatic iodonium salt Chemical class 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 50
- 239000000463 material Substances 0.000 description 15
- 239000007788 liquid Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 12
- 238000004528 spin coating Methods 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 238000005520 cutting process Methods 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N isopropyl alcohol Natural products CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000010538 cationic polymerization reaction Methods 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 235000019241 carbon black Nutrition 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- YEOCHZFPBYUXMC-UHFFFAOYSA-L copper benzoate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 YEOCHZFPBYUXMC-UHFFFAOYSA-L 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- HXVNBWAKAOHACI-UHFFFAOYSA-N 2,4-dimethyl-3-pentanone Chemical compound CC(C)C(=O)C(C)C HXVNBWAKAOHACI-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- NPDRCMNPWJMFNZ-UHFFFAOYSA-L C(C)O.[O-]S(=O)(=O)C(F)(F)F.[Cu+2].[O-]S(=O)(=O)C(F)(F)F Chemical compound C(C)O.[O-]S(=O)(=O)C(F)(F)F.[Cu+2].[O-]S(=O)(=O)C(F)(F)F NPDRCMNPWJMFNZ-UHFFFAOYSA-L 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229920006237 degradable polymer Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical compound C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920006215 polyvinyl ketone Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/07—Ink jet characterised by jet control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP06010078A JP3143307B2 (ja) | 1993-02-03 | 1994-01-31 | インクジェット記録ヘッドの製造方法 |
EP94101556A EP0609860B1 (fr) | 1993-02-03 | 1994-02-02 | Méthode pour la fabrication d'une tête à jet d'encre |
AT94101556T ATE166836T1 (de) | 1993-02-03 | 1994-02-02 | Herstellungsverfahren für einen tintenstrahlaufzeichnungskopf |
DE69410648T DE69410648T2 (de) | 1993-02-03 | 1994-02-02 | Herstellungsverfahren für einen Tintenstrahlaufzeichnungskopf |
CN94102753A CN1080645C (zh) | 1993-02-03 | 1994-02-02 | 喷墨记录头的制造方法 |
KR1019940001857A KR0152452B1 (ko) | 1993-02-03 | 1994-02-02 | 잉크 제트 기록 헤드 제조 방법 |
ES94101556T ES2116478T3 (es) | 1993-02-03 | 1994-02-02 | Metodo para la fabricacion de un cabezal para impresion por chorros de tinta. |
US08/392,686 US5478606A (en) | 1993-02-03 | 1995-02-23 | Method of manufacturing ink jet recording head |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1623893 | 1993-02-03 | ||
JP5-16238 | 1993-02-03 | ||
JP06010078A JP3143307B2 (ja) | 1993-02-03 | 1994-01-31 | インクジェット記録ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06286149A JPH06286149A (ja) | 1994-10-11 |
JP3143307B2 true JP3143307B2 (ja) | 2001-03-07 |
Family
ID=26345271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP06010078A Expired - Lifetime JP3143307B2 (ja) | 1993-02-03 | 1994-01-31 | インクジェット記録ヘッドの製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5478606A (fr) |
EP (1) | EP0609860B1 (fr) |
JP (1) | JP3143307B2 (fr) |
KR (1) | KR0152452B1 (fr) |
CN (1) | CN1080645C (fr) |
AT (1) | ATE166836T1 (fr) |
DE (1) | DE69410648T2 (fr) |
ES (1) | ES2116478T3 (fr) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6951380B2 (en) | 2002-07-10 | 2005-10-04 | Canon Kabushiki Kaisha | Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head |
US6960424B2 (en) | 2001-07-11 | 2005-11-01 | Canon Kabushiki Kaisha | Method for manufacturing microstructure, method for manufacturing liquid discharge head, and liquid discharge head |
US7063799B2 (en) | 2002-12-27 | 2006-06-20 | Canon Kabushiki Kaisha | Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture |
US7575851B2 (en) | 2004-06-28 | 2009-08-18 | Canon Kabushiki Kaisha | Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member |
US7592131B2 (en) | 2002-07-10 | 2009-09-22 | Canon Kabushiki Kaisha | Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head |
US7629111B2 (en) | 2004-06-28 | 2009-12-08 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
US7658469B2 (en) | 2003-07-22 | 2010-02-09 | Canon Kabushiki Kaisha | Ink jet head and its manufacture method |
US8211719B2 (en) | 2009-09-24 | 2012-07-03 | Canon Kabushiki Kaisha | Method of processing substrate and method of manufacturing substrate for use in liquid ejection head |
US8227043B2 (en) | 2004-06-28 | 2012-07-24 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
WO2013115393A1 (fr) | 2012-01-31 | 2013-08-08 | Canon Kabushiki Kaisha | Composition de résine négative photosensible, structure fine, procédé de production d'une structure fine et tête de sortie de liquide |
US8945818B2 (en) | 2013-05-02 | 2015-02-03 | Canon Kabushiki Kaisha | Method of manufacturing liquid ejection head |
US9096063B2 (en) | 2012-01-24 | 2015-08-04 | Canon Kabushiki Kaisha | Liquid ejection head and method of manufacturing same |
US9102145B2 (en) | 2012-04-10 | 2015-08-11 | Canon Kabushiki Kaisha | Liquid ejecting head and method for producing the same |
US9205654B2 (en) | 2013-06-06 | 2015-12-08 | Canon Kabushiki Kaisha | Method of manufacturing a liquid ejection head |
US9707757B2 (en) | 2013-04-10 | 2017-07-18 | Canon Kabushiki Kaisha | Photosensitive negative resin composition |
Families Citing this family (165)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3283979B2 (ja) * | 1993-11-12 | 2002-05-20 | キヤノン株式会社 | 液体噴射記録ヘッドの製造方法 |
JP3143308B2 (ja) | 1994-01-31 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JP3236458B2 (ja) * | 1994-11-22 | 2001-12-10 | キヤノン株式会社 | インクジェット記録ヘッド |
EP0715957B1 (fr) * | 1994-12-05 | 1999-05-26 | Canon Kabushiki Kaisha | Procédé de production d'une tête à jet d'encre |
JP3229146B2 (ja) * | 1994-12-28 | 2001-11-12 | キヤノン株式会社 | 液体噴射ヘッドおよびその製造方法 |
US5983486A (en) * | 1995-03-10 | 1999-11-16 | Canon Kabushiki Kaisha | Process for producing ink jet head |
DE69603639T2 (de) * | 1995-03-31 | 2000-04-13 | Canon K.K., Tokio/Tokyo | Verfahren zum Herstellen eines Tintenstrahlkopfes |
JP3368094B2 (ja) * | 1995-04-21 | 2003-01-20 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JP3459703B2 (ja) * | 1995-06-20 | 2003-10-27 | キヤノン株式会社 | インクジェットヘッドの製造方法、およびインクジェットヘッド |
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1994
- 1994-01-31 JP JP06010078A patent/JP3143307B2/ja not_active Expired - Lifetime
- 1994-02-02 KR KR1019940001857A patent/KR0152452B1/ko not_active IP Right Cessation
- 1994-02-02 AT AT94101556T patent/ATE166836T1/de not_active IP Right Cessation
- 1994-02-02 EP EP94101556A patent/EP0609860B1/fr not_active Expired - Lifetime
- 1994-02-02 ES ES94101556T patent/ES2116478T3/es not_active Expired - Lifetime
- 1994-02-02 CN CN94102753A patent/CN1080645C/zh not_active Expired - Fee Related
- 1994-02-02 DE DE69410648T patent/DE69410648T2/de not_active Expired - Lifetime
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1995
- 1995-02-23 US US08/392,686 patent/US5478606A/en not_active Expired - Lifetime
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US7063799B2 (en) | 2002-12-27 | 2006-06-20 | Canon Kabushiki Kaisha | Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture |
US7753495B2 (en) | 2002-12-27 | 2010-07-13 | Canon Kabushiki Kaisha | Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture |
US7658469B2 (en) | 2003-07-22 | 2010-02-09 | Canon Kabushiki Kaisha | Ink jet head and its manufacture method |
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US7629111B2 (en) | 2004-06-28 | 2009-12-08 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
US8227043B2 (en) | 2004-06-28 | 2012-07-24 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
US8211719B2 (en) | 2009-09-24 | 2012-07-03 | Canon Kabushiki Kaisha | Method of processing substrate and method of manufacturing substrate for use in liquid ejection head |
US9096063B2 (en) | 2012-01-24 | 2015-08-04 | Canon Kabushiki Kaisha | Liquid ejection head and method of manufacturing same |
WO2013115393A1 (fr) | 2012-01-31 | 2013-08-08 | Canon Kabushiki Kaisha | Composition de résine négative photosensible, structure fine, procédé de production d'une structure fine et tête de sortie de liquide |
JP2013178492A (ja) * | 2012-01-31 | 2013-09-09 | Canon Inc | 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド |
US9268222B2 (en) | 2012-01-31 | 2016-02-23 | Canon Kabushiki Kaisha | Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head |
US9102145B2 (en) | 2012-04-10 | 2015-08-11 | Canon Kabushiki Kaisha | Liquid ejecting head and method for producing the same |
US9707757B2 (en) | 2013-04-10 | 2017-07-18 | Canon Kabushiki Kaisha | Photosensitive negative resin composition |
US8945818B2 (en) | 2013-05-02 | 2015-02-03 | Canon Kabushiki Kaisha | Method of manufacturing liquid ejection head |
US9205654B2 (en) | 2013-06-06 | 2015-12-08 | Canon Kabushiki Kaisha | Method of manufacturing a liquid ejection head |
Also Published As
Publication number | Publication date |
---|---|
CN1080645C (zh) | 2002-03-13 |
ATE166836T1 (de) | 1998-06-15 |
EP0609860A3 (en) | 1995-08-16 |
KR940019477A (ko) | 1994-09-14 |
US5478606A (en) | 1995-12-26 |
ES2116478T3 (es) | 1998-07-16 |
KR0152452B1 (ko) | 1998-12-01 |
EP0609860A2 (fr) | 1994-08-10 |
EP0609860B1 (fr) | 1998-06-03 |
JPH06286149A (ja) | 1994-10-11 |
CN1104585A (zh) | 1995-07-05 |
DE69410648D1 (de) | 1998-07-09 |
DE69410648T2 (de) | 1998-12-10 |
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