JP4274554B2 - 素子基板および液体吐出素子の形成方法 - Google Patents
素子基板および液体吐出素子の形成方法 Download PDFInfo
- Publication number
- JP4274554B2 JP4274554B2 JP2004210086A JP2004210086A JP4274554B2 JP 4274554 B2 JP4274554 B2 JP 4274554B2 JP 2004210086 A JP2004210086 A JP 2004210086A JP 2004210086 A JP2004210086 A JP 2004210086A JP 4274554 B2 JP4274554 B2 JP 4274554B2
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- Prior art keywords
- substrate
- forming
- supply port
- ink supply
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000000758 substrate Substances 0.000 title claims description 83
- 239000007788 liquid Substances 0.000 title claims description 59
- 238000000034 method Methods 0.000 title claims description 35
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims 2
- 230000035515 penetration Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 21
- 239000010410 layer Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 238000001312 dry etching Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000001454 recorded image Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49139—Assembling to base an electrical component, e.g., capacitor, etc. by inserting component lead or terminal into base aperture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
Description
10 素子基板
11 基板
12 貫通電極
13 インク供給口
14 液流路
15 電極
16 発熱抵抗体
18 吐出口
20 オリフィス
21 オリフィスプレート
22 貫通穴
26 パターン
27 エポキシ膜
28 樹脂膜
100 記録ヘッドカートリッジ
101 インクタンク
102 インクホルダ
103 ベースプレート
104 記録ヘッド
Claims (4)
- 基板と、該基板を貫通するインク供給口と、該基板上に設けられ、該インク供給口から流入したインクに吐出エネルギーを供給するエネルギー供給手段とを有する素子基板の形成方法であって、
前記基板上に前記エネルギー供給手段を形成する工程と、
その後に、前記基板を薄化する工程と、
その後に、前記基板に前記インク供給口を形成するインク供給口形成工程と、
を有し、
前記素子基板は、前記基板を貫通して前記エネルギー供給手段に接続し、前記エネルギー供給手段に駆動電流を供給する貫通電極をさらに有し、
前記インク供給口形成工程は、前記基板に前記インク供給口と前記貫通電極とを形成する貫通部形成工程を有する、素子基板の形成方法。 - 前記貫通部形成工程は、
前記貫通電極の形成のための貫通穴を形成する工程と、
その後に、前記貫通穴に導電性材料を充填し前記貫通電極を形成する工程と、
その後に、前記インク供給口を形成する工程と、
を有する、
請求項1に記載の素子基板の形成方法。 - 前記貫通部形成工程は、
前記インク供給口と、前記貫通電極の形成のための貫通穴とを同時に形成する工程と、
その後に、前記貫通穴に導電性材料を充填し前記貫通電極を形成する工程と、
を有する、
請求項1に記載の素子基板の形成方法。 - 請求項1から3のいずれか1項に記載の素子基板の形成方法によって素子基板を形成する工程と、
前記インク供給口と接続し、前記素子基板の前記エネルギー供給手段が設けられた面上を延びる液流路と、該液流路と接続し前記エネルギー供給手段によって吐出エネルギーを与えられたインクを記録媒体に吐出させるオリフィスとを形成するオリフィスプレートを形成する工程と、
を有する、液体吐出素子の形成方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004210086A JP4274554B2 (ja) | 2004-07-16 | 2004-07-16 | 素子基板および液体吐出素子の形成方法 |
US11/179,543 US7757397B2 (en) | 2004-07-16 | 2005-07-13 | Method for forming an element substrate |
TW094124154A TWI273983B (en) | 2004-07-16 | 2005-07-15 | Liquid ejection element and manufacturing method therefor |
KR1020050064023A KR100790605B1 (ko) | 2004-07-16 | 2005-07-15 | 소자 기판의 제조 방법 및 액체 토출 소자의 제조 방법 |
CNB200510084876XA CN100418773C (zh) | 2004-07-16 | 2005-07-18 | 用于形成喷液元件基质的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004210086A JP4274554B2 (ja) | 2004-07-16 | 2004-07-16 | 素子基板および液体吐出素子の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006027108A JP2006027108A (ja) | 2006-02-02 |
JP4274554B2 true JP4274554B2 (ja) | 2009-06-10 |
Family
ID=35598986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004210086A Expired - Fee Related JP4274554B2 (ja) | 2004-07-16 | 2004-07-16 | 素子基板および液体吐出素子の形成方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7757397B2 (ja) |
JP (1) | JP4274554B2 (ja) |
KR (1) | KR100790605B1 (ja) |
CN (1) | CN100418773C (ja) |
TW (1) | TWI273983B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4274556B2 (ja) * | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 液体吐出素子の製造方法 |
JP4274554B2 (ja) | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 素子基板および液体吐出素子の形成方法 |
JP4274555B2 (ja) * | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 液体吐出素子基板の製造方法および液体吐出素子の製造方法 |
JP2008012911A (ja) * | 2006-06-07 | 2008-01-24 | Canon Inc | 液体吐出ヘッド、及び液体吐出ヘッドの製造方法 |
JP5371475B2 (ja) * | 2009-02-17 | 2013-12-18 | キヤノン株式会社 | インクジェット記録ヘッド及びそのクリーニング方法 |
US11161351B2 (en) * | 2018-09-28 | 2021-11-02 | Canon Kabushiki Kaisha | Liquid ejection head |
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JP4274555B2 (ja) * | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 液体吐出素子基板の製造方法および液体吐出素子の製造方法 |
JP4274556B2 (ja) * | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 液体吐出素子の製造方法 |
JP4274554B2 (ja) | 2004-07-16 | 2009-06-10 | キヤノン株式会社 | 素子基板および液体吐出素子の形成方法 |
-
2004
- 2004-07-16 JP JP2004210086A patent/JP4274554B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-13 US US11/179,543 patent/US7757397B2/en not_active Expired - Fee Related
- 2005-07-15 TW TW094124154A patent/TWI273983B/zh not_active IP Right Cessation
- 2005-07-15 KR KR1020050064023A patent/KR100790605B1/ko not_active IP Right Cessation
- 2005-07-18 CN CNB200510084876XA patent/CN100418773C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN100418773C (zh) | 2008-09-17 |
JP2006027108A (ja) | 2006-02-02 |
KR100790605B1 (ko) | 2008-01-02 |
TW200607653A (en) | 2006-03-01 |
KR20060050197A (ko) | 2006-05-19 |
US20060012641A1 (en) | 2006-01-19 |
CN1721189A (zh) | 2006-01-18 |
TWI273983B (en) | 2007-02-21 |
US7757397B2 (en) | 2010-07-20 |
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