JP6274954B2 - 液体吐出ヘッドの製造方法 - Google Patents
液体吐出ヘッドの製造方法 Download PDFInfo
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- JP6274954B2 JP6274954B2 JP2014080390A JP2014080390A JP6274954B2 JP 6274954 B2 JP6274954 B2 JP 6274954B2 JP 2014080390 A JP2014080390 A JP 2014080390A JP 2014080390 A JP2014080390 A JP 2014080390A JP 6274954 B2 JP6274954 B2 JP 6274954B2
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- 239000007788 liquid Substances 0.000 title claims description 125
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims description 59
- 239000000463 material Substances 0.000 claims description 55
- 238000010438 heat treatment Methods 0.000 claims description 42
- 229920005989 resin Polymers 0.000 claims description 18
- 239000011347 resin Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 230000009477 glass transition Effects 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 115
- 238000005530 etching Methods 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229920002614 Polyether block amide Polymers 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910004200 TaSiN Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000012663 cationic photopolymerization Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14032—Structure of the pressure chamber
- B41J2/1404—Geometrical characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14475—Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
Claims (10)
- 基板と、該基板の表面側に形成された発熱抵抗体と、該基板の表面側に液室及び液体吐出口を形成するノズル層と、を有する液体吐出ヘッドの製造方法であって、
発熱抵抗体とノズル層形成材料層とを表面側に有する基板を用意する工程と、
前記発熱抵抗体を駆動させて加熱することで前記ノズル層形成材料層に液室となる気泡を形成する工程と、
前記ノズル層形成材料層に前記液室と連通する液体吐出口を形成し、前記基板の表面側に前記液室及び前記液体吐出口を形成するノズル層を形成する工程と、
を有することを特徴とする液体吐出ヘッドの製造方法。 - 前記ノズル層形成材料層を形成する材料のガラス転移点は、前記発熱抵抗体を駆動させることで前記ノズル層形成材料層にかかる温度よりも高い請求項1に記載の液体吐出ヘッドの製造方法。
- 前記ノズル層形成材料層を形成する材料のガラス転移点は100℃以上である請求項1または2に記載の液体吐出ヘッドの製造方法。
- 前記ノズル層形成材料層は、ネガ型感光性樹脂で形成されている請求項1乃至3のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記液室は、前記基板を表面側の上側からみたときに、前記基板に形成された液体供給口と重なるように形成する請求項1乃至4のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記ノズル層形成材料層に液室となる気泡を形成する際に、前記ノズル層形成材料層の表面側に金属層を形成しておく請求項1乃至5のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記金属層の厚みは、前記ノズル層形成材料層の厚みの20%以上、60%以下である請求項6に記載の液体吐出ヘッドの製造方法。
- 前記金属層の厚みは、5μm以上、10μm以下である請求項6または7に記載の液体吐出ヘッドの製造方法。
- 前記金属層はTa、TiW、Auの少なくとも1つで形成する請求項6乃至8のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記ノズル層形成材料層は、1つの前記液室に対応して1つ形成する請求項1乃至9のいずれか1項に記載の液体吐出ヘッドの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014080390A JP6274954B2 (ja) | 2014-04-09 | 2014-04-09 | 液体吐出ヘッドの製造方法 |
US14/679,904 US9604454B2 (en) | 2014-04-09 | 2015-04-06 | Method for manufacturing liquid ejection head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014080390A JP6274954B2 (ja) | 2014-04-09 | 2014-04-09 | 液体吐出ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015199294A JP2015199294A (ja) | 2015-11-12 |
JP6274954B2 true JP6274954B2 (ja) | 2018-02-07 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014080390A Active JP6274954B2 (ja) | 2014-04-09 | 2014-04-09 | 液体吐出ヘッドの製造方法 |
Country Status (2)
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US (1) | US9604454B2 (ja) |
JP (1) | JP6274954B2 (ja) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55131882A (en) * | 1979-04-02 | 1980-10-14 | Canon Inc | Electronic equipment |
JP3218255B2 (ja) * | 1992-09-22 | 2001-10-15 | 富士通株式会社 | インクジェットヘッドの製造方法 |
JP3143307B2 (ja) | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JP3647150B2 (ja) * | 1996-07-12 | 2005-05-11 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
EP1016525B1 (en) * | 1998-12-29 | 2009-01-14 | Canon Kabushiki Kaisha | Liquid-ejecting head, liquid-ejecting method and liquid-ejecting printing apparatus |
US6627467B2 (en) * | 2001-10-31 | 2003-09-30 | Hewlett-Packard Development Company, Lp. | Fluid ejection device fabrication |
JP4632648B2 (ja) * | 2003-10-02 | 2011-02-16 | ソニー株式会社 | 液体吐出装置及び液体吐出方法 |
KR20070025634A (ko) * | 2005-09-03 | 2007-03-08 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
JP5787578B2 (ja) * | 2011-04-05 | 2015-09-30 | キヤノン株式会社 | 記録ヘッドの製造方法 |
JP2012245675A (ja) * | 2011-05-26 | 2012-12-13 | Canon Inc | 液体吐出ヘッド、液体吐出ヘッド用基板、及びこれらの製造方法 |
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2014
- 2014-04-09 JP JP2014080390A patent/JP6274954B2/ja active Active
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2015
- 2015-04-06 US US14/679,904 patent/US9604454B2/en active Active
Also Published As
Publication number | Publication date |
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JP2015199294A (ja) | 2015-11-12 |
US9604454B2 (en) | 2017-03-28 |
US20150290939A1 (en) | 2015-10-15 |
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