JP2015510263A5 - - Google Patents

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JP2015510263A5
JP2015510263A5 JP2014554825A JP2014554825A JP2015510263A5 JP 2015510263 A5 JP2015510263 A5 JP 2015510263A5 JP 2014554825 A JP2014554825 A JP 2014554825A JP 2014554825 A JP2014554825 A JP 2014554825A JP 2015510263 A5 JP2015510263 A5 JP 2015510263A5
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silicon
containing reactant
phase flow
nitrogen
gas phase
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JP2014554825A
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JP2015510263A (ja
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JP2014554825A 2012-01-26 2013-01-24 紫外線を用いたコンフォーマルな膜蒸着の方法 Pending JP2015510263A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261591230P 2012-01-26 2012-01-26
US61/591,230 2012-01-26
US13/472,282 US8647993B2 (en) 2011-04-11 2012-05-15 Methods for UV-assisted conformal film deposition
US13/472,282 2012-05-15
PCT/US2013/022977 WO2013112727A1 (en) 2012-01-26 2013-01-24 Methods for uv-assisted conformal film deposition

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JP2015510263A JP2015510263A (ja) 2015-04-02
JP2015510263A5 true JP2015510263A5 (cg-RX-API-DMAC7.html) 2016-03-03

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JP2014554825A Pending JP2015510263A (ja) 2012-01-26 2013-01-24 紫外線を用いたコンフォーマルな膜蒸着の方法

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US (1) US8647993B2 (cg-RX-API-DMAC7.html)
JP (1) JP2015510263A (cg-RX-API-DMAC7.html)
KR (1) KR20130086989A (cg-RX-API-DMAC7.html)
CN (1) CN104081505A (cg-RX-API-DMAC7.html)
SG (1) SG11201404315RA (cg-RX-API-DMAC7.html)
TW (1) TW201349346A (cg-RX-API-DMAC7.html)
WO (1) WO2013112727A1 (cg-RX-API-DMAC7.html)

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