TWI621923B - Exposure apparatus, exposure method, and component manufacturing method - Google Patents

Exposure apparatus, exposure method, and component manufacturing method Download PDF

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Publication number
TWI621923B
TWI621923B TW100140676A TW100140676A TWI621923B TW I621923 B TWI621923 B TW I621923B TW 100140676 A TW100140676 A TW 100140676A TW 100140676 A TW100140676 A TW 100140676A TW I621923 B TWI621923 B TW I621923B
Authority
TW
Taiwan
Prior art keywords
liquid
substrate
supply
recovery
optical system
Prior art date
Application number
TW100140676A
Other languages
English (en)
Chinese (zh)
Other versions
TW201220002A (en
Inventor
Hiroyuki Nagasaka
Soichi Owa
Yasufumi Nishii
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201220002A publication Critical patent/TW201220002A/zh
Application granted granted Critical
Publication of TWI621923B publication Critical patent/TWI621923B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • User Interface Of Digital Computer (AREA)
TW100140676A 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and component manufacturing method TWI621923B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003049365 2003-02-26
JP2003110748 2003-04-15
JP2003320100 2003-09-11

Publications (2)

Publication Number Publication Date
TW201220002A TW201220002A (en) 2012-05-16
TWI621923B true TWI621923B (zh) 2018-04-21

Family

ID=33101941

Family Applications (6)

Application Number Title Priority Date Filing Date
TW107141889A TW201908879A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法
TW103143643A TWI591445B (zh) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and device manufacturing method
TW093104895A TW200500813A (en) 2003-02-26 2004-02-26 Exposure apparatus and method, and method of producing device
TW101105430A TWI468876B (zh) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and device manufacturing method
TW106102146A TW201719296A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法
TW100140676A TWI621923B (zh) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and component manufacturing method

Family Applications Before (5)

Application Number Title Priority Date Filing Date
TW107141889A TW201908879A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法
TW103143643A TWI591445B (zh) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and device manufacturing method
TW093104895A TW200500813A (en) 2003-02-26 2004-02-26 Exposure apparatus and method, and method of producing device
TW101105430A TWI468876B (zh) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and device manufacturing method
TW106102146A TW201719296A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法

Country Status (9)

Country Link
US (15) US7268854B2 (ko)
EP (9) EP2945016B1 (ko)
JP (11) JP4640516B2 (ko)
KR (11) KR101643112B1 (ko)
CN (2) CN104678715B (ko)
HK (9) HK1168912A1 (ko)
SG (4) SG183572A1 (ko)
TW (6) TW201908879A (ko)
WO (1) WO2004086468A1 (ko)

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US20060274293A1 (en) 2006-12-07
JP5126191B2 (ja) 2013-01-23
SG10201401559QA (en) 2014-06-27

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