TWI468876B - - Google Patents

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Publication number
TWI468876B
TWI468876B TW101105430A TW101105430A TWI468876B TW I468876 B TWI468876 B TW I468876B TW 101105430 A TW101105430 A TW 101105430A TW 101105430 A TW101105430 A TW 101105430A TW I468876 B TWI468876 B TW I468876B
Authority
TW
Taiwan
Application number
TW101105430A
Other versions
TW201229691A (en
Inventor
長坂博之
大和壯一
西井康文
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003049365 priority Critical
Priority to JP2003110748 priority
Priority to JP2003320100 priority
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201229691A publication Critical patent/TW201229691A/zh
Application granted granted Critical
Publication of TWI468876B publication Critical patent/TWI468876B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
TW101105430A 2003-02-26 2004-02-26 TWI468876B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003049365 2003-02-26
JP2003110748 2003-04-15
JP2003320100 2003-09-11

Publications (2)

Publication Number Publication Date
TW201229691A TW201229691A (en) 2012-07-16
TWI468876B true TWI468876B (zh) 2015-01-11

Family

ID=33101941

Family Applications (6)

Application Number Title Priority Date Filing Date
TW106102146A TW201719296A (en) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and method for producing device
TW093104895A TWI361957B (zh) 2003-02-26 2004-02-26
TW107141889A TW201908879A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法
TW100140676A TWI621923B (zh) 2003-02-26 2004-02-26
TW101105430A TWI468876B (zh) 2003-02-26 2004-02-26
TW103143643A TWI591445B (zh) 2003-02-26 2004-02-26

Family Applications Before (4)

Application Number Title Priority Date Filing Date
TW106102146A TW201719296A (en) 2003-02-26 2004-02-26 Exposure apparatus, exposure method, and method for producing device
TW093104895A TWI361957B (zh) 2003-02-26 2004-02-26
TW107141889A TW201908879A (zh) 2003-02-26 2004-02-26 曝光裝置、曝光方法及元件製造方法
TW100140676A TWI621923B (zh) 2003-02-26 2004-02-26

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW103143643A TWI591445B (zh) 2003-02-26 2004-02-26

Country Status (9)

Country Link
US (15) US7268854B2 (zh)
EP (9) EP2945016B1 (zh)
JP (11) JP4640516B2 (zh)
KR (11) KR101563453B1 (zh)
CN (2) CN104678715B (zh)
HK (8) HK1168912A1 (zh)
SG (4) SG10201401559QA (zh)
TW (6) TW201719296A (zh)
WO (1) WO2004086468A1 (zh)

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* Cited by examiner, † Cited by third party
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