HK1214405A1 - 曝光裝置、曝光方法以及器件製造方法 - Google Patents
曝光裝置、曝光方法以及器件製造方法Info
- Publication number
- HK1214405A1 HK1214405A1 HK16102125.6A HK16102125A HK1214405A1 HK 1214405 A1 HK1214405 A1 HK 1214405A1 HK 16102125 A HK16102125 A HK 16102125A HK 1214405 A1 HK1214405 A1 HK 1214405A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposure
- producing device
- exposure apparatus
- producing
- exposure method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- User Interface Of Digital Computer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003049365 | 2003-02-26 | ||
JP2003110748 | 2003-04-15 | ||
JP2003320100 | 2003-09-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1214405A1 true HK1214405A1 (zh) | 2016-07-22 |
Family
ID=33101941
Family Applications (9)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12109463.5A HK1168912A1 (zh) | 2003-02-26 | 2012-09-26 | 曝光裝置以及器件製造方法 |
HK12110803.2A HK1170067A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110806.9A HK1170070A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110802.3A HK1170066A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110800.5A HK1170064A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK15108688.3A HK1208088A1 (zh) | 2003-02-26 | 2015-09-07 | 曝光方法以及器件製造方法 |
HK16102136.3A HK1214372A1 (zh) | 2003-02-26 | 2016-02-25 | 曝光裝置、曝光方法以及器件製造方法 |
HK16102125.6A HK1214405A1 (zh) | 2003-02-26 | 2016-02-25 | 曝光裝置、曝光方法以及器件製造方法 |
HK18107319.9A HK1247997A1 (zh) | 2003-02-26 | 2018-06-05 | 曝光裝置、曝光方法以及器件製造方法 |
Family Applications Before (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12109463.5A HK1168912A1 (zh) | 2003-02-26 | 2012-09-26 | 曝光裝置以及器件製造方法 |
HK12110803.2A HK1170067A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110806.9A HK1170070A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110802.3A HK1170066A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK12110800.5A HK1170064A1 (zh) | 2003-02-26 | 2012-10-29 | 曝光設備、曝光方法和製造裝置的方法 |
HK15108688.3A HK1208088A1 (zh) | 2003-02-26 | 2015-09-07 | 曝光方法以及器件製造方法 |
HK16102136.3A HK1214372A1 (zh) | 2003-02-26 | 2016-02-25 | 曝光裝置、曝光方法以及器件製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18107319.9A HK1247997A1 (zh) | 2003-02-26 | 2018-06-05 | 曝光裝置、曝光方法以及器件製造方法 |
Country Status (9)
Country | Link |
---|---|
US (15) | US7268854B2 (zh) |
EP (9) | EP2945016B1 (zh) |
JP (11) | JP4640516B2 (zh) |
KR (11) | KR101506408B1 (zh) |
CN (2) | CN102495540B (zh) |
HK (9) | HK1168912A1 (zh) |
SG (4) | SG2012087615A (zh) |
TW (6) | TWI468876B (zh) |
WO (1) | WO2004086468A1 (zh) |
Families Citing this family (147)
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