WO2001027978A1 - Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition - Google Patents

Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition Download PDF

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Publication number
WO2001027978A1
WO2001027978A1 PCT/JP1999/005539 JP9905539W WO0127978A1 WO 2001027978 A1 WO2001027978 A1 WO 2001027978A1 JP 9905539 W JP9905539 W JP 9905539W WO 0127978 A1 WO0127978 A1 WO 0127978A1
Authority
WO
WIPO (PCT)
Prior art keywords
stage
direction
exposure
substrate
mask
Prior art date
Application number
PCT/JP1999/005539
Other languages
English (en)
Japanese (ja)
Inventor
Masato Takahashi
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to PCT/JP1999/005539 priority Critical patent/WO2001027978A1/fr
Publication of WO2001027978A1 publication Critical patent/WO2001027978A1/fr

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70766Reaction force control means, e.g. countermass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression

Abstract

L'invention concerne un dispositif à étage (4) comprenant un support (8) isolé d'une plaque de surface (3) du point de vue des vibrations, et un étage de réaction (17) pouvant se déplacer sur le support (8) dans une direction, sous l'effet de la force de réaction qui s'exerce lorsque le corps de l'étage (2) est attaqué. L'élimination du mouvement de lacet dû à la réaction permet de diminuer le temps de stabilisation et d'améliorer le débit. En outre, on empêche la propagation des vibrations résiduelles depuis le support vers la plaque de surface.
PCT/JP1999/005539 1999-10-07 1999-10-07 Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition WO2001027978A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005539 WO2001027978A1 (fr) 1999-10-07 1999-10-07 Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
AU60054/99A AU6005499A (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method
KR1020017016269A KR100625625B1 (ko) 1999-10-07 1999-10-07 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
PCT/JP1999/005539 WO2001027978A1 (fr) 1999-10-07 1999-10-07 Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition
CNB99816934XA CN1260772C (zh) 1999-10-07 1999-10-07 载物台装置、载物台驱动方法和曝光装置及曝光方法

Publications (1)

Publication Number Publication Date
WO2001027978A1 true WO2001027978A1 (fr) 2001-04-19

Family

ID=14236940

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1999/005539 WO2001027978A1 (fr) 1999-10-07 1999-10-07 Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition

Country Status (4)

Country Link
KR (1) KR100625625B1 (fr)
CN (1) CN1260772C (fr)
AU (1) AU6005499A (fr)
WO (1) WO2001027978A1 (fr)

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JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
WO2004032212A1 (fr) * 2002-10-04 2004-04-15 Nikon Corporation Dispositif etage et dispositif d'exposition
US6741332B2 (en) 2001-08-08 2004-05-25 Nikon Corporation Stage system, exposure apparatus, and device manufacturing method
JP2005286321A (ja) * 2004-03-04 2005-10-13 Asml Netherlands Bv 可動物品担持装置、可動物品担持装置を含むリトグラフ装置、およびデバイス製造方法
CN100433253C (zh) * 2003-02-26 2008-11-12 株式会社尼康 曝光装置以及器件制造方法
US7453550B2 (en) 2003-02-26 2008-11-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2009135507A (ja) * 1999-12-21 2009-06-18 Asml Netherlands Bv リソグラフィ投影装置に使うための平衡位置決めシステム
US7696653B2 (en) 2006-03-30 2010-04-13 Nikon Corporation Movable-body apparatus, exposure apparatus and methods comprising same, and device-manufacturing methods
US7855777B2 (en) 2003-07-09 2010-12-21 Nikon Corporation Exposure apparatus and method for manufacturing device
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8547519B2 (en) 2003-11-14 2013-10-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
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US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction

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JPWO2004012260A1 (ja) * 2002-07-30 2005-11-24 株式会社タムラ製作所 精密加工用ステージ装置
KR101508810B1 (ko) * 2003-04-11 2015-04-14 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
KR100865051B1 (ko) * 2006-05-31 2008-10-23 닛본 세이고 가부시끼가이샤 노광 장치 및 노광 방법
US8544317B2 (en) * 2009-10-09 2013-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor processing apparatus with simultaneously movable stages
CN102880013B (zh) * 2012-09-28 2015-02-18 清华大学 一种掩模台工作台
CN103543612B (zh) * 2013-09-25 2015-09-30 清华大学 一种带真空罩的动铁式无线缆六自由度磁浮运动平台
US10254659B1 (en) 2017-09-27 2019-04-09 Wuhan China Star Optoelectronics Technology Co., Ltd Exposure apparatus and method for exposure of transparent substrate
CN107450284B (zh) * 2017-09-27 2019-06-07 武汉华星光电技术有限公司 曝光设备及透明基板的曝光方法

Citations (2)

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EP0917004A2 (fr) * 1997-11-11 1999-05-19 Canon Kabushiki Kaisha Système de dispositifs porte-objet et appareil d'exposition avec un tel système
US5909272A (en) * 1996-08-02 1999-06-01 Canon Kabushiki Kaisha Stage and exposure apparatus using same

Patent Citations (2)

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US5909272A (en) * 1996-08-02 1999-06-01 Canon Kabushiki Kaisha Stage and exposure apparatus using same
EP0917004A2 (fr) * 1997-11-11 1999-05-19 Canon Kabushiki Kaisha Système de dispositifs porte-objet et appareil d'exposition avec un tel système

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JP2009135507A (ja) * 1999-12-21 2009-06-18 Asml Netherlands Bv リソグラフィ投影装置に使うための平衡位置決めシステム
JP4621765B2 (ja) * 1999-12-21 2011-01-26 エーエスエムエル ネザーランズ ビー.ブイ. リソグラフィ投影装置に使うための平衡位置決めシステム
JP2009141371A (ja) * 1999-12-21 2009-06-25 Asml Netherlands Bv リソグラフィ投影装置に使うための平衡位置決めシステム
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
US6741332B2 (en) 2001-08-08 2004-05-25 Nikon Corporation Stage system, exposure apparatus, and device manufacturing method
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US9348239B2 (en) 2003-02-26 2016-05-24 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
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Also Published As

Publication number Publication date
CN1260772C (zh) 2006-06-21
CN1373900A (zh) 2002-10-09
AU6005499A (en) 2001-04-23
KR20020038592A (ko) 2002-05-23
KR100625625B1 (ko) 2006-09-20

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