WO2004032212A1 - Dispositif etage et dispositif d'exposition - Google Patents

Dispositif etage et dispositif d'exposition Download PDF

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Publication number
WO2004032212A1
WO2004032212A1 PCT/JP2003/012136 JP0312136W WO2004032212A1 WO 2004032212 A1 WO2004032212 A1 WO 2004032212A1 JP 0312136 W JP0312136 W JP 0312136W WO 2004032212 A1 WO2004032212 A1 WO 2004032212A1
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WO
WIPO (PCT)
Prior art keywords
stage
slider
guide
plane
sliders
Prior art date
Application number
PCT/JP2003/012136
Other languages
English (en)
Japanese (ja)
Inventor
Keiichi Tanaka
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU2003268662A priority Critical patent/AU2003268662A1/en
Publication of WO2004032212A1 publication Critical patent/WO2004032212A1/fr
Priority to US11/097,036 priority patent/US20050189901A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Definitions

  • the present invention relates to a stage device for moving and positioning a pattern original (mask, reticle), a sensitive substrate (wafer), and the like, and an exposure apparatus provided with such a stage device.
  • the present invention relates to a stage device which has little disturbance of a magnetic field and can be made compact and lightweight, or a stage device which has advantages such as high-precision scan positioning. Further, the present invention relates to an exposure apparatus having such a stage device.
  • a so-called H-type or I-type XY stage device is mainly used as a stage device of a light exposure apparatus.
  • These stage devices span a moving guide between two fixed guides extending parallel to a certain direction, and run a self-propelled stage on the moving guide.
  • This name is given because the two fixed guides and the moving guides are in the form of H or I in alphabet.
  • This type of stage device has a simple configuration and can be expected to be smaller, lighter, and more efficient.
  • the H-type stage is often used for a wafer stage whose both axes have a long stroke
  • the I-type stage is often used for a mask stage (reticle stage) whose one axis has a long stroke.
  • linear motors are generally used as drive mechanisms for each axis of such H-type or I-type stage devices. Both the stator and mover move in the linear motor of the axis on the self-propelled side on the movement guide of the stage device. Therefore, when these H-type or I-type stage devices are used as a mask stage or a wafer stage in an electron beam exposure apparatus, magnetic field fluctuation during exposure becomes a problem. As a countermeasure, the magnetic field of the linear motor is blocked by a magnetic shield. Although it is conceivable to cover it, in that case, the structure of the device becomes complicated.
  • cruciform stage device As another stage device, there is a so-called cruciform stage device (for example, see Japanese Patent Application Laid-Open No. 2002-93686 (FIGS. 1 and 2)).
  • This cruciform stage device is provided with two parallel fixed guides in both the X and Y directions, and a cruciform intersecting moving guide is slidably provided therebetween. A stage is mounted on the intersection of these moving guides.
  • the permanent magnet and armature coil that make up the linear motor the permanent magnet with a large fluctuating magnetic field is fixed on the surface plate as a stator for both XY axes, and the fluctuating magnetic field is relatively small If the armature coil is a mover, the fluctuating magnetic field during exposure can be reduced.
  • the cruciform stage device has a form in which the above-mentioned H-type stage and I-type stage are connected at the center, and the device becomes large.
  • stage device there is a stage device using a two-degree-of-freedom linear motor (plane motor) (for example, see Japanese Patent Application Laid-Open No. 2002-82445 (FIG. 8)).
  • plane motor for example, see Japanese Patent Application Laid-Open No. 2002-82445 (FIG. 8)
  • Japanese Patent Application Laid-Open No. Hei 9-134135 discloses a stage device of the type that applies a pressure in the Z direction to a table using an air bearing and a vacuum pad.
  • This stage device uses a vacuum pad and an air bearing provided on the surface plate to apply a preload in the Z direction to the moving table.
  • the weight of the moving table and the like can be received on the surface plate, and the pressurizing mechanism is simple, so that the device can be easily reduced in weight.
  • this stage device cannot be preloaded by vacuum in a vacuum. It is conceivable to apply pressurization by magnet attraction instead of vacuum, but it is applicable to charged particle beam exposure equipment where magnetic field fluctuations are to be avoided as much as possible. Peg.
  • the stage of the scan type exposure apparatus requires precise and continuous positioning in the continuous movement (scan) direction, but only intermittently moves and stops in other directions. For this reason, the stage drive mechanism in the scanning direction requires high-precision continuous positioning accuracy, and the stage drive mechanism in the other direction requires a particularly lightweight and center-of-gravity drive.
  • the drive of the center of gravity means that the center of gravity of the driven body and the center of the action of the driving force are matched. Further, it is preferable that the stage device has a characteristic of being able to cut off vibration accompanying movement of the stage portion at a low center of gravity.
  • the present invention has been made in view of the above problems, and has a small disturbance in a magnetic field and a stage device capable of reducing the size and weight of a device, or a device capable of performing high-accuracy scan positioning. It is an object to provide a stage device having advantages. It is another object of the present invention to provide a stage device having a novel reaction force canceling mechanism or a guide deformation correcting mechanism. It is another object of the present invention to provide an exposure apparatus including such a stage device. Disclosure of the invention
  • a first stage device of the present invention is a stage device for driving and positioning a stage in a certain plane (XY plane), and extends in a certain direction (Y direction) in the plane.
  • a fixed guide two Y-sliders sliding on each fixed guide, a drive mechanism for the Y-slider, a moving guide extending between the two Y-sliders and extending in another direction (X direction);
  • An X slider that slides on a moving guide, a driving mechanism for the X slider, and a stage mounted on the X slider, wherein the actuator of the driving mechanism for the Y slider is fixed guide.
  • a linear motor having a permanent magnet stator fixed along the axis, wherein the actuator of the drive mechanism of the X slider is a non-electromagnetic actuator.
  • linear motor Since the linear motor has excellent linearity, high-precision positioning control and speed tracking control are possible. However, linear motors are expensive, generate stray magnetic fields, and The placement stability is not high.
  • the driving mechanism of the X slider is a normal linear motor
  • the permanent magnet of the linear motor moves together with the Y slider and the moving guide, and the magnetic field on the stage becomes more disturbed.
  • Such disturbance of the magnetic field is extremely undesirable when the present stage apparatus is applied to a charged particle beam exposure apparatus. Therefore, if the drive mechanism of the X slider is a non-electromagnetic actuator such as an air cylinder, the disturbance of the magnetic field on the stage when the Y slider is driven can be almost ignored, and high-precision exposure can be performed.
  • the stator (permanent magnet) of the drive actuator for the Y slider is fixed to the surface plate along the fixed guide, and is relatively distant from the stage. The adverse effects are limited even for linear motor drive.
  • a first table driven in the ⁇ direction (around the ⁇ axis) is mounted on the stage unit, and the first table is driven in the ⁇ direction (around the X axis). It is preferable that a second table driven in the y direction (around the Y axis) and the Z direction is mounted.
  • stage device having many degrees of freedom can be realized.
  • control of the stage and the table is reduced, and the accuracy can be improved.
  • the movable part of the actuator of the drive mechanism of the X slider is guided via a gas bearing (air pad).
  • the stage can be driven with low friction.
  • the non-electromagnetic actuator is an air cylinder, and a pneumatic control valve for adjusting the air pressure of the air cylinder is mounted on the moving guide.
  • Air cylinders are inexpensive, have no magnetic field fluctuation due to non-electromagnetic drive, and have stability when stopped.
  • air cylinders have a compressibility for air as a working fluid. Therefore, the nonlinearity caused by air pressure propagation delay is strong.
  • the volume of the gas chamber changes depending on the position of the piston, there is a characteristic change due to the stage position. Therefore, by arranging the pneumatic control valve on the moving guide near the air cylinder, the delay in air pressure propagation is shortened, and the stage position with better responsiveness is determined.
  • a typical example of a highly responsive pneumatic control valve for an air cylinder is a servo valve driven by a VCM (voice coil motor). If this servo valve is mounted on a moving guide and moved, a fluctuating magnetic field on the stage may be generated. However, since the magnetic circuit of the VCM is magnetically closed, the fluctuating magnetic field due to the movement of the servo valve is negligibly small compared to the linear motor.
  • VCM voice coil motor
  • the two Y sliders are guided by the fixed guide only with the upper and lower surfaces restrained, and the thrust distribution of the linear motor of each drive mechanism of the two Y sliders is adjusted. Accordingly, the stage can be rotatable in the ⁇ direction (around the ⁇ axis).
  • the stage can be rotated in the ⁇ direction (around the ⁇ axis) without providing a table that can rotate in the ⁇ direction (around the ⁇ axis).
  • a sub-fixed guide arranged in parallel with the fixed guide, and four surfaces (upper and lower sides and both side surfaces of the sliding surface) are restrained on the sub-fixed guide via a gas bearing. Further comprising: an auxiliary slider that is guided in the direction; and a connecting means that connects the auxiliary slider and the ⁇ ⁇ slider, which is soft in the X direction and stiff in the ⁇ direction.
  • the connection means may be a spring that is flexible in the X direction and rigid in the Y direction.
  • a first exposure apparatus includes a mask stage on which a mask on which a desired pattern is formed is mounted, an illumination optical system for irradiating the mask with energy rays, and a sensor for mounting a sensitive substrate on which the pattern is transferred.
  • An exposure apparatus that performs exposure while performing synchronous scanning with the mask, wherein the mask stage or the sensitive substrate stage extends in the Y direction, two Y sliders sliding on the respective fixed guides, and the Y slider Drive mechanism, a moving guide extending between the two Y sliders, extending in the other direction (X direction), an X slider sliding on the moving guide, and the X slider
  • a linear motor wherein the actuator of the driving mechanism of the X slider is a non-electromagnetic actuator.
  • the scan axis (Y-axis) of the sensitive substrate stage of the exposure apparatus is a linear motor drive of the fixed guide
  • the other axis (X-axis, stationary step axis, etc.) is a non-electromagnetic cavitation drive of the movable guide. It is. By doing so, there is no substantial electromagnetic generating part in the non-electromagnetic cradle that moves together with the moving guide, and the permanent magnet, which is the scan axis drive stator, is fixed on the surface plate. Fluctuating magnetic field can be reduced as much as possible. In addition, special and expensive two-degree-of-freedom linear motors can be avoided.
  • the linear motor may be of an electromagnetic type, an electrostatic type, an electrostrictive type, a magnetostrictive type, or the like.
  • Examples of non-magnetic cavities include pneumatic cylinders and ultrasonic motors.
  • the apparatus can be simplified by guiding the scan axis with two fixed guides and adopting an H-shaped structure in which the step axis is driven on one moving guide.
  • a first table driven in the ⁇ direction (around the ⁇ axis) is mounted on the stage unit, and the first table is driven in the ⁇ direction (around the X axis). It is preferable that a second table driven in the ⁇ direction (around the ⁇ axis) and in the ⁇ direction is mounted.
  • the second stage device of the present invention performs continuous movement (scan) requiring precise positioning in a certain plane ( ⁇ ⁇ plane) in a certain direction ( ⁇ direction) in the plane, and in another direction.
  • a stage device that drives and positions a stage that only intermittently moves and stops, two fixed guides extending in the ⁇ direction, and each of these fixed guides
  • a drive mechanism for the stage wherein the drive mechanism for the slider is a linear motor, and the drive mechanism for the stage is an air cylinder. And wherein the door.
  • air cylinder in this specification includes a cylinder using a gas other than air as a working medium.
  • the fixed guide has upper and lower guide members sandwiching the slider from above and below, and non-contact between the guide members and upper and lower surfaces of the slider.
  • a gas bearing may be provided.
  • the Y-slider since the Y-slider has a structure in which the Y-slider is sandwiched between the fixed guides instead of a structure on the fixed guides, there is an advantage that the weight and the center of gravity of the stage device can be reduced.
  • a guide mechanism for restraining the slider in the X direction is not provided between the fixed guide and the slider,
  • a linear motor ( ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ) that drives in the X direction with a small dimension is attached to the ⁇ ⁇ -driven linear motor, and in the ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • the attitude control of the slider and the moving guide may be performed.
  • the stage attitude can be adjusted around the ⁇ direction by driving the ⁇ linear motor and moving the ⁇ slider and the moving guide around the direction ( ⁇ direction) orthogonal to the ⁇ plane.
  • ⁇ ⁇ ⁇ attitude control is possible by linear motor thrust distribution without multiple constraints at the guideless. Furthermore, it becomes possible to keep ⁇ ⁇ arbitrarily.
  • the stage may be guided on the moving guide with four surfaces (up and down and both side surfaces) restrained.
  • an exhaust groove can be provided around the non-contact gas bearing.
  • the stage device of the present invention can be used even in a vacuum atmosphere or a special atmosphere.
  • a third stage device of the present invention is a stage device for driving and positioning a stage in a certain plane (XY plane), comprising two fixed guides extending in a certain direction (Y direction) in the plane. Two Y-sliders sliding along each of the fixed guides, a driving mechanism for the Y-slider, and another direction in the plane (X direction) bridged between the two Y-sliders.
  • the guide member receives a driving reaction force of the Y slider, and further includes an active counter mass disposed in the guide member and driven in a direction opposite to the Y slider, and a driving mechanism therefor. And wherein the child.
  • the reaction force generated by the movement of the stage can be canceled. Therefore, the positioning accuracy of the stage is further improved.
  • a fourth stage device of the present invention is a stage device for driving and positioning a stage in a certain plane (XY plane), comprising: two fixed guides extending in a certain direction (Y direction) in the plane; Two Y sliders each sliding along each of these fixed guides, a driving mechanism of the Y slider, and a second direction (X direction) in the plane, which is bridged between the two Y sliders.
  • a moving guide that extends, a stage (X-slider) that slides along the moving guide, and a drive mechanism for the stage, wherein the fixed guide includes upper and lower guides that sandwich the Y slider from above and below.
  • a guide member the guide member receiving a driving reaction force of the Y slider, the guide member being supported in a non-contact manner with respect to a base of the stage device, and being driven by the driving reaction force of the Y slider.
  • the active reaction processing mechanism can reduce the stroke (size) and the total weight of the stage.
  • the passive reaction force processing mechanism can realize the simultaneous processing of the reaction force and reduce the power consumption. It can be said that the active reaction processing and the passive reaction processing have a dual relationship with each other.
  • the moving guide receives a driving reaction force of the stage (X slider), and is arranged in the moving guide and is driven in a direction opposite to the stage and an active counter mass. It is preferable to further provide a driving mechanism.
  • the movement guide receives a reaction force of the stage (X slider), and the movement guide is supported in a non-contact manner with respect to the Y slider. It is preferable to configure a passive counter mass mechanism in which the moving guide moves in a reverse direction.
  • the actuator of the drive mechanism may be an air cylinder.
  • the air cylinder can be made lighter than a linear motor or the like, the drive system on the moving guide side can be made lighter, and thus the entire stage device can be made lighter.
  • an auxiliary slider that moves alongside the Y slider, a connecting member (pipe) that connects the auxiliary slider and the Y slider, and mediates inflow and outflow of fluid between the Y slider and the outside. And can be provided.
  • the resistance of the stage when traveling by dragging the air pipe or the like can be reduced, and the controllability of the stage improves.
  • a sub-fixed guide for guiding the auxiliary slider which is disposed in parallel with the fixed guide, and is driven in a direction opposite to the auxiliary slider, which is disposed in the sub-fixed guide. And a driving mechanism therefor.
  • the linear motor may be provided with a magnetic shield structure.
  • disturbance magnetic fields such as high-frequency electromagnetic noise generated from the linear motor can be cut off.
  • a fifth stage device of the present invention is a stage device for driving and positioning a stage in a certain plane (XY plane), and two fixed guides extending in a certain direction (Y direction) in the plane.
  • Two Y sliders each sliding along each of these fixed guides, a drive mechanism for the Y slider, and a second direction (X direction) in the plane that is bridged between the two Y sliders.
  • a moving guide that extends, a stage (X-slider) that slides along the moving guide, and a drive mechanism for the stage.
  • a plurality of the non-contact gas bearings are arranged side by side in the X direction. It is characterized in that the supply of gas to each of the non-contact gas bearings is adjusted to correct the deflection of the moving guide by its own weight.
  • the second exposure apparatus of the present invention mounts an original stage on which an original on which a desired pattern is formed is mounted, an illumination optical system for irradiating the original with energy rays, and a sensitive substrate for transferring the pattern. Through the sensitive substrate stage and the master And a projection optical system for projecting and forming an energy beam on the sensitive substrate.
  • the exposure apparatus performs exposure while moving the both stages synchronously and continuously (synchronously scanning) in a certain direction (Y direction). And wherein the original stage or the sensitive substrate stage comprises the stage device.
  • a third exposure apparatus is an exposure apparatus that selectively irradiates an energy beam onto a sensitive substrate to form a pattern, comprising: a sensitive substrate stage on which the sensitive substrate is mounted and moved; and / or the pattern.
  • An original stage on which the original is placed and moved comprises the stage device described above.
  • the energy beam is not particularly limited, and may be light, ultraviolet light, X-ray (soft X-ray, EUV, etc.), charged particle beam (electron beam, ion beam) or the like.
  • the exposure method is not limited, and can be widely applied to reduction projection exposure, close-to-uniform transfer, direct drawing method, and the like.
  • FIG. 1 is a perspective view showing an overall configuration of a stage device according to a first embodiment of the present invention.
  • FIG. 2 is a side sectional view of an X slider and a stage portion of the stage device.
  • FIG. 3 is a side sectional view of a Y slider portion of the stage device.
  • FIG. 4 is an exploded perspective view showing the configuration of a gas bearing provided on the Y slider of the stage device.
  • FIG. 5 is a side sectional view showing a configuration of an air cylinder provided on the X slider.
  • FIG. 6 is a view schematically showing a charged particle beam (electron beam) exposure apparatus on which a stage device according to an embodiment of the present invention can be mounted.
  • charged particle beam electron beam
  • FIG. 7 is a side sectional view of an X slider and a stage section of a stage device according to a second embodiment of the present invention.
  • FIG. 8 shows the overall configuration of a stage device according to a third embodiment of the present invention.
  • FIG. 9 is an exploded perspective view showing a configuration of a table section of the stage device.
  • FIG. 10 is a plan view schematically showing a configuration of a stage device according to a fourth embodiment of the present invention.
  • FIG. 11 is an exploded perspective view showing a configuration of a table unit of the stage device.
  • FIG. 12 is a side sectional view showing a configuration of an auxiliary slider portion of the stage.
  • FIG. 13 is a perspective view showing an overall configuration of a stage device according to a fifth embodiment of the present invention.
  • FIG. 14 is a perspective view showing a state where the upper cover is removed from the guide ⁇ stage of the stage device of FIG. 13.
  • FIG. 15 is a perspective view of the linear motor, the Y slider, the moving guide and the stage of the stage apparatus (a perspective view with the fixed guide removed from FIG. 13).
  • FIG. 16 (A) is a plan view of each part shown in FIG. 15, FIG. 16 (B) is a front view thereof, and FIG. 16 (C) is a side view thereof.
  • FIG. 17 is an exploded perspective view showing the internal configuration of a linear motor driven by a Y slider (Y axis) of the stage device.
  • FIG. 18 is a perspective view of a movement guide and a stage of the stage device.
  • FIG. 19 (A) is a plan view of the moving guide and the stage shown in FIG. 18,
  • FIG. 19 (B) is a front view thereof, and
  • FIG. 19 (C) is a side view thereof. is there.
  • FIG. 20 (A) is a perspective view for explaining an operation of the stage of the stage device in the X direction, and
  • FIG. 20 (B) is an operation chart thereof.
  • FIGS. 21 (A) and (B) are perspective views for explaining the movement of the stage of the stage device in the Y direction, and FIG. 21 (C) is an operation chart thereof.
  • FIGS. 22 (A) and 22 (B) are perspective views for explaining the operation of the pipe carrier of the stage device, and FIG. 22 (C) is an operation chart thereof.
  • FIG. 23 is a schematic diagram showing a configuration example of a passive counter mass mechanism for driving in the Y direction.
  • FIG. 24 is a schematic diagram showing a configuration example of a passive counter mass mechanism for driving in the X direction.
  • A) is a side view and
  • B) is a plan view.
  • the stage device according to the present invention can be used in the atmosphere, and can be used not only for a charged particle beam exposure device but also for various uses.
  • FIG. 6 is a diagram schematically showing a charged particle beam (electron beam) exposure apparatus on which the stage device according to the embodiment of the present invention can be mounted.
  • charged particle beam electron beam
  • FIG. 6 schematically shows an electron beam exposure apparatus 100.
  • An optical column (vacuum chamber) 101 is shown above the electron beam exposure apparatus 100.
  • a vacuum pump 102 is connected to the optical column 101, and the inside of the optical column 101 is evacuated.
  • An electron gun 103 is disposed above the optical barrel 101, and emits an electron beam downward.
  • an illumination optical system 104 including a condenser lens 104a, an electron beam deflector 104.b, and the like, and a mask M are arranged below the electron gun 103.
  • the electron beam emitted from the electron gun 103 is converged by the condenser lens 104a.
  • the light is sequentially scanned (skewed) in the horizontal direction in the figure by the deflector 104b to illuminate each small area (subfield) of the mask M within the field of view of the optical system 104.
  • the condenser lens 104a has one stage, but an actual illumination optical system is provided with several stages of lenses, a beam shaping aperture, and the like.
  • the mask M is fixed to a chuck 110 provided above the mask stage 111 by electrostatic attraction or the like.
  • the mask stage 1 1 1 1 is mounted on a surface plate 1 16.
  • the driving device 1 1 2 shown on the left side of the figure is connected to the mask stage 1 1 1 I have.
  • the drive unit 112 is connected to the control unit 115 via a dry line 114.
  • a laser interferometer 113 is installed on the side (right side of the figure) of the mask stage 111.
  • the laser interferometer 113 is connected to the controller 115.
  • Accurate positional information of the mask stage 111 measured by the laser interferometer 113 is input to the controller 115.
  • a command is sent from the control unit 115 to the driver 114 so that the position of the mask stage 111 is set as the target position, and the drive unit 112 is driven.
  • the position of the mask stage 111 can be accurately feedback-controlled in real time.
  • a wafer chamber (vacuum chamber) 1 21 is shown below the surface plate 1 16.
  • a vacuum pump 122 is connected to the side of the wafer chamber 121 (the right side in the figure), and the inside of the wafer chamber 121 is evacuated.
  • a projection optical system 124 including a condenser lens (projection lens) 124a, a deflector 124b, and the like, and a wafer W are arranged in the wafer chamber 122.
  • the electron beam that has passed through the mask M is converged by the condenser's lens 124a.
  • the electron beam passing through the condenser lens 124a is deflected by the deflector 124, and an image of the mask M is formed at a predetermined position on the wafer W.
  • the condenser lens 124a has one stage, but in actuality, the projection optical system is provided with a plurality of stages of lenses, aberration correction lenses and coils.
  • the wafer W is fixed to a chuck 130 provided on the upper part of the wafer stage 131 by electrostatic attraction or the like.
  • the wafer stage 13 1 is mounted on a surface plate 13 6.
  • the driving device 13 2 shown on the left side of the figure is connected to the wafer stage 13 1.
  • the drive device 132 is connected to the control device 115 via a dryno 134.
  • a laser interferometer 133 is installed on the side of the wafer stage 131 (to the right in the figure).
  • the laser interferometer 133 is connected to the controller 115.
  • the accurate position information of the wafer stage 13 1 measured by the laser interferometer 13 3 is input to the controller 1 15.
  • Wafers In order to set the position of the stage 13 1 as the target position, a command is sent from the controller 1 15 to the driver 13 4, and the driving devices 13 2 are driven. As a result, the position of the wafer stage 13 1 can be accurately feedback-controlled in real time.
  • FIG. 1 is a perspective view showing the overall configuration of the stage device according to the first embodiment of the present invention.
  • FIG. 2 is a side sectional view of an X slider and a stage unit of the stage device.
  • FIG. 3 is a side sectional view of a Y slider portion of the stage device.
  • FIG. 1 shows the stage device 1 installed on a surface plate 1 16 (see FIG. 6) extending in the XY plane.
  • This stage apparatus 1 corresponds to the mask stage 111 in the exposure apparatus shown in FIG.
  • Two fixed guides 6 extending in parallel in the Y direction are fixed to two places on the upper surface of the surface plate 116 via two guide fixing portions 5, respectively.
  • the two fixed guides 6 and the peripheral members have basically the same configuration.
  • a hollow box-shaped Y slider 7 is fitted to each fixed guide 6 via a gas bearing (air pad 51, see FIG. 4) so as to be slidable in the Y direction.
  • an air pad and a guard ring are formed on the Y slider 7 side, and air collection and exhaust are performed on the fixed guide 6 side, which will be described later in detail with reference to FIG.
  • a passage is formed.
  • the outer surface of the Y slider 7 is connected to an air pipe 9a for supplying air to the air pad of the Y slider 7 and a wiring 12a for supplying a drive current to a linear motor 16 described later.
  • a supply pipe 30 b (not shown in the figure) is provided and bundled by a pipe fixing member 9.
  • An L-shaped pipe support 10 extending in the Y direction is fixed on the surface plate 1 16 outside the Y slider 7. Have been.
  • pipe fixing members 10a and 10b are provided, and the pipe 9a and the like fixed by the pipe fixing member 9 are connected to the outside of the apparatus.
  • the air supplied to the air pad of the Y slider 7 is provided to the fixed guide 6 via a collection / discharge passage provided in the fixed guide 6 as described later in detail with reference to FIG. Exhausted from the air port 8 Next, the structure of the fixed guide 6, the Y slider 7, and the linear motor 16 for driving the slider will be described with reference to FIG.
  • a T-shaped coil joint 12 extending in the Y direction lying in the XZ cross section is protruded toward the inside of the stage via a fixing member 11 via an XZ section. .
  • a mover coil 12b (shown only in FIG. 3) having a rectangular flat plate shape.
  • the fixed member 11 is provided with an electric wiring 9a for controlling the mover coil 12b and a pipe 12a for circulating the cooling medium (only FIG. 1 is shown).
  • Each of the wires 9 a and the pipes 12 a are fixed to the pipe fixing member 9.
  • a stator 13 is arranged with a gap.
  • the stator 13 has permanent magnets of Nd-Fe-B system or the like arranged in the drive direction such that the poles are alternated.
  • the stator 13 has a band shape extending in the Y direction, and its XZ section has a flat U-shape.
  • the opening side of the central groove 13 a of the U-shape faces the outside of the stage device.
  • U-shaped stator fixing members 14 are provided at both ends of the upper and lower stators 13 in the Y direction, and both stators 13 are mounted on the support base 15.
  • a plate panel 15a is provided between the stator support 15 and the fixing member 14, so that the stator 13 can slightly move in the Y direction.
  • one of the fixing members 14 should be fixed on the surface plate 116 via a cushioning material (panel damper or the like) whose end is grounded on the surface plate 116.
  • the stator 13 can be slightly moved in the Y direction.
  • Each of the mover coils 1 2b described above is The coil 12b and the stator 13 form a linear motor 16 for driving in the Y direction.
  • the driving force can be applied to the center of gravity of the Y slider 7.
  • Accuracy ⁇ High-speed position control is possible.
  • Moving guides 21 and 22 extending in the X direction are stretched between the Y sliders 7.
  • the moving guides 21 and 22 are spaced apart, and the beam that has passed through the mask M (see FIG. 6) passes downward through the space between the guides 21 and 22.
  • Reinforcing ribs 23, 24 are provided at the connection between the Y sliders 7 and the movement guides 21, 22 respectively.
  • a hollow box-shaped X slider 25 is fitted to the moving guide 21.
  • the movement guide 21 and the X slider 25 constitute an air cylinder 28 (described later with reference to FIG. 5), and the X slider 25 can be driven in the X direction.
  • a pneumatic control valve 27 for controlling air pressure is disposed at one end of the moving guide 21 (only one is shown in FIG. 1).
  • the pneumatic control valve 27 is a servo valve that is driven by a VCM (voice coil). It is preferable that the pneumatic control valve 27 is disposed close to the air cylinder 28 in order to reduce the pressure propagation delay.
  • an air pad and a guard ring are formed on the X slider 25 side, as will be described later in detail with reference to FIG. 4, and air is collected on the moving guide 21 side.
  • a passage for exhausting air is formed.
  • Air piping for supplying air to the air pad of X slider 25 30a is connected.
  • a pipe support 30 extending in the X direction is fixed on a surface plate 1 16 outside the X slider 25.
  • the pipe receiver 30 is not shown in detail, it has the same configuration as the pipe receiver 10 on the side of the Y slider 7, and has an air pipe 30a for supplying helium gas to be supplied to the electrostatic chuck. Piping 30b is fixed so as to be able to swing.
  • a square flat plate-shaped stage 61 extending on the XY plane is attached on the inner side surface of the X slider 25, as shown in FIG. 2, a square flat plate-shaped stage 61 extending on the XY plane is attached.
  • the stage 61 has a through hole 61a so that the beam that has passed through the mask M (see FIG. 6) can pass downward.
  • a gas bearing 61 b having a gas bearing 51 on the lower surface is provided on the stage 61 opposite the X slider 25 side (tip).
  • the gas bearing 6 1 b is mounted on the moving guide 22 via a gas bearing (air pad) 51, and can slide on the moving guide 22 in the X direction without contact. I have.
  • the gas bearing prevents the cantilever-shaped stage 61 from being deformed downward.
  • the air pads 51 can be arranged at, for example, two locations separated in the X direction on the lower surface of the stage 61.
  • an air pad and a guard ring (groove) are formed on the gas bearing portion 61b side, as will be described later in detail with reference to FIG.
  • a passage (not shown) for exhausting air is formed.
  • An air pipe 22a for supplying air to the air pad 51 of the gas bearing 61b is connected to the upper surface of the gas bearing 61b.
  • the air supplied to the air pad of the gas bearing 61b is exhausted through a guard ring and a recovery / exhaust passage (not shown) provided in the moving guide 22.
  • a first table 62 having a rectangular flat plate shape extending in the XY plane is placed.
  • the first table 62 has a through hole 62a, through which the beam that has passed through the mask M (see FIG. 6) passes downward.
  • a second flat plate-shaped square table 65 extending in the XY plane is placed via a gas bearing (air pad 51, see FIG. 2).
  • a gas bearing air pad 51, see FIG. 2.
  • the piezo actuators 63a, 63b, 63c are rotatably locked to the first table 62 by pins (not shown) or the like.
  • the piezoactuye 6 3 a, 6 3 b and 6 3 c can expand and contract on the XY plane.
  • the second table 65 can be rotated in the ⁇ direction (around the ⁇ axis) by the expansion and contraction of the piezo-actuator 6 3 a, 6 3 b, and 6 3 c.
  • a through hole 65a is formed.
  • an electrostatic chuck 110 mask holding device for fixing the mask M.
  • a helium gas supply pipe 30 b is provided on the upper surface of the second table 65 to supply helium gas to the electrostatic chuck 110.
  • one mask is mounted at the center of the stage 61 and the tables 62, 65.
  • two masks may be placed side by side in the X direction. Good.
  • more masks can be mounted.
  • a mark plate 66 for confirming the position of the second table 65 in the X and Y directions is placed at two places on the second table 65 next to the mask M.
  • Moving mirrors 67 a and 67 b are installed at two places on the end face of the second table 65.
  • the outer side surface of the movable mirror 67a> 67b is polished with high precision, and is used as a reflection surface of the laser interferometer 113 shown in FIG.
  • FIG. 4 is an exploded perspective view showing the configuration of a gas bearing provided on the Y slider of the stage device.
  • FIG. 4 shows the outer shape of the Y slider 7 fitted to the fixed guide 6 shown in FIG. 1 by imaginary lines. Above the slider 7, an upper surface portion 7a of the slider 7 is shown in an exploded manner. The other surface portions of the slider 7 have the same configuration as the upper surface portion 7a.
  • FIG. 4 illustrates the configuration of the gas bearing of the fixed guide 6 and the slider 7 as an example of the configuration of the gas bearing, the same configuration can be used for other gas bearings. However, the configuration of the gas bearing However, the present invention is not limited to this, and various forms can be used.
  • each air pad 51 made of a porous orifice member is provided. Between the two air pads 51, an air supply groove 51c is formed linearly at the center in the longitudinal direction.
  • air release guard rings (grooves) 52 that release air to the atmosphere
  • low vacuum guard rings 53 that perform low vacuum (Low Vacuum) exhaust.
  • High Vacuum (High Vacuum) A high vacuum guard ring for pumping out is formed on page 55.
  • Each guard ring 52, 53, 55 has a semicircular end, and a central portion is a straight line extending in the longitudinal direction.
  • An air pipe 9a for supplying air to the air pad 51 is connected to the upper surface of the Y slider upper surface 7a.
  • passages for collecting and exhausting air are formed in each of the guard rings 52, 53, 55.
  • a high vacuum exhaust passage 55a is formed so as to penetrate in the longitudinal direction.
  • An L-shaped low vacuum exhaust passage 53a is formed on the side of the high vacuum exhaust passage 55a so as to penetrate in the longitudinal direction.
  • An L-shaped open air passage 52a is formed on the side of the low vacuum exhaust passage 53a so as to penetrate in the longitudinal direction.
  • Holes 55b, 53b, 52b are formed in the center of the side surface of the fixed guide 6 of the passages 55a, 53a, 52a. Each hole communicates with each guard ring 52, 53, 55 to collect and exhaust air. The central part of each guard ring 52, 53, 55 is straight. Therefore, even if the slider 7 moves on the Y axis, each hole does not come off from each guard ring 52, 53, 55, so that air can be always collected and exhausted from each hole.
  • Air is supplied from the air pipe 9a to the air supply groove 51c, and air is ejected from the air pad 51.
  • the jetted air is released to the atmosphere from the atmosphere-opening passage 52 a via the atmosphere-opening guard ring 52.
  • the gas leaked from the air release guard ring 52 passes through the low vacuum guard ring 53 to the low vacuum exhaust passage 53a. It is exhausted from. Further, the air is exhausted from the high vacuum exhaust passage 55 a through the high vacuum guard ring 55. In this way, the air in the air pad is prevented from leaking too much into the chamber maintained at a high vacuum.
  • FIG. 5 is a side cross-sectional view showing a configuration of an air cylinder provided in the X slider.
  • FIG. 5 shows a moving guide 21 spanned between two Y sliders 7 and an X slider 25 fitted to the moving guide 21.
  • the movement guide 21 and the X slider 25 constitute an air cylinder 28.
  • An air pad 51 is provided on the sliding surface of the X slider 25 with the movement guide 21.
  • the air pads 51 are provided on the upper and lower sides and on both side surfaces (not shown) of the sliding surface near both ends of the X slider 25. Air is supplied to the air pad 51 from the air pipe 30a also shown in FIG.
  • an air release guard ring 52, a low vacuum exhaust guard ring 53, and a high vacuum exhaust guard ring 55 are sequentially provided.
  • a passage for recovering and exhausting gas from the guard rings 52, 53, 55 is also formed in the movement guide 21 (see Fig. 4).
  • Through holes 34, 35, 36 for communicating the guard ring with the passage are provided.
  • partition plates 31a and 3lb At the approximate center of the moving guide 21, there are provided partition plates 31a and 3lb.
  • the center of the X-slider 25 is divided into two air chambers 33a and 33b by partitioning plates 31a and 3lb.
  • a passage 32 for supplying gas to the gas chambers 33a and 33b of the X slider 25 is indicated by broken lines in the movement guide 21.
  • Pneumatic control valves 27 are provided at both ends of the passage 32 to control the pressure of the gas supplied to the gas chambers 33a and 33b.
  • the X slider 25 is driven in the X direction by making a difference between the pressures of the adjacent gas chambers. For example, by making the pressure of the gas chamber 33a higher than that of the gas chamber 33b, a pressure difference occurs between the walls of the gas chamber.
  • the stage apparatus of this example when used as a mask stage (reticle stage), the side guided by the two fixed guides 6 can be used as the scan axis. 1 is not twisted, and the controllability of the stage can be improved.
  • the driving mechanism of the X slider 25 to the air cylinder 28, disturbance of the magnetic field on the stage when the X slider 25 is driven can be almost ignored, so that high-precision exposure can be performed.
  • stator (permanent magnet) 13 of the linear motor 16 which is the driving mechanism for the Y slider 7 is fixed to the surface plate 116 along the fixed guide 6, so that the stage Since the Y-slider 7 is driven relatively linearly, the adverse effect is limited.
  • stage device according to a second embodiment of the present invention will be described with reference to FIG. This is an example in which the upper and lower sides of the stage 61 of the stage device 1 shown in FIG.
  • FIG. 7 is a side cross-sectional view of the X slider and the stage section of the stage device according to the second embodiment of the present invention.
  • FIG. 7 shows an X slider 25 fitted to the movement guide 21.
  • a stage 6 1 ′ is attached to the inner side surface of the X slider 25.
  • a movement guide 22 'extending in the X direction and having a flat U-shaped cross section is provided on the opposite side of the stage 61' from the X slider 25 side (tip end).
  • the stage 61 ' is provided with a through hole 61a' so that the beam passing through the mask M (see Fig. 6) can pass downward.
  • a gas bearing portion 61b 'having a gas bearing 51 is provided on the upper and lower surfaces of the stage 61' on the side opposite to the X slider 2.5 (tip).
  • two air pads 51 can be arranged on each of the upper and lower surfaces of the stage 6 1 ′.
  • an air pad and a guard ring (groove) are formed on the 6 lb 'side of the gas bearing section, and air is collected and exhausted on the moving guide 22' side.
  • a road (not shown) is formed.
  • An air pipe 22 a ′ for supplying air to the air pad 51 of the gas bearing portion 6 1 b ′ is connected to the gas bearing portion 6 1 b ′.
  • the air supplied to the 6 lb 'air pad of the gas bearing section is exhausted through a recovery / exhaust passage provided in the guard ring and the moving guide 22'.
  • the gas bearing 6 lb ' is inserted into the U-shaped part of the movement guide 2 2' with a gap through the gas bearing (air pad) 51, and the inside of the movement guide 22 'is moved in the X direction. It can slide without contact. The presence of this gas bearing prevents the stage 6 1 ′ on the cantilever from deforming up and down.
  • a first table 62 is placed via four cylindrical members 69 extending in the Z direction.
  • a second table 65 on which the mask M is placed is placed via a gas bearing (air pad 51, see FIG. 4).
  • the above-mentioned cylindrical member 69 raises the first table 62 and the second table 65 so as not to block the laser beam applied to the movable mirror 67a provided on the second table 65. It is for.
  • FIG. 8 is a perspective view showing the overall configuration of the stage device according to the third embodiment of the present invention.
  • stage device of this example is the same as that of the stage device 1 shown in FIG. 1, and therefore, the same components are denoted by the same reference numerals and description thereof is omitted.
  • piping and wiring are not shown.
  • FIG. 8 shows two fixed guides 6 fixed on the surface plate 1 16 (see FIG. 6), and a Y slider 7 fitted to each fixed guide 6.
  • the Y slider 7 is driven in the Y direction on the fixed guide 6 by a linear motor 16.
  • the two vertically arranged coil joints 12 and the mover coils 12 b (see FIG. 3) constituting each linear motor 16 are movable in a flat plate shape having a certain thickness. It is fixed by the child fixing plate 7 1.
  • Each of the mover fixing plates 7 1 (only one is shown) is provided with four screw holes 71 a.
  • the fixing plate 71 is fixed to the Y-slider 7 by screws passed through 71a.
  • Moving guides 21 and 22 extending in the X direction are stretched between the Y sliders 7.
  • An X slider 25 is fitted to the movement guide 21 on the front side in the figure.
  • the X slider 25 and the moving guide 21 constitute an air cylinder 28.
  • the stage 61 is attached to the inner side surface of the X slider 25. On the stage 61, a first table 72 and a second table 75 are placed, as will be described in detail later.
  • FIG. 9 is an exploded perspective view showing a configuration of a table unit of the stage device.
  • FIG. 9 shows a first table 72 and a second table 75 placed on the stage 61.
  • the first table 72 placed on the stage 61 is a rectangular flat plate that spreads in the XY plane, and the beam passing through the mask M is located at the center in the lower part.
  • a square through-hole 72a is formed so that it can pass through.
  • the first table 72 is mounted on the stage 61 via an unillustrated gas bearing (air pad 51, see FIG. 4).
  • the air pads 51 can be installed, for example, at four locations on the stage 61.
  • At three places on the end face of the first table 72 there are provided piezoactiye 73a, 73b, and 73c.
  • the piezoelectric actuators 73a, 73b, 73c are rotatably locked to the stage 61 by pins (not shown) or the like.
  • the first table 72 can be rotated in the ⁇ ⁇ direction (around the ⁇ axis) by the expansion and contraction of the piezo-actuator 73 a, 73 b and 73 c.
  • 79 b and 79 c are arranged upward.
  • a second table 75 on which a mask M is to be placed is placed on the three piezoactuers 79a, 79b, and 79c.
  • the second table 75 has a rectangular flat plate shape extending in the XY plane, and has a round through hole at the center to allow the beam passing through the mask M to pass downward. 7 5a is open.
  • the mark plate 66 is placed at two places on the second table 75 next to the through hole 75a.
  • Moving mirrors 67a and 67b are installed at two places on the end face of the second table 75.
  • the second table 75 can be driven in the Z direction by extending and contracting the piezoelectric actuators 79a, 79b, and 79c by the same length.
  • the second table 75 can be driven in the ⁇ direction (around the X axis) by relatively expanding and contracting the piezoelectric actuator 79 a and the piezoelectric actuators 79 b and 79 c.
  • the second table 75 can be driven in the negative direction in the ⁇ direction by fixing or contracting the piezoelectric actuator 79a and extending the piezoelectric actuators 79b and 79c.
  • the second table 75 can be driven in the ⁇ direction (around the Y axis) by relatively expanding and contracting the piezoelectric actuators 79 b and 79 c.
  • the second table 75 can be driven in the positive direction in the y direction by fixing the piezoelectric actuator 79b in a fixed or contracted state and extending the piezoelectric actuator 79c.
  • the three piezoelectric actuators 79a, 79b, and 79c can be controlled independently.By combining the above operations, the second table 75 has three degrees of freedom for position and orientation control. Can be added. In the case of this example, the fine movement table eventually has four degrees of freedom of ⁇ , ⁇ , ⁇ , and ⁇ ⁇ .
  • FIG. 10 is a plan view schematically showing a configuration of a stage device according to a fourth embodiment of the present invention.
  • FIG. 11 is an exploded perspective view showing a configuration of a table unit of the stage device.
  • FIG. 12 is a side sectional view showing the configuration of the auxiliary slider section of the stage.
  • the linear motor mounted on the Y slider 7 ' Then, rotate the stage in the ⁇ direction (around the ⁇ axis).
  • An auxiliary slider is provided, and a mechanism for canceling the stage reaction force is also provided.
  • the configuration of a considerable part of this stage device is the same as that of the stage device 1 shown in FIG. 1, and therefore, the same components are denoted by the same reference numerals and description thereof will be omitted.
  • FIG. 10 shows two fixed guides 6 fixed on the surface plate 1 16 (see FIG. 6) and a ⁇ slider 7 ′ fitted to each fixed guide 6.
  • the ⁇ slider 7 ′ is driven in the ⁇ direction on the fixed guide 6 by the linear motor 16.
  • gas bearings (not shown) (see air pads 51 and 4) are provided only at the upper and lower two places.
  • the ⁇ slider 7 ⁇ is slightly different from the fixed guide 6 in the ⁇ plane in the ⁇ direction (around the There is a degree of freedom of rotation. .
  • Moving guides 21 and 22 ′ (see FIG. 7) extending in the X direction are stretched between the sliders 7 ′.
  • An X slider 25 is fitted to the moving guide 21 to form an air cylinder 28.
  • the stage 61 is attached to the inner side surface of the X slider 25. The stage 61 is driven by the air cylinder 28 on the moving guides 21 and 22 ′ in the X direction.
  • a second table 75 on which a mask M is to be placed is placed on the three piezoactuers 79a ', 79b', and 79c '.
  • the second table 75 is driven in the ⁇ direction (around the X axis), in the 6y direction (around the Y axis), and in the Z direction by expanding and contracting the piezoelectric actuators 79 a ′, 79 b, and 79 c ′.
  • there is no first table (see the first table 72 in FIG. 9 and the like) that rotates in the ⁇ direction (around the ⁇ axis).
  • an arm 81 having a certain thickness and extending in the X direction is attached to the outer end face of one of the two ⁇ sliders 7 ′ (the left side in FIG. 10). ing. As shown in FIG. 12, a hole 81a is formed in the arm 81.
  • the auxiliary fixing guide 86 is fitted through the second fixing guide 86. As shown in FIG.
  • a certain gap C ′ is provided between the left and right side surfaces of the sliding surface of the hole 81 a and the sub-fixing guide 86, so that the arm 81 and the Y slider 7 ′
  • the fixed guides 6, 86 there is a degree of freedom in the ⁇ ⁇ direction (around the ⁇ axis) in the XY plane with respect to the fixed guides 6, 86.
  • the auxiliary fixed guide 86 has basically the same configuration as the fixed guide 6, and is fixed on the surface plate 116 via two guide fixing portions 85.
  • An auxiliary slider 87 is fitted between the two arms 81 on the sub-fixing guide 86.
  • the auxiliary slider 87 has basically the same configuration as the slider 7 shown in FIG. 1 and the like, and air bearings (air pads, not shown) 51, see Figure 4). Therefore, the auxiliary slider 87 has no rotational degree of freedom in the ⁇ direction (around the ⁇ axis) in the ⁇ plane with respect to the sub-fixed guide 86.
  • the auxiliary slider 87 and the two arms 81 are connected by springs 82, respectively.
  • the spring 82 is fixed on the auxiliary slider 87 and the two arms 81 by a spring fixing tool 82a.
  • a parallel plate panel that is flexible (expandable) in the X direction and rigid (non-expandable) in the Y direction is used. Therefore, when the Y slider 7 'is driven in the Y direction, the auxiliary slider 87 is also driven in the Y direction via the spring 82.
  • the stage reaction force is transmitted to the moving guide 21 and the like via the air cylinder 28.
  • the stage reaction force is also transmitted to the Y slider 7 ′, the movement guide 22 ′, the arm 81, etc. connected to the movement guide 21, and these device components are Move in X direction.
  • the movement of the arm 81 and the like applies a force in the X direction to the spring 82, but the spring 82 is flexible (expandable and contractible) in the X direction, and the four surfaces of the auxiliary slider 87 are restrained. Therefore, the stage reaction force can be canceled by the law of conservation of momentum based on the mass ratio between the movable part (X slider 25, etc.) and the fixed part (moving guide 21, etc.).
  • the moving guide 21, the Y slider 7 ′, the moving guide 22 ′, the arm 81, etc. Acts as a force processing mechanism (counter mass).
  • rotational ( ⁇ direction) movement is possible by changing the thrust balance of the linear motor 16 of the ⁇ slider 7 ′ arranged opposite to each other.
  • the second table 75 can be rotated in the positive direction in the ⁇ direction (around the ⁇ axis).
  • the rotation angle is minute because it is only the gap between the slider 7 'and the fixed guide 6 and between the arm 81 and the fixed guide 86.
  • accurate driving with less blurring can be performed.
  • stage device and the like according to the embodiment of the present invention have been described with reference to FIGS. 1 to 12, but the present invention is not limited to this, and the following changes can be made.
  • the stage apparatus described above can be applied to a wafer (sensitive substrate) stage 13 1 (see FIG. 6).
  • the through holes provided in the stage and table in the ⁇ direction through holes 72a and 75a in Fig. 9
  • holes may be provided to reduce the weight of the stage etc. .
  • FIG. 13 is a perspective view showing an overall configuration of a stage device according to a fifth embodiment of the present invention.
  • FIG. 14 is a perspective view showing a state where the upper cover is removed from the guide / stage of the stage device of FIG.
  • Fig. 15 is a perspective view of the linear motor, Y-slider, moving guide and stage of the stage device (perspective view with the fixed guide removed from Fig. 13).
  • Fig. 16 (A) is a plan view of each part shown in Fig. 15, and Fig. 16 (B) is its front view.
  • FIG. 16 (C) is a side view of the same.
  • Fig. 17 is an exploded perspective view showing the internal configuration of the Y-slider (Y-axis) driven linear motor of the stage device.
  • FIG. 18 is a perspective view of a movement guide and a stage of the stage device.
  • FIG. 19 (A) is a plan view of the movement guide and the stage shown in FIG. 18,
  • FIG. 19 (B) is a front view thereof, and
  • FIG. 19 (C) is a side view thereof.
  • FIG. 20 (A) is a perspective view for explaining the operation of the stage device in the X direction
  • FIG. 20 (B) is an operation chart thereof.
  • FIGS. 21 (A) and 21 (B) are perspective views for explaining the movement of the stage of the stage device in the Y direction
  • FIG. 21 (C) is an operation chart thereof.
  • FIGS. 22 (A) and 22 (B) are perspective views for explaining the operation of the piping carrier of the stage device, and FIG. 22 (C) is an operation chart thereof.
  • the stage device 201 corresponds to the wafer stage 131 in the exposure apparatus shown in FIG.
  • the stage device 201 performs continuous movement (scan) that requires precise positioning by a linear motor (see FIGS. 15 to 17) in the Y direction indicated by the arrow at the upper left of FIGS. 13 and 14.
  • the air cylinder In the X direction, the air cylinder (see Fig. 19) is configured to intermittently move and stop.
  • four posts 203a to 203d are set up on a base (not shown) in the square of the stage device 201, respectively.
  • Fixed guides 211, 221 extending in parallel with each other along the Y direction are provided between the left bosses 203a and 203b and between the right posts 203c and 203d, respectively.
  • Each fixed guide 21 1 comprises upper and lower guide members 21A and 21B (221A and 221B), respectively.
  • the upper and lower guide members 2 1 1 A and 2 1 1 B (221 A, 22 1 B) are strips extending in the Y direction and face each other vertically apart from each other by a certain distance. .
  • the main body of the Y slider 213 has a U-shaped cross section that opens outward.
  • a linear motor 214 is incorporated in this U-shaped opening (groove).
  • the linear motor 214 is configured by slidably combining a stator 215 with a T-shaped vertical section and a mover 216 with a U-shaped vertical section.
  • the stator 2 15 lies in a state of being sandwiched between the two guide members 2 11 A and 2 1 IB of the fixed guide 2 11 shown in FIG. Are located. Both ends of the stator 215 are fixed to posts 203a and 203b (see FIGS. 13 and 14).
  • the mover 2 16 is arranged such that the U-shaped opening faces the outside of the stage device 1 (the left side in FIGS. 16A and 16B).
  • the outside of the mover 216 is fixed to a Y slider 213.
  • the mover 216 and the Y slider 213 slide together in the Y direction with respect to the stator 215.
  • the stator 2 15 has a plurality of oval-shaped Y coils 2 15 a arranged in the Y direction (sliding direction), and adjacent to these Y coils 2 15 a A single elongated X coil 2 15 b arranged is incorporated.
  • the Y coil 215a and the X coil 215b are self-magnetic-field canceling coils, and can block disturbance magnetic fields such as high-frequency electromagnetic noise.
  • a plurality of bar-shaped Y permanent magnets 2 16a are arranged so that N poles and S poles are alternated along the Y direction (sliding direction).
  • Each of the permanent magnets 2 16 a and 216 b is a permanent magnet with a self-magnetic shield (Nd-Fe-B system in one example), and can block disturbance magnetic fields such as high-frequency electromagnetic noise.
  • the Y permanent magnets 216a correspond to the Y coils 215a, which serve as a Y-axis linear motor that generates a force Fy in the Y direction.
  • the X permanent magnet 216 b corresponds to the X coil 215 b
  • these and the X permanent magnet 216 b ′ and X coil 215 b ′ which will be described later, correspond to the force F in the X direction.
  • Generates x ⁇ Plays the role of a yoreini-mo.
  • the above-mentioned fixed guide 211 is connected to electric wiring for controlling the ⁇ coil 215 a and the X coil 215 b, piping for circulating a cooling medium, and the like (not shown).
  • the upper and lower surfaces of the Y-slider 2 13 (the surfaces facing the two guide members 2 1 1A and 2 1 1B of the fixed guide 2 1 1 in Fig. 13)
  • There are four air pads 2 17 a to 2 17 d on each surface (only four air pads on the upper sliding surface are shown in the figure).
  • Each of the air pads 217a to 217d is made of a porous orifice material. Air is supplied to each of the air pads 217a to 217d from the air pipe 217X.
  • the air pipe 217X is connected to the Y slider 213 and is connected to an air source (not shown).
  • air exhaust grooves 21a 'to 21d' are formed around the air pads 217a to 217d.
  • the sliding surface of the Y slider 2 13 has a rectangular vacuum exhaust groove 218 a surrounding the entire air pad 217 a to 217 d and a linear vacuum exhaust groove 2 18 b extending in the Y direction. Is formed. Due to the evacuation groove 2 18 b, the air pads 2 17 a to 2 17 d are divided into two inside 2 17 a, 2 17 c and two outside 2 17 b, 2 17 d. It is divided. The inner air pads 217a and 217c and the outer air pads 217b and 217d can adjust the air supply amount independently.
  • the four air pads, air exhaust grooves, and vacuum exhaust grooves on the lower sliding surface are also configured in the same way as the upper sliding surface.
  • the end of the stator 215 of the linear motor 214 is connected to the X permanent magnet 216b and the X coil 2 15b (see Fig. 17) together with the ⁇ An X permanent magnet 2 16 b 'and an X coil 2 15 b' forming a motor are provided.
  • ⁇ Yorinamo ⁇ is a mode in which the slider 2 13 is driven in the X direction by the small dimension described above.
  • the X permanent magnet 2 16 b 'and the X coil 2 15 b' are provided with two gap sensors (not shown) for detecting the displacement of the Y slider 213 in the X direction.
  • the ⁇ -slider 2 13 and the ⁇ ⁇ -slider 2 13 around the direction orthogonal to the The attitude control of the movement guide 231 can be performed.
  • the main body of the slider 223 has a U-shaped cross section that opens outward.
  • a linear motor 224 is incorporated in the U-shaped opening (groove).
  • the linear motor 224 includes a stator 225 having a vertical U-shaped cross section and a movable element 226 having a vertical U-shaped cross section slidably.
  • the stator 225 is arranged so as to be sandwiched between the two guide members 22 1 ⁇ and 22 IB of the fixed guide 221 shown in FIG. Both ends of the stator 225 are fixed to posts 203c and 203d (see FIGS. 13 and 14).
  • the mover 226 has a U-shaped opening on the stage device. It is arranged facing outward (to the right of Figs. 16 (A) and (B): the side opposite to the mover 2 16 of the linear motor 2 14 described above). The outside of the mover 2 26 is fixed to a Y slider 2 23.
  • the mover 2 26 and the Y slider 2 23 integrally slide in the Y direction with respect to the stator 2 25.
  • the stator 2 25 and the mover 2 26 also have a coil with a self-magnetic field cancellation and a self-magnetic shield as shown in Fig. 17 in the same manner as the stator 2 15 and the mover 2 16 described above.
  • a permanent magnet is incorporated.
  • the upper and lower surfaces of the Y slider 2 23 (the surfaces facing the two guide members 22 A and 22 IB of the fixed guide 22 1 in Fig. 13) Has two air pads 2 27a and 2 27b on each side (only two air pads on the upper sliding surface are shown in the figure).
  • Each of the air pads 227a and 227b is made of a porous orifice material. Air is supplied to each air pad 2 27 a and 2 27 b from an air pipe 2 27 X.
  • the air pipe 227X is connected to the Y slider 223 and is connected to an air source (not shown).
  • air exhaust grooves 227a 'and 227b' are formed around the air pads 227a and 227b. Furthermore, the sliding surface of the Y slider 2 23 has a rectangular evacuation groove 2 28 a surrounding the whole air pad 2 27 a and 2 27 b, and a space between both air pads 2 27 a and 2 27 b. Thus, a linear evacuation groove 228b extending in the Y direction is formed.
  • the air pads 227a and 227b are divided into an inner 227b and an outer 227a by the evacuation groove 228b.
  • the outer air pad 227a and the inner air pad 227b can independently adjust the air supply amount.
  • the Y slider 223 is disengaged from the upper and lower guide members 221 A and 221 B (see FIGS. 13 and 14). Contact supported.
  • the two air pads on the lower sliding surface side, the air exhaust groove, and the vacuum exhaust groove are also configured in the same manner as the upper sliding surface side.
  • a movement guide 231 extending in the X direction is bridged between the Y sliders 21 and 223.
  • a stage (X slider) 241 is slidably attached to the movement guide 231.
  • the stage 241 is guided on the movement guide 231 with four surfaces (up and down and both sides of the sliding surface) restrained. Therefore, the slide of the stage 241 is performed more stably.
  • a fine movement table, a wafer chuck, and the like are mounted on the stage 241.
  • the stage 241 has a flat box shape having a through hollow portion, and the inner surface of the hollow portion is fitted to the outer surface of the moving guide 231.
  • four air pads 243a to 243d are provided on each of the upper and lower surfaces of the hollow portion of the stage 241 (the sliding surface with the moving guide 231). Shows only the four upper air pads).
  • Each of the air pads 243a to 243d is made of a porous orifice material.
  • air exhaust grooves 243a 'to 243d' are formed around the air pads 243a to 243d.
  • evacuation grooves 244a and 244b are formed near both ends of the sliding surface of the stage 241.
  • the four air pads on the lower sliding surface side, the air exhaust groove, and the vacuum exhaust groove also It has the same configuration as the upper sliding surface side.
  • each air pad 245a, 245b is made of a porous orifice material.
  • air exhaust grooves 245a 'and 245b' are formed around each air pad 245a and 245b.
  • evacuation grooves 246a and 246b are formed near both ends of the sliding surface of the stage 241.
  • the two air pads, the air exhaust groove, and the vacuum exhaust groove on one of the sliding surfaces are also configured in the same manner as the upper sliding surface.
  • a supply hole 233a to each air pad, an air exhaust hole 233b, and a vacuum exhaust hole 233c are formed in the center of the moving guide 231. ing.
  • the air supply holes 233a are connected to the respective air pads, and the air supplied from the air supply holes 233a is blown out from the porous orifices of the respective air pads.
  • the atmosphere exhaust hole 233b is connected to the atmosphere exhaust groove 245a ⁇ 245b '.
  • the air ejected from the air pad is discharged to the atmosphere from the air vent grooves 245a 'and 245b' through the air vent holes 233b.
  • the evacuation hole 233c is connected to the evacuation grooves 246a and 246b.
  • the air leaked from the air exhaust grooves 245a 'and 245b' passes through the vacuum exhaust grooves 246a and 246b and is evacuated from the vacuum exhaust holes 233c.
  • the stage 241 is non-contactly supported while being restrained on four sides by the movement guide 231 by the air ejected from these air pads.
  • the stage 241 has a gas chamber 241P on the side of the inner hollow portion.
  • partition plates 241 A and 241 B are provided in the center of the gas chamber 241 P of the stage 241.
  • the chamber 24 IP is divided into two adjacent gas chambers 241 P 1 and 24 1 P 2 by a partition 241 A, and two adjacent gas chambers 241 P 1 ′ and 24 1 P by a partition 24 1 B It is divided into 2 '.
  • the gas chambers 241 P 1 and 241 P 1 ′ and the gas chambers 241 P 2 and 241 P 2 ′ communicate with each other.
  • each of these pipes is provided with a pneumatic control valve (not shown) for controlling the pressure of gas supplied to each gas chamber.
  • the stage 241 can be driven in the X direction by making a difference between the pressures of the adjacent gas chambers 241 ⁇ 1 ⁇ 241 ⁇ 1 'and 241 ⁇ 2 ⁇ 242 ⁇ 2' (details will be described later). .
  • the upper and lower guide members 2 11 ⁇ and 2 11 ⁇ of the fixed guide 2 11 are formed by digging a pressure chamber 252 (the upper guide is shown in the figure). Only the part 2 1 1 ⁇ side is shown).
  • a pressure receiving body (counterhead mass) 255 is arranged in the pressure chamber 252.
  • the length of the pressure receiver 255 is shorter than the length of the pressure chamber 252, and the width of the pressure receiver 255 is formed substantially equal to the width of the pressure chamber 252.
  • pressure chambers 252P1 (Y direction side) and 252P2 ( ⁇ 'direction side) are formed at both ends of the pressure receiver 255, respectively. Air as a drive source of the pressure receiving member 255 is supplied into each of the pressure chambers 252 # 1 and 252 # 2 via a pipe 277 of a pipe carrier 270 described later.
  • Similar pressure chambers 262 are also formed in the upper and lower guide members 22 1 ⁇ and 22 IB of the fixed guide 221. (Only the upper guide member 22 1 A side is shown in the figure).
  • a pressure receiving body (counter mass) 265 is arranged in the pressure chamber 262.
  • the length of the pressure receiver 265 is shorter than the length of the pressure chamber 262,
  • the width of the pressure body 265 is substantially equal to the width of the pressure chamber 262.
  • pressure chambers 26 2 P 1 (Y direction side) and 26 2 P 2 ( ⁇ ′ direction side) are formed at both ends of the pressure receiving body 2 65, respectively. Air as a drive source of the pressure receiving body 2565 is supplied into each of the pressure chambers 262-2 ⁇ 1 and 262-2 ⁇ 2 via a tube 279 of a piping carrier described later.
  • the lower guide members 2 11 ⁇ and 22 IB are also provided with the same pressure chambers and pressure receivers as those on the upper side.
  • a pressure chamber 232 is formed by being dug on the upper surface side of the moving guide 231.
  • a pressure receiving body (counterhead mass) 235 is arranged in the pressure chamber 232.
  • the length of the pressure receiving member 235 is shorter than the length of the pressure chamber 232, and the width of the pressure receiving member 235 is substantially equal to the width of the pressure chamber 232.
  • pressure chambers 2 32 P 1 (in the X direction) and 2 32 P 2 (in the X ′ direction) are formed at both ends of the pressure receiving member 2 35, respectively.
  • each of the pressure chambers 2 3 2 P 1 and 2 3 2 P 2 air as a drive source of the pressure receiving member 2 35 is provided through a flow path (not shown) formed in the movement guide 2 31. Is supplied. The operation of the active counters of the fixed guides 2 1 1, 2 2 1 and the moving guide 2 3 1 will be described later.
  • the lower ends of the two left-sided bosses 203a and 203b are respectively provided with support members 27 projecting inward in the X direction. 4 is fixed. Between the two support members 274, a sub-fixed guide 271 arranged in parallel with the fixed guide 211 is bridged. An auxiliary slider 2733 is attached to this sub-fixed guide 271, so that the auxiliary slider 2723 can be slid with four surfaces (upper and lower surfaces and both side surfaces) restrained. An air cylinder is built in the auxiliary slider 273. Auxiliary slider 2 7 3 and Y slider A plurality of pipes 277 are connected between the riders 2 13.
  • These pipes 277 are pipes for mediating the flow of air in and out of the non-contact gas bearings as a drive source for the active counter mass of the fixed guide 211.
  • the auxiliary slider 273 slides on the sub-fixed guide 271 alongside the Y slider 213 and is positioned.
  • a pressure chamber 272 is dug down and formed on the upper surface side of the sub-fixing guide 271.
  • a pressure receiving body (counterhead mass) 275 is arranged in the pressure chamber 272.
  • the length of the pressure receiver 275 is shorter than the length of the pressure chamber 272, and the width of the pressure receiver 275 is substantially equal to the width of the pressure chamber 272.
  • pressure chambers 272P1 (Y-direction side) and 272P2 ( ⁇ '-direction side) are formed at both ends of the pressure receiving body 275, respectively. Air as a drive source of the pressure receiving body 275 is supplied into each of the pressure chambers 272 ⁇ 1 and 272 ⁇ 2.
  • a tube 279 is connected to the side surface of the auxiliary slider 273.
  • the tube 279 has one end 278 a fixed to the auxiliary slider 273, and the other end 278 b fixed to a mounting plate 280 on a base (not shown).
  • the tube 279 itself is made of a flexible material, and accommodates air piping, electric wiring, and the like. Air as a drive source of the active counter mass of the fixed guide 222 and air of a non-contact gas bearing are supplied through the tube 279.
  • the stage 241 is intermittently moved and stopped only by an air cylinder mechanism (pressure operation of the gas chamber 241 P inside the stage 241). Perform the operation.
  • an air cylinder mechanism pressure operation of the gas chamber 241 P inside the stage 241.
  • Perform the operation When moving the stage 2 4 1 in the X direction along the movement guide 2 3 1, exhaust gas from the gas chamber 2 4 1 P 1 ⁇ 2 4 1 P 1 'and gas chamber 2 4 1 P 2 ⁇ 2 Supply air to 4 1 P 2 '.
  • the internal pressure of the gas chamber 2 4 1 P 2 ⁇ 2 4 1 P 2 ' is higher than the internal pressure of the gas chamber 2 4 1 P 1 ⁇ 2 4 1 P 1'
  • the stage 241 moves in the X direction on the right side of FIG.
  • the active counter mass in the movement guide 231 is supplied to the pressure chamber 232 P 2 and exhausted from the pressure chamber 232 P 1, and the pressure receiver 235 is moved in the moving direction of the stage 241 (X direction). Move in the opposite direction (X 'direction).
  • the pressure is applied in the opposite direction to the acceleration SA (solid line) of the stage 241 so that the acceleration MA (dashed line) of the pressure receiver 235 becomes larger than this acceleration SA.
  • the reaction force generated due to the movement of the stage 241 can be canceled by the operation of the pressure receiver 235, and high positioning accuracy of the stage 241 is ensured.
  • the gas chambers 241 ⁇ 1, 241 ⁇ 1 ′ are supplied with air, and the gas chambers 241 ⁇ 2, 241 ⁇ 2 ′ are exhausted.
  • exhaust is performed from the pressure chamber 232 ⁇ 2 and air is supplied to the pressure chamber 232 ⁇ 1.
  • the pressure receiving pressure is set so that the acceleration MA ′ of the pressure receiving member 235 becomes larger than the acceleration SA ′. Activate body 235.
  • ⁇ Slider 2 13, 223 ⁇ Movement guide 231 'Stage 241 requires precise positioning by linear motors 2 14, 224 (see also Fig. 15 to Fig. 17). Perform continuous continuous movement (scan). Moving guide 23 1 ⁇ To move stage 241 in the ⁇ direction along fixed guides 21 1 and 221, energize each linear motor 214 and 224 and move mover 2 1 6 to stators 2 15 and 225. , 226 slide in direction ⁇ (see also Fig. 17). Then, the sliders 21.3 and 223 integrated with the movers 2 16 and 226 slide in the ⁇ direction along the fixed guides 2 1 1 and 221 and the moving guide 231 'stage 241 moves in the ⁇ direction. Moving. At this time, simultaneously with the movement of the slider 213, the auxiliary slider 273 of the pipe carrier is also Move along the Y direction.
  • the pressure chamber 2 52 ⁇ 1 is supplied with air and exhausted from the pressure chamber 2 52 ⁇ 2 to move the pressure receiver 255 to the moving guide 23 1 ⁇ stage. 241 is moved in the opposite direction ( ⁇ 'direction).
  • the pressure chamber 262 ⁇ 1 is supplied with air and exhausted from the pressure chamber 262 ⁇ 2, and the pressure receiving body 265 is moved in the moving guide 231 ⁇ Move in the opposite direction ( ⁇ 'direction) to the ( ⁇ direction). As shown in FIG.
  • the active counter masses of these fixed guides 2 1 1 and 22 1 move in the direction opposite to the acceleration SA (solid line) of the stage 24 1, and the acceleration of the pressure receiver 255 ⁇ A1 (dotted line) is larger than the acceleration SA, and the pressure receivers 255, 265 are separately operated such that the acceleration MA2 (broken line) of the pressure receiver 265 is larger than the acceleration MA1.
  • the acceleration of the pressure receiving body 275 is higher than the acceleration SA of the stage 241 in the direction opposite to the acceleration SA (solid line). Operate the pressure receiver 275 so that A (dashed line) becomes slightly larger.
  • the reaction force generated by the movement of the movement guide 231 and the stage 241 can be canceled by the movement of the pressure receiving bodies 255, 265, and 275, and the high positioning of the stage 241 can be achieved. Accuracy is ensured.
  • the linear motor is operated in the opposite manner as described above, and the active counter mass is also operated in the opposite manner.
  • the acceleration MA 1 ′ (—dashed-dotted line) of the pressure receiving body 255 is more than the acceleration SA ′ in the direction opposite to the acceleration SA ′ of the stage 241 (solid line).
  • Each pressure receiver 255, 265 is operated separately so that the acceleration MA2 '(dashed line) of the pressure receiver 265 is larger than the acceleration MA1'.
  • the active counter mass of the piping carrier is shown in Fig. 22 (C).
  • the pressure receiving body 275 is set so that the acceleration MS A ′ (dashed line) of the pressure receiving body 275 becomes slightly larger than this acceleration SA ′. Activate 275.
  • the stage device 1 of the present embodiment can move and position the stage 241 with high accuracy in the XY plane by combining the operations in the X direction and the Y direction described above.
  • the stroke is, for example, 400 mm (guaranteed stroke 350 mm).
  • the reaction processing mechanism using the active counter mass has been described.
  • the passive counter mass mechanism may be employed. it can.
  • FIG. 23 is a schematic diagram showing a configuration example of a passive counter mass mechanism for driving in the Y direction.
  • FIG. 24 is a schematic diagram showing a configuration example of a passive counter mass mechanism for driving in the X direction.
  • (A) is a side view and
  • (B) is a plan view.
  • the upper guide member 21A and the lower guide member 21B are provided with non-contact gas bearings (air pads) 2832a to 282d on the posts 203a and 203b. It is supported in a non-contact manner through 283a to 283d, and can slide in the Y direction. Between the upper and lower guide members 211A and 211B, a Y slider 213 is supported in a non-contact manner through non-contact gas bearings (air pads) 281a to 281d. Each of these non-contact gas bearings can be the same as the air pad-exhaust groove described above.
  • Guide member 2 1 1 A, 2 1 IB A linear motor stator 284 is attached. The linear motor stator 284 is combined with a linear motor slider 285. When the Y slider 2 13 is driven, the reaction force is applied from the stator 2 84 to the guide members 2 11 A and 2 11 B.
  • a position return mechanism made of a weak leaf spring or the like is provided between the posts 203a and 203b and the guide members 211A and 211B, and the guide members 211A and 211B are provided. Does not move beyond the design stroke.
  • the moving guide 231 is supported by the Y sliders 2 13 and 223 in a non-contact manner through non-contact gas bearings (air pads) 296 a and 296 b and 297 a and 297 b. It is slidable in the X direction.
  • the stage 241 includes non-contact gas bearings (air pads) 295a to 295d (upper and lower surfaces: see FIG. 24 (A)) and 295a 'to 295d' (side surfaces: see FIG. 24 (B)). ) Is supported in a non-contact manner.
  • Each of these non-contact gas bearings can be the same as the air pad / exhaust groove described above.
  • the gas is exhausted from the gas chambers 241 P 1 and 241 P 1 ′ in the stage 241, and the gas is supplied to the gas chambers 241 P 2 and 241 P 2 ′.
  • the movement guide 231 is driven in the opposite direction (X 'direction) with respect to the Y sliders 2 1 3 and 2 23 by the driving reaction force of the stage 24 1. This allows the stage It is possible to cancel the reaction force when driving in the X direction of 2 4 1.
  • the stage 241 slides in the X ′ direction the movement guide 231 is driven in the X direction, and the reaction force when the stage 241 is driven in the X ′ direction can be similarly canceled.
  • a stage device or the like having advantages such as less disturbance of the magnetic field, a smaller and lighter device, and higher accuracy in scan positioning can be performed. Can be provided.

Abstract

Selon l'invention, deux éléments de guidage fixes (6) se prolongeant dans le sens Y d'un dispositif étagé (1) sont chacun pourvus d'un curseur en Y (7) entraîné par un moteur linéaire (16). Deux éléments de guidage mobiles (21, 22) se prolongeant dans le sens X reposent sur les deux curseurs en Y (7), l'élément de guidage mobile (21) étant pourvu d'un curseur en X (25) entraîné par un cylindre pneumatique (28). Le curseur en X (25) comprend un étage (61) faisant saillie à partir de ce dernier, un plateau (65) entraîné dans le sens Z (autour de l'axe Z) étant monté sur cet étage (61). Le dispositif étagé (201) est conçu de sorte que dans le sens Y, un mouvement continu (balayage) nécessitant un positionnement précis soit assuré par des moteurs linéaires (214, 24), un mouvement et un arrêt intermittents étant assurés par un cylindre pneumatique dans le sens X.
PCT/JP2003/012136 2002-10-04 2003-09-24 Dispositif etage et dispositif d'exposition WO2004032212A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2003268662A AU2003268662A1 (en) 2002-10-04 2003-09-24 Stage device and exposure device
US11/097,036 US20050189901A1 (en) 2002-10-04 2005-04-01 Stage devices and exposure systems comprising same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002-292156 2002-10-04
JP2002292156A JP2004128308A (ja) 2002-10-04 2002-10-04 ステージ装置及び露光装置

Related Child Applications (1)

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US11/097,036 Continuation US20050189901A1 (en) 2002-10-04 2005-04-01 Stage devices and exposure systems comprising same

Publications (1)

Publication Number Publication Date
WO2004032212A1 true WO2004032212A1 (fr) 2004-04-15

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AU (1) AU2003268662A1 (fr)
WO (1) WO2004032212A1 (fr)

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JPWO2016158229A1 (ja) * 2015-03-31 2018-01-25 住友重機械工業株式会社 アクチュエータ
WO2019158448A1 (fr) * 2018-02-14 2019-08-22 Asml Netherlands B.V. Dispositif de positionnement de substrat et outil d'inspection de faisceau électronique
CN110554574A (zh) * 2018-05-31 2019-12-10 上海微电子装备（集团）股份有限公司 工件台、物料姿态自动调节装置及调节物料姿态的方法

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JP2001148339A (ja) * 1999-11-19 2001-05-29 Nikon Corp ステージ装置及び露光装置
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EP1211560A1 (fr) * 2000-12-04 2002-06-05 Nikon Corporation Porte-objet actionné par gaz comprenant un mécanisme pour annuler les forces de réaction pour être utilisé dans un système de lithographie utilisant un faisceau de particules chargées
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JP2001148339A (ja) * 1999-11-19 2001-05-29 Nikon Corp ステージ装置及び露光装置
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US10371279B2 (en) 2015-03-31 2019-08-06 Sumitomo Heavy Industries, Ltd. Actuator
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TWI719405B (zh) * 2018-02-14 2021-02-21 荷蘭商Ａｓｍｌ荷蘭公司 電子束設備
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CN110554574A (zh) * 2018-05-31 2019-12-10 上海微电子装备（集团）股份有限公司 工件台、物料姿态自动调节装置及调节物料姿态的方法
CN110554574B (zh) * 2018-05-31 2021-03-19 上海微电子装备（集团）股份有限公司 工件台、物料姿态自动调节装置及调节物料姿态的方法

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