AU6005499A - Substrate, stage device, method of driving stage, exposure system and exposure method - Google Patents

Substrate, stage device, method of driving stage, exposure system and exposure method

Info

Publication number
AU6005499A
AU6005499A AU60054/99A AU6005499A AU6005499A AU 6005499 A AU6005499 A AU 6005499A AU 60054/99 A AU60054/99 A AU 60054/99A AU 6005499 A AU6005499 A AU 6005499A AU 6005499 A AU6005499 A AU 6005499A
Authority
AU
Australia
Prior art keywords
method
exposure
stage
substrate
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60054/99A
Inventor
Masato Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to PCT/JP1999/005539 priority Critical patent/WO2001027978A1/en
Publication of AU6005499A publication Critical patent/AU6005499A/en
Application status is Abandoned legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70766Reaction force control means, e.g. countermass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression
AU60054/99A 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method Abandoned AU6005499A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005539 WO2001027978A1 (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Publications (1)

Publication Number Publication Date
AU6005499A true AU6005499A (en) 2001-04-23

Family

ID=14236940

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60054/99A Abandoned AU6005499A (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Country Status (3)

Country Link
CN (1) CN1260772C (en)
AU (1) AU6005499A (en)
WO (1) WO2001027978A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
CN1484850A (en) 2001-08-08 2004-03-24 尼康株式会社 Stage system exposure device and method of manufacturing device
JP2003059797A (en) * 2001-08-09 2003-02-28 Canon Inc Movement apparatus, stage device, and exposure system
JP2004128308A (en) * 2002-10-04 2004-04-22 Nikon Corp Stage device and aligner
CN100433253C (en) * 2003-02-26 2008-11-12 株式会社尼康 Exposure apparatus, exposure method, and method for producing device
CN104678715B (en) 2003-02-26 2017-05-17 株式会社尼康 Exposure method, and device manufacturing method
KR101532824B1 (en) 2003-04-09 2015-07-01 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
KR101597475B1 (en) * 2003-04-11 2016-02-24 가부시키가이샤 니콘 Cleanup method for optics in immersion lithography
EP1475668A1 (en) 2003-05-09 2004-11-10 ASML Netherlands B.V. Method of preparing components for a lithographic apparatus
KR101296501B1 (en) 2003-07-09 2013-08-13 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI519819B (en) 2003-11-20 2016-02-01 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
US20050128449A1 (en) 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
TWI505329B (en) 2004-02-06 2015-10-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
US7456527B2 (en) * 2004-03-04 2008-11-25 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
JP2005331402A (en) 2004-05-20 2005-12-02 Sumitomo Heavy Ind Ltd Stage device
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
TWI454859B (en) 2006-03-30 2014-10-01 尼康股份有限公司
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus and device manufacturing method
SG10201602750RA (en) 2007-10-16 2016-05-30 Nikon Corp Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
CN101681123B (en) 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN101910817B (en) 2008-05-28 2016-03-09 株式会社尼康 An illumination optical system, exposure apparatus and device manufacturing method
US8544317B2 (en) * 2009-10-09 2013-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor processing apparatus with simultaneously movable stages
CN102880013B (en) * 2012-09-28 2015-02-18 清华大学 Reticle stage worktable
CN103543612B (en) * 2013-09-25 2015-09-30 清华大学 A tape moving iron vacuum enclosure cable-DOF motion platform Maglev
US10254659B1 (en) 2017-09-27 2019-04-09 Wuhan China Star Optoelectronics Technology Co., Ltd Exposure apparatus and method for exposure of transparent substrate
CN107450284B (en) * 2017-09-27 2019-06-07 武汉华星光电技术有限公司 The exposure method of exposure sources and transparent substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3266515B2 (en) * 1996-08-02 2002-03-18 キヤノン株式会社 Exposure apparatus, device manufacturing method and the stage apparatus
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same

Also Published As

Publication number Publication date
WO2001027978A1 (en) 2001-04-19
CN1373900A (en) 2002-10-09
CN1260772C (en) 2006-06-21

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase