AU6005499A - Substrate, stage device, method of driving stage, exposure system and exposure method - Google Patents

Substrate, stage device, method of driving stage, exposure system and exposure method

Info

Publication number
AU6005499A
AU6005499A AU60054/99A AU6005499A AU6005499A AU 6005499 A AU6005499 A AU 6005499A AU 60054/99 A AU60054/99 A AU 60054/99A AU 6005499 A AU6005499 A AU 6005499A AU 6005499 A AU6005499 A AU 6005499A
Authority
AU
Australia
Prior art keywords
exposure
stage
substrate
exposure system
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60054/99A
Inventor
Masato Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU6005499A publication Critical patent/AU6005499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
AU60054/99A 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method Abandoned AU6005499A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005539 WO2001027978A1 (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Publications (1)

Publication Number Publication Date
AU6005499A true AU6005499A (en) 2001-04-23

Family

ID=14236940

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60054/99A Abandoned AU6005499A (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Country Status (4)

Country Link
KR (1) KR100625625B1 (en)
CN (1) CN1260772C (en)
AU (1) AU6005499A (en)
WO (1) WO2001027978A1 (en)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
JPWO2003015139A1 (en) 2001-08-08 2004-12-02 株式会社ニコン Stage system, exposure apparatus, and device manufacturing method
JP2003059797A (en) * 2001-08-09 2003-02-28 Canon Inc Movement apparatus, stage device, and exposure system
EP1548819A4 (en) * 2002-07-30 2007-05-02 Tamura Seisakusho Kk Precision processing stage apparatus
JP2004128308A (en) * 2002-10-04 2004-04-22 Nikon Corp Stage device and aligner
EP3301511A1 (en) 2003-02-26 2018-04-04 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
CN101354539B (en) * 2003-02-26 2011-01-26 株式会社尼康 Exposure apparatus and method for producing device
EP2270597B1 (en) 2003-04-09 2017-11-01 Nikon Corporation Exposure method and apparatus and device manufacturing method
KR101324818B1 (en) * 2003-04-11 2013-11-01 가부시키가이샤 니콘 Cleanup method for optics in immersion lithography
WO2005006418A1 (en) 2003-07-09 2005-01-20 Nikon Corporation Exposure apparatus and method for manufacturing device
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
TWI609410B (en) 2004-02-06 2017-12-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus ,light-exposure method and device manufacturing method
US7456527B2 (en) * 2004-03-04 2008-11-25 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
JP2005331402A (en) * 2004-05-20 2005-12-02 Sumitomo Heavy Ind Ltd Stage device
KR101524964B1 (en) 2005-05-12 2015-06-01 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
TWI454859B (en) 2006-03-30 2014-10-01 尼康股份有限公司 Mobile device, exposure device and exposure method, and component manufacturing method
TW200815935A (en) * 2006-05-31 2008-04-01 Nsk Ltd Exposure device and method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN101681125B (en) 2007-10-16 2013-08-21 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN101910817B (en) 2008-05-28 2016-03-09 株式会社尼康 Lamp optical system, exposure device and device making method
NL2002902A1 (en) * 2008-06-18 2009-12-22 Asml Netherlands Bv Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame.
US8544317B2 (en) * 2009-10-09 2013-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor processing apparatus with simultaneously movable stages
CN102880013B (en) * 2012-09-28 2015-02-18 清华大学 Reticle stage worktable
CN103543612B (en) * 2013-09-25 2015-09-30 清华大学 A kind of moving-iron type with vacuum (-tight) housing is without cable six-freedom-degree maglev motion platform
CN110089209B (en) * 2016-09-29 2022-03-29 安必昂公司 Component placement device and driving method thereof
CN107450284B (en) * 2017-09-27 2019-06-07 武汉华星光电技术有限公司 The exposure method of exposure sources and transparent substrate
US10254659B1 (en) 2017-09-27 2019-04-09 Wuhan China Star Optoelectronics Technology Co., Ltd Exposure apparatus and method for exposure of transparent substrate
WO2019071040A1 (en) * 2017-10-04 2019-04-11 Leica Biosystems Imaging, Inc. Opposing edges system for scanning and processing glass slides
EP3625567A4 (en) 2017-12-01 2021-04-21 Leica Biosystems Imaging, Inc. Fixed reference edge system for slide loading and unloading
CN113488950B (en) * 2021-07-12 2022-09-16 上海隐冠半导体技术有限公司 Cable table mechanism and moving device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3266515B2 (en) * 1996-08-02 2002-03-18 キヤノン株式会社 Exposure apparatus, device manufacturing method, and stage apparatus
JPH10149974A (en) * 1996-11-15 1998-06-02 Canon Inc Stage device, aligner, and manufacture of device
JP3890136B2 (en) * 1997-03-25 2007-03-07 キヤノン株式会社 Exposure apparatus, device manufacturing method using the same, and stage apparatus
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same

Also Published As

Publication number Publication date
CN1260772C (en) 2006-06-21
WO2001027978A1 (en) 2001-04-19
CN1373900A (en) 2002-10-09
KR20020038592A (en) 2002-05-23
KR100625625B1 (en) 2006-09-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase