AU6005499A - Substrate, stage device, method of driving stage, exposure system and exposure method - Google Patents

Substrate, stage device, method of driving stage, exposure system and exposure method

Info

Publication number
AU6005499A
AU6005499A AU60054/99A AU6005499A AU6005499A AU 6005499 A AU6005499 A AU 6005499A AU 60054/99 A AU60054/99 A AU 60054/99A AU 6005499 A AU6005499 A AU 6005499A AU 6005499 A AU6005499 A AU 6005499A
Authority
AU
Australia
Prior art keywords
exposure
stage
substrate
driving
driving stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60054/99A
Inventor
Masato Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to PCT/JP1999/005539 priority Critical patent/WO2001027978A1/en
Publication of AU6005499A publication Critical patent/AU6005499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70766Reaction force control means, e.g. countermass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression
AU60054/99A 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method Abandoned AU6005499A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005539 WO2001027978A1 (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Publications (1)

Publication Number Publication Date
AU6005499A true AU6005499A (en) 2001-04-23

Family

ID=14236940

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60054/99A Abandoned AU6005499A (en) 1999-10-07 1999-10-07 Substrate, stage device, method of driving stage, exposure system and exposure method

Country Status (4)

Country Link
KR (1) KR100625625B1 (en)
CN (1) CN1260772C (en)
AU (1) AU6005499A (en)
WO (1) WO2001027978A1 (en)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6686991B1 (en) 2000-11-06 2004-02-03 Nikon Corporation Wafer stage assembly, servo control system, and method for operating the same
JPWO2003015139A1 (en) 2001-08-08 2004-12-02 株式会社ニコン Stage system, exposure apparatus, and device manufacturing method
JP2003059797A (en) * 2001-08-09 2003-02-28 Canon Inc Movement apparatus, stage device, and exposure system
JPWO2004012260A1 (en) * 2002-07-30 2005-11-24 株式会社タムラ製作所 Precision machining stage equipment
JP2004128308A (en) * 2002-10-04 2004-04-22 Nikon Corp Stage device and aligner
CN106873316A (en) * 2003-02-26 2017-06-20 株式会社尼康 Exposure device, exposure method and device making method
KR101563453B1 (en) 2003-02-26 2015-10-26 가부시키가이샤 니콘 Exposure apparatus and method, and method of producing apparatus
KR101346406B1 (en) 2003-04-09 2014-01-02 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
CN101825847B (en) * 2003-04-11 2013-10-16 株式会社尼康 Cleanup method for optics in immersion lithography
WO2005006418A1 (en) 2003-07-09 2005-01-20 Nikon Corporation Exposure apparatus and method for manufacturing device
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
JP4295712B2 (en) 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー.ブイ. Lithographic apparatus and apparatus manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
US7456527B2 (en) * 2004-03-04 2008-11-25 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
JP2005331402A (en) * 2004-05-20 2005-12-02 Sumitomo Heavy Ind Ltd Stage device
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
TWI454859B (en) 2006-03-30 2014-10-01 尼康股份有限公司 Mobile device, exposure device and exposure method, and component manufacturing method
TWI356284B (en) * 2006-05-31 2012-01-11 Nsk Ltd
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
WO2009050977A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5360057B2 (en) 2008-05-28 2013-12-04 株式会社ニコン Spatial light modulator inspection apparatus and inspection method, illumination optical system, illumination optical system adjustment method, exposure apparatus, and device manufacturing method
NL2002902A1 (en) * 2008-06-18 2009-12-22 Asml Netherlands Bv Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame.
US8544317B2 (en) * 2009-10-09 2013-10-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor processing apparatus with simultaneously movable stages
CN102880013B (en) * 2012-09-28 2015-02-18 清华大学 Reticle stage worktable
CN103543612B (en) * 2013-09-25 2015-09-30 清华大学 A kind of moving-iron type with vacuum (-tight) housing is without cable six-freedom-degree maglev motion platform
CN110089209A (en) * 2016-09-29 2019-08-02 安必昂公司 Component placement device and its driving method
US10254659B1 (en) 2017-09-27 2019-04-09 Wuhan China Star Optoelectronics Technology Co., Ltd Exposure apparatus and method for exposure of transparent substrate
CN107450284B (en) * 2017-09-27 2019-06-07 武汉华星光电技术有限公司 The exposure method of exposure sources and transparent substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3266515B2 (en) * 1996-08-02 2002-03-18 キヤノン株式会社 Exposure apparatus, device manufacturing method, and stage apparatus
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same

Also Published As

Publication number Publication date
CN1373900A (en) 2002-10-09
WO2001027978A1 (en) 2001-04-19
KR100625625B1 (en) 2006-09-20
CN1260772C (en) 2006-06-21
KR20020038592A (en) 2002-05-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase