HK1170070A1 - 曝光設備、曝光方法和製造裝置的方法 - Google Patents

曝光設備、曝光方法和製造裝置的方法

Info

Publication number
HK1170070A1
HK1170070A1 HK12110806.9A HK12110806A HK1170070A1 HK 1170070 A1 HK1170070 A1 HK 1170070A1 HK 12110806 A HK12110806 A HK 12110806A HK 1170070 A1 HK1170070 A1 HK 1170070A1
Authority
HK
Hong Kong
Prior art keywords
exposure
producing device
exposure apparatus
producing
exposure method
Prior art date
Application number
HK12110806.9A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Yasufumi Nishii
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1170070A1 publication Critical patent/HK1170070A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
HK12110806.9A 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法 HK1170070A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003049365 2003-02-26
JP2003110748 2003-04-15
JP2003320100 2003-09-11

Publications (1)

Publication Number Publication Date
HK1170070A1 true HK1170070A1 (zh) 2013-02-15

Family

ID=33101941

Family Applications (9)

Application Number Title Priority Date Filing Date
HK12109463.5A HK1168912A1 (zh) 2003-02-26 2012-09-26 曝光裝置以及器件製造方法
HK12110800.5A HK1170064A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK12110802.3A HK1170066A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK12110806.9A HK1170070A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK12110803.2A HK1170067A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK15108688.3A HK1208088A1 (zh) 2003-02-26 2015-09-07 曝光方法以及器件製造方法
HK16102136.3A HK1214372A1 (zh) 2003-02-26 2016-02-25 曝光裝置、曝光方法以及器件製造方法
HK16102125.6A HK1214405A1 (zh) 2003-02-26 2016-02-25 曝光裝置、曝光方法以及器件製造方法
HK18107319.9A HK1247997A1 (zh) 2003-02-26 2018-06-05 曝光裝置、曝光方法以及器件製造方法

Family Applications Before (3)

Application Number Title Priority Date Filing Date
HK12109463.5A HK1168912A1 (zh) 2003-02-26 2012-09-26 曝光裝置以及器件製造方法
HK12110800.5A HK1170064A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK12110802.3A HK1170066A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法

Family Applications After (5)

Application Number Title Priority Date Filing Date
HK12110803.2A HK1170067A1 (zh) 2003-02-26 2012-10-29 曝光設備、曝光方法和製造裝置的方法
HK15108688.3A HK1208088A1 (zh) 2003-02-26 2015-09-07 曝光方法以及器件製造方法
HK16102136.3A HK1214372A1 (zh) 2003-02-26 2016-02-25 曝光裝置、曝光方法以及器件製造方法
HK16102125.6A HK1214405A1 (zh) 2003-02-26 2016-02-25 曝光裝置、曝光方法以及器件製造方法
HK18107319.9A HK1247997A1 (zh) 2003-02-26 2018-06-05 曝光裝置、曝光方法以及器件製造方法

Country Status (9)

Country Link
US (15) US7268854B2 (zh)
EP (9) EP2945184B1 (zh)
JP (11) JP4640516B2 (zh)
KR (11) KR20180126102A (zh)
CN (2) CN102495540B (zh)
HK (9) HK1168912A1 (zh)
SG (4) SG183572A1 (zh)
TW (6) TW201719296A (zh)
WO (1) WO2004086468A1 (zh)

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