RU2000124872A - Генератор рисунков, использующий куф излучение - Google Patents
Генератор рисунков, использующий куф излучениеInfo
- Publication number
- RU2000124872A RU2000124872A RU2000124872/28A RU2000124872A RU2000124872A RU 2000124872 A RU2000124872 A RU 2000124872A RU 2000124872/28 A RU2000124872/28 A RU 2000124872/28A RU 2000124872 A RU2000124872 A RU 2000124872A RU 2000124872 A RU2000124872 A RU 2000124872A
- Authority
- RU
- Russia
- Prior art keywords
- modulator
- spatial light
- paragraphs
- light modulator
- workpiece
- Prior art date
Links
- 230000000051 modifying Effects 0.000 claims 14
- 230000003287 optical Effects 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
Claims (10)
1. Устройство для создания рисунка с чрезвычайно высоким разрешением на заготовке, например, такого, как рисунок на полупроводниковом чипе с линиями шириной 50 нм, содержит источник для испускания электромагнитного излучения в КУФ диапазоне длин волн, пространственный модулятор, имеющий множество модулирующих элементов (пикселей), адаптированных для их освещения упомянутым излучением, проекционную систему, формирующую изображение модулятора на заготовке, электронную систему обработки и подачи данных, принимающую цифровое описание рисунка, подлежащего записи, выделяющую из него последовательность частичных рисунков, преобразующую упомянутые частичные рисунки в сигналы модулятора и подающую упомянутые сигналы в модулятор, прецизионную механическую систему для перемещения упомянутой заготовки и/или проекционной системы друг относительно друга, электронную систему управления, координирующую перемещение заготовки, подачу сигналов в модулятор и интенсивность излучения, так чтобы упомянутый рисунок сшивался вместе от частичных изображений, созданных последовательностью частичных рисунков.
2. Устройство по п. 1, отличающееся тем, что пространственный модулятор света является отражающим.
3. Устройство по одному из п. 1 или 2, отличающееся тем, что пространственный модулятор света имеет многозначные пиксели.
4. Устройство по одному из пп. 1-3, отличающееся тем, что оптический путь сформирован с отражающей оптикой.
5. Устройство по одному из пп. 1-4, отличающееся тем, что линза, формирующая изображение, имеет кольцеобразное поле, а пространственный модулятор света имеет кольцеобразную апертуру.
6. Устройство по одному из пп. 1-5, отличающееся тем, что оптическая схема является вакуумированной.
7. Устройство по одному из пп. 1-6, отличающееся тем, что пространственный модулятор света работает посредством явления дифракции.
8. Устройство по одному из пп. 1-7, отличающееся тем, что пространственный модулятор света представляет собой твердую пластинку из пьезоэлектрического материала с отражающей фронтальной поверхностью, которая деформируется в ответ на электрические напряжения адресации, таким образом создавая модуляцию волнового фронта.
9. Устройство по п. 8, отличающееся тем, что пространственный модулятор света подключен к активному полупроводниковому чипу.
10. Устройство по одному из пп. 1-9, отличающееся тем, что излучение составляет наклонный угол с пространственным модулятором света.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9800665A SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Improved method for projection printing using a micromirror SLM |
SE9800665-3 | 1998-03-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
RU2000124872A true RU2000124872A (ru) | 2002-09-27 |
RU2257603C2 RU2257603C2 (ru) | 2005-07-27 |
Family
ID=20410382
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2000124871/28A RU2232411C2 (ru) | 1998-03-02 | 1999-03-02 | Усовершенствованный генератор рисунков |
RU2000124872/28A RU2257603C2 (ru) | 1998-03-02 | 1999-03-02 | Устройство для формирования рисунков |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2000124871/28A RU2232411C2 (ru) | 1998-03-02 | 1999-03-02 | Усовершенствованный генератор рисунков |
Country Status (12)
Country | Link |
---|---|
US (16) | US6687041B1 (ru) |
EP (6) | EP1600817B1 (ru) |
JP (12) | JP2002506232A (ru) |
KR (2) | KR100451026B1 (ru) |
CN (3) | CN1550902A (ru) |
AT (5) | ATE309557T1 (ru) |
AU (7) | AU3284299A (ru) |
DE (6) | DE69938895D1 (ru) |
ES (1) | ES2357473T3 (ru) |
RU (2) | RU2232411C2 (ru) |
SE (1) | SE9800665D0 (ru) |
WO (7) | WO1999045435A1 (ru) |
Families Citing this family (515)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2335452T3 (es) * | 1997-04-14 | 2010-03-26 | Huntsman Advanced Materials (Switzerland) Gmbh | Unidad de ilumunacion y procedimiento para la iluminacion puntual de un medio. |
SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6816302B2 (en) * | 1998-03-02 | 2004-11-09 | Micronic Laser Systems Ab | Pattern generator |
US6727980B2 (en) * | 1998-09-17 | 2004-04-27 | Nikon Corporation | Apparatus and method for pattern exposure and method for adjusting the apparatus |
US6181210B1 (en) * | 1998-09-21 | 2001-01-30 | Broadcom Corporation | Low offset and low glitch energy charge pump for PLL-based timing recovery systems |
US7328425B2 (en) * | 1999-05-20 | 2008-02-05 | Micronic Laser Systems Ab | Method and device for correcting SLM stamp image imperfections |
GB2344899B (en) * | 1999-05-29 | 2000-11-22 | Bookham Technology Ltd | Production of an integrated optical device |
SE516914C2 (sv) * | 1999-09-09 | 2002-03-19 | Micronic Laser Systems Ab | Metoder och rastrerare för högpresterande mönstergenerering |
EP1152263A4 (en) * | 1999-09-30 | 2003-08-20 | Nikon Corp | OPTICAL DEVICE WITH THIN MULTI-LAYER SYSTEM AND THEIR USE FOR ALIGNMENT |
SE522531C2 (sv) * | 1999-11-24 | 2004-02-17 | Micronic Laser Systems Ab | Metod och anordning för märkning av halvledare |
TW508653B (en) * | 2000-03-24 | 2002-11-01 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit manufacturing method |
SE517550C2 (sv) * | 2000-04-17 | 2002-06-18 | Micronic Laser Systems Ab | Mönstergenereringssystem användande en spatialljusmodulator |
US6552740B1 (en) * | 2000-08-01 | 2003-04-22 | Eastman Kodak Company | Method and apparatus for printing monochromatic imaging using a spatial light modulator |
US6645677B1 (en) | 2000-09-18 | 2003-11-11 | Micronic Laser Systems Ab | Dual layer reticle blank and manufacturing process |
US6580490B1 (en) * | 2000-10-30 | 2003-06-17 | Eastman Kodak Company | Method and apparatus for printing images in multiple formats using a spatial light modulator |
US6690499B1 (en) * | 2000-11-22 | 2004-02-10 | Displaytech, Inc. | Multi-state light modulator with non-zero response time and linear gray scale |
USRE43841E1 (en) * | 2000-12-14 | 2012-12-04 | F. Poszat Hu, Llc | Printing by active tiling |
US6653026B2 (en) * | 2000-12-20 | 2003-11-25 | Numerical Technologies, Inc. | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
US20020122237A1 (en) * | 2001-03-01 | 2002-09-05 | Torbjorn Sandstrom | Method and apparatus for spatial light modulation |
JP4495898B2 (ja) * | 2001-04-04 | 2010-07-07 | マイクロニック レーザー システムズ アクチボラゲット | 改良型パターン・ジェネレータ |
US7843632B2 (en) * | 2006-08-16 | 2010-11-30 | Cymer, Inc. | EUV optics |
US6753947B2 (en) * | 2001-05-10 | 2004-06-22 | Ultratech Stepper, Inc. | Lithography system and method for device manufacture |
GB0114862D0 (en) | 2001-06-19 | 2001-08-08 | Secr Defence | Image replication system |
US7095484B1 (en) * | 2001-06-27 | 2006-08-22 | University Of South Florida | Method and apparatus for maskless photolithography |
JP5144863B2 (ja) * | 2001-06-29 | 2013-02-13 | 株式会社オーク製作所 | 多重露光描画方法及び多重露光描画装置 |
JP4273291B2 (ja) * | 2001-08-17 | 2009-06-03 | 株式会社オーク製作所 | 多重露光描画装置および多重露光描画方法 |
JP4324645B2 (ja) * | 2001-08-21 | 2009-09-02 | 株式会社オーク製作所 | 多重露光描画装置および多重露光描画方法 |
JP2003066366A (ja) * | 2001-08-22 | 2003-03-05 | Fuji Photo Film Co Ltd | 照明光学系及びこれを用いた画像表示装置、画像露光装置 |
US6784975B2 (en) * | 2001-08-30 | 2004-08-31 | Micron Technology, Inc. | Method and apparatus for irradiating a microlithographic substrate |
US6794100B2 (en) | 2001-08-30 | 2004-09-21 | Micron Technology, Inc. | Method for controlling radiation beam intensity directed to microlithographic substrates |
US6819490B2 (en) | 2001-09-10 | 2004-11-16 | Micronic Laser Systems Ab | Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
US7302111B2 (en) * | 2001-09-12 | 2007-11-27 | Micronic Laser Systems A.B. | Graphics engine for high precision lithography |
KR20040047816A (ko) * | 2001-09-12 | 2004-06-05 | 마이크로닉 레이저 시스템즈 에이비 | 공간광변조기를 이용한 개선된 방법 및 장치 |
JP3881865B2 (ja) | 2001-10-19 | 2007-02-14 | 株式会社 液晶先端技術開発センター | 光学的な記録装置及び方法並びに露光装置及び方法 |
CN101446773A (zh) | 2001-11-07 | 2009-06-03 | 应用材料有限公司 | 无掩膜光子电子点格栅阵列光刻机 |
KR20050044371A (ko) * | 2001-11-07 | 2005-05-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 광학 스폿 그리드 어레이 프린터 |
US6618185B2 (en) * | 2001-11-28 | 2003-09-09 | Micronic Laser Systems Ab | Defective pixel compensation method |
US6903859B2 (en) | 2001-12-07 | 2005-06-07 | Micronic Laser Systems Ab | Homogenizer |
US6950194B2 (en) * | 2001-12-07 | 2005-09-27 | Micronic Laser Systems Ab | Alignment sensor |
GB2383140A (en) * | 2001-12-13 | 2003-06-18 | Zarlink Semiconductor Ltd | Exposure positioning in photolithography |
WO2004095110A1 (en) * | 2003-04-24 | 2004-11-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Exposure control |
SE0104238D0 (sv) * | 2001-12-14 | 2001-12-14 | Micronic Laser Systems Ab | Method and apparatus for patterning a workpiece |
US7106490B2 (en) * | 2001-12-14 | 2006-09-12 | Micronic Laser Systems Ab | Methods and systems for improved boundary contrast |
US20030233630A1 (en) * | 2001-12-14 | 2003-12-18 | Torbjorn Sandstrom | Methods and systems for process control of corner feature embellishment |
US6665110B2 (en) * | 2001-12-31 | 2003-12-16 | Texas Instruments Incorporated | Diagonal to rectangular pixel mapping for spatial light modulator |
US7159197B2 (en) * | 2001-12-31 | 2007-01-02 | Synopsys, Inc. | Shape-based geometry engine to perform smoothing and other layout beautification operations |
US6873401B2 (en) * | 2002-01-24 | 2005-03-29 | Intel Corporation | Reflective liquid crystal display lithography system |
SG106121A1 (en) * | 2002-02-06 | 2004-09-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
SE0200547D0 (sv) * | 2002-02-25 | 2002-02-25 | Micronic Laser Systems Ab | An image forming method and apparatus |
US6590695B1 (en) * | 2002-02-26 | 2003-07-08 | Eastman Kodak Company | Micro-mechanical polarization-based modulator |
SE0200864D0 (sv) * | 2002-03-21 | 2002-03-21 | Micronic Laser Systems Ab | Method and apparatus for printing large data flows |
US7167185B1 (en) | 2002-03-22 | 2007-01-23 | Kla- Tencor Technologies Corporation | Visualization of photomask databases |
US6976426B2 (en) * | 2002-04-09 | 2005-12-20 | Day International, Inc. | Image replication element and method and system for producing the same |
US6707534B2 (en) * | 2002-05-10 | 2004-03-16 | Anvik Corporation | Maskless conformable lithography |
US6728023B1 (en) * | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
US7023528B2 (en) * | 2002-06-10 | 2006-04-04 | International Business Machines Corporation | Hybrid electronic mask |
AUPS328402A0 (en) * | 2002-06-28 | 2002-07-18 | Australian Photonics Pty Limited | Writing of photo-induced structures |
JP2005533283A (ja) * | 2002-07-12 | 2005-11-04 | ケイデンス デザイン システムズ インコーポレイテッド | コンテクスト特定のマスク書込のための方法及びシステム |
JP2006502422A (ja) * | 2002-07-12 | 2006-01-19 | ケイデンス デザイン システムズ インコーポレイテッド | コンテクスト特定型のマスク検査のための方法及びシステム |
US7302672B2 (en) * | 2002-07-12 | 2007-11-27 | Cadence Design Systems, Inc. | Method and system for context-specific mask writing |
WO2004017069A1 (ja) * | 2002-08-16 | 2004-02-26 | Kabushiki Kaisha Hayashi Soken | バイオチップ分析装置およびオンライン分析システム |
US6818910B2 (en) * | 2002-08-23 | 2004-11-16 | Micron Technology, Inc. | Writing methodology to reduce write time, and system for performing same |
KR101087862B1 (ko) * | 2002-08-24 | 2011-11-30 | 매스크리스 리소그래피 인코퍼레이티드 | 연속적인 직접-기록 광 리쏘그래피 장치 및 방법 |
EP2302457B1 (en) | 2002-10-25 | 2016-03-30 | Mapper Lithography Ip B.V. | Lithography system |
US7098468B2 (en) * | 2002-11-07 | 2006-08-29 | Applied Materials, Inc. | Raster frame beam system for electron beam lithography |
JP2004200221A (ja) * | 2002-12-16 | 2004-07-15 | Toray Eng Co Ltd | レーザマーキング方法及び装置 |
US7171068B2 (en) * | 2002-12-20 | 2007-01-30 | Texas Instruments Incorporated | Method to improve an extinction ratio of an optical device |
EP1583946B1 (en) * | 2003-01-15 | 2006-11-08 | Micronic Laser Systems Ab | A method to detect a defective pixel |
SE0300138D0 (sv) * | 2003-01-22 | 2003-01-22 | Micronic Laser Systems Ab | Electromagnetic radiation pulse timing control |
US6906848B2 (en) * | 2003-02-24 | 2005-06-14 | Exajoule, Llc | Micromirror systems with concealed multi-piece hinge structures |
SE0300516D0 (sv) * | 2003-02-28 | 2003-02-28 | Micronic Laser Systems Ab | SLM direct writer |
US20060104413A1 (en) * | 2003-03-05 | 2006-05-18 | Tadahiro Ohmi | Mask repeater and mask manufacturing method |
EP1662552A1 (en) * | 2003-04-11 | 2006-05-31 | Ball Semiconductor Inc. | Pattern plotting device and pattern plotting method |
JP4314054B2 (ja) * | 2003-04-15 | 2009-08-12 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
US6956692B2 (en) * | 2003-04-24 | 2005-10-18 | Micronic Laser Systems, Ab | Method and apparatus for controlling exposure of a surface of a substrate |
JP2004341160A (ja) * | 2003-05-15 | 2004-12-02 | Seiko Epson Corp | 露光用マスク、光近接効果補正装置、光近接効果補正方法、半導体装置の製造方法および光近接効果補正プログラム |
US7063920B2 (en) * | 2003-05-16 | 2006-06-20 | Asml Holding, N.V. | Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
TWI304522B (en) * | 2003-05-28 | 2008-12-21 | Asml Netherlands Bv | Lithographic apparatus, method of calibrating and device manufacturing method |
US6989920B2 (en) | 2003-05-29 | 2006-01-24 | Asml Holding N.V. | System and method for dose control in a lithographic system |
US7061591B2 (en) * | 2003-05-30 | 2006-06-13 | Asml Holding N.V. | Maskless lithography systems and methods utilizing spatial light modulator arrays |
US20040239901A1 (en) * | 2003-05-29 | 2004-12-02 | Asml Holding N.V. | System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4486323B2 (ja) * | 2003-06-10 | 2010-06-23 | 富士フイルム株式会社 | 画素位置特定方法、画像ずれ補正方法、および画像形成装置 |
WO2004111701A1 (en) * | 2003-06-12 | 2004-12-23 | Micronic Laser Systems Ab | Method for high precision printing of patterns |
US6833854B1 (en) * | 2003-06-12 | 2004-12-21 | Micronic Laser Systems Ab | Method for high precision printing of patterns |
SG118283A1 (en) * | 2003-06-20 | 2006-01-27 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1489449A1 (en) * | 2003-06-20 | 2004-12-22 | ASML Netherlands B.V. | Spatial light modulator |
SG110099A1 (en) * | 2003-06-24 | 2005-04-28 | Asml Holding Nv | Projection optical system for maskless lithography |
US7110082B2 (en) * | 2003-06-24 | 2006-09-19 | Asml Holding N.V. | Optical system for maskless lithography |
EP1491966A1 (en) * | 2003-06-26 | 2004-12-29 | ASML Netherlands B.V. | Calibration method for a lithographic apparatus |
SG119224A1 (en) * | 2003-06-26 | 2006-02-28 | Asml Netherlands Bv | Calibration method for a lithographic apparatus and device manufacturing method |
US7158215B2 (en) * | 2003-06-30 | 2007-01-02 | Asml Holding N.V. | Large field of view protection optical system with aberration correctability for flat panel displays |
US7154587B2 (en) * | 2003-06-30 | 2006-12-26 | Asml Netherlands B.V | Spatial light modulator, lithographic apparatus and device manufacturing method |
US7024638B2 (en) * | 2003-07-14 | 2006-04-04 | Cadence Design Systems, Inc. | Method for creating patterns for producing integrated circuits |
US7224504B2 (en) | 2003-07-30 | 2007-05-29 | Asml Holding N. V. | Deformable mirror using piezoelectric actuators formed as an integrated circuit and method of use |
US6831768B1 (en) | 2003-07-31 | 2004-12-14 | Asml Holding N.V. | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
US7186486B2 (en) * | 2003-08-04 | 2007-03-06 | Micronic Laser Systems Ab | Method to pattern a substrate |
KR101080545B1 (ko) * | 2003-08-04 | 2011-11-04 | 마이크로닉 레이저 시스템즈 에이비 | 공간 광 변조기 정렬 방법 |
US7079306B2 (en) * | 2003-08-22 | 2006-07-18 | Plex Llc | Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator |
US7315294B2 (en) * | 2003-08-25 | 2008-01-01 | Texas Instruments Incorporated | Deinterleaving transpose circuits in digital display systems |
US6972843B2 (en) * | 2003-08-25 | 2005-12-06 | Intel Corporation | Lithography alignment |
WO2005022263A2 (en) * | 2003-08-27 | 2005-03-10 | Koninklijke Philips Electronics N.V. | Control circuit and method for forming optical images |
US7714983B2 (en) * | 2003-09-12 | 2010-05-11 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
DE10343333A1 (de) * | 2003-09-12 | 2005-04-14 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
JP2007506136A (ja) * | 2003-09-22 | 2007-03-15 | オーボテック リミテッド | カラーフィルタの直接描画システム及び直接描画方法 |
US7414701B2 (en) * | 2003-10-03 | 2008-08-19 | Asml Holding N.V. | Method and systems for total focus deviation adjustments on maskless lithography systems |
SG110196A1 (en) * | 2003-09-22 | 2005-04-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7023526B2 (en) | 2003-09-30 | 2006-04-04 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation |
US6876440B1 (en) | 2003-09-30 | 2005-04-05 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
US7410736B2 (en) * | 2003-09-30 | 2008-08-12 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
US7003758B2 (en) | 2003-10-07 | 2006-02-21 | Brion Technologies, Inc. | System and method for lithography simulation |
CN101419411B (zh) * | 2003-10-07 | 2013-06-19 | Asml荷兰有限公司 | 用于平板印刷仿真的系统和方法 |
US7109498B2 (en) * | 2003-10-09 | 2006-09-19 | Asml Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
US6894765B2 (en) * | 2003-10-14 | 2005-05-17 | Micron Technology, Inc. | Methods and systems for controlling radiation beam characteristics for microlithographic processing |
US8157389B2 (en) * | 2003-11-01 | 2012-04-17 | Silicon Quest Kabushiki-Kaisha | Synchronous control system for light source and spatial light modulator employed in projection apparatus |
DE10352040A1 (de) * | 2003-11-07 | 2005-07-21 | Carl Zeiss Sms Gmbh | In Lage, Form und/oder den optischen Eigenschaften veränderbare Blenden-und/oder Filteranordnung für optische Geräte, insbesondere Mikroskope |
US7196772B2 (en) * | 2003-11-07 | 2007-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7116398B2 (en) * | 2003-11-07 | 2006-10-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7842926B2 (en) | 2003-11-12 | 2010-11-30 | Micronic Laser Systems Ab | Method and device for correcting SLM stamp image imperfections |
JP2007517239A (ja) | 2003-11-12 | 2007-06-28 | マイクロニック レーザー システムズ アクチボラゲット | Slmスタンプ像の欠陥を修正する方法及び装置 |
US7001232B2 (en) * | 2003-12-11 | 2006-02-21 | Montgomery Robert E | Personal watercraft air intake assembly |
KR100797433B1 (ko) * | 2003-12-11 | 2008-01-23 | 마이크로닉 레이저 시스템즈 에이비 | 워크피스를 패터닝하기 위한 방법과 장치 및 그 제조 방법 |
US6995830B2 (en) * | 2003-12-22 | 2006-02-07 | Asml Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
US7184184B2 (en) * | 2003-12-31 | 2007-02-27 | Reliant Technologies, Inc. | High speed, high efficiency optical pattern generator using rotating optical elements |
US7012674B2 (en) * | 2004-01-13 | 2006-03-14 | Asml Holding N.V. | Maskless optical writer |
US6847461B1 (en) * | 2004-01-29 | 2005-01-25 | Asml Holding N.V. | System and method for calibrating a spatial light modulator array using shearing interferometry |
US7580559B2 (en) * | 2004-01-29 | 2009-08-25 | Asml Holding N.V. | System and method for calibrating a spatial light modulator |
JP4083751B2 (ja) * | 2004-01-29 | 2008-04-30 | エーエスエムエル ホールディング エヌ.ブイ. | 空間光変調器アレイを較正するシステムおよび空間光変調器アレイを較正する方法 |
TWI412067B (zh) * | 2004-02-06 | 2013-10-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
US8537204B2 (en) * | 2004-07-08 | 2013-09-17 | Gyoung Il Cho | 3D television broadcasting system |
US7474454B2 (en) * | 2004-06-18 | 2009-01-06 | Angstrom, Inc. | Programmable micromirror motion control system |
US7580178B2 (en) * | 2004-02-13 | 2009-08-25 | Angstrom, Inc. | Image-guided microsurgery system and method |
US7382516B2 (en) * | 2004-06-18 | 2008-06-03 | Angstrom, Inc. | Discretely controlled micromirror with multi-level positions |
US7330297B2 (en) * | 2005-03-04 | 2008-02-12 | Angstrom, Inc | Fine control of rotation and translation of discretely controlled micromirror |
US7898144B2 (en) * | 2006-02-04 | 2011-03-01 | Angstrom, Inc. | Multi-step microactuator providing multi-step displacement to a controlled object |
US7751694B2 (en) * | 2004-02-13 | 2010-07-06 | Angstrom, Inc. | Three-dimensional endoscope imaging and display system |
US7350922B2 (en) * | 2004-02-13 | 2008-04-01 | Angstrom, Inc. | Three-dimensional display using variable focal length micromirror array lens |
US7333260B2 (en) * | 2004-08-09 | 2008-02-19 | Stereo Display, Inc. | Two-dimensional image projection system |
US7190434B2 (en) * | 2004-02-18 | 2007-03-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7133118B2 (en) * | 2004-02-18 | 2006-11-07 | Asml Netherlands, B.V. | Lithographic apparatus and device manufacturing method |
JP2007522671A (ja) * | 2004-02-25 | 2007-08-09 | マイクロニック レーザー システムズ アクチボラゲット | 光マスクレスリソグラフィにおいてパターンを露光し、マスクをエミュレートする方法 |
US7081947B2 (en) * | 2004-02-27 | 2006-07-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7016014B2 (en) * | 2004-02-27 | 2006-03-21 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
US7061586B2 (en) * | 2004-03-02 | 2006-06-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7094506B2 (en) * | 2004-03-09 | 2006-08-22 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
US6967711B2 (en) * | 2004-03-09 | 2005-11-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
USRE43515E1 (en) | 2004-03-09 | 2012-07-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US6999224B2 (en) * | 2004-03-10 | 2006-02-14 | Reflectivity, Inc | Micromirror modulation method and digital apparatus with improved grayscale |
US7768571B2 (en) * | 2004-03-22 | 2010-08-03 | Angstrom, Inc. | Optical tracking system using variable focal length lens |
US7410266B2 (en) * | 2004-03-22 | 2008-08-12 | Angstrom, Inc. | Three-dimensional imaging system for robot vision |
US7339746B2 (en) * | 2004-03-22 | 2008-03-04 | Angstrom, Inc. | Small and fast zoom system using micromirror array lens |
EP1739482A4 (en) * | 2004-03-24 | 2009-03-25 | Fujifilm Corp | PICTURE GENERATION PROCESS, LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PROCESS |
JP4541010B2 (ja) * | 2004-03-25 | 2010-09-08 | 財団法人国際科学振興財団 | パターン露光装置および二次元光像発生装置 |
US7561251B2 (en) | 2004-03-29 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8064040B2 (en) * | 2004-03-30 | 2011-11-22 | Carl Zeiss Smt Gmbh | Projection objective, projection exposure apparatus and reflective reticle for microlithography |
US7053981B2 (en) * | 2004-03-31 | 2006-05-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7153616B2 (en) * | 2004-03-31 | 2006-12-26 | Asml Holding N.V. | System and method for verifying and controlling the performance of a maskless lithography tool |
US8049776B2 (en) * | 2004-04-12 | 2011-11-01 | Angstrom, Inc. | Three-dimensional camcorder |
US7619614B2 (en) * | 2004-04-12 | 2009-11-17 | Angstrom, Inc. | Three-dimensional optical mouse system |
US20070115261A1 (en) * | 2005-11-23 | 2007-05-24 | Stereo Display, Inc. | Virtual Keyboard input system using three-dimensional motion detection by variable focal length lens |
US7742232B2 (en) * | 2004-04-12 | 2010-06-22 | Angstrom, Inc. | Three-dimensional imaging system |
US20070040924A1 (en) * | 2005-08-19 | 2007-02-22 | Stereo Display, Inc. | Cellular phone camera with three-dimensional imaging function |
US8057963B2 (en) * | 2004-06-10 | 2011-11-15 | Lsi Corporation | Maskless vortex phase shift optical direct write lithography |
US7002666B2 (en) * | 2004-04-16 | 2006-02-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005311145A (ja) * | 2004-04-23 | 2005-11-04 | Canon Inc | 露光装置、露光方法、デバイス製造方法、パターン形成装置および位置合わせ方法 |
US7372547B2 (en) * | 2004-04-27 | 2008-05-13 | Lsi Corporation | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
US6963434B1 (en) * | 2004-04-30 | 2005-11-08 | Asml Holding N.V. | System and method for calculating aerial image of a spatial light modulator |
US20050243295A1 (en) * | 2004-04-30 | 2005-11-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing |
WO2005111920A1 (en) * | 2004-05-18 | 2005-11-24 | Silverbrook Research Pty Ltd | Authentication of an object using a signature encoded in a number of data portions |
EP2246741A1 (en) * | 2004-05-19 | 2010-11-03 | Fujifilm Corporation | Image recording method |
US20050259269A1 (en) | 2004-05-19 | 2005-11-24 | Asml Holding N.V. | Shearing interferometer with dynamic pupil fill |
US7242456B2 (en) | 2004-05-26 | 2007-07-10 | Asml Holdings N.V. | System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions |
US7354167B2 (en) | 2004-05-27 | 2008-04-08 | Angstrom, Inc. | Beam focusing and scanning system using micromirror array lens |
US7777959B2 (en) * | 2004-05-27 | 2010-08-17 | Angstrom, Inc. | Micromirror array lens with fixed focal length |
US7667896B2 (en) | 2004-05-27 | 2010-02-23 | Angstrom, Inc. | DVD recording and reproducing system |
US7477403B2 (en) * | 2004-05-27 | 2009-01-13 | Asml Netherlands B.V. | Optical position assessment apparatus and method |
US7123348B2 (en) * | 2004-06-08 | 2006-10-17 | Asml Netherlands B.V | Lithographic apparatus and method utilizing dose control |
US6989886B2 (en) * | 2004-06-08 | 2006-01-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7345806B2 (en) * | 2004-06-23 | 2008-03-18 | Texas Instruments Incorporated | Method and apparatus for characterizing microelectromechanical devices on wafers |
CA2578203C (en) | 2004-06-23 | 2014-03-11 | Quin Media Arts And Sciences Inc. | Sculptural imaging with optical tiles |
US7016016B2 (en) * | 2004-06-25 | 2006-03-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7116403B2 (en) * | 2004-06-28 | 2006-10-03 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
US7116404B2 (en) * | 2004-06-30 | 2006-10-03 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
US7158208B2 (en) * | 2004-06-30 | 2007-01-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20060001890A1 (en) * | 2004-07-02 | 2006-01-05 | Asml Holding N.V. | Spatial light modulator as source module for DUV wavefront sensor |
US7573574B2 (en) * | 2004-07-13 | 2009-08-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US20060012779A1 (en) * | 2004-07-13 | 2006-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7335398B2 (en) * | 2004-07-26 | 2008-02-26 | Asml Holding N.V. | Method to modify the spatial response of a pattern generator |
US7227613B2 (en) * | 2004-07-26 | 2007-06-05 | Asml Holding N.V. | Lithographic apparatus having double telecentric illumination |
US7259829B2 (en) * | 2004-07-26 | 2007-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7142286B2 (en) * | 2004-07-27 | 2006-11-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7251020B2 (en) * | 2004-07-30 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7538855B2 (en) * | 2004-08-10 | 2009-05-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7102733B2 (en) | 2004-08-13 | 2006-09-05 | Asml Holding N.V. | System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool |
US7500218B2 (en) * | 2004-08-17 | 2009-03-03 | Asml Netherlands B.V. | Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same |
US7304718B2 (en) * | 2004-08-17 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006021406A2 (en) * | 2004-08-23 | 2006-03-02 | Micronic Laser Systems Ab | Pupil improvement of incoherent imaging systems for enhanced cd linearity |
US7079225B2 (en) * | 2004-09-14 | 2006-07-18 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
JP4750396B2 (ja) * | 2004-09-27 | 2011-08-17 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US7588868B2 (en) * | 2004-10-06 | 2009-09-15 | Cadence Design Systems, Inc. | Method and system for reducing the impact of across-wafer variations on critical dimension measurements |
US7177012B2 (en) * | 2004-10-18 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7136210B2 (en) * | 2004-10-21 | 2006-11-14 | Hewlett-Packard Development Company, L.P. | Light modulator |
JP2006128194A (ja) * | 2004-10-26 | 2006-05-18 | Canon Inc | 露光装置及びデバイス製造方法 |
US7388663B2 (en) | 2004-10-28 | 2008-06-17 | Asml Netherlands B.V. | Optical position assessment apparatus and method |
US7423732B2 (en) * | 2004-11-04 | 2008-09-09 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane |
US7457547B2 (en) * | 2004-11-08 | 2008-11-25 | Optium Australia Pty Limited | Optical calibration system and method |
US7489434B2 (en) | 2007-05-02 | 2009-02-10 | Angstrom, Inc. | Hybrid micromirror array lens for reducing chromatic aberration |
US7619807B2 (en) * | 2004-11-08 | 2009-11-17 | Angstrom, Inc. | Micromirror array lens with optical surface profiles |
US7609362B2 (en) * | 2004-11-08 | 2009-10-27 | Asml Netherlands B.V. | Scanning lithographic apparatus and device manufacturing method |
US7170584B2 (en) * | 2004-11-17 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7474384B2 (en) * | 2004-11-22 | 2009-01-06 | Asml Holding N.V. | Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
US7061581B1 (en) * | 2004-11-22 | 2006-06-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7643192B2 (en) * | 2004-11-24 | 2010-01-05 | Asml Holding N.V. | Pattern generator using a dual phase step element and method of using same |
US7713667B2 (en) * | 2004-11-30 | 2010-05-11 | Asml Holding N.V. | System and method for generating pattern data used to control a pattern generator |
US7333177B2 (en) * | 2004-11-30 | 2008-02-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7365848B2 (en) * | 2004-12-01 | 2008-04-29 | Asml Holding N.V. | System and method using visible and infrared light to align and measure alignment patterns on multiple layers |
US7391499B2 (en) * | 2004-12-02 | 2008-06-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7362415B2 (en) * | 2004-12-07 | 2008-04-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7355677B2 (en) * | 2004-12-09 | 2008-04-08 | Asml Netherlands B.V. | System and method for an improved illumination system in a lithographic apparatus |
US7349068B2 (en) * | 2004-12-17 | 2008-03-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7180577B2 (en) * | 2004-12-17 | 2007-02-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane |
US7202939B2 (en) * | 2004-12-22 | 2007-04-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7391676B2 (en) | 2004-12-22 | 2008-06-24 | Asml Netherlands B.V. | Ultrasonic distance sensors |
US7274502B2 (en) * | 2004-12-22 | 2007-09-25 | Asml Holding N.V. | System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks |
US7230677B2 (en) * | 2004-12-22 | 2007-06-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing hexagonal image grids |
US7375795B2 (en) * | 2004-12-22 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7256867B2 (en) * | 2004-12-22 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7538857B2 (en) * | 2004-12-23 | 2009-05-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a substrate handler |
US7656506B2 (en) * | 2004-12-23 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a substrate handler |
US7426076B2 (en) * | 2004-12-23 | 2008-09-16 | Asml Holding N.V. | Projection system for a lithographic apparatus |
US7242458B2 (en) * | 2004-12-23 | 2007-07-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates |
US7126672B2 (en) * | 2004-12-27 | 2006-10-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20060138349A1 (en) * | 2004-12-27 | 2006-06-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7317510B2 (en) * | 2004-12-27 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7279110B2 (en) * | 2004-12-27 | 2007-10-09 | Asml Holding N.V. | Method and apparatus for creating a phase step in mirrors used in spatial light modulator arrays |
US7459247B2 (en) * | 2004-12-27 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7403865B2 (en) * | 2004-12-28 | 2008-07-22 | Asml Netherlands B.V. | System and method for fault indication on a substrate in maskless applications |
US7274029B2 (en) * | 2004-12-28 | 2007-09-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7756660B2 (en) * | 2004-12-28 | 2010-07-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7145636B2 (en) * | 2004-12-28 | 2006-12-05 | Asml Netherlands Bv | System and method for determining maximum operational parameters used in maskless applications |
US7253881B2 (en) * | 2004-12-29 | 2007-08-07 | Asml Netherlands Bv | Methods and systems for lithographic gray scaling |
US7342644B2 (en) * | 2004-12-29 | 2008-03-11 | Asml Netherlands B.V. | Methods and systems for lithographic beam generation |
US7453645B2 (en) * | 2004-12-30 | 2008-11-18 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
US7567368B2 (en) * | 2005-01-06 | 2009-07-28 | Asml Holding N.V. | Systems and methods for minimizing scattered light in multi-SLM maskless lithography |
JP4758443B2 (ja) * | 2005-01-28 | 2011-08-31 | エーエスエムエル ホールディング エヌ.ブイ. | 大域的最適化に基づくマスクレスリソグラフィ・ラスタライゼーション技術の方法、装置およびコンピュータ読取可能媒体 |
US7542013B2 (en) * | 2005-01-31 | 2009-06-02 | Asml Holding N.V. | System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode |
US7460208B2 (en) * | 2005-02-18 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7286137B2 (en) * | 2005-02-28 | 2007-10-23 | Asml Holding N.V. | Method and system for constrained pixel graytones interpolation for pattern rasterization |
US20060198011A1 (en) * | 2005-03-04 | 2006-09-07 | Stereo Display, Inc. | Volumetric three-dimensional device using two-dimensional scanning device |
US20060204859A1 (en) * | 2005-03-09 | 2006-09-14 | International Business Machines Corporation | An extra dose trim mask, method of manufacture, and lithographic process using the same |
US20060203117A1 (en) * | 2005-03-10 | 2006-09-14 | Stereo Display, Inc. | Video monitoring system using variable focal length lens |
US7499146B2 (en) * | 2005-03-14 | 2009-03-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping |
US7812930B2 (en) * | 2005-03-21 | 2010-10-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume |
US7209216B2 (en) * | 2005-03-25 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography |
US7403265B2 (en) | 2005-03-30 | 2008-07-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing data filtering |
US7728956B2 (en) * | 2005-04-05 | 2010-06-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data |
US7456935B2 (en) * | 2005-04-05 | 2008-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table |
TWI427440B (zh) * | 2005-04-06 | 2014-02-21 | Kodak Graphic Comm Canada Co | 用於校正影像化規則圖案的條帶之方法與裝置 |
JP4691653B2 (ja) * | 2005-04-07 | 2011-06-01 | 国立大学法人東北大学 | データ生成方法、データ生成装置、及びプログラム |
US7209217B2 (en) | 2005-04-08 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing plural patterning devices |
US7330239B2 (en) | 2005-04-08 | 2008-02-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device |
JP2008536331A (ja) * | 2005-04-15 | 2008-09-04 | マイクロニック レーザー システムズ アクチボラゲット | 複数の露光ビームによるリソグラフィ・ツールのための方法 |
CN101203808A (zh) * | 2005-04-15 | 2008-06-18 | 麦克罗尼克激光系统公司 | 图像增强技术 |
US7221514B2 (en) * | 2005-04-15 | 2007-05-22 | Asml Netherlands B.V. | Variable lens and exposure system |
US20060244805A1 (en) * | 2005-04-27 | 2006-11-02 | Ming-Hsiang Yeh | Multicolor pen |
US7400382B2 (en) | 2005-04-28 | 2008-07-15 | Asml Holding N.V. | Light patterning device using tilting mirrors in a superpixel form |
US7738081B2 (en) * | 2005-05-06 | 2010-06-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler |
JP4570151B2 (ja) * | 2005-05-06 | 2010-10-27 | 株式会社ナノシステムソリューションズ | マスク製造方法 |
KR100815352B1 (ko) * | 2005-05-12 | 2008-03-19 | 삼성전기주식회사 | 후단 렌즈계의 개구수가 개선된 광변조기를 이용한디스플레이 장치 |
US7197828B2 (en) * | 2005-05-31 | 2007-04-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing FPD chuck Z position measurement |
US7477772B2 (en) * | 2005-05-31 | 2009-01-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression |
US7292317B2 (en) * | 2005-06-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing substrate stage compensating |
US7742148B2 (en) * | 2005-06-08 | 2010-06-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method for writing a digital image |
JP4828870B2 (ja) * | 2005-06-09 | 2011-11-30 | 株式会社東芝 | 評価パタンの作成方法およびプログラム |
US7233384B2 (en) * | 2005-06-13 | 2007-06-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor |
US7321416B2 (en) * | 2005-06-15 | 2008-01-22 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion |
US7408617B2 (en) * | 2005-06-24 | 2008-08-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method |
US7965373B2 (en) * | 2005-06-28 | 2011-06-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load |
US7307694B2 (en) * | 2005-06-29 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method |
US7522258B2 (en) * | 2005-06-29 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination |
US7209275B2 (en) | 2005-06-30 | 2007-04-24 | Asml Holding N.V. | Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation |
US20070013889A1 (en) * | 2005-07-12 | 2007-01-18 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus |
US7251019B2 (en) * | 2005-07-20 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging |
US7446855B2 (en) * | 2005-07-25 | 2008-11-04 | Micron Technology, Inc | Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure |
US7283289B2 (en) * | 2005-07-30 | 2007-10-16 | Hewlett-Packard Development Company, L.P. | Projection system modulator reducing distortion and field curvature effects of projection system lens |
US20070041077A1 (en) * | 2005-08-19 | 2007-02-22 | Stereo Display, Inc. | Pocket-sized two-dimensional image projection system |
US7606430B2 (en) * | 2005-08-30 | 2009-10-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD |
US20070046917A1 (en) * | 2005-08-31 | 2007-03-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU |
JP2007114750A (ja) * | 2005-09-09 | 2007-05-10 | Asml Netherlands Bv | 投影システム設計方法、リソグラフィー装置およびデバイス製造方法 |
US7650588B2 (en) * | 2005-09-26 | 2010-01-19 | Micronic Laser Systems Ab | Methods and systems for pattern generation based on multiple forms of design data |
JP5025157B2 (ja) * | 2005-09-29 | 2012-09-12 | 大日本スクリーン製造株式会社 | 画像記録装置および画像記録方法 |
JP2007101687A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | 描画装置、描画方法、データ構造及び記録媒体、並びに、データ処理装置及び処理方法 |
JP2007101730A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | 画像露光装置 |
US7830493B2 (en) * | 2005-10-04 | 2010-11-09 | Asml Netherlands B.V. | System and method for compensating for radiation induced thermal distortions in a substrate or projection system |
US7391503B2 (en) * | 2005-10-04 | 2008-06-24 | Asml Netherlands B.V. | System and method for compensating for thermal expansion of lithography apparatus or substrate |
US7332733B2 (en) * | 2005-10-05 | 2008-02-19 | Asml Netherlands B.V. | System and method to correct for field curvature of multi lens array |
US7492450B2 (en) * | 2005-10-24 | 2009-02-17 | General Electric Company | Methods and apparatus for inspecting an object |
CN100362387C (zh) * | 2005-11-18 | 2008-01-16 | 重庆大学 | 静电简支梁式干涉光调制器 |
US20070127005A1 (en) * | 2005-12-02 | 2007-06-07 | Asml Holding N.V. | Illumination system |
US7626181B2 (en) * | 2005-12-09 | 2009-12-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20070133007A1 (en) * | 2005-12-14 | 2007-06-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using laser trimming of a multiple mirror contrast device |
US7440078B2 (en) * | 2005-12-20 | 2008-10-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units |
US20070153249A1 (en) * | 2005-12-20 | 2007-07-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types |
US7528932B2 (en) * | 2005-12-21 | 2009-05-05 | Micronic Laser Systems Ab | SLM direct writer |
US7466394B2 (en) * | 2005-12-21 | 2008-12-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array |
US7532403B2 (en) * | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
JP4495104B2 (ja) * | 2006-03-28 | 2010-06-30 | エーエスエムエル ネザーランズ ビー.ブイ. | 可変式照明源 |
US7528933B2 (en) * | 2006-04-06 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement |
US7508491B2 (en) * | 2006-04-12 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity |
US7948606B2 (en) * | 2006-04-13 | 2011-05-24 | Asml Netherlands B.V. | Moving beam with respect to diffractive optics in order to reduce interference patterns |
US7839487B2 (en) * | 2006-04-13 | 2010-11-23 | Asml Holding N.V. | Optical system for increasing illumination efficiency of a patterning device |
JP2007286311A (ja) * | 2006-04-17 | 2007-11-01 | Matsushita Electric Ind Co Ltd | 波面変換装置、および光学装置 |
DE102006019963B4 (de) * | 2006-04-28 | 2023-12-07 | Envisiontec Gmbh | Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung |
US8264667B2 (en) * | 2006-05-04 | 2012-09-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using interferometric and other exposure |
DE102006020734A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
US9736346B2 (en) | 2006-05-09 | 2017-08-15 | Stereo Display, Inc | Imaging system improving image resolution of the system with low resolution image sensor |
US8934084B2 (en) * | 2006-05-31 | 2015-01-13 | Asml Holding N.V. | System and method for printing interference patterns having a pitch in a lithography system |
US7728954B2 (en) * | 2006-06-06 | 2010-06-01 | Asml Netherlands B.V. | Reflective loop system producing incoherent radiation |
US8052289B2 (en) * | 2006-06-07 | 2011-11-08 | Asml Netherlands B.V. | Mirror array for lithography |
US7649676B2 (en) * | 2006-06-14 | 2010-01-19 | Asml Netherlands B.V. | System and method to form unpolarized light |
US7936445B2 (en) * | 2006-06-19 | 2011-05-03 | Asml Netherlands B.V. | Altering pattern data based on measured optical element characteristics |
US8896808B2 (en) * | 2006-06-21 | 2014-11-25 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7697115B2 (en) * | 2006-06-23 | 2010-04-13 | Asml Holding N.V. | Resonant scanning mirror |
US7593094B2 (en) * | 2006-06-26 | 2009-09-22 | Asml Netherlands B.V. | Patterning device |
US20080002174A1 (en) * | 2006-06-30 | 2008-01-03 | Asml Netherlands B.V. | Control system for pattern generator in maskless lithography |
US7630136B2 (en) | 2006-07-18 | 2009-12-08 | Asml Holding N.V. | Optical integrators for lithography systems and methods |
JP5180446B2 (ja) * | 2006-07-20 | 2013-04-10 | 株式会社ナノシステムソリューションズ | 露光装置及び露光方法 |
US7548315B2 (en) | 2006-07-27 | 2009-06-16 | Asml Netherlands B.V. | System and method to compensate for critical dimension non-uniformity in a lithography system |
US7738077B2 (en) * | 2006-07-31 | 2010-06-15 | Asml Netherlands B.V. | Patterning device utilizing sets of stepped mirrors and method of using same |
US7365899B2 (en) * | 2006-08-10 | 2008-04-29 | Angstrom, Inc. | Micromirror with multi-axis rotation and translation |
US7626182B2 (en) * | 2006-09-05 | 2009-12-01 | Asml Netherlands B.V. | Radiation pulse energy control system, lithographic apparatus and device manufacturing method |
TWI345748B (en) * | 2006-09-05 | 2011-07-21 | Chunghwa Picture Tubes Ltd | Thin film transistor liquid crystal display |
US7628875B2 (en) * | 2006-09-12 | 2009-12-08 | Asml Netherlands B.V. | MEMS device and assembly method |
US8049865B2 (en) * | 2006-09-18 | 2011-11-01 | Asml Netherlands B.V. | Lithographic system, device manufacturing method, and mask optimization method |
US7589884B2 (en) * | 2006-09-22 | 2009-09-15 | Angstrom, Inc. | Micromirror array lens with encapsulation of reflective metal layer and method of making the same |
US7589885B2 (en) * | 2006-09-22 | 2009-09-15 | Angstrom, Inc. | Micromirror array device comprising encapsulated reflective metal layer and method of making the same |
KR100816494B1 (ko) * | 2006-10-09 | 2008-03-24 | 엘지전자 주식회사 | 마스크리스 노광기 및 이를 이용한 표시장치용 기판의 제조방법 |
US7683300B2 (en) * | 2006-10-17 | 2010-03-23 | Asml Netherlands B.V. | Using an interferometer as a high speed variable attenuator |
US20080121939A1 (en) * | 2006-11-06 | 2008-05-29 | Michael Murray | Methods of automatically generating dummy fill having reduced storage size |
US7453551B2 (en) * | 2006-11-14 | 2008-11-18 | Asml Netherlands B.V. | Increasing pulse-to-pulse radiation beam uniformity |
JP4937705B2 (ja) * | 2006-11-14 | 2012-05-23 | 株式会社オーク製作所 | 多重露光装置 |
US20080111977A1 (en) * | 2006-11-14 | 2008-05-15 | Asml Holding N.V. | Compensation techniques for fluid and magnetic bearings |
US7738079B2 (en) * | 2006-11-14 | 2010-06-15 | Asml Netherlands B.V. | Radiation beam pulse trimming |
US8054449B2 (en) * | 2006-11-22 | 2011-11-08 | Asml Holding N.V. | Enhancing the image contrast of a high resolution exposure tool |
US7488082B2 (en) | 2006-12-12 | 2009-02-10 | Angstrom, Inc. | Discretely controlled micromirror array device with segmented electrodes |
US8259285B2 (en) * | 2006-12-14 | 2012-09-04 | Asml Holding N.V. | Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data |
US7990339B2 (en) * | 2006-12-27 | 2011-08-02 | Silicon Quest Kabushiki-Kaisha | Deformable micromirror device |
US8749463B2 (en) | 2007-01-19 | 2014-06-10 | Hamamatsu Photonics K.K. | Phase-modulating apparatus |
CN100456141C (zh) * | 2007-01-23 | 2009-01-28 | 上海微电子装备有限公司 | 批量硅片曝光的方法 |
JP5211487B2 (ja) * | 2007-01-25 | 2013-06-12 | 株式会社ニコン | 露光方法及び露光装置並びにマイクロデバイスの製造方法 |
US7965378B2 (en) * | 2007-02-20 | 2011-06-21 | Asml Holding N.V | Optical system and method for illumination of reflective spatial light modulators in maskless lithography |
US7705309B1 (en) * | 2007-02-27 | 2010-04-27 | Agiltron Corporation | Radiation detector with extended dynamic range |
US7535618B2 (en) * | 2007-03-12 | 2009-05-19 | Angstrom, Inc. | Discretely controlled micromirror device having multiple motions |
US8009269B2 (en) | 2007-03-14 | 2011-08-30 | Asml Holding N.V. | Optimal rasterization for maskless lithography |
US8009270B2 (en) * | 2007-03-22 | 2011-08-30 | Asml Netherlands B.V. | Uniform background radiation in maskless lithography |
US20080259304A1 (en) * | 2007-04-20 | 2008-10-23 | Asml Netherlands B.V. | Lithographic apparatus and method |
CN101669071B (zh) * | 2007-04-25 | 2012-03-21 | 卡尔蔡司Smt有限责任公司 | 微光刻曝光装置中照明掩模的照明系统 |
CN101682958A (zh) * | 2007-04-30 | 2010-03-24 | 皇家飞利浦电子股份有限公司 | 模块化固态照明系统 |
US8237913B2 (en) * | 2007-05-08 | 2012-08-07 | Asml Netherlands B.V. | Lithographic apparatus and method |
US20080278698A1 (en) * | 2007-05-08 | 2008-11-13 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7714986B2 (en) * | 2007-05-24 | 2010-05-11 | Asml Netherlands B.V. | Laser beam conditioning system comprising multiple optical paths allowing for dose control |
US20080304034A1 (en) * | 2007-06-07 | 2008-12-11 | Asml Netherlands B.V. | Dose control for optical maskless lithography |
KR20080109409A (ko) * | 2007-06-13 | 2008-12-17 | 삼성전자주식회사 | 투사형 디스플레이장치 및 그에 적용된 디스플레이방법 |
US9505606B2 (en) * | 2007-06-13 | 2016-11-29 | Angstrom, Inc. | MEMS actuator with discretely controlled multiple motions |
US8189172B2 (en) * | 2007-06-14 | 2012-05-29 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7768627B2 (en) * | 2007-06-14 | 2010-08-03 | Asml Netherlands B.V. | Illumination of a patterning device based on interference for use in a maskless lithography system |
US8692974B2 (en) * | 2007-06-14 | 2014-04-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control |
TWI443472B (zh) * | 2007-07-13 | 2014-07-01 | 尼康股份有限公司 | Pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method and element |
US7605988B2 (en) * | 2007-07-23 | 2009-10-20 | Angstrom, Inc. | Compact image taking lens system with a lens-surfaced prism |
US7589916B2 (en) * | 2007-08-10 | 2009-09-15 | Angstrom, Inc. | Micromirror array with iris function |
US7838178B2 (en) * | 2007-08-13 | 2010-11-23 | Micron Technology, Inc. | Masks for microlithography and methods of making and using such masks |
DE102007038999A1 (de) * | 2007-08-17 | 2009-02-19 | Punch Graphix Prepress Germany Gmbh | Verfahren zur Steigerung des Durchsatzes und zur Reduzierung der Bewegungsunschärfe |
US7755121B2 (en) * | 2007-08-23 | 2010-07-13 | Aptina Imaging Corp. | Imagers, apparatuses and systems utilizing pixels with improved optical resolution and methods of operating the same |
CN101796460B (zh) * | 2007-08-30 | 2013-05-01 | 卡尔蔡司Smt有限责任公司 | 微光刻投射曝光设备中用于照明掩模的照明系统 |
US8245162B2 (en) * | 2007-09-14 | 2012-08-14 | Abrams Daniel S | Write-pattern determination for maskless lithography |
JP5267029B2 (ja) * | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
WO2009050976A1 (en) * | 2007-10-16 | 2009-04-23 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US8379187B2 (en) * | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
KR101644660B1 (ko) * | 2007-11-06 | 2016-08-01 | 가부시키가이샤 니콘 | 조명 광학 장치 및 노광 장치 |
JP5326259B2 (ja) * | 2007-11-08 | 2013-10-30 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
JP5270142B2 (ja) | 2007-12-05 | 2013-08-21 | 浜松ホトニクス株式会社 | 反射型空間光変調素子 |
JP5063320B2 (ja) * | 2007-12-11 | 2012-10-31 | 株式会社ニューフレアテクノロジー | 描画装置及び描画データの変換方法 |
WO2009078223A1 (ja) * | 2007-12-17 | 2009-06-25 | Nikon Corporation | 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 |
EP2388650B1 (en) | 2007-12-21 | 2013-11-20 | Carl Zeiss SMT GmbH | Illumination system for illuminating a mask in a microlithographic exposure apparatus |
WO2009080310A1 (en) * | 2007-12-21 | 2009-07-02 | Carl Zeiss Smt Ag | Illumination system for a microlithographic projection exposure apparatus |
US20090185067A1 (en) * | 2007-12-21 | 2009-07-23 | Stereo Display, Inc. | Compact automatic focusing camera |
US8247999B2 (en) | 2008-01-22 | 2012-08-21 | Alcatel Lucent | Time division multiplexing a DC-to-DC voltage converter |
US8129669B2 (en) | 2008-01-22 | 2012-03-06 | Alcatel Lucent | System and method generating multi-color light for image display having a controller for temporally interleaving the first and second time intervals of directed first and second light beams |
US8109638B2 (en) * | 2008-01-22 | 2012-02-07 | Alcatel Lucent | Diffuser configuration for an image projector |
GB0802944D0 (en) * | 2008-02-19 | 2008-03-26 | Rumsby Philip T | Apparatus for laser processing the opposite sides of thin panels |
US8810908B2 (en) * | 2008-03-18 | 2014-08-19 | Stereo Display, Inc. | Binoculars with micromirror array lenses |
KR101657053B1 (ko) * | 2008-04-24 | 2016-09-13 | 마이크로닉 마이데이타 에이비 | 구조화된 거울 표면을 가진 공간적 광 조절기 |
US20090303569A1 (en) * | 2008-05-20 | 2009-12-10 | Stereo Didplay, Inc. | Self-tilted micromirror device |
US8622557B2 (en) * | 2008-05-20 | 2014-01-07 | Stereo Display, Inc. | Micromirror array lens with self-tilted micromirrors |
US8300263B2 (en) * | 2008-06-06 | 2012-10-30 | Eastman Kodak Company | Forming images with minimum feature sizes |
US7971961B2 (en) * | 2008-06-06 | 2011-07-05 | Eastman Kodak Company | Forming images with stitched swaths |
US20100020331A1 (en) * | 2008-07-25 | 2010-01-28 | Micronic Laser Systems Ab | Laser interferometer systems and methods with suppressed error and pattern generators having the same |
JP5253037B2 (ja) * | 2008-08-18 | 2013-07-31 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
US8867113B2 (en) * | 2008-08-26 | 2014-10-21 | Hamamatsu Photonics K.K. | Laser processing device and laser processing method |
JPWO2010024106A1 (ja) | 2008-08-28 | 2012-01-26 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
KR101560617B1 (ko) * | 2008-09-10 | 2015-10-16 | 삼성전자주식회사 | 광 발생 장치 및 그 제어 방법 |
DE102008048660B4 (de) * | 2008-09-22 | 2015-06-18 | Carl Zeiss Sms Gmbh | Verfahren und Vorrichtung zur Vermessung von Strukturen auf Photolithographiemasken |
US8390786B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8395752B2 (en) | 2008-09-23 | 2013-03-12 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8253923B1 (en) | 2008-09-23 | 2012-08-28 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8670106B2 (en) * | 2008-09-23 | 2014-03-11 | Pinebrook Imaging, Inc. | Optical imaging writer system |
US8390781B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
NL2003364A (en) * | 2008-09-26 | 2010-03-29 | Asml Netherlands Bv | Lithographic apparatus and method. |
JP5376494B2 (ja) * | 2008-10-08 | 2013-12-25 | 大日本スクリーン製造株式会社 | 描画装置および描画方法 |
US8048359B2 (en) * | 2008-10-20 | 2011-11-01 | 3D Systems, Inc. | Compensation of actinic radiation intensity profiles for three-dimensional modelers |
NL2003449A (en) * | 2008-10-28 | 2010-04-29 | Asml Netherlands Bv | Fly's eye integrator, illuminator, lithographic apparatus and method. |
DE102009020320A1 (de) * | 2008-11-19 | 2010-05-20 | Heidelberg Instruments Mikrotechnik Gmbh | Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen |
DE102008054844B4 (de) * | 2008-12-17 | 2010-09-23 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Projektionsbelichtungsverfahren |
EP2202580B1 (en) * | 2008-12-23 | 2011-06-22 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
US8531755B2 (en) * | 2009-02-16 | 2013-09-10 | Micronic Laser Systems Ab | SLM device and method combining multiple mirrors for high-power delivery |
JP5209544B2 (ja) * | 2009-03-04 | 2013-06-12 | 大日本スクリーン製造株式会社 | 描画装置、描画装置用のデータ処理装置、および描画装置用の描画データ生成方法 |
RU2473936C2 (ru) * | 2009-04-02 | 2013-01-27 | Аслан Хаджимуратович Абдуев | Экран и оптический коммутатор |
US8610986B2 (en) * | 2009-04-06 | 2013-12-17 | The Board Of Trustees Of The University Of Illinois | Mirror arrays for maskless photolithography and image display |
US8226241B2 (en) | 2009-05-15 | 2012-07-24 | Alcatel Lucent | Image projector employing a speckle-reducing laser source |
EP3144955A1 (en) * | 2009-05-20 | 2017-03-22 | Mapper Lithography IP B.V. | Method for exposing a wafer |
US8434887B2 (en) | 2009-08-27 | 2013-05-07 | Dolby Laboratories Licensing Corporation | Optical mixing and shaping system for display backlights and displays incorporating the same |
CN102598310A (zh) * | 2009-09-18 | 2012-07-18 | 应用材料公司 | 背接触太阳能电池中的通孔的激光钻孔 |
JP5393406B2 (ja) * | 2009-11-06 | 2014-01-22 | オリンパス株式会社 | パターン投影装置、走査型共焦点顕微鏡、及びパターン照射方法 |
US9511448B2 (en) * | 2009-12-30 | 2016-12-06 | Resonetics, LLC | Laser machining system and method for machining three-dimensional objects from a plurality of directions |
JP5481400B2 (ja) * | 2010-01-15 | 2014-04-23 | 株式会社日立ハイテクノロジーズ | マイクロミラーデバイスの選別方法、マイクロミラーデバイス選別装置およびマスクレス露光装置 |
JP5446930B2 (ja) | 2010-01-27 | 2014-03-19 | 東洋インキScホールディングス株式会社 | インクジェットインキ受容層形成用コート剤、それを用いた記録媒体及び印刷物 |
KR101653213B1 (ko) * | 2010-02-19 | 2016-09-02 | 삼성디스플레이 주식회사 | 디지털 노광 방법 및 이를 수행하기 위한 디지털 노광 장치 |
US8539395B2 (en) | 2010-03-05 | 2013-09-17 | Micronic Laser Systems Ab | Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image |
JP2011199279A (ja) * | 2010-03-18 | 2011-10-06 | Ims Nanofabrication Ag | ターゲット上へのマルチビーム露光のための方法 |
DE102010029651A1 (de) | 2010-06-02 | 2011-12-08 | Carl Zeiss Smt Gmbh | Verfahren zum Betrieb einer Projektionsbelichtungsanlage für die Mikrolithographie mit Korrektur von durch rigorose Effekte der Maske induzierten Abbildungsfehlern |
WO2012013227A1 (en) * | 2010-07-28 | 2012-02-02 | Carl Zeiss Smt Gmbh | Facet mirror device |
JP5811362B2 (ja) * | 2010-09-27 | 2015-11-11 | 株式会社ニコン | 露光用パターンの生成方法、露光方法及び装置、並びにデバイス製造方法 |
US8413084B2 (en) | 2010-10-04 | 2013-04-02 | International Business Machines Corporation | Photomask throughput by reducing exposure shot count for non-critical elements |
WO2012076629A2 (en) * | 2010-12-07 | 2012-06-14 | Micronic Mydata AB | Criss-cross writing strategy |
JP5880443B2 (ja) * | 2010-12-13 | 2016-03-09 | 株式会社ニコン | 露光方法、露光装置、及びデバイス製造方法 |
US8492074B2 (en) * | 2011-01-05 | 2013-07-23 | Laurie A. Bryant | Method of improving print performance in flexographic printing plates |
WO2012150263A1 (en) * | 2011-05-03 | 2012-11-08 | Stichting Dutch Polymer Institute | Method for controlling deposition |
JP5346356B2 (ja) * | 2011-05-30 | 2013-11-20 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びデバイス製造方法 |
JP5722136B2 (ja) * | 2011-06-30 | 2015-05-20 | 株式会社Screenホールディングス | パターン描画装置およびパターン描画方法 |
EP2732341B1 (en) * | 2011-07-11 | 2016-11-30 | Mapper Lithography IP B.V. | Lithography system and method for storing positional data of a target |
US8653454B2 (en) | 2011-07-13 | 2014-02-18 | Luminescent Technologies, Inc. | Electron-beam image reconstruction |
US10317346B2 (en) | 2011-09-02 | 2019-06-11 | Nikon Corporation | Method and device for inspecting spatial light modulator, and exposure method and device |
US8691476B2 (en) | 2011-12-16 | 2014-04-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV mask and method for forming the same |
JP2013193110A (ja) * | 2012-03-21 | 2013-09-30 | Sumitomo Heavy Ind Ltd | レーザ加工装置及びレーザ加工方法 |
JP5952391B2 (ja) | 2012-04-23 | 2016-07-13 | キヤノン電子株式会社 | 光走査装置及び画像読取装置 |
DE102012207220A1 (de) * | 2012-04-30 | 2013-10-31 | Robert Bosch Gmbh | Verfahren zur Bearbeitung eines Werkstücks mit Laserstrahlung |
US10149390B2 (en) | 2012-08-27 | 2018-12-04 | Mycronic AB | Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs |
US9261793B2 (en) | 2012-09-14 | 2016-02-16 | Globalfoundries Inc. | Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution |
CN102914949B (zh) * | 2012-09-17 | 2015-12-09 | 天津芯硕精密机械有限公司 | 一种用于扫描式无掩膜光刻机倾斜slm曝光的数据处理方法 |
JP2014066954A (ja) * | 2012-09-27 | 2014-04-17 | Dainippon Screen Mfg Co Ltd | 描画装置、および、描画方法 |
EP2926197A4 (en) * | 2012-10-29 | 2016-09-07 | Univ Northwestern | PROJECTED AND HEAT-ACTIVATED LITHOGRAPHY SYSTEMS AND METHODS |
RU2515672C1 (ru) * | 2012-12-18 | 2014-05-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" (НИУ ИТМО) | Способ изготовления микрооптического растра |
KR101984898B1 (ko) | 2012-12-27 | 2019-06-03 | 삼성디스플레이 주식회사 | 마스크리스 노광 장치를 이용한 표시 장치의 제조 방법 및 그 표시 장치 |
EP2757571B1 (en) * | 2013-01-17 | 2017-09-20 | IMS Nanofabrication AG | High-voltage insulation device for charged-particle optical apparatus |
KR102112751B1 (ko) * | 2013-02-01 | 2020-05-19 | 삼성디스플레이 주식회사 | 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치 |
KR102253995B1 (ko) | 2013-03-12 | 2021-05-18 | 마이크로닉 아베 | 기계적으로 생성된 정렬 표식 방법 및 정렬 시스템 |
WO2014140047A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
KR102171301B1 (ko) | 2013-07-09 | 2020-10-29 | 삼성디스플레이 주식회사 | Dmd를 이용한 디지털 노광기 및 그 제어 방법 |
JP2015023286A (ja) | 2013-07-17 | 2015-02-02 | アイエムエス ナノファブリケーション アーゲー | 複数のブランキングアレイを有するパターン画定装置 |
EP2830083B1 (en) | 2013-07-25 | 2016-05-04 | IMS Nanofabrication AG | Method for charged-particle multi-beam exposure |
CN103424996B (zh) * | 2013-09-03 | 2016-03-02 | 苏州大学 | 一种光学加工系统和方法 |
CN110286484A (zh) * | 2013-10-20 | 2019-09-27 | Mtt创新公司 | 光场投影装置及方法 |
EP2871525A3 (de) * | 2013-11-08 | 2015-09-23 | Limata GmbH | Lithografiebelichtungseinrichtung zur lithographischen Belichtung durch ein- oder mehrstufige Laserprojektionseinheiten mit einer oder mehreren Wellenlängen |
US9735067B2 (en) * | 2013-11-27 | 2017-08-15 | Tokyo Electron Limited | Substrate tuning system and method using optical projection |
US9645391B2 (en) * | 2013-11-27 | 2017-05-09 | Tokyo Electron Limited | Substrate tuning system and method using optical projection |
DE102014203040A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
EP2913838B1 (en) | 2014-02-28 | 2018-09-19 | IMS Nanofabrication GmbH | Compensation of defective beamlets in a charged-particle multi-beam exposure tool |
JP2015184480A (ja) * | 2014-03-24 | 2015-10-22 | 古河電気工業株式会社 | 光信号選択装置および光信号選択装置の制御方法 |
EP2927948A1 (en) * | 2014-04-04 | 2015-10-07 | Nordson Corporation | X-ray inspection apparatus for inspecting semiconductor wafers |
CN103926803B (zh) * | 2014-04-21 | 2016-03-09 | 中国科学院上海光学精密机械研究所 | 光刻机照明光源的描述方法 |
US9443699B2 (en) | 2014-04-25 | 2016-09-13 | Ims Nanofabrication Ag | Multi-beam tool for cutting patterns |
EP2944413A1 (de) * | 2014-05-12 | 2015-11-18 | Boegli-Gravures S.A. | Vorrichtung zur Maskenprojektion von Femtosekunden- und Pikosekunden- Laserstrahlen mit einer Blende, einer Maske und Linsensystemen |
EP3143763B8 (en) | 2014-05-15 | 2023-12-27 | MTT Innovation Incorporated | Light projector and method for displaying an image |
EP3358599B1 (en) | 2014-05-30 | 2021-01-27 | IMS Nanofabrication GmbH | Compensation of dose inhomogeneity using row calibration |
JP6892214B2 (ja) | 2014-07-10 | 2021-06-23 | アイエムエス ナノファブリケーション ゲーエムベーハー | 畳み込みカーネルを使用する粒子ビーム描画機のカスタマイズ化 |
US9568907B2 (en) | 2014-09-05 | 2017-02-14 | Ims Nanofabrication Ag | Correction of short-range dislocations in a multi-beam writer |
KR20160046016A (ko) * | 2014-10-17 | 2016-04-28 | 삼성디스플레이 주식회사 | 마스크리스 노광 장치 및 이를 이용한 누적 조도 보정 방법 |
JP6474995B2 (ja) | 2014-11-11 | 2019-02-27 | ローランドディー.ジー.株式会社 | スライスデータ作成装置、スライスデータ作成方法、プログラムおよびコンピューター読み取り可能な記録媒体 |
DE102015201140A1 (de) * | 2015-01-23 | 2016-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Bearbeitungskopf für die Materialbearbeitung |
JP6513980B2 (ja) * | 2015-03-16 | 2019-05-15 | 株式会社東芝 | 撮像装置及び撮像方法 |
US9653263B2 (en) | 2015-03-17 | 2017-05-16 | Ims Nanofabrication Ag | Multi-beam writing of pattern areas of relaxed critical dimension |
EP3096342B1 (en) | 2015-03-18 | 2017-09-20 | IMS Nanofabrication AG | Bi-directional double-pass multi-beam writing |
JP6593623B2 (ja) * | 2015-03-30 | 2019-10-23 | 株式会社ニコン | 空間光変調器の設定方法、駆動データの作成方法、露光装置、露光方法、およびデバイス製造方法 |
DE102015217523B4 (de) | 2015-04-28 | 2022-03-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur lokal definierten Bearbeitung an Oberflächen von Werkstücken mittels Laserlicht |
US10410831B2 (en) | 2015-05-12 | 2019-09-10 | Ims Nanofabrication Gmbh | Multi-beam writing using inclined exposure stripes |
DE102016204703B4 (de) | 2016-03-22 | 2022-08-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Erzeugung eines optischen Musters aus Bildpunkten in einer Bildebene |
US10325756B2 (en) | 2016-06-13 | 2019-06-18 | Ims Nanofabrication Gmbh | Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer |
JP6818393B2 (ja) * | 2016-09-01 | 2021-01-20 | 株式会社オーク製作所 | 露光装置 |
US10799998B2 (en) * | 2016-10-17 | 2020-10-13 | Virtek Vision International Ulc | Laser projector with flash alignment |
AU2017387099B2 (en) * | 2016-12-27 | 2023-02-02 | DePuy Synthes Products, Inc. | Systems, methods, and devices for providing illumination in an endoscopic imaging environment |
US10325757B2 (en) | 2017-01-27 | 2019-06-18 | Ims Nanofabrication Gmbh | Advanced dose-level quantization of multibeam-writers |
EP3598236A4 (en) * | 2017-03-16 | 2021-01-20 | Nikon Corporation | CONTROL DEVICE AND CONTROL PROCESS, EXPOSURE DEVICE AND EXPOSURE PROCESS, DEVICE MANUFACTURING PROCESS, DATA PRODUCTION PROCESS AND PROGRAM |
GB2560584B (en) * | 2017-03-17 | 2021-05-19 | Optalysys Ltd | Optical processing systems |
US10522329B2 (en) | 2017-08-25 | 2019-12-31 | Ims Nanofabrication Gmbh | Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus |
CN109426091B (zh) * | 2017-08-31 | 2021-01-29 | 京东方科技集团股份有限公司 | 曝光装置、曝光方法及光刻方法 |
US11569064B2 (en) | 2017-09-18 | 2023-01-31 | Ims Nanofabrication Gmbh | Method for irradiating a target using restricted placement grids |
CN107728312A (zh) | 2017-10-24 | 2018-02-23 | 上海天马微电子有限公司 | 一种空间光调制器及显示装置 |
US10651010B2 (en) | 2018-01-09 | 2020-05-12 | Ims Nanofabrication Gmbh | Non-linear dose- and blur-dependent edge placement correction |
US10840054B2 (en) | 2018-01-30 | 2020-11-17 | Ims Nanofabrication Gmbh | Charged-particle source and method for cleaning a charged-particle source using back-sputtering |
JP7260959B2 (ja) * | 2018-03-16 | 2023-04-19 | キヤノン株式会社 | リソグラフィ装置、照明装置及び物品の製造方法 |
US10983444B2 (en) * | 2018-04-26 | 2021-04-20 | Applied Materials, Inc. | Systems and methods of using solid state emitter arrays |
US10761430B2 (en) | 2018-09-13 | 2020-09-01 | Applied Materials, Inc. | Method to enhance the resolution of maskless lithography while maintaining a high image contrast |
JP7283893B2 (ja) * | 2018-12-03 | 2023-05-30 | 株式会社エスケーエレクトロニクス | フォトマスクの製造方法 |
US11679555B2 (en) | 2019-02-21 | 2023-06-20 | Sprintray, Inc. | Reservoir with substrate assembly for reducing separation forces in three-dimensional printing |
US11099482B2 (en) | 2019-05-03 | 2021-08-24 | Ims Nanofabrication Gmbh | Adapting the duration of exposure slots in multi-beam writers |
DE102019115554A1 (de) * | 2019-06-07 | 2020-12-10 | Bystronic Laser Ag | Bearbeitungsvorrichtung zur Laserbearbeitung eines Werkstücks und Verfahren zur Laserbearbeitung eines Werkstücks |
CN110456609B (zh) * | 2019-08-09 | 2021-04-09 | 中国科学院光电技术研究所 | 一种适用于无掩模数字光刻的邻近效应校正方法 |
CN113050381B (zh) * | 2019-12-27 | 2022-04-26 | 上海微电子装备(集团)股份有限公司 | 一种拼接物镜的剂量控制装置、方法和曝光设备 |
KR20210132599A (ko) | 2020-04-24 | 2021-11-04 | 아이엠에스 나노패브릭케이션 게엠베하 | 대전 입자 소스 |
PL4048472T3 (pl) | 2020-08-14 | 2024-08-19 | Ceramic Data Solutions GmbH | Sposób i urządzenie do szybkiego rejestrowania danych na warstwie lub w warstwie (10) pierwszego materiału za pomocą lasera, galwanometru i mikrozwierciadła cyfrowego |
SE545314C2 (en) * | 2021-03-30 | 2023-06-27 | Sense Range Ab | Method and apparatus for laser beam mudulation and beam steering |
DE102021108339B4 (de) | 2021-04-01 | 2023-12-07 | Hochschule Anhalt, Körperschaft des öffentlichen Rechts | Lichtfeld-Display, Verfahren, Computerprogramm und Vorrichtung zum Kalibrieren eines solchen Lichtfeld-Displays |
EP4095882A1 (en) | 2021-05-25 | 2022-11-30 | IMS Nanofabrication GmbH | Pattern data processing for programmable direct-write apparatus |
CN113210873B (zh) * | 2021-06-03 | 2022-04-05 | 北京理工大学 | 一种基于电子动态调控的金属纳米网的制备方法 |
DE102023101782B3 (de) | 2023-01-25 | 2024-06-13 | Leica Microsystems Cms Gmbh | Vorrichtung und Verfahren zum Erzeugen eines zusammengesetzten Bildes einer Probe |
Family Cites Families (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2030468A5 (ru) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
US3896338A (en) * | 1973-11-01 | 1975-07-22 | Westinghouse Electric Corp | Color video display system comprising electrostatically deflectable light valves |
US4317611A (en) * | 1980-05-19 | 1982-03-02 | International Business Machines Corporation | Optical ray deflection apparatus |
US4467211A (en) * | 1981-04-16 | 1984-08-21 | Control Data Corporation | Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system |
US4430571A (en) * | 1981-04-16 | 1984-02-07 | Control Data Corporation | Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system |
US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
US4566935A (en) | 1984-07-31 | 1986-01-28 | Texas Instruments Incorporated | Spatial light modulator and method |
US5061049A (en) * | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
US4596992A (en) * | 1984-08-31 | 1986-06-24 | Texas Instruments Incorporated | Linear spatial light modulator and printer |
US4675702A (en) | 1986-03-14 | 1987-06-23 | Gerber Scientific Inc. | Photoplotter using a light valve device and process for exposing graphics |
JPS6370423A (ja) * | 1986-09-11 | 1988-03-30 | Toshiba Corp | パタ−ン形成方法 |
JPH01154519A (ja) * | 1987-12-11 | 1989-06-16 | Hitachi Ltd | 半導体装置の製造方法 |
US5523193A (en) * | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
US6348907B1 (en) * | 1989-08-22 | 2002-02-19 | Lawson A. Wood | Display apparatus with digital micromirror device |
JP2938568B2 (ja) * | 1990-05-02 | 1999-08-23 | フラウンホファー・ゲゼルシャフト・ツール・フォルデルング・デル・アンゲバンテン・フォルシュング・アインゲトラーゲネル・フェライン | 照明装置 |
US5073010A (en) * | 1990-05-11 | 1991-12-17 | University Of Colorado Foundation, Inc. | Optically addressable spatial light modulator having a distorted helix ferroelectric liquid crystal member |
JPH0423314A (ja) * | 1990-05-15 | 1992-01-27 | Kawasaki Steel Corp | 露光装置 |
DE4022732A1 (de) | 1990-07-17 | 1992-02-20 | Micronic Laser Systems Ab | Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung |
JP2902506B2 (ja) * | 1990-08-24 | 1999-06-07 | キヤノン株式会社 | 半導体装置の製造方法及び半導体装置 |
US5148157A (en) | 1990-09-28 | 1992-09-15 | Texas Instruments Incorporated | Spatial light modulator with full complex light modulation capability |
JPH0536595A (ja) * | 1991-08-02 | 1993-02-12 | Fujitsu Ltd | 電子線露光方法 |
CA2075026A1 (en) * | 1991-08-08 | 1993-02-09 | William E. Nelson | Method and apparatus for patterning an imaging member |
WO1993009469A1 (de) | 1991-10-30 | 1993-05-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Belichtungsvorrichtung |
DE69226511T2 (de) * | 1992-03-05 | 1999-01-28 | Micronic Laser Systems Ab, Taeby | Verfahren und Vorrichtung zur Belichtung von Substraten |
US5312513A (en) * | 1992-04-03 | 1994-05-17 | Texas Instruments Incorporated | Methods of forming multiple phase light modulators |
EP0664033B1 (en) * | 1992-11-02 | 2002-02-06 | Etec Systems, Inc. | Rasterizer for a pattern generation apparatus |
JP3296448B2 (ja) * | 1993-03-15 | 2002-07-02 | 株式会社ニコン | 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法 |
JP3372086B2 (ja) * | 1993-08-06 | 2003-01-27 | 株式会社ニコン | 露光方法及び装置、並びにデバイスの製造方法 |
EP0657760A1 (en) | 1993-09-15 | 1995-06-14 | Texas Instruments Incorporated | Image simulation and projection system |
US5467146A (en) * | 1994-03-31 | 1995-11-14 | Texas Instruments Incorporated | Illumination control unit for display system with spatial light modulator |
US5497258A (en) * | 1994-05-27 | 1996-03-05 | The Regents Of The University Of Colorado | Spatial light modulator including a VLSI chip and using solder for horizontal and vertical component positioning |
US5539567A (en) * | 1994-06-16 | 1996-07-23 | Texas Instruments Incorporated | Photolithographic technique and illuminator using real-time addressable phase shift light shift |
US5504504A (en) | 1994-07-13 | 1996-04-02 | Texas Instruments Incorporated | Method of reducing the visual impact of defects present in a spatial light modulator display |
ATE349024T1 (de) * | 1994-08-04 | 2007-01-15 | Texas Instruments Inc | Anzeigevorrichtung |
US5614990A (en) | 1994-08-31 | 1997-03-25 | International Business Machines Corporation | Illumination tailoring system using photochromic filter |
JP3537192B2 (ja) * | 1994-09-14 | 2004-06-14 | テキサス インスツルメンツ インコーポレイテツド | 空間光変調器に基づく位相コントラスト画像投射装置 |
JP3335011B2 (ja) * | 1994-09-16 | 2002-10-15 | 富士通株式会社 | マスク及びこれを用いる荷電粒子ビーム露光方法 |
US5754217A (en) * | 1995-04-19 | 1998-05-19 | Texas Instruments Incorporated | Printing system and method using a staggered array spatial light modulator having masked mirror elements |
JPH08304924A (ja) * | 1995-05-10 | 1996-11-22 | Nikon Corp | プロジェクター装置 |
US5835256A (en) | 1995-06-19 | 1998-11-10 | Reflectivity, Inc. | Reflective spatial light modulator with encapsulated micro-mechanical elements |
US5661591A (en) * | 1995-09-29 | 1997-08-26 | Texas Instruments Incorporated | Optical switch having an analog beam for steering light |
JP3617558B2 (ja) * | 1995-11-17 | 2005-02-09 | 株式会社ニコン | 露光量制御方法、露光装置、及び素子製造方法 |
JPH09148221A (ja) * | 1995-11-21 | 1997-06-06 | Seiko Epson Corp | 露光方法及び露光装置及びそれに用いるレチクル |
JP3884098B2 (ja) * | 1996-03-22 | 2007-02-21 | 株式会社東芝 | 露光装置および露光方法 |
JPH1050604A (ja) * | 1996-04-04 | 1998-02-20 | Nikon Corp | 位置管理方法及び位置合わせ方法 |
JP3512945B2 (ja) * | 1996-04-26 | 2004-03-31 | 株式会社東芝 | パターン形成方法及びパターン形成装置 |
US5691541A (en) * | 1996-05-14 | 1997-11-25 | The Regents Of The University Of California | Maskless, reticle-free, lithography |
US5870176A (en) * | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
JPH1011813A (ja) * | 1996-06-26 | 1998-01-16 | Nec Corp | 露光方法及び露光装置 |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
WO1998004950A1 (en) * | 1996-07-25 | 1998-02-05 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
JPH10209019A (ja) * | 1997-01-27 | 1998-08-07 | Sony Corp | 露光パターン投影デバイス及び露光装置 |
US5847959A (en) * | 1997-01-28 | 1998-12-08 | Etec Systems, Inc. | Method and apparatus for run-time correction of proximity effects in pattern generation |
JPH113849A (ja) * | 1997-06-12 | 1999-01-06 | Sony Corp | 可変変形照明フィルタ及び半導体露光装置 |
US5790297A (en) * | 1997-06-26 | 1998-08-04 | Xerox Corporation | Optical row displacement for a fault tolerant projective display |
US5774254A (en) * | 1997-06-26 | 1998-06-30 | Xerox Corporation | Fault tolerant light modulator display system |
DE69835776T2 (de) | 1997-10-29 | 2007-08-30 | E. Calum Vancouver MacAulay | Gerät und Verfahren zur Mikroskopie unter Verwendung räumlich modulierten Lichtes |
SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6195196B1 (en) * | 1998-03-13 | 2001-02-27 | Fuji Photo Film Co., Ltd. | Array-type exposing device and flat type display incorporating light modulator and driving method thereof |
US6142641A (en) * | 1998-06-18 | 2000-11-07 | Ultratech Stepper, Inc. | Four-mirror extreme ultraviolet (EUV) lithography projection system |
US6489984B1 (en) | 1998-12-29 | 2002-12-03 | Kenneth C. Johnson | Pixel cross talk suppression in digital microprinters |
US6498685B1 (en) | 1999-01-11 | 2002-12-24 | Kenneth C. Johnson | Maskless, microlens EUV lithography system |
SE516914C2 (sv) | 1999-09-09 | 2002-03-19 | Micronic Laser Systems Ab | Metoder och rastrerare för högpresterande mönstergenerering |
SE517550C2 (sv) * | 2000-04-17 | 2002-06-18 | Micronic Laser Systems Ab | Mönstergenereringssystem användande en spatialljusmodulator |
US6425669B1 (en) * | 2000-05-24 | 2002-07-30 | Ball Semiconductor, Inc. | Maskless exposure system |
-
1998
- 1998-03-02 SE SE9800665A patent/SE9800665D0/xx unknown
-
1999
- 1999-03-02 DE DE69938895T patent/DE69938895D1/de not_active Expired - Lifetime
- 1999-03-02 WO PCT/SE1999/000291 patent/WO1999045435A1/en active Application Filing
- 1999-03-02 JP JP2000534917A patent/JP2002506232A/ja active Pending
- 1999-03-02 DE DE69943041T patent/DE69943041D1/de not_active Expired - Lifetime
- 1999-03-02 AT AT99908041T patent/ATE309557T1/de not_active IP Right Cessation
- 1999-03-02 EP EP05013286A patent/EP1600817B1/en not_active Expired - Lifetime
- 1999-03-02 AU AU32842/99A patent/AU3284299A/en not_active Abandoned
- 1999-03-02 KR KR10-2000-7009717A patent/KR100451026B1/ko not_active IP Right Cessation
- 1999-03-02 EP EP99908042A patent/EP1060440B1/en not_active Expired - Lifetime
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- 1999-03-02 CN CNA2004100353616A patent/CN1550902A/zh active Pending
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2007
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