SE0200547D0 - An image forming method and apparatus - Google Patents

An image forming method and apparatus

Info

Publication number
SE0200547D0
SE0200547D0 SE0200547A SE0200547A SE0200547D0 SE 0200547 D0 SE0200547 D0 SE 0200547D0 SE 0200547 A SE0200547 A SE 0200547A SE 0200547 A SE0200547 A SE 0200547A SE 0200547 D0 SE0200547 D0 SE 0200547D0
Authority
SE
Sweden
Prior art keywords
workpiece
radiation
image forming
sensitive material
forming method
Prior art date
Application number
SE0200547A
Other languages
English (en)
Inventor
Torbjoern Sandstroem
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0200547A priority Critical patent/SE0200547D0/sv
Publication of SE0200547D0 publication Critical patent/SE0200547D0/sv
Priority to US10/505,564 priority patent/US7215409B2/en
Priority to EP03705592.8A priority patent/EP1478979B1/en
Priority to EP10175836A priority patent/EP2290445A3/en
Priority to JP2003570186A priority patent/JP2005518659A/ja
Priority to AU2003206547A priority patent/AU2003206547A1/en
Priority to PCT/SE2003/000238 priority patent/WO2003071353A2/en
Priority to CN2007101025735A priority patent/CN101055431B/zh
Priority to CNB038044250A priority patent/CN100573330C/zh
Priority to US11/745,388 priority patent/US7446857B2/en
Priority to US12/264,808 priority patent/US8144307B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Mechanical Optical Scanning Systems (AREA)
SE0200547A 2002-02-25 2002-02-25 An image forming method and apparatus SE0200547D0 (sv)

Priority Applications (11)

Application Number Priority Date Filing Date Title
SE0200547A SE0200547D0 (sv) 2002-02-25 2002-02-25 An image forming method and apparatus
CNB038044250A CN100573330C (zh) 2002-02-25 2003-02-13 图像形成方法和装置
JP2003570186A JP2005518659A (ja) 2002-02-25 2003-02-13 画像形成方法及び装置
EP03705592.8A EP1478979B1 (en) 2002-02-25 2003-02-13 An image forming method and apparatus
EP10175836A EP2290445A3 (en) 2002-02-25 2003-02-13 An image forming method and apparatus
US10/505,564 US7215409B2 (en) 2002-02-25 2003-02-13 Image forming method and apparatus
AU2003206547A AU2003206547A1 (en) 2002-02-25 2003-02-13 An image forming method and apparatus
PCT/SE2003/000238 WO2003071353A2 (en) 2002-02-25 2003-02-13 An image forming method and apparatus
CN2007101025735A CN101055431B (zh) 2002-02-25 2003-02-13 图像形成方法和装置
US11/745,388 US7446857B2 (en) 2002-02-25 2007-05-07 Image forming method and apparatus
US12/264,808 US8144307B2 (en) 2002-02-25 2008-11-04 Image forming method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0200547A SE0200547D0 (sv) 2002-02-25 2002-02-25 An image forming method and apparatus

Publications (1)

Publication Number Publication Date
SE0200547D0 true SE0200547D0 (sv) 2002-02-25

Family

ID=20287067

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0200547A SE0200547D0 (sv) 2002-02-25 2002-02-25 An image forming method and apparatus

Country Status (7)

Country Link
US (3) US7215409B2 (sv)
EP (2) EP1478979B1 (sv)
JP (1) JP2005518659A (sv)
CN (2) CN100573330C (sv)
AU (1) AU2003206547A1 (sv)
SE (1) SE0200547D0 (sv)
WO (1) WO2003071353A2 (sv)

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US7697115B2 (en) * 2006-06-23 2010-04-13 Asml Holding N.V. Resonant scanning mirror
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JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
US8395752B2 (en) 2008-09-23 2013-03-12 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8670106B2 (en) * 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
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DE102008051204A1 (de) * 2008-10-14 2010-04-15 Tesa Scribos Gmbh Verfahren zur Herstellung von Mikrostrukturen in einem Speichermedium
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Also Published As

Publication number Publication date
EP1478979B1 (en) 2019-06-05
CN1639642A (zh) 2005-07-13
EP2290445A2 (en) 2011-03-02
US7215409B2 (en) 2007-05-08
US20070206264A1 (en) 2007-09-06
US20090066926A1 (en) 2009-03-12
WO2003071353A3 (en) 2003-12-11
AU2003206547A8 (en) 2003-09-09
US7446857B2 (en) 2008-11-04
US20050168851A1 (en) 2005-08-04
CN101055431B (zh) 2011-11-30
EP2290445A3 (en) 2012-06-06
JP2005518659A (ja) 2005-06-23
CN100573330C (zh) 2009-12-23
CN101055431A (zh) 2007-10-17
EP1478979A2 (en) 2004-11-24
US8144307B2 (en) 2012-03-27
AU2003206547A1 (en) 2003-09-09
WO2003071353A2 (en) 2003-08-28

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