JP4937705B2 - 多重露光装置 - Google Patents
多重露光装置 Download PDFInfo
- Publication number
- JP4937705B2 JP4937705B2 JP2006307378A JP2006307378A JP4937705B2 JP 4937705 B2 JP4937705 B2 JP 4937705B2 JP 2006307378 A JP2006307378 A JP 2006307378A JP 2006307378 A JP2006307378 A JP 2006307378A JP 4937705 B2 JP4937705 B2 JP 4937705B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- data
- state
- difference
- dmd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000007704 transition Effects 0.000 description 4
- 238000007562 laser obscuration time method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Description
10 制御部
11 露光データ生成部
13 メモリ
15 判別部
30 装置ヘッド部
31 デバイス制御部
33 DMD
Claims (3)
- 連続して複数行われる露光のために使用されるベクタデータであって多重露光装置に送られてくる描画データに基づいて、2次元ビットマップ形式のラスタデータを露光データとして生成する露光データ生成部を有し、作成される複数の露光データのうち、前後の露光データとの差異に基づいて差異データを作成する制御部と、
前記露光のために使用されるDMDと、前記制御部から送られてくる前記差異データに基づいて前記DMDを駆動するデバイス制御部とを有する露光ヘッド部とを備えることを特徴とする多重露光装置。 - 前記制御部は、前記露光データのうち、最初の露光に対応する第1露光データと、前記差異データを前記デバイス制御部に転送し、
前記デバイス制御部は、前記最初の露光においては、前記第1露光データに基づいて、前記DMDを駆動し、次の露光からは、前記差異データに基づいて前記DMDを駆動することを特徴とする請求項1に記載の多重露光装置。 - 前記差異データは、前記前後の露光データの排他的論理和に基づいて求められることを特徴とする請求項1に記載の多重露光装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006307378A JP4937705B2 (ja) | 2006-11-14 | 2006-11-14 | 多重露光装置 |
TW096140016A TWI417675B (zh) | 2006-11-14 | 2007-10-25 | Multiple exposure device |
KR1020070107506A KR101355425B1 (ko) | 2006-11-14 | 2007-10-25 | 다중 노광장치 |
CN2007101695440A CN101183221B (zh) | 2006-11-14 | 2007-11-09 | 多重曝光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006307378A JP4937705B2 (ja) | 2006-11-14 | 2006-11-14 | 多重露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008122730A JP2008122730A (ja) | 2008-05-29 |
JP4937705B2 true JP4937705B2 (ja) | 2012-05-23 |
Family
ID=39448539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006307378A Expired - Fee Related JP4937705B2 (ja) | 2006-11-14 | 2006-11-14 | 多重露光装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4937705B2 (ja) |
KR (1) | KR101355425B1 (ja) |
CN (1) | CN101183221B (ja) |
TW (1) | TWI417675B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013223043A (ja) * | 2012-04-13 | 2013-10-28 | Toshiba Corp | 受光装置および伝送システム |
KR102055889B1 (ko) * | 2012-10-24 | 2019-12-13 | 엘지디스플레이 주식회사 | 마스크리스 노광장치 및 노광방법 |
KR20240012560A (ko) * | 2021-07-05 | 2024-01-29 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 전자 디바이스의 제조 방법 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1172726A (ja) * | 1997-08-27 | 1999-03-16 | Fuji Photo Film Co Ltd | 画像走査記録装置 |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
EP1771749B1 (en) * | 2004-07-30 | 2011-08-24 | Panasonic Electric Works Co., Ltd. | Image processing device |
JP4532202B2 (ja) | 2004-08-11 | 2010-08-25 | 株式会社オーク製作所 | 描画装置 |
JP2006051724A (ja) * | 2004-08-13 | 2006-02-23 | Fuji Photo Film Co Ltd | 画像形成装置 |
US7145636B2 (en) * | 2004-12-28 | 2006-12-05 | Asml Netherlands Bv | System and method for determining maximum operational parameters used in maskless applications |
JP2006192607A (ja) * | 2005-01-11 | 2006-07-27 | Fuji Photo Film Co Ltd | フレームデータ作成方法および装置並びにフレームデータ作成プログラム、描画方法および装置 |
US8184333B2 (en) * | 2005-04-28 | 2012-05-22 | Fujifilm Corporation | Image recording processing circuit, image recording apparatus and image recording method using image recording processing circuit |
JP2006337576A (ja) * | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | 描画処理装置及び方法 |
JP2007094116A (ja) * | 2005-09-29 | 2007-04-12 | Fujifilm Corp | フレームデータ作成装置、方法及び描画装置 |
JP2007101687A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | 描画装置、描画方法、データ構造及び記録媒体、並びに、データ処理装置及び処理方法 |
-
2006
- 2006-11-14 JP JP2006307378A patent/JP4937705B2/ja not_active Expired - Fee Related
-
2007
- 2007-10-25 KR KR1020070107506A patent/KR101355425B1/ko active IP Right Grant
- 2007-10-25 TW TW096140016A patent/TWI417675B/zh not_active IP Right Cessation
- 2007-11-09 CN CN2007101695440A patent/CN101183221B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101183221A (zh) | 2008-05-21 |
KR101355425B1 (ko) | 2014-01-27 |
CN101183221B (zh) | 2011-06-15 |
TW200821775A (en) | 2008-05-16 |
JP2008122730A (ja) | 2008-05-29 |
KR20080043701A (ko) | 2008-05-19 |
TWI417675B (zh) | 2013-12-01 |
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