TW200821775A - Multiple exposure apparatus - Google Patents

Multiple exposure apparatus Download PDF

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Publication number
TW200821775A
TW200821775A TW096140016A TW96140016A TW200821775A TW 200821775 A TW200821775 A TW 200821775A TW 096140016 A TW096140016 A TW 096140016A TW 96140016 A TW96140016 A TW 96140016A TW 200821775 A TW200821775 A TW 200821775A
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TW
Taiwan
Prior art keywords
exposure
data
difference
state
dmd
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TW096140016A
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Chinese (zh)
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TWI417675B (en
Inventor
Takashi Okuyama
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Orc Mfg Co Ltd
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Publication of TW200821775A publication Critical patent/TW200821775A/en
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Publication of TWI417675B publication Critical patent/TWI417675B/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)

Abstract

To provide an apparatus which performs data transfer from a controller to an apparatus head section without increasing the size of a scale of the data transfer. The multiple exposure apparatus 1 is equipped with an exposure data creating section 11 which creates the differential data based on the difference between the front and the rear exposure data out of a plurality of the exposure data which is the raster data created based on the drawing data being the vector data used for the exposure performed continuously a plurality of times. The apparatus includes the apparatus head section 30 having a DMD 33 used for the purpose of exposure and a device controller 31 for driving the DMD based on the differential data.

Description

200821775 九、發明說明： 【發明所屬之技術領域】 本發明係有關於多重曝光裝置’特別是有關於進行$ 以將DMD(數位微型反射鏡元件，digital dev ice)等的二次元顯示元件驅動的曝光資料的轉 置。 【先前技術】 %知使用DMD專的一次元顯不元件的多重曝光穿：置 被提案（例如，專利文獻1)。 ' [專利文獻1]日本特開20 0 6-53325號公報 【發明内容】 [發明所欲解決之問題] 在使用專利文獻1的裝置等DMD等的-呤-如一 』一—人兀顯不元件200821775 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a multiple exposure apparatus that is particularly useful for driving a secondary element display element such as a DMD (digital dev ice) or the like. Transposition of exposure data. [Prior Art] % Multi-exposure wear using a DMD-dedicated primary meta-component is known (for example, Patent Document 1). [Patent Document 1] Japanese Unexamined Patent Application Publication No. Publication No. Publication No. JP-A------ element

的多重曝光裝置中，曝光資料係從驅動二一 人凡顯不70件用 的位圖（bitmap)型式的曝光資料被作成（被繪製資料處理 的控制部、被轉送至基於曝光資料驅動二 处 一夂凡顯示元件的 裝置頭部。 位圖型式的曝光資料係由於資料尺+ 、 丁大’有關從控制 部朝裝置頭部的轉送，係LVDS(低電壓差分訊號〜 V〇ltageDifferentialSignaling)等的高速轉送方式 數段使用《因此，資料轉送的電路規模擴大。 因此，本發明的目的係提供 從貝料轉迗的規模擴大 2258-9093-PF;Tungming 5 200821775 而進行從控制部朝裝置頭部的資料轉送的裝置。 [解決問題之技術手段] 有關本發明的多重曝光裝置係包括··控制部，在作為 基於作為在連續而被複數進行的曝光用中被使用的向量 (vector)資料的繪製資料而被作成的網格（ras_^r)資料的 複數的曝光資料中，基於前後曝光資料間的差異而作成差 異資料；以及曝光頭部，具有在曝光用中被使用的D〇、 以及基於差異資料驅動])MD的元件控制部。 較佳的是控制部係曝光資料中，將對應於最初的曝光 的第一曝光資料、和差異資料轉送至曝光頭部，元件控制 =係在最初的曝光中，基於第一曝光資料，驅動md，從 次一曝光起，基於差異資料驅動 又，較佳的是差異資料係基於前後的曝光資料的排他 性邏輯而被求出。 [發明的效果] ) #上述般’根據本發明，可提供不使資料轉送的規模 擴大而進行從控制部朝裝置頭部的資料轉送的裝置。 【實施方式】 以下利用圖示說明古關士 — 月有關本貫施例。本實施例中的多重 曝光裝置1係包括控制部 ^ | 、以及裝置頭部3〇(參考第1 圖）。控制部1 〇係基於 仕返績而被複數進行的曝光用中被 使用的繪製資料（向量資 一 枓、CAD資料），進行製作複數的 曝光資料（網格資料）的 «辰貝#處理。裝置頭部3 〇係具有 2258-9093-PF;Tungming 6 200821775 DMD 33以及驅動DMD 33的元件控制部31。 控制部1 0係具有曝光資料產生部11、記憶體1 3、以 及判別部15(參考第2圖）。曝光資料產生部11係基於綠 製資料依序製作第卜第N曝光資料D^Dn。N係為1以上的 整數。第1曝光資料Dl係為在繪製面上的最初曝光領域（第 1曝光領域f 1)曝光用而被製作的曝光資料，第η曝光資料 Dn係為從繪製面上的第1曝光領域fi在以（11_1)>(每次的移 動量在X方向或y方向被移動的曝光領域（第η曝光領域 f η)曝光用而被製作的曝光資料。η係為2以上Ν以下的整 數。每次的移動量係包含DMD 33的裝置頭部3〇對於搭載 繪製面的繪製桌（或繪製桌係對於DMD 33)相對的移動量， 在一次的移動’使其被移動在繪製面上的鄰接的曝光領域。 記憶體13係將被製作的曝光資料的一個暫時紀錄。具 體而言，第（n-1)曝光資料係在記憶體13被暫時紀錄 的狀態下，在將第n曝光資料Dn在記憶體13暫時紀錄時， 第（n_l)曝光資料DnM係被消去。 第1曝光資料Di係被轉送至裝置頭部3〇。第2〜第N 曝光資料D2〜Dn係不被轉送。 判別部15係將在記憶體丨3被暫時紀錄的第（η—ι )曝光 資料Dh、和在曝光資料產生部u新的被製作的第n曝光 資料Dn間的差異（求出排他性邏輯 di s junct ion])比較，製作第n差異資料l。 第3圖係為表示基於第η曝光資料Dn的第n晝像IMn。 第4圖係為表示基於第（n—d·光資料Dni的第（n — 丨）晝像 2258-9093-PF;Tungniing 7 200821775 IMh。以塗黑的四方形表示的領域係為將被曝光的領域， 以虛線的四方形表示的領域係為不將被曝光的領域。 第5圖係為表示基於作為第n晝像IMn和第（η”）晝像 IMh的差異的第n差異資料In的第n差異晝像隐的圖 示。第η畫像ΙΜη係和第（η-1)晝像ΙΜη^相比，表示只在左 側劃斜線的四方形（x2個）表示的領域作為開啟狀態=微型 反射鏡被增加，只在右側劃橫線的四方形（χ4個）表示的領 域作為關閉狀態的微型反射鏡被增加的狀態。In the multiple exposure apparatus, the exposure data is created from a bitmap type of exposure data for driving the twenty-one person to display the data (the control unit for the data processing is transferred to the exposure based on the exposure data) The head of the display unit of the display unit. The exposure data of the bitmap type is LVDS (low voltage differential signal ~ V〇ltageDifferentialSignaling) due to the transfer of the data meter + and Ding's from the control unit to the device head. The high-speed transfer method uses several segments. Therefore, the circuit scale of the data transfer is expanded. Therefore, the object of the present invention is to provide a scale expansion from the bedding material 2258-9093-PF; Tungming 5 200821775 and proceed from the control unit toward the device head. [Means for Solving the Problem] [Technical means for solving the problem] The multi-exposure device according to the present invention includes a control unit, which is based on vector data used as an exposure for a plurality of consecutive exposures. In the exposure data of the complex (ras_^r) data of the data drawn, the difference is made based on the difference between the front and back exposure data. Material; and an exposure head having D〇 be used in the exposure, and based on the difference data drive]) in the MD element control portion. Preferably, in the control unit exposure data, the first exposure data corresponding to the initial exposure and the difference data are forwarded to the exposure head, and the component control= is in the initial exposure, and drives the md based on the first exposure data. From the next exposure, based on the difference data drive, it is preferable that the difference data is obtained based on the exclusive logic of the exposure data before and after. [Effects of the Invention] In the above, according to the present invention, it is possible to provide a device for transferring data from the control unit to the head of the device without enlarging the scale of data transfer. [Embodiment] The following is an illustration of the official application of the Guguanshi-Month. The multiple exposure apparatus 1 in this embodiment includes a control unit ^ | and a device head 3 (refer to Fig. 1). The control unit 1 is based on the drawing data (vector data, CAD data) used for the exposure based on the resignation, and is used to create a plurality of exposure data (grid data). The device head 3 has a 2258-9093-PF, a Tungming 6 200821775 DMD 33, and an element control unit 31 that drives the DMD 33. The control unit 10 includes an exposure data generating unit 11, a memory 13 and a determining unit 15 (refer to Fig. 2). The exposure data generating unit 11 sequentially creates the second N exposure data D^Dn based on the green data. The N system is an integer of 1 or more. The first exposure data D1 is exposure data prepared for exposure in the first exposure field (first exposure field f 1) on the drawing surface, and the nth exposure data Dn is the first exposure field fi from the drawing surface. (11_1)> (Exposure data prepared for exposure in an exposure field (n-th exposure field f η) in which the movement amount is moved in the X direction or the y direction. The η is an integer of 2 or more Ν or less. The amount of movement per time is the amount of movement of the device head 3 containing the DMD 33 for the drawing table on which the drawing surface is mounted (or the drawing table for the DMD 33), and the movement in one time is made to be moved on the drawing surface. Adjacent exposure area Memory 13 is a temporary record of the exposure data to be produced. Specifically, the (n-1) exposure data is in the state where the memory 13 is temporarily recorded, and the nth exposure data is When the Dn is temporarily recorded in the memory 13, the (n-1)th exposure data DnM is erased. The first exposure data Di is transferred to the device head 3〇. The 2nd to Nth exposure data D2 to Dn are not transferred. The discriminating unit 15 is the first (η-) that is temporarily recorded in the memory cassette 3 The exposure data Dh is compared with the difference between the exposure data generation unit u and the new nth exposure data Dn (to find the exclusive logic di s junct ion), and the nth difference data 1 is created. The nth image IMn based on the nth exposure data Dn is shown. Fig. 4 is a view showing the (n-th) image 2258-9093-PF based on the (n-d. optical data Dni; Tungniing 7 200821775 IMh. The area indicated by the black square is the area to be exposed, and the area indicated by the dotted square is the area that will not be exposed. The fifth figure is based on the representation as the nth image IMn and the ( η") The nth difference of the difference of the IMh difference, the nth difference is shown in the image. The ηth image ΙΜ η is compared with the (η-1) ΙΜ ^ ^ ^, indicating that the slash is only on the left side. The squares represented by the squares (x2) are opened as the state of the micromirror is increased, and only the area represented by the squares (χ4) of the right-handed line is added as the micromirror in the closed state.

V 記憶體13係將被製作的差異資料的一個暫時紀錄。具 體而言’第（η-1)差異資料ΙηΜ係在記憶體13被暫時紀錄 的狀態下，在將第η差異資料Ιη在記憶體丨3暫時紀錄時， 第（η-1)差異資料ιηΜ係被消去。 第2〜第Ν差異資料η〜ιΝ係被轉送至裝置頭部3〇。 疋件控制部31係基於第1曝光資料Di、第2〜第Ν差 異資料I2〜h驅動DMD 33，使DMD 33曝光曝光領域。元件 控制部31係具有記憶體（未圖示），紀錄基於第丨曝光資料 L、以及第2〜第N差異資料I2〜In將被產生的第2〜第N曝 光資料D2〜lb。 在最初的曝光（第1曝光）中，繪製面係被設定在第1 曝光領域f!將被曝光的狀態下，第1曝光領域^的曝光通 過基於第1曝光資料Dl被驅動的33而被進行。 在下一曝光（第2曝光）中，繪製面係被設定於只被移 動一次的移動量的第2曝光領域f2將被曝光的狀態下，第 2曝光領域h的曝光通過基於藉由第1曝光資料仏、以及 2258-9093-pp.Tungming 200821775 第2差異資料h產生的第2曝光資料爪而被驅動的MD 33 而被進行。具體而言，在設置於元件控制部3 i的記憶體被 紀錄的第1曝光資料Dl，將第2差異資料h的内容加上（在 第1曝光資料D!中，使對應於第2差異資料h表示的晝素 的位置的曝光資料的位元反轉）的演算被進行，第2曝光資 料D2係被產生。第2曝光領域f2的曝光通過基於第2曝光 資料D2被驅動的DM]) 33而被進行。 基於第2差異資料12，在從第丨曝光的狀態朝第2曝 光的狀態移行時有需要使其變化（從開啟狀態到關閉狀 態、或從關閉狀態到開啟狀態）的MD 33的微型反射鏡係， 以和第1曝光狀態時不同的狀態下被驅動。在從第i曝光 的狀態朝第2曝光的狀態移行時不需使其變化的DMD 33的 微型反射鏡係’以和第i曝光狀態時相同的狀態下被驅動。 在下一次的曝光（第3曝光）中，繪製面係被設定於只 使其移動2x每次的移動量的第3曝光領域fs被曝光的狀態 下，第3曝光領域h的曝光通過基於藉由第丨曝光資料 以及第2、第3差異資料12、13產生的第3曝光資料^被 驅動的DMD 33而被進行。具體而言，在設置於元件控制部 31的記憶體被紀錄的第2曝光資料^，將第3差異資料^ 的内容加上（在第2曝光資料^中，使對應於第3差異資 料夕表示的晝素的位置的曝光資料的位元反轉)的演算： 進行，第3曝光資料匕係被產生。第3曝光領域匕的曝 通過基於第3曝光資料j)3被驅動的麵33而被進行。 基於第3差異資料l3，在從第2曝光的狀態朝第3曝 2258-9093-PF;Tungming 9 200821775 光的狀n 4亍時有需要使其變化（從開啟狀態到關閉狀 〜、或彳之關閉狀恶到開啟狀態）的的微型反射鏡係， 以和第2曝光狀態時不同的狀態下被驅動。在從第2曝光 的狀匕、朝第3曝光的狀態移行時不需使其變化的励33的 微里反射鏡係’以和第2曝光狀態時相同的狀態下被驅動。 在第η曝光中，繪製面係被設定於只使其移動八 每次的移動量的第n曝光領域匕被曝光的狀態下，第n曝 光領域fn的曝光通過基於藉由第1曝光資料、以及第2〜 第η差異資料I2〜ln被產生的第n曝光資料仏被驅動的MD 33而被進行。具體而言，在設置於元件控制部31的記憶 體被紀錄的第（n-1)曝光資料Dn i，將第n差異資料h的内 容加上（在第（n-1)曝光資料Dn i中，使對應於第η差異資 料In所表示的畫素的位置的曝光資料的位元反轉）的演算 被進行’第η曝光資料Dn係被產生。第η曝光領域f n的曝 光通過基於第n曝光資料Dn被驅動的DMD 33而被進行。 基於第η差異資料In，在從第（n-i)曝光的狀態朝第η 曝光的狀態移行時有需要使其變化（從開啟狀態到關閉狀 態、或從關閉狀態到開啟狀態）的DMD 33的微型反射鏡係， 以和第（η-1)曝光狀態時不同的狀態下被驅動。在從第（η— 1) 曝光的狀態朝第η曝光的狀態移行時不需使其變化的DMD 33的微型反射鏡係，以和第（η-1)曝光狀態時相同的狀態 下被驅動。 在本實施例的多重曝光中，因為一邊將繪製面沿移動 方向稍微一點點移動而重複曝光，藉由和前一個的曝光資 2258-9093-PF;Tungming 10 200821775 料所不同的部份只有一些些，曝光資料的大部份係不會變 化。因此，差異資料的情報量係舆曝光資料相比大幅減少。 DMD 33的顯示元件的數目係為1〇24χ768，幅（虹 頻率為lGkHz的情形，對應！畫面的曝光資料的轉送速度 (rate)係需要為 1〇24bitx768xl〇kHz£：：?8Gbps。為了 確保此 轉送速度，必需準備複數段LVDS等的高速轉送方式，但在 本貫施例中，與曝光資料相比，由於利用情報量少的差異 資料來驅動DMD 33，不用將資料轉送用的電路規模擴大。 【圖式簡單說明】 第1圖係為表示本實施例中的多重曝光裝置的立體 圖； 第2圖係為多重曝光裝置的構成圖； 第3圖係為表示基於第n曝光資料的第^晝像的圖示； 第4圖係為表示基於第（η_υ曝光資料的第（^丨）畫像 的圖示；以及 ； 第5圖係為表示基於作為第11畫像和第（η —υ晝像的差 異的第η差異資料的第η差異晝像的圖示。 【主要元件符號說明】 1〜多重曝光裝置； 10〜控制部； 1卜曝光資料產生部； 13〜記憶體； 15〜判別部； 30〜裝置頭部； 31〜元件控制部； 33〜DMD。 2258-9093-PF;Tungming 11V Memory 13 is a temporary record of the difference data that will be produced. Specifically, the (n-1) difference data ΙηΜ is in the state where the memory 13 is temporarily recorded, and when the ηth difference data Ιη is temporarily recorded in the memory 丨3, the (η-1) difference data ΜηΜ The system is eliminated. The 2nd to 3rd difference data η~ιΝ is transferred to the device head 3〇. The component control unit 31 drives the DMD 33 based on the first exposure data Di and the second to third difference data I2 to h to expose the DMD 33 to the exposure area. The element control unit 31 has a memory (not shown) for recording the second to Nth exposure data D2 to lb which are generated based on the second exposure data L and the second to Nth difference data I2 to In. In the first exposure (first exposure), the drawing surface is set in the first exposure area f! In the state where the exposure is to be performed, the exposure of the first exposure area is performed by the 33 driven based on the first exposure data D1. get on. In the next exposure (second exposure), the drawing surface is set in a state where the second exposure field f2 of the movement amount that is moved only once is exposed, and the exposure of the second exposure field h is based on the first exposure. The data 仏 and the MD 33 driven by the second exposure data generated by the second difference data h of 2258-9093-pp.Tungming 200821775 are performed. Specifically, the content of the second difference data h is added to the first exposure data D1 in which the memory of the component control unit 3 i is recorded (in the first exposure data D!, the second difference is made corresponding to the second difference) The calculation of the bit reversal of the exposure data of the position of the halogen element indicated by the data h is performed, and the second exposure data D2 is generated. The exposure of the second exposure area f2 is performed by DM]) 33 driven based on the second exposure data D2. Based on the second difference data 12, there is a micro-mirror of the MD 33 that needs to be changed (from the on state to the off state, or from the off state to the on state) when moving from the state of the second exposure to the state of the second exposure. It is driven in a state different from that in the first exposure state. The micromirror system of the DMD 33, which does not need to be changed when moving from the state of the ith exposure to the state of the second exposure, is driven in the same state as in the ith exposure state. In the next exposure (third exposure), the drawing surface is set to a state in which only the third exposure field fs of the movement amount per movement 2x is exposed, and the exposure of the third exposure field h is based on The third exposure data and the third exposure data generated by the second and third difference data 12, 13 are driven by the DMD 33 that is driven. Specifically, the content of the third difference data ^ is added to the second exposure data set in the memory of the component control unit 31 (in the second exposure data ^, corresponding to the third difference data The calculation of the bit reversal of the exposure data of the position of the pixel is shown: The third exposure data is generated. Exposure in the third exposure field is performed by the surface 33 driven based on the third exposure data j)3. Based on the third difference data l3, it is necessary to change the state from the second exposure state to the third exposure 2258-9093-PF; Tungming 9 200821775 light n 4 ( (from the on state to the off state ~, or 彳The micromirror system that is turned off in an open state is driven in a state different from that in the second exposure state. The micro-mirror system ' of the excitation 33 that does not need to be changed from the state of the second exposure to the state of the third exposure is driven in the same state as in the second exposure state. In the nth exposure, the drawing surface is set in a state in which the nth exposure field 只 which is only moved by eight times, and the exposure of the nth exposure field fn is based on the first exposure data, And the second to nth difference data I2 to ln are generated by the nth exposure data 仏 driven MD 33. Specifically, the content of the nth difference data h is added to the (n-1)th exposure data Dn i in which the memory of the component control unit 31 is recorded (at the (n-1)th exposure data Dn i The calculation of the "inversion of the bit of the exposure data corresponding to the position of the pixel indicated by the nth difference data In" is performed as the 'n exposure data Dn'. The exposure of the nth exposure field f n is performed by the DMD 33 driven based on the nth exposure data Dn. Based on the ηth difference data In, there is a need to change the state of the DMD 33 from the (ni) exposure state to the nth exposure state (from the on state to the off state, or from the off state to the on state) The mirror system is driven in a state different from that in the (n-1)th exposure state. The micromirror system of the DMD 33 that does not need to be changed when moving from the state of the (n-1) exposure to the state of the nth exposure is driven in the same state as in the (n-1)th exposure state. . In the multiple exposure of this embodiment, since the exposure is repeated while moving the drawing surface slightly by a little bit in the moving direction, only the difference from the previous exposure 2258-9093-PF; Tungming 10 200821775 is only some Most of the exposure data will not change. Therefore, the amount of information in the differential data is significantly reduced compared to the exposure data. The number of display elements of the DMD 33 is 1〇24χ768, and the amplitude (the frequency of the rainbow frequency is 1GkHz, the transfer rate of the exposure data corresponding to the screen needs to be 1〇24bitx768xl〇kHz£::?8Gbps. To ensure In this transfer rate, it is necessary to prepare a high-speed transfer method such as a plurality of LVDS. However, in the present embodiment, since the DMD 33 is driven by the difference data with less intelligence than the exposure data, the circuit scale for data transfer is not required. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a multiple exposure apparatus in the present embodiment; Fig. 2 is a configuration diagram of a multiple exposure apparatus; and Fig. 3 is a diagram showing the basis of the nth exposure data. Fig. 4 is a diagram showing an image based on the (n_υ exposure data); and Fig. 5 is a representation based on the 11th image and the (n-υ昼) Graphical representation of the ηth difference image of the difference η difference data. [Main component symbol description] 1~ multiple exposure device; 10~ control unit; 1 exposure data generation unit; 13~memory; unit 30~ device head; 31~ element control portion;. 33~DMD 2258-9093-PF; Tungming 11

Claims (1)

200821775 十、申請專利範圍： 1· 一種多重曝光裝置，包括： 控制部，在作為基於作為在連續而被複數進行的曝光 用中被使用的向里身料的繪製資料而被作成的網格資料的 上述複數曝光資料中，基於前後曝光資料間的差異而作成 差異資料；以及 曝光頭部’具有在上述曝光用中被使用的DMD、以及 基於上述差異為料驅動上述的元件控制部。 2·如申請專利範圍第丨項所述之多重曝光裝置，其中 上述控制部係上述曝光資料中，將對應於最初的曝光的第 一曝光資料、和上述差異資料轉送至上述曝光頭部， 上述元件控制部係在上述最初的曝光中，基於上述第 一曝光資料，驅動上述DMD，從次一曝光起，基於上述差 異資料驅動上述DMD。 3 ·如申叫專利範圍第1項所述之多重曝光裝置，其中 上述差異資料係基於上述前後的曝光資料的排他性邏輯而 被求出。 2258-9093-PF；Tungming 12200821775 X. Patent application scope: 1. A multiple exposure apparatus comprising: a control unit, which is a grid material which is created based on drawing material of an inward body which is used as an exposure for a plurality of continuous exposures. In the plurality of exposure data, the difference data is created based on the difference between the front and rear exposure data; and the exposure head ' has the DMD used for the exposure, and the element control unit that drives the above based on the difference. 2. The multiple exposure apparatus according to claim 2, wherein the control unit transmits the first exposure data corresponding to the first exposure and the difference data to the exposure head in the exposure data, The element control unit drives the DMD based on the first exposure data during the first exposure, and drives the DMD based on the difference data from the next exposure. 3. The multiple exposure apparatus of claim 1, wherein the difference data is obtained based on an exclusive logic of the exposure data before and after. 2258-9093-PF; Tungming 12
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