JP2014057108A5 - - Google Patents

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Publication number
JP2014057108A5
JP2014057108A5 JP2013265102A JP2013265102A JP2014057108A5 JP 2014057108 A5 JP2014057108 A5 JP 2014057108A5 JP 2013265102 A JP2013265102 A JP 2013265102A JP 2013265102 A JP2013265102 A JP 2013265102A JP 2014057108 A5 JP2014057108 A5 JP 2014057108A5
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Japan
Prior art keywords
substrate
liquid
projection apparatus
lithographic projection
trench
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JP2013265102A
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Japanese (ja)
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JP2014057108A (ja
JP5655131B2 (ja
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Priority claimed from US10/921,348 external-priority patent/US7701550B2/en
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Publication of JP5655131B2 publication Critical patent/JP5655131B2/ja
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JP2013265102A 2004-08-19 2013-12-24 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP5655131B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/921,348 2004-08-19
US10/921,348 US7701550B2 (en) 2004-08-19 2004-08-19 Lithographic apparatus and device manufacturing method

Related Parent Applications (1)

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JP2012061783A Division JP5676508B2 (ja) 2004-08-19 2012-03-19 リソグラフィ装置およびデバイス製造方法

Publications (3)

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JP2014057108A JP2014057108A (ja) 2014-03-27
JP2014057108A5 true JP2014057108A5 (enExample) 2014-10-09
JP5655131B2 JP5655131B2 (ja) 2015-01-14

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Family Applications (12)

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JP2005237216A Expired - Fee Related JP4456044B2 (ja) 2004-08-19 2005-08-18 リソグラフィ装置およびデバイス製造方法
JP2009007038A Expired - Lifetime JP4718619B2 (ja) 2004-08-19 2009-01-15 リソグラフィ装置およびデバイス製造方法
JP2010116393A Expired - Lifetime JP5023187B2 (ja) 2004-08-19 2010-05-20 リソグラフィ装置
JP2010116426A Expired - Fee Related JP5167307B2 (ja) 2004-08-19 2010-05-20 リソグラフィ投影装置
JP2011130651A Expired - Lifetime JP5023231B2 (ja) 2004-08-19 2011-06-10 リソグラフィ装置およびデバイス製造方法
JP2012061783A Expired - Fee Related JP5676508B2 (ja) 2004-08-19 2012-03-19 リソグラフィ装置およびデバイス製造方法
JP2013265102A Expired - Fee Related JP5655131B2 (ja) 2004-08-19 2013-12-24 リソグラフィ装置およびデバイス製造方法
JP2014216375A Expired - Lifetime JP5763255B2 (ja) 2004-08-19 2014-10-23 リソグラフィ装置およびデバイス製造方法
JP2015013672A Expired - Lifetime JP5952926B2 (ja) 2004-08-19 2015-01-27 リソグラフィ装置およびデバイス製造方法
JP2016097814A Expired - Fee Related JP6259489B2 (ja) 2004-08-19 2016-05-16 リソグラフィ装置およびデバイス製造方法
JP2017190006A Expired - Lifetime JP6518305B2 (ja) 2004-08-19 2017-09-29 リソグラフィ装置およびデバイス製造方法
JP2019031673A Pending JP2019074770A (ja) 2004-08-19 2019-02-25 リソグラフィ装置およびデバイス製造方法

Family Applications Before (6)

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JP2005237216A Expired - Fee Related JP4456044B2 (ja) 2004-08-19 2005-08-18 リソグラフィ装置およびデバイス製造方法
JP2009007038A Expired - Lifetime JP4718619B2 (ja) 2004-08-19 2009-01-15 リソグラフィ装置およびデバイス製造方法
JP2010116393A Expired - Lifetime JP5023187B2 (ja) 2004-08-19 2010-05-20 リソグラフィ装置
JP2010116426A Expired - Fee Related JP5167307B2 (ja) 2004-08-19 2010-05-20 リソグラフィ投影装置
JP2011130651A Expired - Lifetime JP5023231B2 (ja) 2004-08-19 2011-06-10 リソグラフィ装置およびデバイス製造方法
JP2012061783A Expired - Fee Related JP5676508B2 (ja) 2004-08-19 2012-03-19 リソグラフィ装置およびデバイス製造方法

Family Applications After (5)

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JP2014216375A Expired - Lifetime JP5763255B2 (ja) 2004-08-19 2014-10-23 リソグラフィ装置およびデバイス製造方法
JP2015013672A Expired - Lifetime JP5952926B2 (ja) 2004-08-19 2015-01-27 リソグラフィ装置およびデバイス製造方法
JP2016097814A Expired - Fee Related JP6259489B2 (ja) 2004-08-19 2016-05-16 リソグラフィ装置およびデバイス製造方法
JP2017190006A Expired - Lifetime JP6518305B2 (ja) 2004-08-19 2017-09-29 リソグラフィ装置およびデバイス製造方法
JP2019031673A Pending JP2019074770A (ja) 2004-08-19 2019-02-25 リソグラフィ装置およびデバイス製造方法

Country Status (8)

Country Link
US (13) US7701550B2 (enExample)
EP (4) EP1628163B1 (enExample)
JP (12) JP4456044B2 (enExample)
KR (3) KR100806823B1 (enExample)
CN (1) CN100526987C (enExample)
DE (1) DE602005020720D1 (enExample)
SG (3) SG173341A1 (enExample)
TW (1) TWI308674B (enExample)

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