HK1049521A1 - 石版印刷工藝中的高精度方位調整及縫隙控制階段 - Google Patents

石版印刷工藝中的高精度方位調整及縫隙控制階段

Info

Publication number
HK1049521A1
HK1049521A1 HK03101591.8A HK03101591A HK1049521A1 HK 1049521 A1 HK1049521 A1 HK 1049521A1 HK 03101591 A HK03101591 A HK 03101591A HK 1049521 A1 HK1049521 A1 HK 1049521A1
Authority
HK
Hong Kong
Prior art keywords
high precision
imprint lithography
gap control
lithography processes
control stages
Prior art date
Application number
HK03101591.8A
Other languages
English (en)
Inventor
Jin Choi Byung
V Sreenivasan Sidlgata
C Johnson Stephen
Original Assignee
Univ Texas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Texas filed Critical Univ Texas
Publication of HK1049521A1 publication Critical patent/HK1049521A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
HK03101591.8A 1999-10-29 2003-03-04 石版印刷工藝中的高精度方位調整及縫隙控制階段 HK1049521A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16239299P 1999-10-29 1999-10-29
US09/698,317 US6873087B1 (en) 1999-10-29 2000-10-27 High precision orientation alignment and gap control stages for imprint lithography processes
PCT/US2000/030041 WO2001033300A2 (en) 1999-10-29 2000-10-30 High precision orientation alignment and gap control stages for imprint lithography processes

Publications (1)

Publication Number Publication Date
HK1049521A1 true HK1049521A1 (zh) 2003-05-16

Family

ID=26858716

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03101591.8A HK1049521A1 (zh) 1999-10-29 2003-03-04 石版印刷工藝中的高精度方位調整及縫隙控制階段

Country Status (6)

Country Link
US (8) US6873087B1 (zh)
EP (3) EP2315077A1 (zh)
JP (3) JP2003517727A (zh)
AU (1) AU1448801A (zh)
HK (1) HK1049521A1 (zh)
WO (1) WO2001033300A2 (zh)

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* Cited by examiner, † Cited by third party
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US7374415B2 (en) 2008-05-20
US6922906B2 (en) 2005-08-02
EP1240550A2 (en) 2002-09-18
US6873087B1 (en) 2005-03-29
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US20040168588A1 (en) 2004-09-02
US6955868B2 (en) 2005-10-18
US7060402B2 (en) 2006-06-13
US20040251775A1 (en) 2004-12-16
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US20040169441A1 (en) 2004-09-02
AU1448801A (en) 2001-05-14
US7098572B2 (en) 2006-08-29
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JP2011003910A (ja) 2011-01-06
WO2001033300A2 (en) 2001-05-10
US20040104641A1 (en) 2004-06-03
US20040149687A1 (en) 2004-08-05
US20050264132A1 (en) 2005-12-01
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WO2001033300A3 (en) 2002-01-24

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