JP4500183B2 - 転写装置 - Google Patents
転写装置 Download PDFInfo
- Publication number
- JP4500183B2 JP4500183B2 JP2005051757A JP2005051757A JP4500183B2 JP 4500183 B2 JP4500183 B2 JP 4500183B2 JP 2005051757 A JP2005051757 A JP 2005051757A JP 2005051757 A JP2005051757 A JP 2005051757A JP 4500183 B2 JP4500183 B2 JP 4500183B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- fine adjustment
- support plate
- transfer
- molded product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B30—PRESSES
- B30B—PRESSES IN GENERAL
- B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
- B30B15/007—Means for maintaining the press table, the press platen or the press ram against tilting or deflection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B30—PRESSES
- B30B—PRESSES IN GENERAL
- B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
- B30B15/06—Platens or press rams
- B30B15/068—Drive connections, e.g. pivotal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/0004—Machines or apparatus for embossing decorations or marks, e.g. embossing coins characterised by the movement of the embossing tool(s), or the movement of the work, during the embossing operation
- B44B5/0019—Rectilinearly moving embossing tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/0061—Machines or apparatus for embossing decorations or marks, e.g. embossing coins characterised by the power drive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/02—Dies; Accessories
- B44B5/022—Devices for holding or supporting work
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Description
Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology 25(2001)192−199
原点Oを中心とした平面は、一般に次の式で表される。
上の各点P1,P2,P3がこの平面上にあることから、
−aR+cΔ1=0 (2)
aR/2+b√3/2×R+cΔ2=0 (3)
aR/2−b√3/2×R+cΔ3=0 (4)
(2)からaR=cΔ1を(3)、(4)へ代入すると、
cΔ1/2+b√3/2×R+cΔ2=0 (5)
cΔ1/2−b√3/2×R+cΔ3=0 (6)
(5)+(6)より
c(Δ1+Δ2+Δ3)=0 (7)
これからΔ1、Δ2、Δ3は次の条件を満たさなければならない。
11 可動テーブル
13 被成形品
15 支持台
17 加熱手段
19 可動体
25 ボールネジ機構
33 サーボモータ
39 制御装置
41 型
43 型支持プレート
45 球面軸受
47A,47B,47C 微調整用アクチュエータ
49A,49B,49C 距離測定装置
51 光源
Claims (3)
- 被成形品の表面に凹凸のパターンを転写するための転写装置であって、前記被成形品を支持した支持台に対して接近離反する方向へ相対的に移動可能な可動体と、この可動体に球面軸受を揺動中心として中央部を揺動可能に支持された型支持プレートと、この型支持プレートに装着され、前記被成形品へ転写するための凹凸のパターンを形成した転写面を備えた型と、前記被成形品の表面に対する前記型の転写面の平行度を微調整するために前記可動体と前記型支持プレートとの間であって、前記型支持プレートの回転中心を中心とする同一円上に等間隔に備えられた少なくとも3個以上の微調整用アクチュエータとを備え、前記被成形品と前記型との間の距離を測定すべく前記各微調整用アクチュエータに対応する各距離測長装置が、前記各微調整用アクチュエータと前記型支持プレートの前記揺動中心を結ぶ直線に対して直交しかつ前記揺動中心を通る直線を間にして、対応する前記各微調整用アクチュエータの反対側に配置してあることを特徴とする転写装置。
- 請求項1に記載の転写装置において、前記支持台に、前記被成形品を加熱するための加熱手段を備えていることを特徴とする転写装置。
- 請求項1又は2に記載の転写装置において、前記型支持プレートに光源又は光源からの光を前記型へ導くための導光路を備えると共に、前記型を透明に構成してあることを特徴とする転写装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005051757A JP4500183B2 (ja) | 2005-02-25 | 2005-02-25 | 転写装置 |
TW095105132A TWI348181B (en) | 2005-02-25 | 2006-02-15 | Imprinting apparatus |
DE102006008464.0A DE102006008464B4 (de) | 2005-02-25 | 2006-02-23 | Eindruckeinrichtung |
US11/360,505 US7789653B2 (en) | 2005-02-25 | 2006-02-24 | Imprinting apparatus |
KR1020060018058A KR100683106B1 (ko) | 2005-02-25 | 2006-02-24 | 각인 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005051757A JP4500183B2 (ja) | 2005-02-25 | 2005-02-25 | 転写装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006237395A JP2006237395A (ja) | 2006-09-07 |
JP4500183B2 true JP4500183B2 (ja) | 2010-07-14 |
Family
ID=36794335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005051757A Expired - Fee Related JP4500183B2 (ja) | 2005-02-25 | 2005-02-25 | 転写装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7789653B2 (ja) |
JP (1) | JP4500183B2 (ja) |
KR (1) | KR100683106B1 (ja) |
DE (1) | DE102006008464B4 (ja) |
TW (1) | TWI348181B (ja) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4700996B2 (ja) * | 2005-04-19 | 2011-06-15 | 東芝機械株式会社 | 転写装置 |
US7648354B2 (en) * | 2005-04-28 | 2010-01-19 | Toshiba Kikai Kabushiki Kaisha | Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus |
JP4729338B2 (ja) * | 2005-05-10 | 2011-07-20 | 東芝機械株式会社 | 転写装置 |
JP4596981B2 (ja) * | 2005-05-24 | 2010-12-15 | 株式会社日立ハイテクノロジーズ | インプリント装置、及び微細構造転写方法 |
JP4701008B2 (ja) | 2005-05-25 | 2011-06-15 | 東芝機械株式会社 | ジンバル機構を備えた転写装置 |
US8025829B2 (en) * | 2006-11-28 | 2011-09-27 | Nanonex Corporation | Die imprint by double side force-balanced press for step-and-repeat imprint lithography |
KR100843342B1 (ko) | 2007-02-12 | 2008-07-03 | 삼성전자주식회사 | Uv 나노 임프린트 리소그래피 수행 공정 및 장치 |
GB2457269A (en) * | 2008-02-07 | 2009-08-12 | Jbs Process Enginerrng Ltd | A press for compressing tortilla |
WO2009129443A2 (en) * | 2008-04-17 | 2009-10-22 | Massachusetts Institute Of Technology | Diaphragm flexure with large range and high load capacity |
WO2009129441A2 (en) * | 2008-04-17 | 2009-10-22 | Massachusetts Institute Of Technology | Symmetric thermocentric flexure with minimal yaw error motion |
DE102009038108A1 (de) * | 2009-06-25 | 2010-12-30 | Bpe E.K. | Verfahren zum Aufbringen von mikro-und/oder nanogroßen Strukturen auf feste Körper |
FR2951106B1 (fr) * | 2009-10-08 | 2012-01-06 | S E T | Presse a tete articulee |
DE102010007970A1 (de) * | 2010-02-15 | 2011-08-18 | Suss MicroTec Lithography GmbH, 85748 | Verfahren und Vorrichtung zum aktiven Keilfehlerausgleich zwischen zwei im wesentlichen zueinander parallel positionierbaren Gegenständen |
KR101007050B1 (ko) * | 2010-04-30 | 2011-01-12 | 황진성 | 열 프레스 각인기 및 이를 이용한 각인방법 |
FR2965495B1 (fr) * | 2010-10-01 | 2013-08-02 | Commissariat Energie Atomique | Dispositif d'estampage et/ou de percage comprenant une tete support de substrat dont l'orientation est commandee en continu |
KR101110420B1 (ko) * | 2011-02-16 | 2012-02-24 | 한국기계연구원 | 기판 정렬 모듈 및 이를 구비하는 리소그래피 장치 |
JP2013230017A (ja) * | 2012-04-26 | 2013-11-07 | Seiko Epson Corp | 搬送装置、電子部品搬送装置および電子部品検査装置 |
WO2014052777A1 (en) * | 2012-09-27 | 2014-04-03 | North Carolina State University | Methods and systems for fast imprinting of nanometer scale features in a workpiece |
JP6116937B2 (ja) * | 2013-02-28 | 2017-04-19 | 公立大学法人大阪府立大学 | パターン形成装置およびそれを用いたパターン形成方法 |
JP6370539B2 (ja) * | 2013-09-13 | 2018-08-08 | 公立大学法人大阪府立大学 | パターン形成装置およびそれを用いたパターン形成方法 |
CN104712616B (zh) * | 2013-12-12 | 2017-04-12 | 上海旭恒精工机械制造有限公司 | 内循环高速液压系统、液压平台及液压平台组件 |
KR101567192B1 (ko) * | 2014-02-28 | 2015-11-06 | (주)케이딧 | 타각장치 |
JP2018069501A (ja) * | 2016-10-26 | 2018-05-10 | ローランドディー.ジー.株式会社 | 加飾装置及び加飾方法 |
CN106547175B (zh) * | 2017-01-22 | 2019-08-09 | 青岛天仁微纳科技有限责任公司 | 一种精密对准式纳米压印设备 |
KR102152070B1 (ko) * | 2017-07-04 | 2020-09-04 | 주식회사 리텍 | 변위 센서를 이용하여 기판의 표면을 평탄화하기 위한 장치 및 그 방법 |
TWI633644B (zh) * | 2017-08-17 | 2018-08-21 | 矽品精密工業股份有限公司 | 打印設備 |
CN108422537A (zh) * | 2018-05-15 | 2018-08-21 | 佛山市东鹏陶瓷有限公司 | 一种减少瓷砖裂纹的支撑装置、平板印花机及印花方法 |
US11911989B2 (en) | 2018-12-19 | 2024-02-27 | Promess, Inc. | Press frame assembly |
CN112046069B (zh) * | 2020-08-25 | 2022-05-17 | 东北电力大学 | 基于模态驱动的蛛网型热压机平台配平装置及其配平方法 |
CN113787276A (zh) * | 2021-09-30 | 2021-12-14 | 苏州艾科瑞思智能装备股份有限公司 | 一种自适应调整水平度的封装机焊头 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03101409U (ja) * | 1990-02-05 | 1991-10-23 | ||
JPH04146092A (ja) * | 1990-10-05 | 1992-05-20 | Toshiba Corp | 非接触ハンドリング装置およびその方法 |
JP2000329528A (ja) * | 1999-05-20 | 2000-11-30 | Mitsutoyo Corp | 構造体の制御方式 |
JP2003077867A (ja) * | 2001-09-04 | 2003-03-14 | National Institute Of Advanced Industrial & Technology | インプリントリソグラフィー用移動ステージ |
JP2004259985A (ja) * | 2003-02-26 | 2004-09-16 | Sony Corp | レジストパターン形成装置およびその形成方法、および、当該方法を用いた半導体装置の製造方法 |
Family Cites Families (11)
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US4879676A (en) | 1988-02-29 | 1989-11-07 | Mips Computer Systems, Inc. | Method and apparatus for precise floating point exceptions |
US6873087B1 (en) * | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
EP1840649B1 (en) * | 2000-10-12 | 2013-07-17 | Board of Regents, The University of Texas System | Device for holding an imprint lithography template |
US7117790B2 (en) * | 2002-01-11 | 2006-10-10 | Massachusetts Institute Of Technology | Microcontact printing |
AU2003261317A1 (en) * | 2002-08-01 | 2004-02-23 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
KR20040033482A (ko) * | 2002-10-14 | 2004-04-28 | 현대모비스 주식회사 | 차량의 비상등 자동점멸장치 |
US6871558B2 (en) * | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
TW568349U (en) * | 2003-05-02 | 2003-12-21 | Ind Tech Res Inst | Parallelism adjusting device for nano-transferring |
DE10343323A1 (de) * | 2003-09-11 | 2005-04-07 | Carl Zeiss Smt Ag | Stempellithografieverfahren sowie Vorrichtung und Stempel für die Stempellithografie |
US6977461B2 (en) * | 2003-12-15 | 2005-12-20 | Asml Netherlands B.V. | System and method for moving an object employing piezo actuators |
JP2005288672A (ja) * | 2004-04-06 | 2005-10-20 | Mitsubishi Heavy Ind Ltd | 微小構造体の製造方法及び製造装置 |
-
2005
- 2005-02-25 JP JP2005051757A patent/JP4500183B2/ja not_active Expired - Fee Related
-
2006
- 2006-02-15 TW TW095105132A patent/TWI348181B/zh active
- 2006-02-23 DE DE102006008464.0A patent/DE102006008464B4/de active Active
- 2006-02-24 US US11/360,505 patent/US7789653B2/en not_active Expired - Fee Related
- 2006-02-24 KR KR1020060018058A patent/KR100683106B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03101409U (ja) * | 1990-02-05 | 1991-10-23 | ||
JPH04146092A (ja) * | 1990-10-05 | 1992-05-20 | Toshiba Corp | 非接触ハンドリング装置およびその方法 |
JP2000329528A (ja) * | 1999-05-20 | 2000-11-30 | Mitsutoyo Corp | 構造体の制御方式 |
JP2003077867A (ja) * | 2001-09-04 | 2003-03-14 | National Institute Of Advanced Industrial & Technology | インプリントリソグラフィー用移動ステージ |
JP2004259985A (ja) * | 2003-02-26 | 2004-09-16 | Sony Corp | レジストパターン形成装置およびその形成方法、および、当該方法を用いた半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US7789653B2 (en) | 2010-09-07 |
TWI348181B (en) | 2011-09-01 |
DE102006008464A1 (de) | 2006-08-31 |
DE102006008464B4 (de) | 2015-01-08 |
US20060193938A1 (en) | 2006-08-31 |
KR100683106B1 (ko) | 2007-02-15 |
JP2006237395A (ja) | 2006-09-07 |
KR20060094908A (ko) | 2006-08-30 |
TW200727336A (en) | 2007-07-16 |
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