AU2003261317A1 - Scatterometry alignment for imprint lithography - Google Patents

Scatterometry alignment for imprint lithography

Info

Publication number
AU2003261317A1
AU2003261317A1 AU2003261317A AU2003261317A AU2003261317A1 AU 2003261317 A1 AU2003261317 A1 AU 2003261317A1 AU 2003261317 A AU2003261317 A AU 2003261317A AU 2003261317 A AU2003261317 A AU 2003261317A AU 2003261317 A1 AU2003261317 A1 AU 2003261317A1
Authority
AU
Australia
Prior art keywords
scatterometry
alignment
imprint lithography
imprint
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003261317A
Other versions
AU2003261317A8 (en
Inventor
Byung-Jin Choi
Ian Mcmackin
Norman E. Schumaker
Sidlgata V. Sreenivasan
Ronald D. Voisin
Michael P.C. Watts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
Original Assignee
Canon Nanotechnologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/210,785 priority Critical
Priority to US10/210,894 priority patent/US7070405B2/en
Priority to US10/210,780 priority
Priority to US10/210,894 priority
Priority to US10/210,780 priority patent/US6916584B2/en
Priority to US10/210,785 priority patent/US7027156B2/en
Application filed by Canon Nanotechnologies Inc filed Critical Canon Nanotechnologies Inc
Priority to PCT/US2003/023948 priority patent/WO2004013693A2/en
Publication of AU2003261317A8 publication Critical patent/AU2003261317A8/en
Publication of AU2003261317A1 publication Critical patent/AU2003261317A1/en
Application status is Abandoned legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
AU2003261317A 2002-08-01 2003-07-31 Scatterometry alignment for imprint lithography Abandoned AU2003261317A1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US10/210,894 US7070405B2 (en) 2002-08-01 2002-08-01 Alignment systems for imprint lithography
US10/210,780 2002-08-01
US10/210,894 2002-08-01
US10/210,780 US6916584B2 (en) 2002-08-01 2002-08-01 Alignment methods for imprint lithography
US10/210,785 US7027156B2 (en) 2002-08-01 2002-08-01 Scatterometry alignment for imprint lithography
US10/210,785 2002-08-01
PCT/US2003/023948 WO2004013693A2 (en) 2002-08-01 2003-07-31 Scatterometry alignment for imprint lithography

Publications (2)

Publication Number Publication Date
AU2003261317A8 AU2003261317A8 (en) 2004-02-23
AU2003261317A1 true AU2003261317A1 (en) 2004-02-23

Family

ID=31499238

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003261317A Abandoned AU2003261317A1 (en) 2002-08-01 2003-07-31 Scatterometry alignment for imprint lithography

Country Status (6)

Country Link
EP (1) EP1573395A4 (en)
JP (2) JP2006516065A (en)
KR (1) KR20050026088A (en)
AU (1) AU2003261317A1 (en)
TW (1) TWI266970B (en)
WO (1) WO2004013693A2 (en)

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Also Published As

Publication number Publication date
EP1573395A4 (en) 2010-09-29
EP1573395A2 (en) 2005-09-14
JP2006516065A (en) 2006-06-15
JP5421221B2 (en) 2014-02-19
TW200406651A (en) 2004-05-01
WO2004013693A3 (en) 2006-01-19
TWI266970B (en) 2006-11-21
AU2003261317A8 (en) 2004-02-23
KR20050026088A (en) 2005-03-14
JP2011101016A (en) 2011-05-19
WO2004013693A2 (en) 2004-02-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase