CN106547175B - 一种精密对准式纳米压印设备 - Google Patents
一种精密对准式纳米压印设备 Download PDFInfo
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- CN106547175B CN106547175B CN201710046646.7A CN201710046646A CN106547175B CN 106547175 B CN106547175 B CN 106547175B CN 201710046646 A CN201710046646 A CN 201710046646A CN 106547175 B CN106547175 B CN 106547175B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
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- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710046646.7A CN106547175B (zh) | 2017-01-22 | 2017-01-22 | 一种精密对准式纳米压印设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710046646.7A CN106547175B (zh) | 2017-01-22 | 2017-01-22 | 一种精密对准式纳米压印设备 |
Publications (2)
Publication Number | Publication Date |
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CN106547175A CN106547175A (zh) | 2017-03-29 |
CN106547175B true CN106547175B (zh) | 2019-08-09 |
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CN201710046646.7A Active CN106547175B (zh) | 2017-01-22 | 2017-01-22 | 一种精密对准式纳米压印设备 |
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CN (1) | CN106547175B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107561856A (zh) * | 2017-08-23 | 2018-01-09 | 无锡英普林纳米科技有限公司 | 一种智能加压纳米压印机 |
CN107340685A (zh) * | 2017-08-23 | 2017-11-10 | 无锡英普林纳米科技有限公司 | 一种红外探测智能纳米压印机 |
CN107346093A (zh) * | 2017-08-29 | 2017-11-14 | 无锡英普林纳米科技有限公司 | 一种纳米压印机卡位机构 |
CN107357132A (zh) * | 2017-08-29 | 2017-11-17 | 无锡英普林纳米科技有限公司 | 一种纳米压印机限位机构 |
CN107632496A (zh) * | 2017-08-31 | 2018-01-26 | 无锡英普林纳米科技有限公司 | 一种采用对位机构的纳米压印设备 |
EP3847548A4 (en) * | 2018-09-10 | 2022-06-01 | AVEVA Software, LLC | EDGE HMI MODULE SERVER SYSTEM AND PROCEDURES |
CN112046069B (zh) * | 2020-08-25 | 2022-05-17 | 东北电力大学 | 基于模态驱动的蛛网型热压机平台配平装置及其配平方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1997869A (zh) * | 2002-08-01 | 2007-07-11 | 分子制模股份有限公司 | 散射对齐法在平版压印中的应用 |
CN101446777A (zh) * | 2008-12-30 | 2009-06-03 | 中国科学院光电技术研究所 | 一种超分辨i线光刻装置 |
CN104570622A (zh) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | 一种光刻机的接近式间隙曝光工件台 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4500183B2 (ja) * | 2005-02-25 | 2010-07-14 | 東芝機械株式会社 | 転写装置 |
CN100340417C (zh) * | 2005-12-02 | 2007-10-03 | 华中科技大学 | 纳米压印机 |
KR100829398B1 (ko) * | 2007-05-17 | 2008-05-15 | 주식회사 에이디피엔지니어링 | 미세패턴 형성장치 및 이를 이용한 미세패턴 형성방법 |
CN101403855A (zh) * | 2008-11-07 | 2009-04-08 | 南京大学 | 紫外/热压固化型纳米压印方法与压印机 |
KR101155588B1 (ko) * | 2009-04-24 | 2012-06-19 | 주식회사 디엠에스 | 임프린트 장치 |
DE102010007970A1 (de) * | 2010-02-15 | 2011-08-18 | Suss MicroTec Lithography GmbH, 85748 | Verfahren und Vorrichtung zum aktiven Keilfehlerausgleich zwischen zwei im wesentlichen zueinander parallel positionierbaren Gegenständen |
CN102346369B (zh) * | 2011-09-08 | 2013-04-10 | 青岛理工大学 | 一种整片晶圆纳米压印光刻机 |
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2017
- 2017-01-22 CN CN201710046646.7A patent/CN106547175B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1997869A (zh) * | 2002-08-01 | 2007-07-11 | 分子制模股份有限公司 | 散射对齐法在平版压印中的应用 |
CN101446777A (zh) * | 2008-12-30 | 2009-06-03 | 中国科学院光电技术研究所 | 一种超分辨i线光刻装置 |
CN104570622A (zh) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | 一种光刻机的接近式间隙曝光工件台 |
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CN106547175A (zh) | 2017-03-29 |
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Legal Events
Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Ji Ran Inventor before: Zhang Xin |
|
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20190523 Address after: 266000 Room 407 and 408, Building 21A, Doctoral Pioneer Park, No. 89 Great Wall Road, Chengyang District, Qingdao City, Shandong Province Applicant after: GERMANLITHO CO., LTD. Address before: Room 506, 5th floor, Shitong Building, No. 2 Zhuyuan Road, Qingdao Hi-tech District, Shandong Province Applicant before: Qingdao Technology Co., Ltd. |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A precision alignment nano imprinting device Effective date of registration: 20210330 Granted publication date: 20190809 Pledgee: Bank of Qingdao Co. science and Technology Branch Pledgor: GERMANLITHO Co.,Ltd. Registration number: Y2021370010012 |