AU2001286245A1 - Exposure system, exposure method, and production method for device - Google Patents

Exposure system, exposure method, and production method for device

Info

Publication number
AU2001286245A1
AU2001286245A1 AU2001286245A AU8624501A AU2001286245A1 AU 2001286245 A1 AU2001286245 A1 AU 2001286245A1 AU 2001286245 A AU2001286245 A AU 2001286245A AU 8624501 A AU8624501 A AU 8624501A AU 2001286245 A1 AU2001286245 A1 AU 2001286245A1
Authority
AU
Australia
Prior art keywords
exposure
production method
exposure system
production
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001286245A
Inventor
Hiroyuki Nagasaka
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001286245A1 publication Critical patent/AU2001286245A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2001286245A 2000-09-19 2001-09-14 Exposure system, exposure method, and production method for device Abandoned AU2001286245A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-282980 2000-09-19
JP2000282980 2000-09-19
PCT/JP2001/007994 WO2002025710A1 (en) 2000-09-19 2001-09-14 Exposure system, exposure method, and production method for device

Publications (1)

Publication Number Publication Date
AU2001286245A1 true AU2001286245A1 (en) 2002-04-02

Family

ID=18767401

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001286245A Abandoned AU2001286245A1 (en) 2000-09-19 2001-09-14 Exposure system, exposure method, and production method for device

Country Status (6)

Country Link
US (1) US6798495B2 (en)
JP (1) JPWO2002025710A1 (en)
KR (1) KR20030097781A (en)
CN (1) CN1459124A (en)
AU (1) AU2001286245A1 (en)
WO (1) WO2002025710A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI311691B (en) * 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2006339448A (en) * 2005-06-02 2006-12-14 Canon Inc Exposure device with photodetection unit
TWI401538B (en) * 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
NL1036026A1 (en) * 2007-10-10 2009-04-15 Asml Netherlands Bv Apparatus and method for obtaining information indicative of the uniformity of a projection system or a lithographic apparatus.
NL2002968A1 (en) * 2008-06-30 2009-12-31 Asml Netherlands Bv Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured.
WO2011101528A1 (en) * 2010-02-22 2011-08-25 Vaisala Oyj A method for calibrating or testing a detector surface of a device for detecting hydrometeors and a calibration and testing device
US10514607B1 (en) 2018-08-28 2019-12-24 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source supply system for lithographic tools

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3358090B2 (en) * 1992-01-13 2002-12-16 株式会社ニコン Illumination apparatus, exposure apparatus having the illumination apparatus, and device manufacturing method using the exposure method
JP3448670B2 (en) 1993-09-02 2003-09-22 株式会社ニコン Exposure apparatus and element manufacturing method
JP3367167B2 (en) 1993-10-26 2003-01-14 株式会社ニコン Illumination optical device, discharge lamp used in the device, and exposure device
JPH09129550A (en) * 1995-08-30 1997-05-16 Canon Inc Light exposure and method for manufacturing device using the same
JPH10116766A (en) * 1996-10-11 1998-05-06 Canon Inc Aligner and fabrication of device
US6546037B2 (en) * 1999-02-10 2003-04-08 Lambda Physik Ag Molecular fluorine laser with spectral linewidth of less than 1 pm
JP3710321B2 (en) * 1999-04-01 2005-10-26 キヤノン株式会社 Exposure amount control method, exposure apparatus, and device manufacturing method
JP2001284227A (en) * 2000-03-31 2001-10-12 Canon Inc Exposure method, exposure system, and method of manufacturing device
US6570713B2 (en) 2001-02-27 2003-05-27 Silicon Valley Group, Inc. Method and apparatus for optimizing the output beam characteristics of a laser

Also Published As

Publication number Publication date
KR20030097781A (en) 2003-12-31
US20030156268A1 (en) 2003-08-21
CN1459124A (en) 2003-11-26
US6798495B2 (en) 2004-09-28
WO2002025710A1 (en) 2002-03-28
JPWO2002025710A1 (en) 2004-01-29

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