AU2002221133A1 - Exposure method and system, and device producing method - Google Patents

Exposure method and system, and device producing method

Info

Publication number
AU2002221133A1
AU2002221133A1 AU2002221133A AU2113302A AU2002221133A1 AU 2002221133 A1 AU2002221133 A1 AU 2002221133A1 AU 2002221133 A AU2002221133 A AU 2002221133A AU 2113302 A AU2113302 A AU 2113302A AU 2002221133 A1 AU2002221133 A1 AU 2002221133A1
Authority
AU
Australia
Prior art keywords
device producing
exposure
exposure method
producing method
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002221133A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002221133A1 publication Critical patent/AU2002221133A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2002221133A 2000-12-15 2001-12-13 Exposure method and system, and device producing method Abandoned AU2002221133A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000382708 2000-12-15
JP2000-382708 2000-12-15
PCT/JP2001/010937 WO2002049084A1 (en) 2000-12-15 2001-12-13 Exposure method and system, and device producing method

Publications (1)

Publication Number Publication Date
AU2002221133A1 true AU2002221133A1 (en) 2002-06-24

Family

ID=18850489

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002221133A Abandoned AU2002221133A1 (en) 2000-12-15 2001-12-13 Exposure method and system, and device producing method

Country Status (3)

Country Link
JP (1) JPWO2002049084A1 (en)
AU (1) AU2002221133A1 (en)
WO (1) WO2002049084A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5448724B2 (en) * 2009-10-29 2014-03-19 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP7386742B2 (en) * 2020-03-24 2023-11-27 株式会社Ｓｃｒｅｅｎホールディングス exposure equipment
CN112965342B (en) * 2021-02-05 2022-07-12 三河建华高科有限责任公司 Bottom nitrogen blowing vacuum copying exposure device close to contact photoetching machine

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3473649B2 (en) * 1995-04-07 2003-12-08 株式会社ニコン Projection exposure equipment
JPH1167651A (en) * 1997-08-25 1999-03-09 Nikon Corp Projection aligner
JPH11219902A (en) * 1997-11-27 1999-08-10 Nikon Corp Aligner and device manufacturing apparatus
JPH11295056A (en) * 1998-04-15 1999-10-29 Nikon Corp Position detecting method, positioning method, and exposing method
JP2000133588A (en) * 1998-08-18 2000-05-12 Nikon Corp Aligner, manufacture thereof and exposing method
JP2000133583A (en) * 1998-10-27 2000-05-12 Canon Inc Aligner and manufacture thereof

Also Published As

Publication number Publication date
JPWO2002049084A1 (en) 2004-04-15
WO2002049084A1 (en) 2002-06-20

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