AU2003284540A1 - Exposure system, exposure method, and device fabricating method - Google Patents

Exposure system, exposure method, and device fabricating method

Info

Publication number
AU2003284540A1
AU2003284540A1 AU2003284540A AU2003284540A AU2003284540A1 AU 2003284540 A1 AU2003284540 A1 AU 2003284540A1 AU 2003284540 A AU2003284540 A AU 2003284540A AU 2003284540 A AU2003284540 A AU 2003284540A AU 2003284540 A1 AU2003284540 A1 AU 2003284540A1
Authority
AU
Australia
Prior art keywords
exposure
device fabricating
exposure system
fabricating method
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003284540A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003284540A1 publication Critical patent/AU2003284540A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
AU2003284540A 2002-12-03 2003-12-02 Exposure system, exposure method, and device fabricating method Abandoned AU2003284540A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002351336 2002-12-03
JP2002-351336 2002-12-03
PCT/JP2003/015436 WO2004051716A1 (en) 2002-12-03 2003-12-02 Exposure system, exposure method, and device fabricating method

Publications (1)

Publication Number Publication Date
AU2003284540A1 true AU2003284540A1 (en) 2004-06-23

Family

ID=32463146

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003284540A Abandoned AU2003284540A1 (en) 2002-12-03 2003-12-02 Exposure system, exposure method, and device fabricating method

Country Status (3)

Country Link
AU (1) AU2003284540A1 (en)
TW (1) TW200423224A (en)
WO (1) WO2004051716A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7180669B2 (en) * 2004-12-17 2007-02-20 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Method and system for generating substantially uniform speckle patterns
SG143178A1 (en) * 2006-11-27 2008-06-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program product
US7903234B2 (en) 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
JP2022096141A (en) 2020-12-17 2022-06-29 キヤノン株式会社 Exposure method, exposure device and manufacturing method of article
EP4166524B1 (en) * 2021-10-14 2023-11-22 Ivoclar Vivadent AG Furnace for heating a dental object
EP4166523B1 (en) * 2021-10-14 2023-11-29 Ivoclar Vivadent AG Exposure unit for a dental object

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09232213A (en) * 1996-02-26 1997-09-05 Nikon Corp Projection aligner
JPH09298143A (en) * 1996-05-02 1997-11-18 Hitachi Ltd Exposure and device
EP0823662A2 (en) * 1996-08-07 1998-02-11 Nikon Corporation Projection exposure apparatus
AU4318100A (en) * 1999-05-07 2000-11-21 Nikon Corporation Method and apparatus for exposure
DE10000191B8 (en) * 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Project exposure system of microlithography
JP3490068B2 (en) * 2001-03-14 2004-01-26 株式会社半導体先端テクノロジーズ Photomask storage device, projection exposure apparatus and projection exposure method

Also Published As

Publication number Publication date
TW200423224A (en) 2004-11-01
WO2004051716A1 (en) 2004-06-17

Similar Documents

Publication Publication Date Title
AU2003236023A1 (en) Exposure method, exposure device, and device manufacturing method
AU2003289239A1 (en) Exposure system and device producing method
AU2003227194A1 (en) Exposure device, exposure method, and device manufacturing method
AU2003289271A1 (en) Exposure apparatus, exposure method and method for manufacturing device
AU2003302831A1 (en) Exposure method, exposure apparatus and method for manufacturing device
AU2003235124A1 (en) Exposure system and device manufacturing method
AU2003291770A1 (en) Imaging device, focusing method and program
AU2003268668A1 (en) Substrate-cutting system, substrate-producing apparatus, substrate-scribing method, and substrate-cutting method
AU2325900A (en) Exposure device, exposure method, and device manufacturing method
AU2003283762A1 (en) Object positioning system, object positioning apparatus and object positioning method
AU2002332279A1 (en) Communication method, communication device, and communication system
AU2003242085A1 (en) Communication method, communication system, and communication device
AU2003242147A1 (en) Communication method, communication system, and communication device
AU2003214603A1 (en) Auto-focusing method and device
AU2003291551A1 (en) Magnetoelectronics device and method for fabricating the same
AU2003213343A1 (en) Communication device, communication system, communication method, and program thereof
AU2003265176A1 (en) Exposure method, exposure mask, and exposure apparatus
AU2003303267A1 (en) Positioning system, apparatus and method
AU2003258929A1 (en) System, device and method for ventilation
AU2003221153A1 (en) Representation generation method, representation generation device, and representation generation system
AU2002325503A1 (en) Transmission system, and method thereof
AU2003220867A1 (en) Aligner and device manufacuring method
AU2003251373A1 (en) Locating system, device and method
AU2003221393A1 (en) Mask storage device, exposure device, and device manufacturing method
AU2003241737A1 (en) Position measurement method, exposure method, exposure device, and device manufacturing method

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase