AU4318100A - Method and apparatus for exposure - Google Patents
Method and apparatus for exposureInfo
- Publication number
- AU4318100A AU4318100A AU43181/00A AU4318100A AU4318100A AU 4318100 A AU4318100 A AU 4318100A AU 43181/00 A AU43181/00 A AU 43181/00A AU 4318100 A AU4318100 A AU 4318100A AU 4318100 A AU4318100 A AU 4318100A
- Authority
- AU
- Australia
- Prior art keywords
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12780299 | 1999-05-07 | ||
JP11/127802 | 1999-05-07 | ||
PCT/JP2000/002924 WO2000068980A1 (en) | 1999-05-07 | 2000-05-08 | Method and apparatus for exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
AU4318100A true AU4318100A (en) | 2000-11-21 |
Family
ID=14969048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU43181/00A Abandoned AU4318100A (en) | 1999-05-07 | 2000-05-08 | Method and apparatus for exposure |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU4318100A (en) |
WO (1) | WO2000068980A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111326414A (en) * | 2018-12-14 | 2020-06-23 | 东京毅力科创株式会社 | Substrate processing method |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2002075795A1 (en) * | 2001-03-19 | 2004-07-08 | 株式会社ニコン | Exposure method and apparatus, and device manufacturing method |
TW587197B (en) * | 2002-03-15 | 2004-05-11 | Nikon Corp | Mask safekeeping apparatus, exposure apparatus and manufacturing method of device |
WO2004051716A1 (en) * | 2002-12-03 | 2004-06-17 | Nikon Corporation | Exposure system, exposure method, and device fabricating method |
JP2005243771A (en) * | 2004-02-25 | 2005-09-08 | Nikon Corp | Aligner |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09232213A (en) * | 1996-02-26 | 1997-09-05 | Nikon Corp | Projection aligner |
JPH09266151A (en) * | 1996-03-28 | 1997-10-07 | Nikon Corp | Aligner and aligning method |
JP3823408B2 (en) * | 1997-01-10 | 2006-09-20 | 株式会社ニコン | Optical element manufacturing method and optical element cleaning method |
DE69817663T2 (en) * | 1997-04-23 | 2004-06-24 | Nikon Corp. | Optical exposure apparatus and optical cleaning process |
JP3635860B2 (en) * | 1997-05-14 | 2005-04-06 | 株式会社ニコン | Optical device |
JPH11219902A (en) * | 1997-11-27 | 1999-08-10 | Nikon Corp | Aligner and device manufacturing apparatus |
-
2000
- 2000-05-08 WO PCT/JP2000/002924 patent/WO2000068980A1/en active Application Filing
- 2000-05-08 AU AU43181/00A patent/AU4318100A/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111326414A (en) * | 2018-12-14 | 2020-06-23 | 东京毅力科创株式会社 | Substrate processing method |
Also Published As
Publication number | Publication date |
---|---|
WO2000068980A1 (en) | 2000-11-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |