JPH09232213A - Projection aligner - Google Patents
Projection alignerInfo
- Publication number
- JPH09232213A JPH09232213A JP8038017A JP3801796A JPH09232213A JP H09232213 A JPH09232213 A JP H09232213A JP 8038017 A JP8038017 A JP 8038017A JP 3801796 A JP3801796 A JP 3801796A JP H09232213 A JPH09232213 A JP H09232213A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- projection
- optical system
- optical
- temperature distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体デバイスや
液晶ディスプレイ等の製造に用いられる投影露光装置に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection exposure apparatus used for manufacturing semiconductor devices, liquid crystal displays and the like.
【0002】[0002]
【従来の技術】半導体素子、液晶ディスプレイ、薄膜磁
気ヘッド等を製造するフォトリソグラフ工程では、投影
露光装置を用いてフォトマスク又はレチクル(以下、レ
チクルという)に形成されたパターンをフォトレジスト
等の感光剤が塗布されたウエハやガラスプレート等の感
光基板上に投影露光することが行われる。このパターン
露光は、感光基板上にすでに形成されているパターンの
上に重ね合わせて露光することを複数回繰り返して行う
のが通常である。感光基板上に形成されたパターンの精
度は完成品であるデバイスの性能に直接影響を与えるた
め、投影露光装置の投影光学系は像の歪み(歪曲収差)
を極めて小さいものとすることが要求されている。その
ために、投影レンズの設計の際に原理的に生ずる歪曲収
差を極めて小さくするのはむろんのこと、製造の際に生
ずる光学素子の製造誤差や組立公差を小さくすることが
必要とされている。また、気圧や温度などの環境パラメ
ータの変化や、露光時に露光光を吸収することによる光
学素子の温度変化などによっても投影光学系の収差が変
動するために、これらの変動に対する補正も必要であ
る。2. Description of the Related Art In a photolithography process for manufacturing a semiconductor device, a liquid crystal display, a thin film magnetic head, etc., a pattern formed on a photomask or reticle (hereinafter referred to as a reticle) is exposed to a photoresist or the like using a projection exposure apparatus. Projection exposure is performed on a photosensitive substrate such as a wafer or a glass plate coated with the agent. In this pattern exposure, it is usual to carry out exposure by superposing it on a pattern already formed on the photosensitive substrate a plurality of times. Since the accuracy of the pattern formed on the photosensitive substrate directly affects the performance of the finished device, the projection optical system of the projection exposure apparatus has image distortion (distortion aberration).
Is required to be extremely small. For this reason, it is, of course, necessary to make the distortion aberration that is theoretically generated when designing the projection lens extremely small, and it is necessary to reduce the manufacturing error and the assembly tolerance of the optical element that are generated during manufacturing. Further, since the aberration of the projection optical system also changes due to changes in environmental parameters such as atmospheric pressure and temperature, and changes in temperature of the optical element due to absorption of exposure light during exposure, correction for these changes is also necessary. .
【0003】従来、投影露光装置の製造時に生ずる誤差
を抑えるためには次のようなことが行われてきた。一つ
は、使用する光学素子自体の誤差の低減である。例え
ば、屈折型の光学素子(いわゆる光学レンズ)を製作す
る際には、屈折率均一性の高い光学材料を使用し、かつ
極めて高い精度で加工を行うことにより光学設計上の理
想値に近いものを作り上げようという努力がなされてき
た。また、完成された光学部品が変形を生じさせること
なく正確な位置関係に保持されるようにマウントに工夫
を加えることにより、設計された性能の達成が図られて
きた。Heretofore, the following has been performed in order to suppress an error that occurs during the manufacture of a projection exposure apparatus. One is to reduce the error of the optical element itself used. For example, when manufacturing a refraction-type optical element (so-called optical lens), an optical material with a high refractive index uniformity is used, and processing is performed with extremely high precision, which is close to the ideal value in optical design. Efforts have been made to create a. In addition, the designed performance has been achieved by devising a mount so that the completed optical component is held in an accurate positional relationship without causing deformation.
【0004】しかしながら、投影露光装置の投影光学系
の製造においては、非常に高度の性能が要求されるた
め、個々の部品に対して要求される製造精度が現在の技
術で得られる加工精度の限界を越えてしまうことが起こ
る。そのため、上述のような方法だけでは必要な性能を
得ることができず、最終的に組上がった光学系の各部に
対して調整を繰り返すことで、試行錯誤的に投影光学系
全体として必要な性能を達成させるという手法を採って
いるのが実状である。However, in the production of the projection optical system of the projection exposure apparatus, since a very high level of performance is required, the manufacturing precision required for each component is the limit of the processing precision obtained by the present technology. It happens that it exceeds. Therefore, it is not possible to obtain the required performance only with the above method, and by repeating adjustments to each part of the finally assembled optical system, the required performance of the projection optical system as a whole is trial-and-error tested. The reality is that the method of achieving
【0005】また、使用環境などの変化によって生じる
収差の変動に対しては、投影光学系全体を環境制御シス
テム内に入れたり、投影光学系を温度制御ジャケットで
覆うことにより外部環境の変化から隔離して保護する方
法、もしくは投影光学系の一部分を密閉構造にしてその
部分の気圧を制御したり、一部の光学素子を動かす方法
によって環境変化による収差の変動を補償する構成を採
っていた。Further, with respect to fluctuations in aberration caused by changes in the operating environment, the entire projection optical system is placed in an environment control system, or the projection optical system is covered with a temperature control jacket to isolate it from changes in the external environment. In this case, the projection optical system is partly sealed to control the atmospheric pressure of the part, or a part of the optical element is moved to compensate the fluctuation of the aberration due to the environmental change.
【0006】[0006]
【発明が解決しようとする課題】上述した従来の投影露
光装置には、次のような問題がある。即ち、従来は製造
時に生じる誤差に対して最終的に組み立てられた投影光
学系について調整を行うことで補償を行っていたが、そ
の調整にも高い精度が必要とされ、また全ての性能につ
いて組み上げられた製品上で調整できるわけではない。The conventional projection exposure apparatus described above has the following problems. In other words, conventionally, compensation was made by adjusting the finally assembled projection optical system for the error that occurs during manufacturing, but high precision is also required for that adjustment, and all performance is assembled. Cannot be adjusted on the product provided.
【0007】投影光学系の歪曲収差(ディストーショ
ン)の補正の場合、回転対称成分の補正には投影光学系
を構成する光学素子間の距離を数カ所で調整することに
より大部分を修正できるし、いくつかの非回転対称な成
分についても光学素子を3次元的に動かすことにより修
正が可能である。しかしながら、製品の完成後に全ての
成分について修正することは精度やアクセス性などの面
から極めて困難であった。In the case of correcting the distortion aberration of the projection optical system, most of the correction can be made by adjusting the distance between the optical elements constituting the projection optical system at several points in order to correct the rotationally symmetric component. The non-rotationally symmetric component can be corrected by moving the optical element three-dimensionally. However, it was extremely difficult to correct all components after the product was completed in terms of accuracy and accessibility.
【0008】また、光学素子を形成する光学ガラス材が
屈折率分布を持っていた場合や保持部品が変形してしま
った場合など、光学系を構成する部品のレベルまで分解
して交換しないと修正が不可能なものも有り、これまで
投入部品量の予測や製造工期のスケジューリングを難し
くすると共に装置価格の増大をもたらしていた。温度な
ど装置が使用されている環境が変化した場合の調整や、
装置の経時変化などに対する調整においても同様の問題
があった。本発明はこれらの点に鑑みてなされたもの
で、投影露光装置に搭載する投影光学系に対し、柔軟性
を持ち比較的簡単な構成で歪曲収差の多様な成分を補正
し得る機構を提供することを目的とする。In addition, if the optical glass material forming the optical element has a refractive index distribution or the holding component is deformed, the components of the optical system must be disassembled to the level of the components to be replaced. However, it has been difficult to predict the amount of parts to be input and to schedule the manufacturing period, and at the same time, the equipment price has been increased. Adjustment when the environment where the device is used such as temperature changes,
There is a similar problem in the adjustment with respect to the change with time of the apparatus. The present invention has been made in view of these points, and provides a mechanism capable of correcting various components of distortion aberration with respect to a projection optical system mounted on a projection exposure apparatus with flexibility and a relatively simple configuration. The purpose is to
【0009】[0009]
【課題を解決するための手段】本発明においては、投影
光学系を構成する光学素子自体に意図的に温度分布を与
え、その光学素子を物理的に変形させることで歪曲収差
を補正することによって前記目的を達成する。According to the present invention, a temperature distribution is intentionally given to an optical element itself constituting a projection optical system, and the optical element is physically deformed to correct distortion. To achieve the above objectives.
【0010】すなわち、本発明は、レチクルを照明する
照明系(IU)と、感光基板(W)を保持する基板ステ
ージ(ST)と、レチクル(R)のパターン像を感光基
板上に形成する投影光学系(PL)とを含む投影露光装
置において、投影光学系(PL)を構成する光学素子
(L1〜L6)の温度を変化させる温度可変手段(H
1,H2,HP1〜HP8,SC)と、光学素子の温度
分布を計測する温度計測手段(S1〜S8,IR)と、
温度計測手段によって計測された温度分布に基づいて温
度可変手段を制御して光学素子に所定の温度分布を与え
ることにより投影光学系の収差を補正する温度分布制御
手段(TC)とを備えることを特徴とする。That is, according to the present invention, an illumination system (IU) for illuminating a reticle, a substrate stage (ST) for holding a photosensitive substrate (W), and a projection for forming a pattern image of the reticle (R) on the photosensitive substrate. In a projection exposure apparatus including an optical system (PL), temperature varying means (H) for changing the temperature of the optical elements (L1 to L6) forming the projection optical system (PL).
1, H2, HP1 to HP8, SC) and temperature measuring means (S1 to S8, IR) for measuring the temperature distribution of the optical element,
Temperature distribution control means (TC) for correcting the aberration of the projection optical system by controlling the temperature varying means based on the temperature distribution measured by the temperature measuring means to give a predetermined temperature distribution to the optical element. Characterize.
【0011】温度可変手段は、光学素子に接触して熱伝
導により光学素子に温度分布を与えるタイプのもの、又
は光学素子に非接触で熱を与えるタイプのもののいずれ
も採用することができ、両タイプのものを組み合わせて
用いることもできる。接触型の温度可変手段としては、
投影光学系を構成する1つ又は複数の光学素子の外周に
複数配設したヒーター(H1,H2)等の加熱手段又は
ヒートポンプ(HP1〜HP8)等の加熱冷却手段を用
いることができる。また、非接触型の温度可変手段とし
ては、光学素子に所望のパターンで赤外線を照射する赤
外線照射手段(SC)を用いることができる。As the temperature varying means, either of a type which gives a temperature distribution to the optical element by contacting with the optical element by heat conduction or a type which gives heat to the optical element in a non-contact manner can be adopted. It is also possible to use a combination of types. As the contact type temperature varying means,
It is possible to use heating means such as heaters (H1, H2) or heating / cooling means such as heat pumps (HP1 to HP8) arranged in the outer periphery of one or a plurality of optical elements constituting the projection optical system. Further, as the non-contact type temperature varying means, an infrared irradiating means (SC) which irradiates the optical element with infrared rays in a desired pattern can be used.
【0012】温度計測手段としては、光学素子の周辺に
配置された複数の熱電対等の温度センサ(S1〜S8)
を用いることができる。また、温度計測手段として赤外
線撮像装置等からなる放射温度計(IR)を用いると、
光学素子の中央部分の温度分布を非接触で計測すること
ができる。もちろん、温度計測手段として、光学素子の
周辺部の温度分布を計測する複数の熱電対と光学素子の
中央部分の温度分布を計測する放射温度計とを組み合わ
せて用いてもよい。温度分布制御手段(TC)は、温度
計測手段によって計測された光学素子の温度分布が所望
の温度分布となるように温度可変手段を制御すること
で、高精度な制御を行うことができる。As the temperature measuring means, a plurality of temperature sensors such as thermocouples arranged around the optical element (S1 to S8)
Can be used. Further, when a radiation thermometer (IR) including an infrared imaging device is used as the temperature measuring means,
The temperature distribution in the central portion of the optical element can be measured without contact. Of course, a plurality of thermocouples for measuring the temperature distribution in the peripheral portion of the optical element and a radiation thermometer for measuring the temperature distribution in the central portion of the optical element may be used in combination as the temperature measuring means. The temperature distribution control means (TC) can perform highly accurate control by controlling the temperature varying means so that the temperature distribution of the optical element measured by the temperature measuring means becomes a desired temperature distribution.
【0013】ヒーターやヒートポンプ等の接触型の温度
可変手段は、光学素子の外周部に配設するため、レンズ
鏡筒(T)の中央部分に配置された光学レンズ等どの位
置の光学素子に対しても設置可能である。また、加熱能
力を有するヒーター等に加えて冷却能力を有するヒート
ポンプ等を組み合わせて用いることにより、光学素子に
大きな温度勾配を与えることが可能である。反面、光学
素子の有効面積を広くとるためには取り付け位置が光学
素子の外周部に限られ、光学素子の光軸に近い中央領域
に直接熱伝達を行うことができないため、光学素子に付
与することのできる温度分布パターンが制限されてしま
う。Since the contact type temperature varying means such as a heater or a heat pump is arranged on the outer peripheral portion of the optical element, it can be used for any position of the optical element such as the optical lens arranged in the central portion of the lens barrel (T). Can be installed. In addition, it is possible to give a large temperature gradient to the optical element by using a heat pump having a cooling ability in combination with a heater having a heating ability. On the other hand, in order to increase the effective area of the optical element, the mounting position is limited to the outer peripheral portion of the optical element, and heat cannot be directly transferred to the central region near the optical axis of the optical element. The possible temperature distribution pattern is limited.
【0014】これに対して、赤外線ビームスキャナ等の
非接触型の温度可変手段は、光学素子の有効面積を狭め
ることなく光軸近くの領域に対しても直接熱を与えるこ
とができるため、光学素子に付与することのできる温度
分布パターンの自由度が比較的大きい。しかしながら、
赤外線ビームを照射することのできる光学素子は通常は
投影光学系の上下両端部の光学素子に限られ、また光学
素子を加熱することはできるが冷却することはできな
い。このように、接触型の温度可変手段と非接触型の温
度可変手段とは相互に補完しあう機能を有し、両者を組
み合わせて用いることで、それぞれを単独で用いる場合
に比較してより高精度な投影光学系の収差補正が可能と
なる。On the other hand, the non-contact type temperature varying means such as the infrared beam scanner can directly apply heat to the region near the optical axis without narrowing the effective area of the optical element. The degree of freedom of the temperature distribution pattern that can be given to the device is relatively large. However,
The optical element capable of irradiating the infrared beam is usually limited to the optical elements at the upper and lower ends of the projection optical system, and the optical element can be heated but cannot be cooled. In this way, the contact-type temperature varying means and the non-contact-type temperature varying means have mutually complementary functions, and by using both in combination, it is possible to obtain higher performance than when using each independently. It is possible to accurately correct the aberration of the projection optical system.
【0015】投影光学系の歪曲収差(ディストーショ
ン)を補正するに当たっては、まず格子パターンなど既
知のパターンを投影光学系によって結像面に投影し、結
像されたパターンの歪みを計測することで投影光学系の
収差を求める。次に、計測された収差を補正するために
は投影光学系中のどの光学素子にどのような温度分布を
与えるべきであるかを決定する。続いて、その温度分布
を実現するために個々のヒーターに流すべき電流値等、
温度分布制御手段による制御量を求めて制御を行うこと
になる。制御量は、解析的に求めることは困難であるた
め、実測データをもとにした線形演算によって、もしく
はシミュレーションによって求める。In correcting the distortion of the projection optical system, a known pattern such as a lattice pattern is first projected onto the image plane by the projection optical system, and the distortion of the imaged pattern is measured to project the image. Find the aberration of the optical system. Next, what temperature distribution should be given to which optical element in the projection optical system in order to correct the measured aberration. Then, the current value to be passed to each heater to realize the temperature distribution,
The control is performed by obtaining the control amount by the temperature distribution control means. Since it is difficult to analytically obtain the control amount, the control amount is obtained by linear calculation based on actual measurement data or by simulation.
【0016】図1及び図2を用いて、本発明による投影
光学系の歪曲収差補正の原理について説明する。図1
は、光学レンズL1,L2,L3からなる屈折型の投影
光学系を模式的に示すものである。照明光ILで一様に
照明されたレチクルR上のパターンは、光学レンズ群L
1〜L3によりフォトレジスト等の感光剤を塗布された
ウェハW上に結像される。光学レンズL3の外周には、
ヒーターH1とH2が図示するように取り付けられてい
る。The principle of correcting the distortion of the projection optical system according to the present invention will be described with reference to FIGS. 1 and 2. FIG.
Shows schematically a refraction type projection optical system including optical lenses L1, L2 and L3. The pattern on the reticle R uniformly illuminated with the illumination light IL is the optical lens group L.
Images 1 to L3 form an image on the wafer W coated with a photosensitizer such as a photoresist. On the outer circumference of the optical lens L3,
Heaters H1 and H2 are mounted as shown.
【0017】ヒーターH1,H2に通電していない場
合、光学レンズL3の温度は均一であり、その時のレチ
クルR上のパターンの物点Oに対するウェハW上の像点
はIである。いま、レチクルRに図2(a)に示すよう
な格子状パターンPが形成されているとして、このパタ
ーンPを光学レンズ群L1〜L3からなる投影光学系に
よってウエハW上に投影したとき、図2(b)に示すよ
うに歪曲されて結像したとする。このとき光学レンズL
3の上方に取り付けられたヒーターH1に通電して発熱
させると、光学レンズL3には温度分布が生じ加熱され
た部分が膨張して破線で示すL3’の様な形状になる。
そのためにウエハW上の像の位置がずれ、物点Oに対す
る像点はI’になり、ウエハW上に図2(c)に示すよ
うに歪みのないパターン像が形成される。When the heaters H1 and H2 are not energized, the temperature of the optical lens L3 is uniform, and the image point on the wafer W with respect to the object point O of the pattern on the reticle R at that time is I. Now, assuming that a grid pattern P as shown in FIG. 2A is formed on the reticle R, when the pattern P is projected onto the wafer W by the projection optical system including the optical lens groups L1 to L3, It is assumed that the image is distorted as shown in FIG. At this time, the optical lens L
When the heater H1 attached above 3 is energized to generate heat, the temperature distribution is generated in the optical lens L3, and the heated portion expands to have a shape as indicated by a broken line L3 '.
Therefore, the position of the image on the wafer W is displaced, the image point with respect to the object point O becomes I ′, and a pattern image without distortion is formed on the wafer W as shown in FIG.
【0018】ヒーターH1とH2を同時に通電加熱する
ことにより、光学レンズL3の周辺部分を中央部に比べ
て厚くすることもできる。この場合、光学レンズL3は
凹レンズとして働き、像を拡大することが可能になる。
また、ヒーターの代わりにペルチェ素子などのヒートポ
ンプを使用し、光学レンズ周辺部を中央部に対して冷却
することで、逆に光学レンズの周辺部分をを中心部に比
べて薄くすることもできる。その場合には光学レンズL
3は凸レンズとして働く。By energizing and heating the heaters H1 and H2 simultaneously, the peripheral portion of the optical lens L3 can be made thicker than the central portion. In this case, the optical lens L3 functions as a concave lens, and the image can be magnified.
Further, by using a heat pump such as a Peltier element instead of the heater and cooling the peripheral part of the optical lens with respect to the central part, it is possible to make the peripheral part of the optical lens thinner than the central part. In that case, the optical lens L
3 functions as a convex lens.
【0019】ここでは非常に単純化した例によって説明
したが、実際にはヒーターH1への通電による光学レン
ズL3の温度分布、したがって対応する部分の像の位置
ずれ量も複雑なものになる。そのため、光学レンズL3
のそれぞれの部分の温度の差による歪曲収差の変動量を
有限要素法による熱解析や光学シミュレーションなどで
解析すると共に、温度を測定するためのセンサや温度分
布を与えるための加熱手段や冷却手段の配置を十分検討
することが必要である。また、光学レンズに対する熱的
な外乱を防ぐことも重要である。Although a very simplified example has been described here, in actuality, the temperature distribution of the optical lens L3 due to energization of the heater H1 and therefore the amount of positional deviation of the image of the corresponding portion also becomes complicated. Therefore, the optical lens L3
The amount of fluctuation of the distortion aberration due to the temperature difference of each part of is analyzed by thermal analysis or optical simulation by the finite element method, and the sensor for measuring the temperature and the heating and cooling means for giving the temperature distribution It is necessary to carefully consider the placement. It is also important to prevent thermal disturbance to the optical lens.
【0020】本発明を屈折光学素子に適用する場合、光
学素子の材料は歪曲収差の補正量に応じて物性を選び選
択する必要がある。投影露光装置では近年の露光光の短
波長化により光学素子として使用できる光学材料が限ら
れているが、蛍石(CaF2)は温度による線膨張率が
比較的大きく、KrFやArFエキシマレーザなどから
発生される紫外線に対する透過率も大きいため、本発明
による投影光学系の光学材料として好適である。When the present invention is applied to the refractive optical element, it is necessary to select and select the physical properties of the material of the optical element according to the amount of distortion correction. In projection exposure apparatuses, optical materials that can be used as optical elements have been limited due to the shortening of the wavelength of exposure light in recent years, but fluorite (CaF 2 ) has a relatively large linear expansion coefficient due to temperature, and KrF and ArF excimer lasers, etc. Since it has a high transmittance for the ultraviolet rays generated from, it is suitable as an optical material of the projection optical system according to the present invention.
【0021】本発明は、従来、光学素子の相対位置を変
えることで調整していた投影光学系の歪曲収差を、光学
素子自体を動かすことなく光学素子の温度を変化させて
物理的に変形させることで補正するものであるため、従
来必要であった調整用の機械部品を省くことができ、構
造の簡素化やコスト低減に効果的である。また、単に温
度を変えるだけでなく温度分布を与えることで光学素子
を局所的に変形させることが可能であるため、従来の方
法では修正できなかった歪曲収差、例えば歪曲収差のう
ちの回転対称でない成分や比較的ランダムな成分をも修
正することが可能となる。According to the present invention, the distortion aberration of the projection optical system, which has been conventionally adjusted by changing the relative position of the optical element, is physically deformed by changing the temperature of the optical element without moving the optical element itself. Since the correction is performed by this, mechanical components for adjustment, which have been conventionally required, can be omitted, which is effective in simplifying the structure and reducing the cost. Further, since it is possible to locally deform the optical element by not only changing the temperature but also providing a temperature distribution, distortion that cannot be corrected by the conventional method, for example, not rotational symmetry among the distortions. It is also possible to modify components and relatively random components.
【0022】[0022]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明する。図3は、本発明による投影露光装
置の第1の実施の形態を示す概略図である。投影露光装
置は照明光学系IU、レチクルRを保持するレチクルス
テージRS、投影光学系PL、ウエハWを保持して2次
元方向に移動可能なウエハステージSTを備え、装置全
体は環境制御チャンバEC内に納められて一定温度にな
るよう空調制御されている。投影光学系PLは、この例
では6枚の光学レンズL1〜L6からなる屈折光学系で
構成され、光学レンズL1〜L6を保持するレンズ鏡筒
Tは、より高精度な温度制御を行うために温度制御ジャ
ケットTJで覆われている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 3 is a schematic view showing the first embodiment of the projection exposure apparatus according to the present invention. The projection exposure apparatus includes an illumination optical system IU, a reticle stage RS that holds a reticle R, a projection optical system PL, and a wafer stage ST that holds a wafer W and is movable in a two-dimensional direction. The air-conditioning is controlled so that the temperature is kept constant. In this example, the projection optical system PL is composed of a refracting optical system composed of six optical lenses L1 to L6, and the lens barrel T holding the optical lenses L1 to L6 is for performing more accurate temperature control. It is covered with a temperature control jacket TJ.
【0023】照明光学系IUから射出された照明光IL
は、投影されるパターンが描画されたレチクルRを均一
に照明する。そしてレチクルRに描かれたパターンによ
り強度変調と回折を受けることで、パターンの情報を持
って投影光学系PLに入射する。投影光学系PLは、レ
チクルRに描かれたパターンの像をウェハW上に形成す
る。Illumination light IL emitted from the illumination optical system IU
Uniformly illuminates the reticle R on which the projected pattern is drawn. Then, the pattern drawn on the reticle R undergoes intensity modulation and diffraction, so that the pattern information is incident on the projection optical system PL. The projection optical system PL forms an image of the pattern drawn on the reticle R on the wafer W.
【0024】投影光学系PLを構成する光学レンズのう
ち上端部の光学レンズL1の外周部分には、図4に示す
ように、ペルチェ素子などのヒートポンプHP1〜HP
8と温度センサS1〜S8とが対になって空間的に対称
に取り付けられている。それぞれのヒートポンプHP1
〜HP8は、温度センサS1〜S8からの温度測定結果
をもとに温度コントローラTCによって温度制御され
る。各ヒートポンプHP1〜HP8を個別に加熱駆動も
しくは冷却駆動して光学レンズ外周各部の温度を互いに
変化させることにより、あるいは環境制御チャンバEC
や温度制御ジャケットTJの設定温度に対して変化させ
ることにより、光学レンズL1に温度分布を発生させる
ことができる。As shown in FIG. 4, heat pumps HP1 to HP such as Peltier elements are provided on the outer peripheral portion of the optical lens L1 at the upper end of the optical lenses constituting the projection optical system PL.
8 and temperature sensors S1 to S8 form a pair and are spatially symmetrically attached. Each heat pump HP1
~ HP8 is temperature controlled by the temperature controller TC based on the temperature measurement results from the temperature sensors S1 to S8. Each of the heat pumps HP1 to HP8 is individually driven to be heated or cooled to change the temperature of each part of the outer circumference of the optical lens, or the environment control chamber EC.
A temperature distribution can be generated in the optical lens L1 by changing the temperature control jacket TJ or the temperature control jacket TJ with respect to the set temperature.
【0025】ヒートポンプHP1〜HP8により光学レ
ンズ外周部各点での温度を変えることにより、光学レン
ズL1に単に凹レンズや凸レンズとしての機能を付加す
るだけではなく、より複雑な非球面レンズとしての機能
を持たせることも可能である。例えば、光軸を挟んで対
向配置されたヒートポンプHP1とHP5の位置で光学
レンズL1の温度を上げ、それと直交するように対向配
置されたヒートポンプHP3とHP7の位置の温度を逆
に下げることにより、非回転対称な歪曲収差の補正も可
能である。このほかにも発生させる温度の組み合わせを
変えることにより、さらに複雑な形状の歪曲収差にも対
応することが可能である。By changing the temperature at each point on the outer circumference of the optical lens by the heat pumps HP1 to HP8, not only the function of the concave lens or the convex lens is added to the optical lens L1, but also the function of a more complicated aspherical lens is obtained. It is possible to have it. For example, by increasing the temperature of the optical lens L1 at the positions of the heat pumps HP1 and HP5 that are arranged opposite to each other with the optical axis interposed therebetween, and decreasing the temperature of the positions of the heat pumps HP3 and HP7 that are arranged opposite to each other so as to be orthogonal thereto, in reverse, It is also possible to correct non-rotationally symmetric distortion. In addition to this, by changing the combination of the temperatures to be generated, it is possible to deal with distortion of a more complicated shape.
【0026】温度コントローラTCに付随してROMや
磁気ディスク等の記憶装置Mが設けられ、記憶装置Mに
は光学レンズL1の温度分布と投影光学系PLの歪曲収
差の変動量の関係を示すデータが記憶されている。この
データは、実測又はシミュレーションによって求めるこ
とができる。実測によるデータの収集は、投影光学系P
Lを構成する光学レンズL1にある温度分布を与え、そ
の温度分布を与えた状態で図2(a)に示すような格子
状パターンを有するレチクルRの像を像面に投影し、投
影されたパターンの設計位置からのずれ量を計測するこ
とを温度分布を変えながら反復することで行うことがで
きる。また、シミュレーションによるデータ収集は、各
光学素子に種々の温度分布を与えたときの歪曲収差の変
動量を有限要素法による熱解析や光学シミュレーション
などで解析することにより行うことができる。A storage device M such as a ROM or a magnetic disk is provided in association with the temperature controller TC, and the storage device M has data indicating the relationship between the temperature distribution of the optical lens L1 and the variation amount of the distortion aberration of the projection optical system PL. Is remembered. This data can be obtained by actual measurement or simulation. Data is collected by actual measurement using the projection optical system P
A certain temperature distribution is given to the optical lens L1 constituting L, and in the state where the temperature distribution is given, an image of the reticle R having a lattice pattern as shown in FIG. It is possible to repeatedly measure the amount of deviation of the pattern from the design position while changing the temperature distribution. Further, the data collection by simulation can be performed by analyzing the fluctuation amount of the distortion aberration when various temperature distributions are given to each optical element by thermal analysis by the finite element method or optical simulation.
【0027】温度コントローラTCによる各ヒートポン
プHP1〜HP8の制御量は、図2(a)に示すような
格子状パターンを投影して投影光学系PLの歪曲収差を
計測し、その収差を補正するのに必要な温度分布を記憶
装置Mに記憶されているデータから線形演算によって求
めることで決定される。温度コントローラTCは、こう
して決定された制御量を用い、温度センサS1〜S8の
出力をモニターしながら各ヒートポンプHP1〜HP8
を制御することにより投影光学系PLの歪曲収差を補正
する。The control amount of each of the heat pumps HP1 to HP8 by the temperature controller TC is such that the grid pattern as shown in FIG. 2A is projected to measure the distortion aberration of the projection optical system PL and the aberration is corrected. The temperature distribution required for the above is determined by linear calculation from the data stored in the storage device M. The temperature controller TC uses each of the control amounts thus determined and monitors the outputs of the temperature sensors S1 to S8, and heat pumps HP1 to HP8.
The distortion aberration of the projection optical system PL is corrected by controlling.
【0028】図5は、本発明による投影露光装置の第2
の実施の形態を示す概略図である。図5に示す第2の実
施の形態の装置は、図3に示した第1の実施の形態の装
置に加えて赤外線ビームスキャナSC及び2次元CCD
赤外線撮像装置などの放射温度計IRを備え、また記憶
装置に代えてシミュレーション装置SMを備えたもので
ある。図5において、図3に示したのと同様の機能を果
たす部分には図3と同一の番号を付して詳細な説明を省
略する。FIG. 5 shows a second projection exposure apparatus according to the present invention.
It is a schematic diagram showing an embodiment of. The apparatus of the second embodiment shown in FIG. 5 includes an infrared beam scanner SC and a two-dimensional CCD in addition to the apparatus of the first embodiment shown in FIG.
The radiation thermometer IR such as an infrared imaging device is provided, and the simulation device SM is provided instead of the storage device. 5, parts having the same functions as those shown in FIG. 3 are assigned the same reference numerals as those in FIG. 3 and detailed description thereof will be omitted.
【0029】赤外線ビームスキャナSCは、投影光学系
PLの上端部に露出する光学レンズL1の表面を赤外線
ビームの強度を変化させながら高速に走査することで、
光学レンズL1に対して所望のパターンで熱を与えるこ
とができるものである。つまり、光学レンズL1は、図
4に示すように光学レンズ外周部に配置されたヒートポ
ンプHP1〜HP8による温度制御と同時に赤外線ビー
ムの照射による温度制御を受ける。赤外線ビームスキャ
ナSCは、ヒートポンプによっては不可能であった光学
レンズL1の光軸近くの領域にも熱を与えることができ
るため、ヒートポンプHP1〜HP8のみによる温度制
御に比べてより精度の高い温度制御が可能となる。赤外
線ビームスキャナSCによって走査される赤外線の波長
は光学レンズL1を形成している光学ガラス材料が強い
吸収を示す波長に設定するのが好ましい。光学レンズL
1が強い吸収を示す波長の赤外線を使用することによ
り、他の光学レンズL2〜L6に影響を与えることなく
必要な光学レンズL1のみに熱を与えることができる。
なお、赤外線ビームスキャナに代えて、所望の強度パタ
ーン(例えば、中央部が強く、周辺部が弱い強度の円形
パターン)を有する赤外線光束を光学レンズL1に照射
する照明手段を照明光学系IU中に設けても同様の効果
を上げることができる。The infrared beam scanner SC scans the surface of the optical lens L1 exposed at the upper end of the projection optical system PL at high speed while changing the intensity of the infrared beam.
Heat can be applied to the optical lens L1 in a desired pattern. That is, the optical lens L1 is subjected to temperature control by the heat pumps HP1 to HP8 arranged on the outer periphery of the optical lens as shown in FIG. Since the infrared beam scanner SC can give heat to a region near the optical axis of the optical lens L1 which is impossible with the heat pump, the temperature control with higher accuracy than the temperature control with only the heat pumps HP1 to HP8. Is possible. The wavelength of infrared rays scanned by the infrared beam scanner SC is preferably set to a wavelength at which the optical glass material forming the optical lens L1 exhibits strong absorption. Optical lens L
By using infrared rays having a wavelength at which 1 strongly absorbs, heat can be given to only the necessary optical lens L1 without affecting other optical lenses L2 to L6.
Instead of the infrared beam scanner, an illumination means for irradiating the optical lens L1 with an infrared light flux having a desired intensity pattern (for example, a circular pattern having a strong central portion and a weak peripheral portion) is provided in the illumination optical system IU. Even if it is provided, the same effect can be obtained.
【0030】また、放射温度計IRを用いることによ
り、光学レンズL1の外周部に配置した温度センサS1
〜S8では測定することができなかった光学レンズ中心
部も含めた光学レンズL1全体の温度分布を測定するこ
とができる。Further, by using the radiation thermometer IR, the temperature sensor S1 arranged on the outer peripheral portion of the optical lens L1.
The temperature distribution of the entire optical lens L1 including the central part of the optical lens, which could not be measured in S8 to S8, can be measured.
【0031】シミュレーション装置SMは、有限要素法
などの手法により、光学レンズL1の温度分布を与える
ことで投影光学系PLの結像特性をシミュレートする機
能を有するものとすることができる。投影光学系PLの
歪曲収差補正に当たっては、まず既知のパターンを投影
することによって投影光学系PLの歪曲収差を計測し、
計測された歪曲収差の補正に必要な光学レンズL1の温
度分布をシミュレーション装置SMを用いて求める。温
度コントローラTCは、放射温度計IRによる光学レン
ズL1の温度分布を実時間で監視しながら、その温度分
布がシミュレーション装置SMで求められた温度分布に
一致するように光学レンズL1の外周部に付設されたヒ
ートポンプHP1〜HP8及び赤外線ビームスキャナS
Cを制御することによって、投影光学系PLの光学特性
を修正し歪曲収差を補正する。The simulation device SM can have a function of simulating the image forming characteristic of the projection optical system PL by giving the temperature distribution of the optical lens L1 by a method such as the finite element method. In correcting the distortion aberration of the projection optical system PL, the distortion aberration of the projection optical system PL is first measured by projecting a known pattern,
The temperature distribution of the optical lens L1 required to correct the measured distortion aberration is obtained using the simulation device SM. The temperature controller TC is attached to the outer peripheral portion of the optical lens L1 so that the temperature distribution matches the temperature distribution obtained by the simulation device SM while monitoring the temperature distribution of the optical lens L1 by the radiation thermometer IR in real time. Heat pumps HP1 to HP8 and infrared beam scanner S
By controlling C, the optical characteristics of the projection optical system PL are corrected and the distortion aberration is corrected.
【0032】また、シミュレーション装置SMは、光学
レンズL1に配設されたヒートポンプHP1〜HP8へ
の通電量や赤外線ビームスキャナSCによる光学レンズ
L1への赤外線照射パターンなど、温度コントロータT
Cによる制御パラメータを入力することで、有限要素法
などの方法によって投影光学系PLの結像特性をシミュ
レートする機能を有するものとすることもできる。この
場合には、シミュレーション装置SMに種々の制御パラ
メータを入力し、投影光学系PLの歪曲収差がどのよう
に変化するかをシミュレーションすることで最適な制御
パラメータを見出すことができる。温度コントローラT
Cは、その最適パラメータに従って温度可変手段を制御
すればよい。Further, the simulation device SM includes a temperature controller T such as the amount of electricity supplied to the heat pumps HP1 to HP8 arranged in the optical lens L1 and the infrared irradiation pattern of the infrared beam scanner SC to the optical lens L1.
It is also possible to have a function of simulating the image forming characteristic of the projection optical system PL by a method such as the finite element method by inputting the control parameter by C. In this case, various control parameters can be input to the simulation apparatus SM to simulate how the distortion aberration of the projection optical system PL changes to find optimum control parameters. Temperature controller T
C may control the temperature varying means according to the optimum parameter.
【0033】あるいは、シミュレーション装SM置に実
測された投影光学系PLの歪曲収差データを入力し、そ
の歪曲収差を補正するのに最適な制御パラメータが自動
的に出力されるようにシミュレーション装置SMを自動
運転することもできる。Alternatively, the distortion data of the projection optical system PL actually measured is input to the simulation device SM, and the simulation device SM is set so that optimum control parameters for correcting the distortion aberration are automatically output. It can also be operated automatically.
【0034】このように投影露光装置自体にシミュレー
ション装置SMを搭載することで、リアルタイムで温度
分布パターンを変化させることが可能である。事前に計
算しておいた有限要素法などによるシミュレーション結
果を使用する場合でも、蛍石などの比較的線膨張率の大
きい光学材料では実際に与える温度差が少ないことから
熱的な計算部分を線形演算で近似することが可能になり
柔軟性の高い設定が可能になる。また変形量が微少であ
るか、誤差を許容できるならば、蛍石に関わらずあらゆ
る光学材料についても適用できる。By mounting the simulation apparatus SM on the projection exposure apparatus itself in this way, it is possible to change the temperature distribution pattern in real time. Even when using the simulation results obtained by the finite element method calculated in advance, the thermal calculation part is linear because the temperature difference actually given is small for optical materials with a relatively large linear expansion coefficient such as fluorite. It becomes possible to approximate by calculation, and highly flexible setting is possible. Further, if the amount of deformation is small or an error can be tolerated, it can be applied to any optical material regardless of fluorite.
【0035】ここでは、投影光学系を構成する光学素子
のうち上端部の光学レンズL1にのみヒートポンプや赤
外線スキャナ等の温度可変手段を付与する例を説明し
た。温度可変手段を設ける光学素子は、一般には物体も
しくは像に近い光学素子とするのが有利であり、縮小投
影型の投影光学系においては物体側の光学素子とするの
が有利である。しかし、温度可変手段を付設する光学素
子は投影光学系の上端や下端の光学素子に限られるもの
ではなく、鏡筒内部の光学素子に設けることもできる
し、同時に複数の光学素子に付設することもできる。Here, an example has been described in which the temperature varying means such as a heat pump or an infrared scanner is provided only to the optical lens L1 at the upper end of the optical elements constituting the projection optical system. The optical element provided with the temperature varying means is generally an optical element close to an object or an image, and in the reduction projection type projection optical system, an optical element on the object side is advantageous. However, the optical element to which the temperature varying means is attached is not limited to the optical element at the upper end or the lower end of the projection optical system, and it can be provided in the optical element inside the lens barrel, or it can be attached to a plurality of optical elements at the same time. You can also
【0036】また、温度可変手段の例として、ヒータ、
ペルチェ素子等のヒートポンプ、赤外線ビームスキャナ
をあげたが、その他にノズル先端から温風又は熱風を吹
き付けたり、マイクロ波照射によって光学素子の温度分
布を制御することもできる。As an example of the temperature varying means, a heater,
Although a heat pump such as a Peltier element and an infrared beam scanner have been mentioned, it is also possible to blow warm air or hot air from the tip of the nozzle or to control the temperature distribution of the optical element by microwave irradiation.
【0037】[0037]
【発明の効果】本発明によれば、投影露光装置に搭載す
る投影光学系に対し、比較的簡単な構成で歪曲収差の多
様な成分を補正することができる。According to the present invention, various components of distortion can be corrected with a relatively simple structure for a projection optical system mounted on a projection exposure apparatus.
【図1】本発明による投影光学系の歪曲収差補正の原理
を説明する図。FIG. 1 is a diagram for explaining the principle of distortion aberration correction of a projection optical system according to the present invention.
【図2】レチクルのパターンとその像を示す図。FIG. 2 is a diagram showing a reticle pattern and its image.
【図3】本発明による投影露光装置の一例を示す概略
図。FIG. 3 is a schematic view showing an example of a projection exposure apparatus according to the present invention.
【図4】ヒートポンプと温度センサが取り付けられた光
学レンズの模式図。FIG. 4 is a schematic diagram of an optical lens to which a heat pump and a temperature sensor are attached.
【図5】本発明による投影露光装置の他の例を示す概略
図。FIG. 5 is a schematic view showing another example of the projection exposure apparatus according to the present invention.
EC…環境制御チャンバ H1,H2…ヒーター HP1〜HP8…ヒートポンプ I…像点 IL…照明光 IR…放射温度計 IU 照明光学系 L1〜L6…光学レンズ M…記憶装置 O…物点 PL…投影光学系 R…レチクル RS…レチクルステージ S1〜S8…温度センサ SM…シミュレーション装置 ST…ウエハステージ T…レンズ鏡筒 TC…温度コントローラ TJ…温度制御ジャケット W…ウェハ EC ... Environment control chambers H1, H2 ... Heaters HP1 to HP8 ... Heat pump I ... Image point IL ... Illumination light IR ... Radiation thermometer IU Illumination optical system L1 to L6 ... Optical lens M ... Memory device O ... Object point PL ... Projection optics System R ... Reticle RS ... Reticle stage S1-S8 ... Temperature sensor SM ... Simulation device ST ... Wafer stage T ... Lens barrel TC ... Temperature controller TJ ... Temperature control jacket W ... Wafer
Claims (5)
を保持する基板ステージと、前記レチクルのパターン像
を前記感光基板上に形成する投影光学系とを含む投影露
光装置において、 前記投影光学系を構成する光学素子の温度を変化させる
温度可変手段と、前記光学素子の温度分布を計測する温
度計測手段と、前記温度計測手段によって計測された温
度分布に基づいて前記温度可変手段を制御して前記光学
素子に所定の温度分布を与えることにより前記投影光学
系の収差を補正する温度分布制御手段とを備えることを
特徴とする投影露光装置。1. A projection exposure apparatus including an illumination system that illuminates a reticle, a substrate stage that holds a photosensitive substrate, and a projection optical system that forms a pattern image of the reticle on the photosensitive substrate. Temperature changing means for changing the temperature of the optical element constituting the, temperature measuring means for measuring the temperature distribution of the optical element, and controlling the temperature varying means based on the temperature distribution measured by the temperature measuring means. A projection exposure apparatus comprising: a temperature distribution control unit that corrects aberrations of the projection optical system by giving a predetermined temperature distribution to the optical element.
系を構成する1つ又は複数の光学素子の外周に配設され
た複数のヒートポンプを備えることを特徴とする請求項
1記載の投影露光装置。2. The projection exposure apparatus according to claim 1, wherein the temperature varying means includes a plurality of heat pumps arranged on the outer circumference of one or a plurality of optical elements that constitute the projection optical system. .
に所望のパターンで赤外線を照射する赤外線照射手段を
備え、前記温度計測手段として放射温度計を備えること
を特徴とする請求項1又は2記載の投影露光装置。3. The infrared temperature irradiating means for irradiating the optical element with infrared rays in a desired pattern is provided as the temperature varying means, and a radiation thermometer is provided as the temperature measuring means. Projection exposure equipment.
系の光学特性とを対応させて記憶した記憶手段を備える
ことを特徴とする請求項1記載の投影露光装置。4. The projection exposure apparatus according to claim 1, further comprising a storage unit that stores the temperature distribution of the optical element and the optical characteristics of the projection optical system in association with each other.
変手段の制御結果としての前記投影光学系の結像特性を
シミュレートするシミュレーション手段を備え、前記温
度分布制御手段は前記シミュレーション手段によるシミ
ュレーションの結果をもとに前記温度可変手段を制御す
ることを特徴とする請求項1記載の投影露光装置。5. A simulation means for simulating an image forming characteristic of the projection optical system as a control result of the temperature varying means by the temperature distribution control means, wherein the temperature distribution control means is a result of a simulation by the simulation means. The projection exposure apparatus according to claim 1, wherein the temperature varying means is controlled based on the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8038017A JPH09232213A (en) | 1996-02-26 | 1996-02-26 | Projection aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8038017A JPH09232213A (en) | 1996-02-26 | 1996-02-26 | Projection aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09232213A true JPH09232213A (en) | 1997-09-05 |
Family
ID=12513816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8038017A Pending JPH09232213A (en) | 1996-02-26 | 1996-02-26 | Projection aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09232213A (en) |
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-
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