AU1301801A - Illuminator, aligner, and method for fabricating device - Google Patents

Illuminator, aligner, and method for fabricating device

Info

Publication number
AU1301801A
AU1301801A AU13018/01A AU1301801A AU1301801A AU 1301801 A AU1301801 A AU 1301801A AU 13018/01 A AU13018/01 A AU 13018/01A AU 1301801 A AU1301801 A AU 1301801A AU 1301801 A AU1301801 A AU 1301801A
Authority
AU
Australia
Prior art keywords
aligner
illuminator
fabricating device
fabricating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU13018/01A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1301801A publication Critical patent/AU1301801A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU13018/01A 1999-11-09 2000-11-08 Illuminator, aligner, and method for fabricating device Abandoned AU1301801A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/317732 1999-11-09
JP31773299 1999-11-09
PCT/JP2000/007830 WO2001035451A1 (en) 1999-11-09 2000-11-08 Illuminator, aligner, and method for fabricating device

Publications (1)

Publication Number Publication Date
AU1301801A true AU1301801A (en) 2001-06-06

Family

ID=18091433

Family Applications (1)

Application Number Title Priority Date Filing Date
AU13018/01A Abandoned AU1301801A (en) 1999-11-09 2000-11-08 Illuminator, aligner, and method for fabricating device

Country Status (2)

Country Link
AU (1) AU1301801A (en)
WO (1) WO2001035451A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10148170A1 (en) * 2001-09-28 2003-04-17 Zeiss Carl Jena Gmbh Method and device for reducing speckle in an optical system
DE10148167A1 (en) * 2001-09-28 2003-04-17 Zeiss Carl Jena Gmbh lighting arrangement
EP1324136A1 (en) 2001-12-28 2003-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR20150036786A (en) 2003-04-09 2015-04-07 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI519819B (en) * 2003-11-20 2016-02-01 尼康股份有限公司 Light beam converter, optical illuminating apparatus, exposure device, and exposure method
TWI412067B (en) 2004-02-06 2013-10-11 尼康股份有限公司 Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP2007189079A (en) * 2006-01-13 2007-07-26 Canon Inc Illuminating optical system, exposure device having it, and manufacturing method of device
KR101227803B1 (en) 2006-06-09 2013-01-29 칼 짜이스 레이저 옵틱스 게엠베하 Homogenizer with reduced interference
DE102009009366A1 (en) 2009-02-18 2010-08-19 Limo Patentverwaltung Gmbh & Co. Kg Device for homogenizing laser radiation
JP5157961B2 (en) * 2009-02-27 2013-03-06 ウシオ電機株式会社 Light source device
JP6825956B2 (en) 2017-03-28 2021-02-03 株式会社Ｓｃｒｅｅｎホールディングス Selection method of substrate processing equipment, substrate processing method and ultraviolet irradiation means
JP7145620B2 (en) * 2018-02-27 2022-10-03 株式会社オーク製作所 projection exposure equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6358827A (en) * 1986-08-29 1988-03-14 Nippon Telegr & Teleph Corp <Ntt> Exposure device
EP0266203B1 (en) * 1986-10-30 1994-07-06 Canon Kabushiki Kaisha An illumination device
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements

Also Published As

Publication number Publication date
WO2001035451A1 (en) 2001-05-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase