AU2001260985A1 - Control technique for microlithography lasers - Google Patents

Control technique for microlithography lasers

Info

Publication number
AU2001260985A1
AU2001260985A1 AU2001260985A AU6098501A AU2001260985A1 AU 2001260985 A1 AU2001260985 A1 AU 2001260985A1 AU 2001260985 A AU2001260985 A AU 2001260985A AU 6098501 A AU6098501 A AU 6098501A AU 2001260985 A1 AU2001260985 A1 AU 2001260985A1
Authority
AU
Australia
Prior art keywords
microlithography
lasers
control technique
technique
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001260985A
Inventor
Palash P Das
Gamaralalage G. Padmabandu
Tom A Watson
Paolo Zambon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2001260985A1 publication Critical patent/AU2001260985A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
    • H01S3/1024—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
AU2001260985A 2000-02-29 2001-02-14 Control technique for microlithography lasers Abandoned AU2001260985A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09515974 2000-02-29
US09/515,974 US6392743B1 (en) 2000-02-29 2000-02-29 Control technique for microlithography lasers
PCT/US2001/005239 WO2002005030A1 (en) 2000-02-29 2001-02-14 Control technique for microlithography lasers

Publications (1)

Publication Number Publication Date
AU2001260985A1 true AU2001260985A1 (en) 2002-01-21

Family

ID=24053576

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001260985A Abandoned AU2001260985A1 (en) 2000-02-29 2001-02-14 Control technique for microlithography lasers

Country Status (5)

Country Link
US (1) US6392743B1 (en)
JP (1) JP3459819B2 (en)
AU (1) AU2001260985A1 (en)
TW (1) TW478221B (en)
WO (1) WO2002005030A1 (en)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6868106B1 (en) * 1998-06-04 2005-03-15 Lambda Physik Ag Resonator optics for high power UV lasers
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6556600B2 (en) 1999-09-27 2003-04-29 Cymer, Inc. Injection seeded F2 laser with centerline wavelength control
US6570901B2 (en) * 2000-02-24 2003-05-27 Lambda Physik Ag Excimer or molecular fluorine laser having lengthened electrodes
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7378673B2 (en) * 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
JP2004022916A (en) * 2002-06-19 2004-01-22 Nikon Corp Laser light source control method and device, exposure method and device, and device manufacturing method
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7196342B2 (en) * 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7355191B2 (en) * 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7471708B2 (en) * 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) * 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
JP2007029972A (en) * 2005-07-25 2007-02-08 Fanuc Ltd Laser beam machining apparatus
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7835414B2 (en) * 2007-02-26 2010-11-16 Cymer, Inc. Laser gas injection system
JP4782887B1 (en) * 2010-04-02 2011-09-28 ファナック株式会社 Gas laser device
US10727642B2 (en) 2015-12-21 2020-07-28 Cymer, Llc Online calibration for repetition rate dependent performance variables
US9945730B2 (en) * 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
US10234765B2 (en) 2017-06-05 2019-03-19 Coherent Lasersystems Gmbh & Co. Kg Energy controller for excimer-laser silicon crystallization
US20220404717A1 (en) * 2019-10-30 2022-12-22 Cymer, Llc Radiation source testing
CN116636100A (en) * 2020-12-22 2023-08-22 西默有限公司 Energy consumption reduction for gas discharge cell blower

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2583719B2 (en) * 1992-08-10 1997-02-19 株式会社日立製作所 Gas controlled output stabilized gas laser system
JPH08274399A (en) * 1995-04-03 1996-10-18 Komatsu Ltd Device and method for controlling pulse energy of pulse laser device
JP2724993B2 (en) * 1995-08-31 1998-03-09 株式会社小松製作所 Laser processing device and laser device
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
JP3779030B2 (en) * 1997-06-06 2006-05-24 株式会社小松製作所 Gas laser device
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6141081A (en) * 1997-08-08 2000-10-31 Cymer, Inc. Stepper or scanner having two energy monitors for a laser
WO1999008156A1 (en) * 1997-08-08 1999-02-18 Cymer, Inc. Laser-illuminated stepper or scanner with energy sensor feedback
US6188710B1 (en) * 1997-10-10 2001-02-13 Cymer, Inc. Narrow band gas discharge laser with gas additive
US6243405B1 (en) * 1999-03-17 2001-06-05 Lambda Physik Ag Very stable excimer or molecular fluorine laser
JP4253915B2 (en) * 1999-04-23 2009-04-15 株式会社ニコン Exposure apparatus, exposure method, and laser light source
JP2001023888A (en) * 1999-07-09 2001-01-26 Nikon Corp Laser device, control method therefor, aligner and exposure method

Also Published As

Publication number Publication date
JP2001358064A (en) 2001-12-26
TW478221B (en) 2002-03-01
WO2002005030A1 (en) 2002-01-17
US6392743B1 (en) 2002-05-21
JP3459819B2 (en) 2003-10-27

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