AU2001241421A1 - Bandwidth control technique for a laser - Google Patents

Bandwidth control technique for a laser

Info

Publication number
AU2001241421A1
AU2001241421A1 AU2001241421A AU4142101A AU2001241421A1 AU 2001241421 A1 AU2001241421 A1 AU 2001241421A1 AU 2001241421 A AU2001241421 A AU 2001241421A AU 4142101 A AU4142101 A AU 4142101A AU 2001241421 A1 AU2001241421 A1 AU 2001241421A1
Authority
AU
Australia
Prior art keywords
laser
control technique
bandwidth control
bandwidth
technique
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001241421A
Inventor
John M. Algots
Jesse D. Buck
Palash P Das
Frederick G. Erie
Igor V Fomenkov
Armen Kroyan
Gamaralalage G. Padmabandu
Richard L Sandstrom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/501,160 external-priority patent/US6621846B1/en
Priority claimed from US09/597,812 external-priority patent/US6529531B1/en
Priority claimed from US09/608,543 external-priority patent/US6721340B1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2001241421A1 publication Critical patent/AU2001241421A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
AU2001241421A 2000-02-09 2001-01-18 Bandwidth control technique for a laser Abandoned AU2001241421A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US09/501,160 US6621846B1 (en) 1997-07-22 2000-02-09 Electric discharge laser with active wavelength chirp correction
US09/501,160 2000-02-09
US09/597,812 US6529531B1 (en) 1997-07-22 2000-06-19 Fast wavelength correction technique for a laser
US09/597,812 2000-06-19
US09/608,543 US6721340B1 (en) 1997-07-22 2000-06-30 Bandwidth control technique for a laser
US09/608,543 2000-06-30
PCT/US2001/001787 WO2001059889A1 (en) 2000-02-09 2001-01-18 Bandwidth control technique for a laser

Publications (1)

Publication Number Publication Date
AU2001241421A1 true AU2001241421A1 (en) 2001-08-20

Family

ID=27414167

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001241421A Abandoned AU2001241421A1 (en) 2000-02-09 2001-01-18 Bandwidth control technique for a laser

Country Status (5)

Country Link
EP (1) EP1258059B1 (en)
JP (1) JP4038340B2 (en)
AU (1) AU2001241421A1 (en)
TW (1) TW475303B (en)
WO (1) WO2001059889A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6792023B1 (en) 1998-06-04 2004-09-14 Lambda Physik Ag Method and apparatus for reduction of spectral fluctuations
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6603549B2 (en) * 2000-02-25 2003-08-05 Cymer, Inc. Convolution method for measuring laser bandwidth
US6763048B2 (en) 2000-06-19 2004-07-13 Lambda Physik Ag Line narrowing of molecular fluorine laser emission
GB0211388D0 (en) * 2002-05-17 2002-06-26 Sensor Highway Ltd Light source stabilisation
JP2004191551A (en) * 2002-12-10 2004-07-08 Megaopto Co Ltd Laser device and wavelength selection method for laser device
JP4798687B2 (en) 2004-07-09 2011-10-19 株式会社小松製作所 Narrow band laser equipment
JP4911558B2 (en) 2005-06-29 2012-04-04 株式会社小松製作所 Narrow band laser equipment
JP5157004B2 (en) 2006-07-04 2013-03-06 株式会社小松製作所 Method for adjusting spectral width of narrow-band laser
NL2006073A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and method.
DE102010031996A1 (en) * 2010-07-22 2012-01-26 Sirah Laser- Und Plasmatechnik Gmbh Method for operating pulsed laser resonator for e.g. pulsed dye laser system, involves adjusting frequencies of individual laser pulse on statistical distribution within line profile by active modulation of optical path length of resonator
US9124068B1 (en) * 2014-02-27 2015-09-01 Agilent Technologies, Inc. Method and apparatus to reduce noise caused by mode hopping in external cavity lasers
JP6549248B2 (en) * 2015-12-10 2019-07-24 ギガフォトン株式会社 Narrow band laser device and spectral line width measuring device
CN106872047B (en) * 2017-04-26 2018-12-28 中国联合网络通信集团有限公司 A kind of temperature testing method of battery, apparatus and system

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2649357B2 (en) * 1987-08-25 1997-09-03 株式会社小松製作所 Excimer laser wavelength controller
JP2610151B2 (en) * 1987-12-26 1997-05-14 株式会社小松製作所 Anomaly processing device for narrow band excimer laser
JP3244234B2 (en) * 1992-11-17 2002-01-07 株式会社小松製作所 Spectrum anomaly detector for narrow band laser
JP3276118B2 (en) * 1992-12-02 2002-04-22 株式会社小松製作所 Wavelength control device
JPH1012542A (en) * 1996-06-21 1998-01-16 Canon Inc Illumination apparatus and projection aligner
JPH1064788A (en) * 1996-08-22 1998-03-06 Toshiba Corp Method of fabricating semiconductor device and mask for exposure
JP4102457B2 (en) * 1997-05-09 2008-06-18 株式会社小松製作所 Narrow band laser equipment
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
JP3224525B2 (en) * 1997-12-08 2001-10-29 サイマー インコーポレイテッド Narrowband laser with etalon-based output coupler
JPH11204856A (en) * 1998-01-19 1999-07-30 Komatsu Ltd Wavelength detection control device
DE69907594T2 (en) * 1998-03-11 2003-11-20 Cymer Inc WAVELENGTH SYSTEM FOR AN EXCIMER LASER
JP3039531B2 (en) * 1998-08-17 2000-05-08 株式会社ニコン Circuit pattern manufacturing method
JP2001332794A (en) * 1999-09-27 2001-11-30 Cymer Inc Very narrow band injection seeded f2 lithography laser

Also Published As

Publication number Publication date
JP2001267673A (en) 2001-09-28
EP1258059A4 (en) 2006-01-25
EP1258059B1 (en) 2008-04-23
WO2001059889A1 (en) 2001-08-16
JP4038340B2 (en) 2008-01-23
WO2001059889A9 (en) 2002-10-17
EP1258059A1 (en) 2002-11-20
TW475303B (en) 2002-02-01

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