CN102639644A - 用于制备氢化聚锗烷的方法和氢化聚锗烷 - Google Patents
用于制备氢化聚锗烷的方法和氢化聚锗烷 Download PDFInfo
- Publication number
- CN102639644A CN102639644A CN2010800551644A CN201080055164A CN102639644A CN 102639644 A CN102639644 A CN 102639644A CN 2010800551644 A CN2010800551644 A CN 2010800551644A CN 201080055164 A CN201080055164 A CN 201080055164A CN 102639644 A CN102639644 A CN 102639644A
- Authority
- CN
- China
- Prior art keywords
- germane
- hydrogenation
- gathers
- gather
- aforesaid right
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
- C08G79/14—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing two or more elements other than carbon, oxygen, nitrogen, sulfur and silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Silicon Polymers (AREA)
- Chemical Vapour Deposition (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Catalysts (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009056731.3 | 2009-12-04 | ||
| DE102009056731A DE102009056731A1 (de) | 2009-12-04 | 2009-12-04 | Halogenierte Polysilane und Polygermane |
| PCT/EP2010/068979 WO2011067411A1 (de) | 2009-12-04 | 2010-12-06 | Verfahren zur herstellung von hydriertem polygerman und hydriertes polygerman |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102639644A true CN102639644A (zh) | 2012-08-15 |
Family
ID=43499339
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010800551644A Pending CN102639644A (zh) | 2009-12-04 | 2010-12-06 | 用于制备氢化聚锗烷的方法和氢化聚锗烷 |
| CN201080055163.XA Expired - Fee Related CN102639609B (zh) | 2009-12-04 | 2010-12-06 | 动力学稳定的氯化聚硅烷及其制备和用途 |
| CN201080054817.7A Expired - Fee Related CN102666381B (zh) | 2009-12-04 | 2010-12-06 | 制备卤化聚硅烷的方法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080055163.XA Expired - Fee Related CN102639609B (zh) | 2009-12-04 | 2010-12-06 | 动力学稳定的氯化聚硅烷及其制备和用途 |
| CN201080054817.7A Expired - Fee Related CN102666381B (zh) | 2009-12-04 | 2010-12-06 | 制备卤化聚硅烷的方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (7) | US9139702B2 (https=) |
| EP (7) | EP2507169A1 (https=) |
| JP (6) | JP5731531B2 (https=) |
| CN (3) | CN102639644A (https=) |
| BR (2) | BR112012013500A2 (https=) |
| CA (2) | CA2782247A1 (https=) |
| DE (1) | DE102009056731A1 (https=) |
| TW (7) | TWI589527B (https=) |
| WO (7) | WO2011067416A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104619644A (zh) * | 2012-08-20 | 2015-05-13 | 奥瑟亚新材料股份有限公司 | 锗烷气体制备装置及利用其制备单锗烷气体的方法 |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
| US9577243B2 (en) | 2010-05-28 | 2017-02-21 | Sion Power Corporation | Use of expanded graphite in lithium/sulphur batteries |
| DE102012224202A1 (de) * | 2012-12-21 | 2014-07-10 | Evonik Industries Ag | Verfahren zum Hydrieren höherer Halogen-haltiger Silanverbindungen |
| DE102013207447A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan |
| DE102013207444A1 (de) * | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen |
| US9174853B2 (en) | 2013-12-06 | 2015-11-03 | Gelest Technologies, Inc. | Method for producing high purity germane by a continuous or semi-continuous process |
| DE102014007685B4 (de) | 2014-05-21 | 2022-04-07 | Sven Holl | Verfahren zur Herstellung von Hexachlordisilan |
| DE102014007766B4 (de) | 2014-05-21 | 2025-10-16 | Christian Bauch | Verfahren zur plasmachemischen Herstellung halogenierter Oligosilane aus Tetrachlorsilan |
| DE102014007768B4 (de) | 2014-05-21 | 2025-07-03 | Sven Holl | Verfahren zur Herstellung von Mischungen chlorierter Silane mit erhöhten Anteilen von Si4Cl10 und/oder Si5Cl12 |
| DE102014007767B4 (de) * | 2014-05-21 | 2025-08-28 | Christian Bauch | Verfahren zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan |
| CN106604924B (zh) * | 2014-07-22 | 2020-04-03 | 迈图高新材料有限责任公司 | 用于裂解单硅烷、聚硅烷和/或低聚硅烷中的硅-硅键和/或硅-氯键的方法 |
| DE102014013250B4 (de) * | 2014-09-08 | 2021-11-25 | Christian Bauch | Verfahren zur Aufreinigung halogenierter Oligosilane |
| JP2018502817A (ja) * | 2014-12-15 | 2018-02-01 | ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド | 塩素化オリゴシランの製造方法 |
| DE102016014900A1 (de) * | 2016-12-15 | 2018-06-21 | Psc Polysilane Chemicals Gmbh | Verfahren zur Erhöhung der Reinheit von Oligosilanen und Oligosilanverbindungen |
| DE102016225872A1 (de) * | 2016-12-21 | 2018-06-21 | Evonik Degussa Gmbh | Verfahren zur Trennung von Gemischen höherer Silane |
| EP3596117A4 (en) | 2017-03-17 | 2021-01-13 | The Johns Hopkins University | TARGETED EPIGENETIC THERAPY AGAINST THE DISTAL EXPRESSION REGULATORY ELEMENT OF TGFB2 |
| US12492122B2 (en) * | 2018-05-02 | 2025-12-09 | Hysilabs, Sas | Process for producing and regenerating hydrogen carrier compounds |
| JP7125062B2 (ja) * | 2019-01-25 | 2022-08-24 | 株式会社東芝 | 判定方法及び処理方法 |
| CN117247018B (zh) * | 2023-09-22 | 2025-10-31 | 新疆大全新能源股份有限公司 | 一种回收新鲜料系统重杂的方法和装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4778692A (en) * | 1985-02-20 | 1988-10-18 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US20070078252A1 (en) * | 2005-10-05 | 2007-04-05 | Dioumaev Vladimir K | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| JP2007254593A (ja) * | 2006-03-23 | 2007-10-04 | Jsr Corp | ゲルマニウムポリマー、その製造法およびゲルマニウム膜の形成方法 |
| WO2008110386A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte synthese |
| US7498015B1 (en) * | 2004-02-27 | 2009-03-03 | Kovio, Inc. | Method of making silane compositions |
Family Cites Families (104)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1049835B (de) | 1959-02-05 | Kali-Chemie Aktiengesellschaft, Hannover | Verfahren zur Herstellung von Siliciumhydriden | |
| DE108077C (https=) | ||||
| DE340912C (de) | 1916-04-15 | 1921-09-21 | Frank Robert Mc Berty | Einrichtung fuer Fernsprechanlagen |
| GB778383A (en) * | 1953-10-02 | 1957-07-03 | Standard Telephones Cables Ltd | Improvements in or relating to the production of material for semi-conductors |
| GB793718A (en) | 1955-08-16 | 1958-04-23 | Standard Telephones Cables Ltd | Improvements in or relating to methods of producing silicon of high purity |
| GB832333A (en) | 1956-09-28 | 1960-04-06 | Standard Telephones Cables Ltd | Improvements in methods of producing silane of high purity |
| DE1034159B (de) | 1956-11-03 | 1958-07-17 | Kali Chemie Ag | Verfahren zur Herstellung von Siliciumhydriden |
| DE1061302B (de) | 1956-12-12 | 1959-07-16 | Kali Chemie Ag | Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. und V. Gruppe des Periodischen Systems |
| DE1055511B (de) | 1956-12-15 | 1959-04-23 | Kali Chemie Ag | Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. Hauptgruppe des Periodischen Systems mit den Ordnungszahlen 14 bis 50 |
| GB823496A (en) | 1957-12-27 | 1959-11-11 | Metal Hydrides Inc | Improvements in method of preparing high purity silicon |
| GB851962A (en) | 1958-06-09 | 1960-10-19 | Allied Chem | Production of pure silane |
| DE1098931B (de) | 1958-07-03 | 1961-02-09 | Wacker Chemie Gmbh | Verfahren zur Reinigung von geschmolzenem Silicium |
| US3050366A (en) | 1959-07-15 | 1962-08-21 | Du Pont | Production of silane by the use of a zinc catalyst |
| DE1096341B (de) | 1959-10-15 | 1961-01-05 | Kali Chemie Ag | Verfahren zur Herstellung von Monosilan |
| DE1187614B (de) | 1963-07-02 | 1965-02-25 | Bayer Ag | Verfahren zur Herstellung von vorzugsweise organisch substituierten Wasserstoffverbindungen der Elemente Bor und Silicium |
| FR1429930A (fr) | 1964-04-17 | 1966-02-25 | Thomson Houston Comp Francaise | Perfectionnements aux méthodes de préparation des hydrures |
| GB1110627A (en) | 1965-03-03 | 1968-04-24 | Ceskoslovenska Akademie Ved | A method of reduction of halosiliceous compounds |
| US3401183A (en) | 1965-12-23 | 1968-09-10 | Gen Electric | Method for preparing organo germanium, tin and silicon hydrides |
| US3704261A (en) | 1971-10-18 | 1972-11-28 | Gen Electric | Preparation of silicon hydrides |
| BE794871A (fr) | 1972-02-02 | 1973-08-01 | Rhone Poulenc Sa | Nouvelles sulfones isopreniques |
| US3926833A (en) | 1973-03-21 | 1975-12-16 | Lithium Corp | Preparation of mixed chlorohydrides of aluminum |
| FR2430917A1 (fr) | 1978-07-11 | 1980-02-08 | Comp Generale Electricite | Procede et dispositif d'elaboration de silicium polycristallin |
| US4200621A (en) | 1978-07-18 | 1980-04-29 | Motorola, Inc. | Sequential purification and crystal growth |
| US4295986A (en) | 1979-05-14 | 1981-10-20 | Gordon Roy G | Low temperature catalytic reduction |
| US4309259A (en) | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
| US4312849A (en) | 1980-09-09 | 1982-01-26 | Aluminum Company Of America | Phosphorous removal in silicon purification |
| DE3034957C2 (de) | 1980-09-17 | 1983-01-13 | Degussa Ag, 6000 Frankfurt | Verfahren und Vorrichtung zum Innenbeschichten von Kontaktrohren |
| US4374111A (en) | 1980-11-21 | 1983-02-15 | Allied Corporation | Production of silane |
| EP0054650B1 (de) * | 1980-12-24 | 1986-01-29 | Hüls Troisdorf Aktiengesellschaft | Verfahren zum Reinigen von Chlorsilanen |
| US4374110A (en) | 1981-06-15 | 1983-02-15 | Motorola, Inc. | Purification of silicon source materials |
| JPS58156522A (ja) | 1982-03-11 | 1983-09-17 | Mitsui Toatsu Chem Inc | ジシランの製造方法 |
| JPS59500416A (ja) * | 1982-03-18 | 1984-03-15 | ゼネラル・エレクトリック・カンパニイ | ハロゲン化けい素の精製法 |
| US4755370A (en) | 1982-03-18 | 1988-07-05 | General Electric Company | Purification of silicon halides |
| US4407783A (en) | 1982-08-16 | 1983-10-04 | Allied Corporation | Producing silane from silicon tetrafluoride |
| FR2532293A1 (fr) | 1982-08-31 | 1984-03-02 | Rhone Poulenc Spec Chim | Procede continu de preparation de silane |
| US4529707A (en) | 1982-09-21 | 1985-07-16 | General Electric Company | Detection of boron impurities in chlorosilanes |
| FR2533906A1 (fr) | 1982-09-30 | 1984-04-06 | Rhone Poulenc Spec Chim | Procede et dispositif pour la preparation de silane pur par reaction de chlorosilanes avec l'hydrure de lithium |
| US4632816A (en) * | 1982-12-13 | 1986-12-30 | Ethyl Corporation | Process for production of silane |
| CA1225230A (en) | 1982-12-13 | 1987-08-11 | Everett M. Marlett | Process for the production of silane |
| DE3247362A1 (de) | 1982-12-22 | 1984-06-28 | Studiengesellschaft Kohle mbH, 4330 Mülheim | Verfahren zur herstellung von silicium-wasserstoff-verbindungen, insbesondere des silans |
| DE3342496A1 (de) | 1983-11-24 | 1985-06-05 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum reinigen von mg-silicium |
| JPS60176915A (ja) | 1984-02-21 | 1985-09-11 | Central Glass Co Ltd | ジシランの製造法 |
| JPS60221301A (ja) * | 1984-04-13 | 1985-11-06 | Mitsui Toatsu Chem Inc | 水素化ゲルマニウムの製造方法 |
| FR2576902B1 (fr) | 1985-02-04 | 1987-02-13 | Rhone Poulenc Spec Chim | Procede de fabrication d'hydrogeno-silanes |
| JPS61191512A (ja) | 1985-02-20 | 1986-08-26 | Toagosei Chem Ind Co Ltd | ジシランの製造方法 |
| JPS61191022A (ja) * | 1985-02-20 | 1986-08-25 | Canon Inc | 堆積膜形成法 |
| JPH0688773B2 (ja) * | 1985-03-08 | 1994-11-09 | 三井東圧化学株式会社 | ヘキサクロロジシランの製造方法 |
| US4725419A (en) | 1985-05-17 | 1988-02-16 | Ethyl Corporation | Silane production from magnesium hydride |
| EP0316472A1 (en) | 1987-11-17 | 1989-05-24 | Ethyl Corporation | Silane production from magnesium hydride |
| JPS6217004A (ja) * | 1985-07-12 | 1987-01-26 | Mitsui Toatsu Chem Inc | ゲルマン類の製造方法 |
| US4824657A (en) | 1985-11-27 | 1989-04-25 | E. I. Du Pont De Nemours And Company | Process for reducing silicon, germanium and tin halides |
| US4777023A (en) | 1986-02-18 | 1988-10-11 | Solarex Corporation | Preparation of silicon and germanium hydrides containing two different group 4A atoms |
| US4792460A (en) * | 1986-07-15 | 1988-12-20 | Electric Power Research Institute, Inc. | Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium |
| DE3635064A1 (de) | 1986-10-15 | 1988-04-21 | Bayer Ag | Verfahren zur raffination von silicium und derart gereinigtes silicium |
| US4762808A (en) | 1987-06-22 | 1988-08-09 | Dow Corning Corporation | Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes |
| US4847061A (en) | 1987-07-20 | 1989-07-11 | Ethyl Corporation | Process for preparation of silane |
| JP2536027B2 (ja) | 1988-03-16 | 1996-09-18 | 東亞合成株式会社 | ジシランの製造方法 |
| US4855120A (en) | 1988-10-24 | 1989-08-08 | Ethyl Corporation | Production of silane and useful coproducts |
| DE3926595A1 (de) | 1989-08-11 | 1991-02-14 | Degussa | Verfahren zur hydrierung halogensubstituierter verbindungen |
| JPH03205055A (ja) | 1990-01-04 | 1991-09-06 | Hara Herusu Kogyo Kk | 浴槽の気泡発生装置 |
| US5061470A (en) | 1990-08-03 | 1991-10-29 | Ethyl Corporation | Silane production from hydridomagnesium chloride |
| JPH04130010A (ja) | 1990-09-20 | 1992-05-01 | Toagosei Chem Ind Co Ltd | ジシランの製造方法 |
| JP2965094B2 (ja) * | 1991-06-28 | 1999-10-18 | キヤノン株式会社 | 堆積膜形成方法 |
| DE4239246C1 (de) * | 1992-11-21 | 1993-12-16 | Goldschmidt Ag Th | Verfahren zur Herstellung von SiH-Gruppen aufweisenden Organopolysiloxanen |
| DE4306106A1 (de) | 1993-02-27 | 1994-09-01 | Thomas Dipl Chem Lobreyer | Verfahren zur Herstellung von Silylgermanen |
| DE4313130C1 (de) | 1993-04-22 | 1994-05-26 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
| JPH08231949A (ja) * | 1995-02-22 | 1996-09-10 | Osaka Gas Co Ltd | 有機電界発光素子 |
| JPH09237927A (ja) * | 1995-12-26 | 1997-09-09 | Toshiba Corp | 半導体薄膜形成方法および太陽電池の製造方法 |
| US5866471A (en) * | 1995-12-26 | 1999-02-02 | Kabushiki Kaisha Toshiba | Method of forming semiconductor thin film and method of fabricating solar cell |
| DE19812587C1 (de) | 1998-03-23 | 1999-09-23 | Wolfgang Sundermeyer | Verfahren zur Hydrierung halogensubstituierter Siliziumverbindungen |
| JP2002246384A (ja) | 2001-02-21 | 2002-08-30 | Jsr Corp | シリコン酸化膜の形成方法および形成用組成物 |
| FR2827592B1 (fr) | 2001-07-23 | 2003-08-22 | Invensil | Silicium metallurgique de haute purete et procede d'elaboration |
| KR100434698B1 (ko) * | 2001-09-05 | 2004-06-07 | 주식회사 하이닉스반도체 | 반도체소자의 선택적 에피성장법 |
| TWI231750B (en) | 2002-07-17 | 2005-05-01 | Delta Tooling Co Ltd | Seat structure |
| WO2005015609A2 (en) | 2003-06-13 | 2005-02-17 | Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University | Sixsnyge1-x-y and related alloy heterostructures based on si, ge and sn |
| US7879696B2 (en) * | 2003-07-08 | 2011-02-01 | Kovio, Inc. | Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom |
| DE10337309A1 (de) | 2003-08-14 | 2005-03-10 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
| US7314513B1 (en) * | 2004-09-24 | 2008-01-01 | Kovio, Inc. | Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions |
| US7485691B1 (en) * | 2004-10-08 | 2009-02-03 | Kovio, Inc | Polysilane compositions, methods for their synthesis and films formed therefrom |
| JP5157441B2 (ja) | 2005-04-07 | 2013-03-06 | 東亞合成株式会社 | 六塩化二ケイ素の精製方法 |
| DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
| KR101014066B1 (ko) | 2005-11-23 | 2011-02-14 | 아리조나 보드 오브 리전트스, 아리조나주의 아리조나 주립대 대행법인 | 규소-게르마늄 수소화물 및 그의 제조 및 사용 방법 |
| KR101014143B1 (ko) | 2005-11-23 | 2011-02-14 | 아리조나 보드 오브 리전트스, 아리조나주의 아리조나 주립대 대행법인 | 규소-게르마늄 수소화물 및 그의 제조 및 사용 방법 |
| NO326254B1 (no) * | 2005-12-22 | 2008-10-27 | Sinvent As | Fremgangsmate for fremstilling av silan |
| KR101269201B1 (ko) * | 2006-06-30 | 2013-05-28 | 삼성전자주식회사 | 폐 루프 방식의 다중 안테나 시스템에서 데이터송/수신장치 및 방법 |
| DE102006034061A1 (de) | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
| CA2667999A1 (en) | 2006-09-29 | 2008-03-27 | Shin-Etsu Chemical Co., Ltd. | Method for purification of silicon, silicon, and solar cell |
| EP2069368A4 (en) * | 2006-10-06 | 2011-06-22 | Kovio Inc | SILICONE POLYMERS, METHOD FOR POLYMERIZING SILICON COMPOUNDS AND METHOD FOR FORMING THIN FILMS FROM SUCH SILICON POLYMERS |
| KR101506136B1 (ko) | 2006-10-24 | 2015-03-26 | 다우 코닝 코포레이션 | 네오펜타실란을 포함하는 조성물 및 이의 제조 방법 |
| DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
| ES2366597T3 (es) * | 2007-03-30 | 2011-10-21 | Spawnt Private S.À.R.L. | Hiudrogenación catalítica. |
| US8530589B2 (en) * | 2007-05-04 | 2013-09-10 | Kovio, Inc. | Print processing for patterned conductor, semiconductor and dielectric materials |
| JP4714198B2 (ja) * | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
| DE102007000841A1 (de) | 2007-10-09 | 2009-04-16 | Wacker Chemie Ag | Verfahren zur Herstellung von hochreinem Hexachlordisilan |
| DE102008025263B4 (de) | 2008-05-27 | 2015-08-06 | Spawnt Private S.À.R.L. | Verfahren zum Aufreinigen von metallurgischem Silicium |
| EP2300368B1 (de) | 2008-05-27 | 2014-10-08 | Spawnt Private S.à.r.l. | Halogenidhaltiges silicium, verfahren zur herstellung desselben und verwendung desselben |
| DE102008025260B4 (de) * | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und thermisches Verfahren zu dessen Herstellung |
| DE102008025261B4 (de) | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung |
| DE102008036143A1 (de) | 2008-08-01 | 2010-02-04 | Berlinsolar Gmbh | Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium |
| JP6117471B2 (ja) | 2008-09-17 | 2017-04-19 | ナガルジュナ ファーティライザーズ アンド ケミカルズ リミテッド | 第iii族ないし第v族典型元素のハロゲン化オリゴマーおよび/またはハロゲン化ポリマーの製造方法 |
| JP5206334B2 (ja) * | 2008-11-07 | 2013-06-12 | 東亞合成株式会社 | クロロポリシランの製造方法 |
| DE102008054537A1 (de) * | 2008-12-11 | 2010-06-17 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
| DE102009056437B4 (de) * | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen |
| DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
-
2009
- 2009-12-04 DE DE102009056731A patent/DE102009056731A1/de not_active Withdrawn
-
2010
- 2010-12-06 CA CA2782247A patent/CA2782247A1/en not_active Abandoned
- 2010-12-06 TW TW099142322A patent/TWI589527B/zh not_active IP Right Cessation
- 2010-12-06 US US13/512,999 patent/US9139702B2/en not_active Expired - Fee Related
- 2010-12-06 BR BR112012013500A patent/BR112012013500A2/pt not_active IP Right Cessation
- 2010-12-06 US US13/513,217 patent/US20120315392A1/en not_active Abandoned
- 2010-12-06 EP EP10787448A patent/EP2507169A1/de not_active Withdrawn
- 2010-12-06 TW TW099142326A patent/TW201139283A/zh unknown
- 2010-12-06 WO PCT/EP2010/068993 patent/WO2011067416A1/de not_active Ceased
- 2010-12-06 US US13/513,018 patent/US9040009B2/en not_active Expired - Fee Related
- 2010-12-06 WO PCT/EP2010/068995 patent/WO2011067418A1/de not_active Ceased
- 2010-12-06 WO PCT/EP2010/068994 patent/WO2011067417A1/de not_active Ceased
- 2010-12-06 EP EP10787124.6A patent/EP2507296B1/de not_active Revoked
- 2010-12-06 US US13/513,036 patent/US20130004666A1/en not_active Abandoned
- 2010-12-06 CA CA2782226A patent/CA2782226A1/en not_active Abandoned
- 2010-12-06 JP JP2012541537A patent/JP5731531B2/ja not_active Expired - Fee Related
- 2010-12-06 US US13/513,611 patent/US9458294B2/en not_active Expired - Fee Related
- 2010-12-06 WO PCT/EP2010/068986 patent/WO2011067413A2/de not_active Ceased
- 2010-12-06 JP JP2012541533A patent/JP6297778B2/ja not_active Expired - Fee Related
- 2010-12-06 CN CN2010800551644A patent/CN102639644A/zh active Pending
- 2010-12-06 EP EP10787451A patent/EP2507299A2/de not_active Withdrawn
- 2010-12-06 EP EP10788316A patent/EP2507171A1/de not_active Withdrawn
- 2010-12-06 JP JP2012541535A patent/JP2013512842A/ja active Pending
- 2010-12-06 CN CN201080055163.XA patent/CN102639609B/zh not_active Expired - Fee Related
- 2010-12-06 JP JP2012541539A patent/JP2013512845A/ja active Pending
- 2010-12-06 TW TW099142328A patent/TWI580710B/zh not_active IP Right Cessation
- 2010-12-06 WO PCT/EP2010/068974 patent/WO2011067410A1/de not_active Ceased
- 2010-12-06 TW TW099142323A patent/TWI561559B/zh not_active IP Right Cessation
- 2010-12-06 EP EP10792879.8A patent/EP2507172B1/de not_active Not-in-force
- 2010-12-06 CN CN201080054817.7A patent/CN102666381B/zh not_active Expired - Fee Related
- 2010-12-06 TW TW099142324A patent/TW201134764A/zh unknown
- 2010-12-06 BR BR112012014106A patent/BR112012014106A2/pt not_active IP Right Cessation
- 2010-12-06 EP EP10787123A patent/EP2507317A1/de not_active Withdrawn
- 2010-12-06 EP EP10793199.0A patent/EP2507174B1/de not_active Revoked
- 2010-12-06 WO PCT/EP2010/068979 patent/WO2011067411A1/de not_active Ceased
- 2010-12-06 US US13/513,384 patent/US20120321540A1/en not_active Abandoned
- 2010-12-06 WO PCT/EP2010/068991 patent/WO2011067415A1/de not_active Ceased
- 2010-12-06 US US13/512,760 patent/US20130043429A1/en not_active Abandoned
- 2010-12-06 JP JP2012541538A patent/JP2013512844A/ja not_active Ceased
- 2010-12-06 TW TW099142320A patent/TW201132587A/zh unknown
- 2010-12-06 TW TW099142321A patent/TW201132708A/zh unknown
-
2016
- 2016-04-28 JP JP2016090381A patent/JP2016179935A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4778692A (en) * | 1985-02-20 | 1988-10-18 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US7498015B1 (en) * | 2004-02-27 | 2009-03-03 | Kovio, Inc. | Method of making silane compositions |
| US20070078252A1 (en) * | 2005-10-05 | 2007-04-05 | Dioumaev Vladimir K | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| JP2007254593A (ja) * | 2006-03-23 | 2007-10-04 | Jsr Corp | ゲルマニウムポリマー、その製造法およびゲルマニウム膜の形成方法 |
| WO2008110386A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte synthese |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104619644A (zh) * | 2012-08-20 | 2015-05-13 | 奥瑟亚新材料股份有限公司 | 锗烷气体制备装置及利用其制备单锗烷气体的方法 |
| CN104619644B (zh) * | 2012-08-20 | 2016-12-14 | 爱思开新材料有限公司 | 锗烷气体制备装置及利用其制备单锗烷气体的方法 |
Also Published As
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102639644A (zh) | 用于制备氢化聚锗烷的方法和氢化聚锗烷 | |
| CA2725366C (en) | Halogenated polysilane and thermal process for producing the same | |
| Braunschweig et al. | Unexpected cluster formation upon hydroboration of a neutral diborene with 9-BBN | |
| AU2010321106B2 (en) | Method for producing hydridosilanes | |
| Xu et al. | Preparation and thermal properties of aluminum hydride polymorphs | |
| EP2651825B1 (de) | Verfahren zur herstellung höherer halogen- und hydridosilane | |
| WO2004114368A2 (en) | METHOD FOR PREPARING GE1-x-ySnxEy (E=P, As, Sb) SEMICONDUCTORS AND RELATED Si-Ge-Sn-E AND Si-Ge-E ANALOGS | |
| KR101485522B1 (ko) | 아미노싸이올레이트를 이용한 몰리브데넘 전구체, 이의 제조방법, 및 이를 이용하여 박막을 형성하는 방법 | |
| Wegner et al. | Preparation of a series of lanthanide borohydrides and their thermal decomposition to refractory lanthanide borides | |
| US20130216465A1 (en) | Polysilanes of medium chain length and a method for the production of same | |
| Conesa-Egea et al. | Cunning defects: emission control by structural point defects on Cu (i) I double chain coordination polymers | |
| DE102009033351B3 (de) | Verfahren zur Herstellung von Oligo- und Polysilanen | |
| EP2566813A1 (de) | Nanodrähte aus neuartigen precursoren und verfahren zu deren herstellung | |
| CN113388121B (zh) | 一种含异质元素聚碳硅烷及其制备方法 | |
| KR102920535B1 (ko) | 부분 수소화된 클로로실란 및 선택적 수소화에 의해 그를 제조하는 방법 | |
| KR101306812B1 (ko) | 신규의 텅스텐 실릴아미드 화합물, 이의 제조방법 및 이를 이용하여 박막을 형성하는 방법 | |
| WO2025112101A1 (zh) | 提高芳香基氯硅烷还原制备芳香基硅烷转化率的制备方法 | |
| CN110483306A (zh) | 环丁胺的合成方法 | |
| EP3564339B1 (en) | Functionalized semiconductor nanoparticles and method for the manufacture thereof | |
| Davidson | Characteristic vibrations of compounds of main group elements | |
| KR20040088937A (ko) | 화학증착법에 의한 구리 박막 제조를 위한 전구체 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120815 |