NO814376L - Ved hjelp av straaling polymeriserbar blanding og herav fremstilt straalingsfoelsomt opptegningsmateriale - Google Patents
Ved hjelp av straaling polymeriserbar blanding og herav fremstilt straalingsfoelsomt opptegningsmaterialeInfo
- Publication number
- NO814376L NO814376L NO814376A NO814376A NO814376L NO 814376 L NO814376 L NO 814376L NO 814376 A NO814376 A NO 814376A NO 814376 A NO814376 A NO 814376A NO 814376 L NO814376 L NO 814376L
- Authority
- NO
- Norway
- Prior art keywords
- mol
- radiation
- diisocyanate
- groups
- ester
- Prior art date
Links
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- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
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- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- AQBLLJNPHDIAPN-LNTINUHCSA-K iron(3+);(z)-4-oxopent-2-en-2-olate Chemical compound [Fe+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O AQBLLJNPHDIAPN-LNTINUHCSA-K 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- CBBVHSHLSCZIHD-UHFFFAOYSA-N mercury silver Chemical compound [Ag].[Hg] CBBVHSHLSCZIHD-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- VLCAYQIMSMPEBW-UHFFFAOYSA-N methyl 3-hydroxy-2-methylidenebutanoate Chemical compound COC(=O)C(=C)C(C)O VLCAYQIMSMPEBW-UHFFFAOYSA-N 0.000 description 1
- QBRHXTCIXTXYEV-UHFFFAOYSA-N n-acridin-9-ylacetamide Chemical compound C1=CC=C2C(NC(=O)C)=C(C=CC=C3)C3=NC2=C1 QBRHXTCIXTXYEV-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003791 organic solvent mixture Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002988 phenazines Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Chemical class 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229940113116 polyethylene glycol 1000 Drugs 0.000 description 1
- 229940068886 polyethylene glycol 300 Drugs 0.000 description 1
- 229940068918 polyethylene glycol 400 Drugs 0.000 description 1
- 229940057847 polyethylene glycol 600 Drugs 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229920001289 polyvinyl ether Chemical class 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 125000002294 quinazolinyl group Chemical class N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003252 quinoxalines Chemical class 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YODZTKMDCQEPHD-UHFFFAOYSA-N thiodiglycol Chemical compound OCCSCCO YODZTKMDCQEPHD-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/675—Low-molecular-weight compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Dental Preparations (AREA)
- Polyurethanes Or Polyureas (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Paper (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Developing Agents For Electrophotography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19803048502 DE3048502A1 (de) | 1980-12-22 | 1980-12-22 | Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO814376L true NO814376L (no) | 1982-06-23 |
Family
ID=6119968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO814376A NO814376L (no) | 1980-12-22 | 1981-12-21 | Ved hjelp av straaling polymeriserbar blanding og herav fremstilt straalingsfoelsomt opptegningsmateriale |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US4458007A (ja) |
| EP (1) | EP0054700B1 (ja) |
| JP (1) | JPS57128716A (ja) |
| KR (1) | KR880002258B1 (ja) |
| AT (1) | ATE11834T1 (ja) |
| AU (1) | AU546028B2 (ja) |
| BR (1) | BR8108300A (ja) |
| CA (1) | CA1186432A (ja) |
| DE (2) | DE3048502A1 (ja) |
| DK (1) | DK567881A (ja) |
| ES (1) | ES508216A0 (ja) |
| FI (1) | FI69713C (ja) |
| HK (1) | HK76485A (ja) |
| IL (1) | IL64600A (ja) |
| MY (1) | MY8600250A (ja) |
| NO (1) | NO814376L (ja) |
| ZA (1) | ZA818728B (ja) |
Families Citing this family (300)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5971048A (ja) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
| US4615665A (en) * | 1983-05-06 | 1986-10-07 | Dentsply International Inc. | Method for making dental prosthetic device with oxygen barrier layer and visible light irradiation to cure polymer |
| JPS59204837A (ja) * | 1983-05-09 | 1984-11-20 | Asahi Chem Ind Co Ltd | 光重合性積層体及びそれを用いたレジスト像形成方法 |
| JPS608100A (ja) * | 1983-06-28 | 1985-01-16 | 旭化成株式会社 | 吹き付け食刻方法 |
| US4691045A (en) * | 1984-12-06 | 1987-09-01 | Nippon Shokubai Kagaku Co., Ltd. | Hydroxyl group-containing (meth)acrylate oligomer, prepolymer therefrom, and method for use thereof |
| JPS61179216A (ja) * | 1985-02-04 | 1986-08-11 | Sanyo Kokusaku Pulp Co Ltd | 光硬化性樹脂組成物 |
| US4614704A (en) * | 1985-06-21 | 1986-09-30 | M&T Chemicals Inc. | Stable UV curable compositions comprising triphenyl phosphite for forming solder mask coatings of high cure depth |
| US4874799A (en) * | 1985-05-17 | 1989-10-17 | M&T Chemicals Inc. | Aqueous akaline developable, UV curable urethane acrylate compounds and compositions useful for forming liquid 100 percent solids, solvent-free solder mask coatings |
| US4717740A (en) * | 1985-05-17 | 1988-01-05 | M&T Chemicals Inc. | Aqueous alkaline developable, UV curable urethane acrylate compounds and compositions useful for forming solder mask coatings |
| US4690502A (en) * | 1985-07-08 | 1987-09-01 | Desoto, Inc. | Ultraviolet curable optical glass fiber coatings from acrylate terminated, end-branched polyurethane polyurea oligomers |
| US4806574A (en) * | 1985-07-22 | 1989-02-21 | Desoto, Inc. | Ultraviolet curable coatings for optical glass fiber based on a polyfunctional core |
| US4798852A (en) * | 1985-10-29 | 1989-01-17 | Desoto, Inc. | Ultraviolet curable coatings for optical glass fiber |
| DE3540480A1 (de) * | 1985-11-15 | 1987-05-21 | Hoechst Ag | Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
| DE3615612A1 (de) * | 1986-05-09 | 1987-11-12 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3615613A1 (de) * | 1986-05-09 | 1987-11-12 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| GB8622266D0 (en) * | 1986-09-16 | 1986-10-22 | Vickers Plc | Printing plate precursors |
| US4816315A (en) * | 1987-02-05 | 1989-03-28 | The Goodyear Tire & Rubber Company | Shaped skin for decorative parts |
| DE3710281A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3710282A1 (de) * | 1987-03-28 | 1988-10-13 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3743457A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| US5006436A (en) * | 1988-09-20 | 1991-04-09 | Atochem North America, Inc. | UV curable compositions for making tentable solder mask coating |
| JP3638660B2 (ja) * | 1995-05-01 | 2005-04-13 | 松下電器産業株式会社 | 感光性樹脂組成物、それを用いたサンドブラスト用感光性ドライフィルム及びそれを用いた食刻方法 |
| US5837422A (en) * | 1995-07-25 | 1998-11-17 | Mitsubishi Chemical Corporation | Photopolymerizable composition and photosensitive lithographic printing plate employing it |
| EP0763779A3 (en) * | 1995-09-18 | 1997-07-30 | Mitsubishi Chem Corp | Unsaturated urethane derivatives, photopolymerizable compositions containing them and photosensitive lithographic printing plate |
| US5821032A (en) * | 1996-12-19 | 1998-10-13 | Kodak Polychrome Graphics, Llc | Photosensitive polymer composition and negative working photosensitive element containing three photocrosslinkable polymers |
| US5879858A (en) * | 1996-12-19 | 1999-03-09 | Kodak Polychrome Graphics, Llc | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element |
| US5962189A (en) * | 1996-12-19 | 1999-10-05 | Kodak Polychrome Graphics Llc | Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element |
| US5925498A (en) * | 1997-06-16 | 1999-07-20 | Kodak Polychrome Graphics Llc | Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| JP4013532B2 (ja) * | 2001-11-26 | 2007-11-28 | 東亞合成株式会社 | 光学部材用活性エネルギー線硬化型組成物 |
| EP1464486B1 (en) | 2003-03-26 | 2009-06-17 | FUJIFILM Corporation | Lithographic printing method and presensitized plate |
| JP2005028774A (ja) | 2003-07-07 | 2005-02-03 | Fuji Photo Film Co Ltd | 平版印刷版用原版および平版印刷方法 |
| JP4291638B2 (ja) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
| US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
| KR101073620B1 (ko) * | 2004-05-07 | 2011-10-14 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| US20070144384A1 (en) | 2004-05-19 | 2007-06-28 | Fuji Photo Film Co., Ltd | Image recording method |
| EP2618215B1 (en) | 2004-05-31 | 2017-07-05 | Fujifilm Corporation | Method for producing a lithographic printing plate |
| JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
| ATE398298T1 (de) | 2004-07-20 | 2008-07-15 | Fujifilm Corp | Bilderzeugendes material |
| US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
| ATE389900T1 (de) | 2004-08-24 | 2008-04-15 | Fujifilm Corp | Verfahren zur herstellung einer lithographischen druckplatte |
| JP2006062188A (ja) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | 色画像形成材料及び平版印刷版原版 |
| JP2006065074A (ja) | 2004-08-27 | 2006-03-09 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP4429116B2 (ja) | 2004-08-27 | 2010-03-10 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の製版方法 |
| JP2006068963A (ja) | 2004-08-31 | 2006-03-16 | Fuji Photo Film Co Ltd | 重合性組成物、それを用いた親水性膜、及び、平版印刷版原版 |
| JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
| JP4418725B2 (ja) | 2004-09-24 | 2010-02-24 | 富士フイルム株式会社 | 平版印刷版原版 |
| US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
| JP2006181838A (ja) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| EP1685957B1 (en) | 2005-01-26 | 2013-12-11 | FUJIFILM Corporation | Packaged body of lithographic printing plate precursors |
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| EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JP2006259351A (ja) * | 2005-03-17 | 2006-09-28 | Toppan Printing Co Ltd | 感光性組成物及びカラーフィルタ |
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| JP4524235B2 (ja) | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | 平版印刷版原版 |
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| JP5171005B2 (ja) | 2006-03-17 | 2013-03-27 | 富士フイルム株式会社 | 高分子化合物およびその製造方法、並びに顔料分散剤 |
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Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3850770A (en) * | 1969-10-24 | 1974-11-26 | Kansai Paint Co Ltd | Radiation curable compositions from acrylurethane resins |
| US3660371A (en) * | 1970-12-21 | 1972-05-02 | Ford Motor Co | Unsaturated polyester and epoxy-functional graded-rubber paint and process i |
| DE2300371C3 (de) * | 1973-01-05 | 1979-04-19 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare Druckplatte für den Flexodruck |
| US4210713A (en) * | 1973-02-01 | 1980-07-01 | Nippon Paint Co., Ltd. | Photo-curable composition for coating containing an unsaturated urethane modified polymer |
| US4098918A (en) * | 1973-02-05 | 1978-07-04 | Ppg Industries, Inc. | Method of polymerizing non-linear urethane diacrylates using radiation |
| US3954584A (en) * | 1973-06-20 | 1976-05-04 | Kansai Paint Company | Photopolymerizable vinylurethane liquid composition |
| JPS5756490B2 (ja) * | 1974-06-14 | 1982-11-30 | ||
| US4120721A (en) * | 1977-06-02 | 1978-10-17 | W. R. Grace & Co. | Radiation curable compositions for coating and imaging processes and method of use |
| JPS5936254B2 (ja) * | 1977-07-26 | 1984-09-03 | 帝人株式会社 | フレキソ印刷版用感光性樹脂組成物 |
| DE2737406A1 (de) * | 1977-08-19 | 1979-02-22 | Bayer Ag | Strahlenhaertbare bindemittel |
| DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
| US4198238A (en) * | 1978-06-22 | 1980-04-15 | Hercules Incorporated | Photopolymerizable composition |
| GB2030584B (en) * | 1978-10-03 | 1983-03-23 | Lankro Chem Ltd | Photopolymerisable solder resist compositions |
-
1980
- 1980-12-22 DE DE19803048502 patent/DE3048502A1/de not_active Withdrawn
-
1981
- 1981-10-27 AT AT81109005T patent/ATE11834T1/de not_active IP Right Cessation
- 1981-10-27 DE DE8181109005T patent/DE3168946D1/de not_active Expired
- 1981-10-27 EP EP81109005A patent/EP0054700B1/de not_active Expired
- 1981-12-15 US US06/330,888 patent/US4458007A/en not_active Expired - Fee Related
- 1981-12-16 CA CA000392479A patent/CA1186432A/en not_active Expired
- 1981-12-17 ZA ZA818728A patent/ZA818728B/xx unknown
- 1981-12-18 FI FI814092A patent/FI69713C/fi not_active IP Right Cessation
- 1981-12-21 BR BR8108300A patent/BR8108300A/pt unknown
- 1981-12-21 NO NO814376A patent/NO814376L/no unknown
- 1981-12-21 KR KR1019810005109A patent/KR880002258B1/ko active
- 1981-12-21 DK DK567881A patent/DK567881A/da not_active Application Discontinuation
- 1981-12-21 IL IL64600A patent/IL64600A/xx unknown
- 1981-12-21 ES ES508216A patent/ES508216A0/es active Granted
- 1981-12-22 JP JP56206315A patent/JPS57128716A/ja active Granted
- 1981-12-22 AU AU78736/81A patent/AU546028B2/en not_active Ceased
-
1985
- 1985-10-10 HK HK764/85A patent/HK76485A/xx unknown
-
1986
- 1986-12-30 MY MY250/86A patent/MY8600250A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FI69713B (fi) | 1985-11-29 |
| JPS57128716A (en) | 1982-08-10 |
| DK567881A (da) | 1982-06-23 |
| IL64600A0 (en) | 1982-03-31 |
| EP0054700B1 (de) | 1985-02-13 |
| FI69713C (fi) | 1986-03-10 |
| AU546028B2 (en) | 1985-08-08 |
| JPH0232293B2 (ja) | 1990-07-19 |
| KR830008201A (ko) | 1983-11-16 |
| CA1186432A (en) | 1985-04-30 |
| DE3048502A1 (de) | 1982-07-22 |
| EP0054700A3 (en) | 1983-03-16 |
| FI814092L (fi) | 1982-06-23 |
| ES8307384A1 (es) | 1983-07-01 |
| BR8108300A (pt) | 1982-10-05 |
| KR880002258B1 (ko) | 1988-10-20 |
| HK76485A (en) | 1985-10-18 |
| AU7873681A (en) | 1982-07-01 |
| ZA818728B (en) | 1982-11-24 |
| MY8600250A (en) | 1986-12-31 |
| IL64600A (en) | 1985-05-31 |
| ES508216A0 (es) | 1983-07-01 |
| EP0054700A2 (de) | 1982-06-30 |
| US4458007A (en) | 1984-07-03 |
| DE3168946D1 (en) | 1985-03-28 |
| ATE11834T1 (de) | 1985-02-15 |
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