JP5403296B2 - ロード方法、露光方法及び露光装置、並びにデバイス製造方法 - Google Patents
ロード方法、露光方法及び露光装置、並びにデバイス製造方法 Download PDFInfo
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Description
これによれば、搬送系によってステージの上方に搬送される基板が凹部内に載置されるように、前記取得された前記凹部内に載置された物体と前記凹部との位置関係の情報に基づいて、基板が前記ステージにロードされ、凹部内に載置された基板が、液浸方式により露光される。
a.最小領域中心法(MZC):開口の輪郭を2つの同心円ではさんだ時、同心円の半径差が最小になる中心、b.最小二乗中心法(LSC):最小二乗平均円(基準円からの偏差の二乗和が最小となる円)の中心、c.最小外接円中心法(MCC):開口の輪郭に最小で外接する円の中心、d.最大内接円中心法(MIC):開口の輪郭に最大で内接する円の中心。
Claims (50)
- ステージの上面の一部に配置される凹部内に基板をロードするロード方法であって、
前記ステージの凹部内に物体を載置することと、
前記凹部内に載置された物体と前記凹部との位置関係の情報を取得することと、
前記位置関係の情報に基づいて、前記基板と前記ステージとの位置関係を調整して、前記ステージの凹部内に前記基板をロードすることと、を含むロード方法。 - 請求項1に記載のロード方法において、
前記凹部内にロードされた基板の外周エッジと前記凹部の内周エッジとの間隔を計測することを、さらに含むロード方法。 - 請求項1又は2に記載のロード方法において、
前記物体と前記凹部との位置関係の情報は、前記物体の外周エッジと前記凹部の内周エッジとの間隔、あるいは、前記物体の中心と前記凹部の中心とのずれ情報を含むロード方法。 - 請求項1〜3のいずれか一項に記載のロード方法において、
前記位置関係の情報を取得するために前記凹部内に載置される物体は、前記基板よりも小径の工具用基板を含むロード方法。 - 請求項1〜4のいずれか一項に記載のロード方法において、
前記位置関係の情報を取得するために、前記凹部の内周エッジの位置情報と、前記物体の外周エッジの位置情報とが取得されるロード方法。 - 請求項1〜5のいずれか一項に記載のロード方法において、
前記基板の外周エッジと前記凹部の内周エッジとが接触しないように、かつ前記基板の外周エッジと前記凹部の内周エッジとの間隔が所定値より小さくなるように前記基板を前記凹部内にロードするロード方法。 - 投影光学系を介して露光ビームで基板を露光する露光方法であって、
請求項1〜6のいずれか一項に記載のロード方法を用いて、ステージの上面の一部に配置される凹部内に前記基板を載置することと、
前記凹部内に載置された基板に前記露光ビームを照射することと、を含む露光方法。 - 請求項7に記載の露光方法であって、
前記ステージによって前記投影光学系と対向して配置される前記基板の一部に、前記投影光学系の下に供給される液体によって液浸領域が形成され、
前記基板は、前記投影光学系と前記液浸領域の液体とを介して前記露光ビームが照射される露光方法。 - 請求項8に記載の露光方法において、
前記基板はその表面が前記ステージの上面とほぼ同一面となるように前記凹部内に載置され、
前記液浸領域は、前記ステージの上面と前記凹部内に載置される基板との少なくとも一方によって前記投影光学系の下に維持される露光方法。 - 請求項8又は9に記載の露光方法において、
前記ステージの上端側に着脱可能に搭載されるプレートの開口によって前記凹部が規定され、
前記プレートは、前記ステージの上端に撥液面を形成する露光方法。 - 搬送系を介してステージにロードされる基板を、投影光学系と液体とを介して露光ビームで露光する露光方法であって、
前記搬送系によって搬送される物体を前記ステージの凹部内に載置することと、
前記凹部内に載置された物体と前記凹部との位置関係の情報を取得することと、
前記搬送系によって前記ステージの上方に搬送される前記基板が前記凹部内に載置されるように、前記取得された情報に基づいて、前記基板を前記ステージにロードすることと、
前記凹部内に載置された基板の一部に、前記投影光学系と、前記液体によって前記投影光学系の下に形成される液浸領域とを介して、前記露光ビームを照射することと、を含む露光方法。 - 請求項11に記載の露光方法において、
前記基板のロードにおいて、前記位置関係の情報に基づいて前記搬送系と前記ステージとの少なくとも一方が制御される露光方法。 - 請求項12に記載の露光方法において、
前記基板の外周エッジと前記凹部の内周エッジとが接触することなく前記基板がロードされるとともに、前記凹部内に載置される基板の外周エッジと前記凹部の内周エッジとの間隔が所定値より小さくなるように、前記搬送系と前記ステージとの少なくとも一方の制御によって前記搬送された基板と前記ステージとの位置関係が調整される露光方法。 - 請求項12に記載の露光方法において、
前記搬送系と前記ステージとの少なくとも一方の制御によって、前記搬送された基板と前記ステージとの位置関係が設定される露光方法。 - 請求項14に記載の露光方法において、
前記凹部が一部に配置される前記ステージの上面と接触することなく前記基板がロードされるとともに、前記凹部内に載置される基板の表面と前記上面との間に間隙が形成されるように、前記搬送された基板と前記ステージとの位置関係が設定され、
前記ステージはその上面側で前記液浸領域が前記間隙を横切るように移動される露光方法。 - 請求項15に記載の露光方法において、
前記基板は、前記間隙が0.3mm程度以下となる、あるいは、前記間隔が実質的に一様となるように前記凹部内に載置される露光方法。 - 請求項11〜16のいずれか一項に記載の露光方法において、
前記基板のロードにおいて、前記ステージは、前記投影光学系から離れた前記基板の交換位置に配置される露光方法。 - 請求項17に記載の露光方法において、
前記凹部内に載置された物体は、前記交換位置で前記ステージからアンロードされる露光方法。 - 請求項11〜18のいずれか一項に記載の露光方法において、
前記基板はその表面が前記ステージの上面とほぼ同一面となるように前記凹部内に載置される露光方法。 - 請求項11〜19のいずれか一項に記載の露光方法において、
前記基板はプリアライメントが行われ、前記プリアライメントが行われた基板が前記ステージにロードされる露光方法。 - 請求項11〜20のいずれか一項に記載の露光方法において、
前記位置関係の情報を取得するために、前記物体と前記ステージの一部とをそれぞれ検出して、前記物体の外周エッジ及び前記凹部の内周エッジに関する位置情報を計測する露光方法。 - 請求項21に記載の露光方法において、
前記位置関係の情報は、前記物体の外周エッジと前記凹部の内周エッジとの間隔を含む露光方法。 - 請求項21に記載の露光方法において、
前記位置関係の情報は、前記凹部内に載置された物体の中心と、前記凹部の中心とのずれ情報を含む露光方法。 - 請求項21〜23のいずれか一項に記載の露光方法において、
前記凹部内に載置された物体の外周エッジと前記凹部の内周エッジとがそれぞれ複数箇所で検出される露光方法。 - 請求項21〜24のいずれか一項に記載の露光方法において、
前記ステージが移動される座標系を規定する位置計測系によって前記ステージの位置情報を計測しつつ、前記位置計測系と異なる検出装置によって前記物体と前記ステージの一部とが検出される露光方法。 - 請求項21〜25のいずれか一項に記載の露光方法において、
前記ステージは、前記凹部を規定する開口が一部に形成されるプレートが搭載され、
前記位置関係の情報は、前記プレートの着脱毎あるいは交換毎に取得され、
前記取得のために前記プレートの一部が検出される露光方法。 - 請求項26に記載の露光方法において、
前記プレートの検出動作と交換動作との少なくとも一方は、前記ステージと異なるステージによって前記投影光学系の下に前記液浸領域が維持される状態で行われる露光方法。 - 請求項27に記載の露光方法において、
前記異なるステージは、前記投影光学系と前記液浸領域の液体とを介して前記露光ビームで露光される基板を載置可能、あるいは、前記投影光学系と前記液浸領域の液体とを介して前記露光ビームが照射される少なくとも1つの計測部材が設けられる露光方法。 - 請求項11〜28のいずれか一項に記載の露光方法において、
前記物体は、前記基板よりも小径の工具用基板を含む露光方法。 - 請求項7〜29のいずれか一項に記載の露光方法を用いるリソグラフィ工程を含むデバイス製造方法。
- 投影光学系と液体とを介して露光ビームで基板を露光する露光装置であって、
上面の一部に配置される凹部内で前記基板を載置するステージと、
前記ステージによって前記投影光学系と対向して配置される前記基板の一部に、前記液体によって液浸領域を形成する局所液浸部材と、
前記投影光学系から離れた前記基板の交換位置に配置される前記ステージの上方に前記基板を搬送する搬送系と、
前記搬送された基板が前記凹部内に載置されるように前記基板を前記ステージにロードするために、前記搬送系及び前記ステージを制御する制御装置と、
前記搬送系を介して前記ステージの凹部内に載置される物体と前記凹部との位置関係の情報を取得する計測装置と、を備え、
前記基板のロードは、前記物体と前記凹部との位置関係の情報の取得後に行われ、
前記制御装置は、前記基板のロードのために前記取得された情報を用いる露光装置。 - 請求項31に記載の露光装置において、
前記制御装置は、前記位置情報の情報に基づいて、前記基板のロードにおける前記搬送系と前記ステージとの少なくとも一方の位置を制御する露光装置。 - 請求項32に記載の露光装置において、
前記制御装置は、前記基板の外周エッジと前記凹部の内周エッジとが接触することなく前記基板がロードされるとともに、前記凹部内に載置される基板の外周エッジと前記凹部の内周エッジとの間隔が所定値より小さくなるように、前記搬送系と前記ステージとの少なくとも一方の位置制御によって前記搬送された基板と前記ステージとの位置関係を調整する露光装置。 - 請求項32に記載の露光装置において、
前記制御装置は、前記搬送系と前記ステージとの少なくとも一方の位置制御によって、前記搬送された基板と前記ステージとの位置関係を設定する露光装置。 - 請求項34に記載の露光装置において、
前記凹部が一部に配置される前記ステージの上面と接触することなく前記基板がロードされるとともに、前記凹部内に載置される基板の表面と前記上面との間に間隙が形成されるように、前記搬送された基板と前記ステージとの位置関係が設定され、
前記ステージはその上面側で前記液浸領域が前記間隙を横切るように移動される露光装置。 - 請求項35に記載の露光装置において、
前記基板は、前記間隙が0.3mm程度以下となる、あるいは、前記間隔が実質的に一様となるように前記凹部内に載置される露光装置。 - 請求項31〜36のいずれか一項に記載の露光装置において、
前記基板のロードにおいて、前記ステージは、前記投影光学系から離れた前記基板の交換位置に配置される露光装置。 - 請求項37に記載の露光装置において、
前記凹部内に載置された物体は、前記交換位置で前記ステージからアンロードされる露光装置。 - 請求項31〜38のいずれか一項に記載の露光装置において、
前記基板はその表面が前記ステージの上面とほぼ同一面となるように前記凹部内に載置される露光装置。 - 請求項31〜39のいずれか一項に記載の露光装置において、
前記搬送系は、前記基板のプリアライメント装置を有し、
前記プリアライメント装置によってプリアライメントが行われた基板が前記ステージにロードされる露光装置。 - 請求項31〜40のいずれか一項に記載の露光装置において、
前記計測装置は、前記物体と前記ステージの一部とをそれぞれ検出して、前記物体の外周エッジ及び前記凹部の内周エッジに関する位置情報を計測する露光装置。 - 請求項41に記載の露光装置において、
前記位置関係の情報は、前記物体の外周エッジと前記凹部の内周エッジとの間隔を含む露光装置。 - 請求項41に記載の露光装置において、
前記位置関係の情報は、前記凹部内に載置された物体の中心と、前記凹部の中心とのずれ情報を含む露光装置。 - 請求項41〜43のいずれか一項に記載の露光装置において、
前記計測装置は、前記凹部内に載置された物体の外周エッジと前記凹部の内周エッジとをそれぞれ複数箇所で検出する露光装置。 - 請求項41〜44のいずれか一項に記載の露光装置において、
前記ステージの位置情報を計測する位置計測系を、さらに備え、
前記計測装置は、前記物体と前記ステージの一部を検出する、前記位置計測系と異なる検出装置を有し、
前記位置計測系によって前記ステージの位置情報を計測しつつ前記検出装置によって前記物体と前記ステージの一部とが検出される露光装置。 - 請求項41〜45のいずれか一項に記載の露光装置において、
前記ステージは、前記凹部を規定する開口が一部に形成されるプレートが搭載され、
前記物体と前記凹部との位置関係に関する情報は、前記プレートの着脱毎あるいは交換毎に取得され、
前記取得のために前記プレートの一部が検出される露光装置。 - 請求項46に記載の露光装置において、
前記ステージと異なるステージを、さらに備え、
前記プレートの検出動作と交換動作との少なくとも一方は、前記異なるステージによって前記投影光学系の下に前記液浸領域が維持される状態で行われる露光装置。 - 請求項47に記載の露光装置において、
前記異なるステージは、前記投影光学系と前記液浸領域の液体とを介して前記露光ビームで露光される基板を載置可能、あるいは、前記投影光学系と前記液浸領域の液体とを介して前記露光ビームが照射される少なくとも1つの計測部材が設けられる露光装置。 - 請求項31〜48のいずれか一項に記載の露光装置において、
前記物体は、前記基板よりも小径の工具用基板を含む露光装置。 - 請求項31〜49のいずれか一項に記載の露光装置を用いるリソグラフィ工程を含むデバイス製造方法。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014131082A (ja) * | 2004-11-18 | 2014-07-10 | Nikon Corp | 露光装置 |
JP2015111682A (ja) * | 2004-11-18 | 2015-06-18 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
JP2016040624A (ja) * | 2004-11-18 | 2016-03-24 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
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