JP2018067014A - 露光装置及び露光方法、並びに半導体デバイス製造方法 - Google Patents
露光装置及び露光方法、並びに半導体デバイス製造方法 Download PDFInfo
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- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
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Abstract
【解決手段】 コントローラは、投影光学系PLと対向して配置される計測ステージMSTに対してY軸方向の一側(−Y側)からウエハステージWSTを接近させるために、両ステージ(WST、MST)が相対移動されるとともに、投影光学系の下に液浸領域Lqを実質的に維持しつつ計測ステージの代わりにウエハステージを投影光学系と対向して配置するために、投影光学系に対して接近した両ステージがY軸方向の一側から他側(+Y側)に移動されるように両ステージの駆動系を制御するとともに、計測ステージに対してウエハステージを接近させるために、ウエハステージの外周位置情報に基づいて両ステージの駆動系を制御する。
【選択図】 図5
Description
a.最小領域中心法(MZC):開口の輪郭を2つの同心円ではさんだ時、同心円の半径差が最小になる中心、b.最小二乗中心法(LSC):最小二乗平均円(基準円からの偏差の二乗和が最小となる円)の中心、c.最小外接円中心法(MCC):開口の輪郭に最小で外接する円の中心、d.最大内接円中心法(MIC):開口の輪郭に最大で内接する円の中心。
Claims (28)
- 投影光学系と液体を介して照明光で基板を露光する露光装置であって、
前記投影光学系の複数の光学素子のうち最も像面側に配置されるレンズを囲むように設けられ、前記レンズの下に前記液体で液浸領域を局所的に形成するノズル部材と、
前記投影光学系の上方に配置され、前記照明光で照明されるマスクを保持する第1ステージと、前記第1ステージを駆動する第1モータを含む第1駆動系と、を有する第1ステージシステムと、
前記投影光学系の下方に配置されるベース部材と、
前記ベース部材上に配置される第2、第3ステージと、前記第2、第3ステージを駆動する第2モータを含む第2駆動系と、を有する第2ステージシステムと、
前記投影光学系の光軸と直交する所定面内の第1方向を走査方向として、前記照明光に対して前記マスクと前記基板をそれぞれ相対移動する走査露光が行われるように前記第1、第2駆動系を制御するコントローラと、を備え、
前記第2ステージはその上面の凹部内に配置される、前記基板を保持するホルダを有し、前記第3ステージは、前記投影光学系と前記液浸領域の液体を介して前記照明光を検出する少なくとも1つの計測部材を有し、
前記コントローラは、前記投影光学系と対向して配置される前記第3ステージに対して前記第1方向の一側から前記第2ステージを接近させるために、前記第2、第3ステージが相対移動されるとともに、前記投影光学系の下に前記液浸領域を実質的に維持しつつ前記第3ステージの代わりに前記第2ステージを前記投影光学系と対向して配置するために、前記投影光学系に対して前記接近した第2、第3ステージが前記第1方向の一側から他側に移動されるように前記第2駆動系を制御し、
前記コントローラは、前記第3ステージに対して前記第2ステージを接近させるために、前記第2ステージの外周位置情報に基づいて前記第2駆動系を制御する露光装置。 - 請求項1に記載の露光装置において、
前記投影光学系に対して前記第1方向の一側に配置され、前記基板のマークを検出する検出系を、さらに備える露光装置。 - 請求項2に記載の露光装置において、
前記投影光学系を支持する保持部材を、さらに備え、
前記検出系は、前記保持部材に設けられる露光装置。 - 請求項2又は3に記載の露光装置において、
前記投影光学系と対向して配置される前記第3ステージによって前記液浸領域が維持される間、前記検出系によって前記基板のマークが検出されるように前記第2ステージが前記検出系と対向して配置される露光装置。 - 請求項1〜4のいずれか一項に記載の露光装置において、
前記コントローラは、前記投影光学系に対して前記第1方向の一側に設定される交換位置に前記第2ステージが移動されるように前記第2駆動系を制御し、
前記交換位置において、前記投影光学系と前記液浸領域の液体を介して前記走査露光が行われた基板のアンロードが行われる露光装置。 - 請求項5に記載の露光装置において、
前記基板を保持する搬送部材を有し、前記交換位置に配置される前記第2ステージの上方に基板を搬送する搬送系を、さらに備え、前記搬送系によって前記基板の交換が行われる露光装置。 - 請求項6に記載の露光装置において、
前記搬送系は、前記基板のプリアライメント装置を有し、前記プリアライメント装置によってプリアライメントが行われた基板を、前記交換位置に配置される前記第2ステージの上方に搬送する露光装置。 - 請求項6又は7に記載の露光装置において、
前記コントローラは、前記搬送系によって前記第2ステージの上方に搬送される基板が前記第2ステージの上面と接触することなく前記凹部内にロードされるように前記搬送される基板と前記第2ステージとの位置関係を設定するために、前記凹部の位置情報に基づいて前記搬送系と前記第2ステージとの少なくとも一方を制御する露光装置。 - 請求項8に記載の露光装置において、
前記基板は、前記基板の表面と前記第2ステージの上面との間隙が0.3mm程度以下となる、あるいは、前記間隙が実質的に一様となるように前記凹部内で保持される露光装置。 - 請求項8又は9に記載の露光装置において、
前記凹部の位置情報は、前記凹部の中心位置又は形状に関する情報を含む露光装置。 - 請求項1〜10のいずれか一項に記載の露光装置において、
前記第2ステージは、前記基板の表面と前記第2ステージの上面とが実質的に同一面となるように、前記ホルダが配置される前記上面の凹部内で前記基板を保持し、前記上面によって、前記凹部内で保持される基板の表面から外れる前記液浸領域の少なくとも一部を維持可能である露光装置。 - 請求項1〜11のいずれか一項に記載の露光装置において、
前記少なくとも1つの計測部材によって、波面収差計測、空間像計測、照度計測、および照度むら計測の少なくとも1つが行われる露光装置。 - 請求項1〜12のいずれか一項に記載の露光装置において、
前記少なくとも1つの計測部材は、前記第3ステージの上面に配置される開口を有し、
前記第3ステージはその上面に配置される、前記開口と異なる基準マークを有し、前記検出系によって前記基準マークが検出されるように移動される露光装置。 - 請求項1〜13のいずれか一項に記載の露光装置において、
前記第2、第3ステージはそれぞれ上面が撥液性である露光装置。 - 請求項1〜14のいずれか一項に記載の露光装置において、
前記ホルダは、前記基板を支持する複数のピン部材と、前記複数のピン部材を囲む環状凸部と、前記環状凸部内に形成される複数の口と、を有し、前記複数の口を介して前記環状凸部内の気体を排気して、前記複数のビン部材で支持される前記基板を真空吸着する露光装置。 - 請求項15に記載の露光装置において、
前記ホルダは、前記環状凸部内に形成される、前記複数の口と異なる複数の孔を有し、
前記第2ステージは、前記複数の孔にそれぞれ設けられる複数の支持部材と、前記所定面と直交する方向に関して前記ホルダと前記複数の支持部材を相対移動するアクチュエータと、を有し、前記複数の支持部材を介して前記基板が前記ホルダにロードされる露光装置。 - 半導体デバイス製造方法であって、
マスクを準備する工程と、
請求項1〜16のいずれか一項に記載の露光装置を用いて前記マスクのパターン像をウエハに形成するリソグラフィ工程と、を含む半導体デバイス製造方法。 - 投影光学系と液体を介して照明光で基板を露光する露光方法であって、
前記投影光学系の複数の光学素子のうち最も像面側に配置されるレンズを囲むように設けられるノズル部材によって、前記レンズの下に前記液体で液浸領域を局所的に形成することと、
前記投影光学系の上方に配置される第1ステージによってマスクを保持することと、
前記投影光学系の下方に配置されるベース部材上で移動される第2、第3ステージのうち前記第2ステージによって前記基板を保持することと、
前記投影光学系と対向して配置される前記第3ステージに対して、前記投影光学系の光軸と直交する所定面内の第1方向の一側から前記第2ステージが接近するように、前記第2、第3ステージを相対移動することと、
前記投影光学系の下に前記液浸領域を実質的に維持しつつ前記第3ステージの代わりに前記第2ステージが前記投影光学系と対向して配置されるように、前記投影光学系に対して前記接近した第2、第3ステージを前記第1方向の一側から他側に移動することと、
前記投影光学系と対向して配置される前記第2ステージに保持される基板の露光動作を行うために、前記第1方向を走査方向として、前記照明光に対して前記マスクと前記基板をそれぞれ相対移動する走査露光が行われるように前記第1、第2ステージを移動することと、を含み、
前記第2ステージはその上面の凹部内に配置されるホルダによって前記凹部内で前記基板を保持し、前記第3ステージは、前記投影光学系と前記液浸領域の液体を介して前記照明光を検出する少なくとも1つの計測部材を有し、
前記第3ステージに対して前記第2ステージを接近させるために、前記第2ステージの外周位置情報に基づいて前記第2、第3ステージが相対移動される露光方法。 - 請求項18に記載の露光方法において、
前記投影光学系に対して前記第1方向の一側に配置されるように前記投影光学系を支持する保持部材に設けられる検出系によって、前記基板のマークが検出される露光方法。 - 請求項19に記載の露光方法において、
前記投影光学系と対向して配置される前記第3ステージによって前記液浸領域が維持される間、前記検出系によって前記基板のマークが検出されるように前記第2ステージが前記検出系と対向して配置される露光方法。 - 請求項18〜20のいずれか一項に記載の露光方法において、
前記投影光学系と対向して配置される前記第2ステージは、前記投影光学系に対して前記第1方向の一側に設定される交換位置に移動され、前記交換位置において、前記投影光学系と前記液浸領域の液体を介して前記走査露光が行われた基板のアンロードが行われる露光方法。 - 請求項21に記載の露光方法において、
前記基板を保持する搬送部材を有する搬送系によって前記第2ステージに保持される基板の交換が行われるように、前記搬送部材によって前記交換位置に配置される前記第2ステージの上方に基板が搬送される露光方法。 - 請求項22に記載の露光方法において、
前記搬送系に設けられるプリアライメント装置によってプリアライメントが行われた基板が、前記交換位置に配置される前記第2ステージの上方に搬送される露光方法。 - 請求項22又は23に記載の露光方法において、
前記搬送系によって前記第2ステージの上方に搬送される基板が前記第2ステージの上面と接触することなく前記凹部内にロードされるように前記搬送される基板と前記第2ステージとの位置関係を設定するために、前記凹部の位置情報に基づいて前記搬送系と前記第2ステージとの少なくとも一方が制御される露光方法。 - 請求項18〜24のいずれか一項に記載の露光方法において、
前記基板はその表面と前記第2ステージの上面とが実質的に同一面となるように、前記ホルダが配置される前記上面の凹部内で保持され、前記上面によって、前記凹部内で保持される基板の表面から外れる前記液浸領域の少なくとも一部が維持される露光方法。 - 請求項18〜25のいずれか一項に記載の露光方法において、
前記少なくとも1つの計測部材によって、波面収差計測、空間像計測、照度計測、および照度むら計測の少なくとも1つが行われる露光方法。 - 請求項18〜26のいずれか一項に記載の露光方法において、
前記少なくとも1つの計測部材は、前記第3ステージの上面に配置される開口を有し、
前記第3ステージの上面に配置される、前記開口と異なる基準マークが前記検出系によって検出されるように前記第3ステージが移動される露光方法。 - 半導体デバイス製造方法であって、
マスクを準備する工程と、
請求項18〜27のいずれか一項に記載の露光方法を用いて前記マスクのパターン像をウエハに形成するリソグラフィ工程と、を含む半導体デバイス製造方法。
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