JP5900763B2 - 露光装置及び露光方法、並びにデバイス製造方法 - Google Patents
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
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- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
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Description
a.最小領域中心法(MZC):開口の輪郭を2つの同心円ではさんだ時、同心円の半径差が最小になる中心、b.最小二乗中心法(LSC):最小二乗平均円(基準円からの偏差の二乗和が最小となる円)の中心、c.最小外接円中心法(MCC):開口の輪郭に最小で外接する円の中心、d.最大内接円中心法(MIC):開口の輪郭に最大で内接する円の中心。
Claims (24)
- 投影光学系と液体とを介して照明光で基板を露光する露光装置であって、
前記液体と接する前記投影光学系のレンズの周囲に設けられるノズル部材を有し、前記ノズル部材を介して供給される液体によって前記投影光学系の下に液浸領域を形成するとともに、前記ノズル部材を介して前記液浸領域から液体を回収する局所液浸装置と、
前記液浸領域と接する上面と、前記上面の凹部内に配置され、前記基板を保持するホルダと、を有し、前記凹部内で前記基板を保持する第1ステージと、
前記第1ステージに対して相対移動可能な第2ステージと、
前記第1、第2ステージをそれぞれ駆動する駆動系と、
前記第1、第2ステージの位置情報を計測する位置計測系と、
前記投影光学系から離れた前記基板の交換位置に配置される前記第1ステージの上方に前記基板を搬送する搬送系と、
前記位置計測系によって前記第1ステージの位置情報を計測しつつ前記第1ステージの一部を検出して、前記位置計測系によって規定される座標系上での前記凹部の位置情報を取得する計測系と、
前記搬送系によって前記第1ステージの上方に搬送される基板が前記凹部内で前記ホルダに保持されるように前記基板を前記第1ステージにロードするために、前記凹部の位置情報に基づいて前記駆動系と前記搬送系との少なくとも一方を制御して、前記基板と前記第1ステージとの位置関係を設定する制御系と、を備え、
前記制御系は、前記液浸領域を、前記投影光学系の下に維持しつつ前記第1ステージから前記第2ステージに移動するために、前記投影光学系と対向して配置される前記第1ステージに対して前記第2ステージが接近するように前記第1、第2ステージを相対移動するとともに、前記第1ステージの代わりに前記第2ステージが前記投影光学系と対向して配置されるように前記ノズル部材に対して前記接近した第1、第2ステージを相対移動し、前記第2ステージによって前記投影光学系の下に前記液浸領域を維持しつつ、前記投影光学系の下から離れて前記交換位置に移動される前記第1ステージに前記基板をロードする露光装置。 - 請求項1に記載の露光装置において、
前記基板が前記第1ステージの上面と接触することなくロードされ、かつ前記凹部内で保持される基板の表面と前記第1ステージの上面との間に間隙が形成されるように、前記基板と前記第1ステージとの位置関係が設定される露光装置。 - 請求項2に記載の露光装置において、
前記基板は、前記間隙が0.3mm程度以下となる、あるいは、前記間隙が実質的に一様となるように前記凹部内で前記ホルダに保持される露光装置。 - 請求項2に記載の露光装置において、
前記第1ステージはその上面側で前記液浸領域が前記間隙を横切るように移動されるとともに、前記上面によって、前記凹部内で保持される基板の表面から外れる前記液浸領域の少なくとも一部を保持する露光装置。 - 請求項4に記載の露光装置において、
前記第1ステージは、前記基板の表面が前記上面とほぼ同一面となるように前記凹部内で前記基板を保持する露光装置。 - 請求項5に記載の露光装置において、
前記第1ステージの少なくとも前記上面は撥液性である露光装置。 - 請求項5に記載の露光装置において、
前記搬送系は、前記基板のプリアライメント装置を有し、
前記プリアライメント装置によってプリアライメントが行われた基板が前記第1ステージにロードされる露光装置。 - 請求項7に記載の露光装置において、
前記第2ステージは、前記投影光学系と前記液浸領域の液体とを介して前記照明光が照射される計測部材を有し、
前記第2ステージによって前記投影光学系の下に前記液浸領域が維持される間に前記計測部材を用いる計測が行われる露光装置。 - 請求項7に記載の露光装置において、
前記第2ステージは、前記露光が行われる基板を保持する露光ステージ、あるいは、前記投影光学系と前記液浸領域の液体とを介して前記照明光が照射される計測部材を有する計測ステージである露光装置。 - 請求項1〜9のいずれか一項に記載の露光装置において
前記位置計測系によって前記第1ステージの位置情報を計測しつつ前記第1ステージの一部を検出して、前記座標系上での前記第1ステージの外周位置情報が計測され、
前記制御系は、前記外周位置情報に基づいて、前記第1、第2ステージの移動を制御する露光装置。 - 請求項10に記載の露光装置において、
前記制御系は、前記外周位置情報に基づいて、前記接近のための前記第1、第2ステージの相対移動を制御する露光装置。 - 請求項10又は11に記載の露光装置において、
前記制御系は、前記位置計測系によって前記第1、第2ステージの位置情報を計測しつつ前記座標系上での前記第1、第2ステージの移動を制御する露光装置。 - 請求項1〜12のいずれか一項に記載の露光装置を用いるリソグラフィ工程を含むことを特徴とするデバイス製造方法。
- 投影光学系と液体とを介して照明光で基板を露光する露光方法であって、
前記液体と接する前記投影光学系のレンズの周囲に設けられるノズル部材を介して供給される液体によって前記投影光学系の下に形成される液浸領域と接する上面と、前記上面の凹部内に配置され、前記基板を保持するホルダとを有し、前記凹部内で前記基板を保持する第1ステージの位置情報を、前記第1ステージ及び該第1ステージに対して相対移動可能な第2ステージの位置情報を計測する位置計測系によって計測しつつ前記第1ステージの一部を検出して、前記位置計測系によって規定される座標系上での前記凹部の位置情報を取得することと、
前記液浸領域を、前記投影光学系の下に維持しつつ、前記第1ステージから前記第2ステージに移動するために、前記投影光学系と対向して配置される前記第1ステージに対して前記第2ステージが接近するように前記第1、第2ステージを相対移動するとともに、前記第1ステージの代わりに前記第2ステージが前記投影光学系と対向して配置されるように前記ノズル部材に対して前記接近した第1、第2ステージを相対移動することと、
前記投影光学系の下から離れて前記基板の交換位置に移動される前記第1ステージの上方に、搬送系によって前記基板を搬送することと、
前記第2ステージによって前記投影光学系の下に前記液浸領域を維持しつつ、前記搬送系によって前記第1ステージの上方に搬送される基板が前記凹部内で前記ホルダに保持されるように前記基板を前記第1ステージにロードするために、前記凹部の位置情報に基づいて、前記第1、第2ステージを駆動する駆動系と前記搬送系との少なくとも一方を制御して、前記基板と前記第1ステージとの位置関係を設定することと、を含み、
前記第1ステージは、前記凹部内で保持される基板の一部に前記液浸領域が位置するように移動され、
前記基板は、前記投影光学系と前記液浸領域の液体とを介して前記照明光で露光される露光方法。 - 請求項14に記載の露光方法において、
前記基板が前記第1ステージの上面と接触することなくロードされ、かつ前記凹部内で保持される基板の表面と前記第1ステージの上面との間に間隙が形成されるように、前記基板と前記第1ステージとの位置関係が設定される露光方法。 - 請求項15に記載の露光方法において、
前記基板は、前記間隙が0.3mm程度以下となる、あるいは、前記間隙が実質的に一様となるように前記凹部内で前記ホルダに保持される露光方法。 - 請求項15に記載の露光方法において、
前記第1ステージはその上面側で前記液浸領域が前記間隙を横切るように移動されるとともに、前記上面によって、前記凹部内で保持される基板の表面から外れる前記液浸領域の少なくとも一部を保持する露光方法。 - 請求項17に記載の露光方法において、
前記第1ステージは、前記基板の表面が前記上面とほぼ同一面となるように前記凹部内で前記基板を保持する露光方法。 - 請求項18に記載の露光方法において、
前記基板は、前記搬送の途中でプリアライメントが行われ、前記プリアライメントが行われた基板が前記第1ステージにロードされる露光方法。 - 請求項19に記載の露光方法において、
前記第2ステージは、前記投影光学系と前記液浸領域の液体とを介して前記照明光が照射される計測部材を有し、
前記第2ステージによって前記投影光学系の下に前記液浸領域が維持される間に前記計測部材を用いる計測が行われる露光方法。 - 請求項14〜20のいずれか一項に記載の露光方法において
前記位置計測系によって前記第1ステージの位置情報を計測しつつ前記第1ステージの一部を検出して、前記座標系上での前記第1ステージの外周位置情報が計測され、
前記外周位置情報に基づいて、前記第1、第2ステージの移動が制御される露光方法。 - 請求項21に記載の露光方法において、
前記外周位置情報に基づいて、前記接近のための前記第1、第2ステージの相対移動が制御される露光方法。 - 請求項21又は22に記載の露光方法において、
前記位置計測系によって前記第1、第2ステージの位置情報を計測しつつ前記座標系上での前記第1、第2ステージの移動が制御される露光方法。 - 請求項14〜23のいずれか一項に記載の露光方法を用いるリソグラフィ工程を含むことを特徴とするデバイス製造方法。
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