JP2011524640A - 太陽電池形成方法及び太陽電池 - Google Patents
太陽電池形成方法及び太陽電池 Download PDFInfo
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- 229910021332 silicide Inorganic materials 0.000 claims description 4
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 4
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Abstract
Description
Claims (37)
- 太陽電池を形成する太陽電池形成方法において、
プリドーピング領域を有し、シリコン基板である半導体ウェーハを準備する工程と、
上記半導体ウェーハへのドーパントの濃度対深さプロフィールを有する第1のイオン注入を実行して、上記プリドーピング領域上に第1のドーピング領域を形成する工程と、
上記半導体ウェーハへのドーパントの、上記第1のイオン注入とは異なる濃度対深さプロフィールを有する第2のイオン注入を実行して、上記プリドーピング領域の上に第2のドーピング領域を形成する工程とを有し、
上記第1のドーピング領域及び上記第2のドーピング領域の少なくとも1つは、光を受光すると、電子正孔対を発生し、
上記第1及び第2のイオン注入は、互いに独立して実行されることを特徴とする太陽電池形成方法。 - 上記プリドーピング領域と、上記第1のドーピング領域及び上記第2のドーピング領域の少なくとも1つとの間には、電子正孔対を発生するpn接合が形成されることを特徴とする請求項1記載の太陽電池形成方法。
- 上記第1のイオン注入によって形成された第1のドーピング領域は、約80Ω/□〜約160Ω/□シート抵抗を有することを特徴とする請求項1記載の太陽電池形成方法。
- 上記第2のイオン注入によって形成された第2のドーピング領域は、約10Ω/□〜約40Ω/□のシート抵抗を有することを特徴とする請求項1記載の太陽電池形成方法。
- 上記第1のイオン注入によって形成された第1のドーピング領域は、約80Ω/□〜約160Ω/□のシート抵抗を有し、
上記第2のイオン注入によって形成された第2のドーピング領域は、約10Ω/□〜約40Ω/□のシート抵抗を有することを特徴とする請求項1記載の太陽電池形成方法。 - 上記半導体ウェーハの表面に金属接点ラインを配置する工程を更に有し、
上記金属接点ラインは、上記第1及び第2のドーピング領域のうちの少なくとも1つからの電荷を導通することを特徴とする請求項1記載の太陽電池形成方法。 - 上記プリドーピング領域は、p型にドーピングされ、上記第1及び第2のドーピング領域は、n型にドーピングされていることを特徴とする請求項1記載の太陽電池形成方法。
- 上記第1及び第2のイオン注入のうちの少なくとも一方の後に、上記半導体ウェーハに対してアニールプロセスを実行する工程を更に有する請求項1記載の太陽電池形成方法。
- 太陽電池を形成する太陽電池形成方法において、
プリドーピング領域を有する半導体ウェーハを準備する工程と、
上記半導体ウェーハへのドーパントの第1のイオン注入を実行することによって、該半導体ウェーハの上記プリドーピング領域上に均一なドーピング領域を形成し、該プリドーピング領域と該均一なドーピング領域間にpn接合を形成する工程と、
上記半導体ウェーハへのドーパントの第2のイオン注入を実行することによって、該半導体ウェーハの上記均一なドーピング領域の上に複数の選択的ドーピング領域を形成する工程とを有し、
上記第1及び第2のイオン注入は、互いに独立して実行され、
上記選択的ドーピング領域は、上記均一なドーピング領域よりも高いドーパント濃度を有し、
上記均一なドーピング領域は、光を受光すると、電子正孔対を発生することを特徴とする太陽電池形成方法。 - 上記半導体ウェーハは、シリコン基板であることを特徴とする請求項9記載の太陽電池形成方法。
- 上記第1のイオン注入によって形成された均一なドーピング領域は、約80Ω/□〜約160Ω/□のシート抵抗を有することを特徴とする請求項9記載の太陽電池形成方法。
- 上記第2のイオン注入によって形成された選択的ドーピング領域のそれぞれは、約10Ω/□〜約40Ω/□のシート抵抗を有することを特徴とする請求項9記載の太陽電池形成方法。
- 上記第1のイオン注入によって形成された均一なドーピング領域は、約80Ω/□〜約160Ω/□のシート抵抗を有し、
上記第2のイオン注入によって形成された選択的ドーピング領域のそれぞれは、約10Ω/□〜約40Ω/□のシート抵抗を有することを特徴とする請求項9記載の太陽電池形成方法。 - 上記半導体ウェーハの表面に金属接点ラインを配置する工程を更に有し、
上記金属接点ラインは、上記複数の選択的ドーピング領域の上に位置合わせされ、該複数の選択的ドーピング領域からの電荷を導通することを特徴とする請求項9記載の太陽電池形成方法。 - 上記半導体ウェーハの表面の近傍に金属シード層を形成する工程を更に有し、
上記金属シード層は、上記選択的ドーピング領域と上記金属接点ライン間の遷移層として機能することを特徴とする請求項14記載の太陽電池形成方法。 - 上記金属シード層は、シリサイドからなることを特徴とする請求項15記載の太陽電池形成方法。
- 上記金属シード層を形成する工程は、上記半導体ウェーハに、少なくとも1つの材料をイオン注入する工程を含み、
上記少なくとも1つの材料は、Ni、Ta、Ti、W及びCuからなるグループから選択されることを特徴とする請求項15記載の太陽電池形成方法。 - 上記プリドーピング領域は、p型にドーピングされ、上記均一なドーピング領域及び選択的ドーピング領域は、n型にドーピングされていることを特徴とする請求項9記載の太陽電池形成方法。
- 上記第1及び第2のイオン注入のうちの少なくとも一方の後に、上記半導体ウェーハに対してアニールプロセスを実行する工程を更に有する請求項9記載の太陽電池形成方法。
- 上記均一なドーピング領域の上に反射防止コーティング層を形成する工程を更に有することを特徴とする請求項9記載の太陽電池形成方法。
- 上記選択的ドーピング領域は、所定の位置に開口が配列されたマスクを用いて、上記半導体ウェーハの所定の位置に注入されることを特徴とする請求項9記載の太陽電池形成方法。
- 上記マスクは、上記第2のイオン注入中に、上記半導体ウェーハの表面に配置されたコンタクトマスクであることを特徴とする請求項21記載の太陽電池形成方法。
- 上記マスクは、上記第2のイオン注入中に、上記半導体ウェーハの表面よりも所定の距離上に配置された物理的マスクであることを特徴とする請求項21記載の太陽電池形成方法。
- 上記選択的ドーピング領域は、所定の位置に配列された成形イオンビームを用いて、上記半導体ウェーハの該所定の位置に注入されることを特徴とする請求項9記載の太陽電池形成方法。
- 上記選択的ドーピング領域の横方向の間隔は、約1mm〜約3mmであることを特徴とする請求項9記載の太陽電池形成方法。
- 背面ドーピング領域を有する半導体ウェーハと、
上記半導体ウェーハの背面ドーピング領域上に形成された均一なドーピング領域と、
上記均一なドーピング領域と上記背面ドーピング領域の間に形成されたpn接合と、
上記半導体ウェーハの均一なドーピング領域の上に形成された複数の選択的ドーピング領域と、
上記半導体ウェーハの表面に配置され、上記複数の選択的ドーピング領域の上に位置合わせされ、該複数の選択的ドーピング領域からの電荷を導通する複数の金属接点ラインとを備え、
上記均一なドーピング領域は、約80Ω/□〜約160Ω/□のシート抵抗を有し、上記半導体ウェーハにドーパントをイオン注入して形成され、
上記選択的ドーピング領域のそれぞれは、約10Ω/□〜約40Ω/□のシート抵抗を有し、上記半導体ウェーハにドーパントをイオン注入して形成されることを特徴とする太陽電池。 - 上記半導体ウェーハは、シリコン基板であることを特徴とする請求項26記載の太陽電池。
- 上記イオン注入によって形成された均一なドーピング領域は、約100Ω/□のシート抵抗を有することを特徴とする請求項26記載の太陽電池。
- 上記イオン注入によって形成された選択的ドーピング領域のそれぞれは、約25Ω/□のシート抵抗を有することを特徴とする請求項26記載の太陽電池。
- 上記選択的ドーピング領域の上であって、上記金属接点ラインの下に配置された金属シード層を更に備える請求項26記載の太陽電池。
- 上記金属シード層は、シリサイドからなることを特徴とする請求項30記載の太陽電池。
- 上記金属シード層は、Ni、Ta、Ti、W及びCuからなるグループから選択される少なくとも1つの材料を含むことを特徴とする請求項30記載の太陽電池。
- 上記プリドーピング領域は、p型にドーピングされていることを特徴とする請求項26記載の太陽電池。
- 上記均一なドーピング領域の上に配置された反射防止コーティング層を更に備える請求項26記載の太陽電池。
- 上記選択的ドーピング領域の横方向の間隔は、約1mm〜約3mmであることを特徴とする請求項26記載の太陽電池。
- 太陽電池を形成する太陽電池形成方法において、
プリドーピング領域及び表面を有する半導体ウェーハを準備する工程と、
上記半導体ウェーハへのドーパントの濃度対深さプロフィールを有する第1のイオン注入を実行し、上記プリドーピング領域上に、該半導体ウェーハの表面に延びる第1のドーピング領域を形成する工程と、
上記半導体ウェーハへのドーパントの、上記第1のイオン注入とは異なる濃度対深さプロフィールを有する第2のイオン注入を実行し、上記プリドーピング領域の上に、該半導体ウェーハの表面の上記第1のドーピング領域に対応する一部だけに延びる第2のドーピング領域を形成する工程とを有し、
上記第1のドーピング領域及び上記第2のドーピング領域の少なくとも1つは、光を受光すると、電子正孔対を発生し、
上記第1及び第2のイオン注入は、互いに独立して実行されることを特徴とする太陽電池形成方法。 - 太陽電池を形成する太陽電池形成方法において、
プリドーピング領域を有する半導体ウェーハに準備する工程と、
上記半導体ウェーハへのドーパントの濃度対深さプロフィールを有する第1のイオン注入を実行して、上記プリドーピング領域上に第1のドーピング領域を形成する工程と、
上記半導体ウェーハへのドーパントの、上記第1のイオン注入とは異なる濃度対深さプロフィールを有する第2のイオン注入を実行して、上記プリドーピング領域の上に第2のドーピング領域を形成する工程と、
上記第2のドーピング領域に導電性接点を形成する工程とを有し、
上記第2のドーピング領域は、上記第1のドーピング領域でなく、
上記第1のドーピング領域及び上記第2のドーピング領域の少なくとも1つは、光を受光すると、電子正孔対を発生し、
上記第1及び第2のイオン注入は、互いに独立して実行されることを特徴とする太陽電池形成方法。
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- 2009-06-11 US US12/483,017 patent/US20090308440A1/en not_active Abandoned
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JP2016520996A (ja) * | 2013-03-20 | 2016-07-14 | イオン ビーム サービス | シリコンウェーハーのドーピング方法 |
US9960287B2 (en) | 2014-02-11 | 2018-05-01 | Picasolar, Inc. | Solar cells and methods of fabrication thereof |
Also Published As
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US20090308450A1 (en) | 2009-12-17 |
KR20110050423A (ko) | 2011-05-13 |
JP2011524639A (ja) | 2011-09-01 |
US20090309039A1 (en) | 2009-12-17 |
US20090308439A1 (en) | 2009-12-17 |
WO2009152368A1 (en) | 2009-12-17 |
US8871619B2 (en) | 2014-10-28 |
EP2308060A4 (en) | 2013-10-16 |
CN102099923A (zh) | 2011-06-15 |
EP2319087A1 (en) | 2011-05-11 |
HK1158366A1 (zh) | 2012-07-13 |
WO2009152378A1 (en) | 2009-12-17 |
EP2304803A1 (en) | 2011-04-06 |
EP2308060A1 (en) | 2011-04-13 |
JP2011524638A (ja) | 2011-09-01 |
US8697553B2 (en) | 2014-04-15 |
CN102150278A (zh) | 2011-08-10 |
WO2009152375A1 (en) | 2009-12-17 |
CN102150277A (zh) | 2011-08-10 |
KR20110042051A (ko) | 2011-04-22 |
US20090308440A1 (en) | 2009-12-17 |
JP2011525301A (ja) | 2011-09-15 |
JP5520290B2 (ja) | 2014-06-11 |
KR20110042053A (ko) | 2011-04-22 |
EP2319088A1 (en) | 2011-05-11 |
WO2009152365A1 (en) | 2009-12-17 |
CN102099923B (zh) | 2016-04-27 |
CN102099870A (zh) | 2011-06-15 |
KR20110042052A (ko) | 2011-04-22 |
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