JP2010093298A5 - - Google Patents
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- Publication number
- JP2010093298A5 JP2010093298A5 JP2010013488A JP2010013488A JP2010093298A5 JP 2010093298 A5 JP2010093298 A5 JP 2010093298A5 JP 2010013488 A JP2010013488 A JP 2010013488A JP 2010013488 A JP2010013488 A JP 2010013488A JP 2010093298 A5 JP2010093298 A5 JP 2010093298A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- immersion liquid
- exposed
- immersion
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 39
- 238000000034 method Methods 0.000 claims 19
- 238000004140 cleaning Methods 0.000 claims 17
- 238000007654 immersion Methods 0.000 claims 15
- 239000007788 liquid Substances 0.000 claims 14
- 238000000671 immersion lithography Methods 0.000 claims 7
- 238000011084 recovery Methods 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46255603P | 2003-04-11 | 2003-04-11 | |
| US60/462,556 | 2003-04-11 | ||
| US48291303P | 2003-06-27 | 2003-06-27 | |
| US60/482,913 | 2003-06-27 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006509667A Division JP4837556B2 (ja) | 2003-04-11 | 2004-04-02 | 液浸リソグラフィにおける光学素子の洗浄方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011098570A Division JP5582087B2 (ja) | 2003-04-11 | 2011-04-26 | 液浸リソグラフィ装置、及び半導体デバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010093298A JP2010093298A (ja) | 2010-04-22 |
| JP2010093298A5 true JP2010093298A5 (enExample) | 2011-07-14 |
| JP4983933B2 JP4983933B2 (ja) | 2012-07-25 |
Family
ID=33303091
Family Applications (10)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006509667A Expired - Fee Related JP4837556B2 (ja) | 2003-04-11 | 2004-04-02 | 液浸リソグラフィにおける光学素子の洗浄方法 |
| JP2010013488A Expired - Fee Related JP4983933B2 (ja) | 2003-04-11 | 2010-01-25 | 液浸リソグラフィ装置における光学系の洗浄方法、液浸リソグラフィ装置、及びデバイス製造方法 |
| JP2011098570A Expired - Fee Related JP5582087B2 (ja) | 2003-04-11 | 2011-04-26 | 液浸リソグラフィ装置、及び半導体デバイス製造方法 |
| JP2012083162A Expired - Fee Related JP5648650B2 (ja) | 2003-04-11 | 2012-03-30 | 液浸リソグラフィ装置、及び洗浄方法 |
| JP2013168656A Expired - Fee Related JP5799991B2 (ja) | 2003-04-11 | 2013-08-14 | 液浸リソグラフィにおける光学素子の洗浄方法 |
| JP2014173449A Expired - Fee Related JP6020528B2 (ja) | 2003-04-11 | 2014-08-28 | 液浸リソグラフィ装置および洗浄方法 |
| JP2015205420A Expired - Fee Related JP6135737B2 (ja) | 2003-04-11 | 2015-10-19 | 液体供給方法 |
| JP2016201391A Expired - Lifetime JP6319393B2 (ja) | 2003-04-11 | 2016-10-13 | 液浸リソグラフィ装置、半導体デバイス製造方法及び洗浄方法 |
| JP2017197311A Pending JP2018025818A (ja) | 2003-04-11 | 2017-10-11 | 液浸リソグラフィにおける光学系の洗浄方法 |
| JP2018228345A Withdrawn JP2019045873A (ja) | 2003-04-11 | 2018-12-05 | 液浸リソグラフィにおける光学素子の洗浄方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006509667A Expired - Fee Related JP4837556B2 (ja) | 2003-04-11 | 2004-04-02 | 液浸リソグラフィにおける光学素子の洗浄方法 |
Family Applications After (8)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011098570A Expired - Fee Related JP5582087B2 (ja) | 2003-04-11 | 2011-04-26 | 液浸リソグラフィ装置、及び半導体デバイス製造方法 |
| JP2012083162A Expired - Fee Related JP5648650B2 (ja) | 2003-04-11 | 2012-03-30 | 液浸リソグラフィ装置、及び洗浄方法 |
| JP2013168656A Expired - Fee Related JP5799991B2 (ja) | 2003-04-11 | 2013-08-14 | 液浸リソグラフィにおける光学素子の洗浄方法 |
| JP2014173449A Expired - Fee Related JP6020528B2 (ja) | 2003-04-11 | 2014-08-28 | 液浸リソグラフィ装置および洗浄方法 |
| JP2015205420A Expired - Fee Related JP6135737B2 (ja) | 2003-04-11 | 2015-10-19 | 液体供給方法 |
| JP2016201391A Expired - Lifetime JP6319393B2 (ja) | 2003-04-11 | 2016-10-13 | 液浸リソグラフィ装置、半導体デバイス製造方法及び洗浄方法 |
| JP2017197311A Pending JP2018025818A (ja) | 2003-04-11 | 2017-10-11 | 液浸リソグラフィにおける光学系の洗浄方法 |
| JP2018228345A Withdrawn JP2019045873A (ja) | 2003-04-11 | 2018-12-05 | 液浸リソグラフィにおける光学素子の洗浄方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (10) | US7522259B2 (enExample) |
| EP (6) | EP2161621B1 (enExample) |
| JP (10) | JP4837556B2 (enExample) |
| KR (11) | KR20170016014A (enExample) |
| CN (4) | CN103558736B (enExample) |
| AT (1) | ATE449982T1 (enExample) |
| DE (1) | DE602004024295D1 (enExample) |
| SG (5) | SG10201803122UA (enExample) |
| WO (1) | WO2004093130A2 (enExample) |
Families Citing this family (227)
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