FR2893725B1 - Dispositif et procede d'exposition de lithographie par immersion megasonique - Google Patents
Dispositif et procede d'exposition de lithographie par immersion megasoniqueInfo
- Publication number
- FR2893725B1 FR2893725B1 FR0511753A FR0511753A FR2893725B1 FR 2893725 B1 FR2893725 B1 FR 2893725B1 FR 0511753 A FR0511753 A FR 0511753A FR 0511753 A FR0511753 A FR 0511753A FR 2893725 B1 FR2893725 B1 FR 2893725B1
- Authority
- FR
- France
- Prior art keywords
- exposing
- immersion lithography
- megasonic
- megasonic immersion
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000671 immersion lithography Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0511753A FR2893725B1 (fr) | 2005-11-21 | 2005-11-21 | Dispositif et procede d'exposition de lithographie par immersion megasonique |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0511753A FR2893725B1 (fr) | 2005-11-21 | 2005-11-21 | Dispositif et procede d'exposition de lithographie par immersion megasonique |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2893725A1 FR2893725A1 (fr) | 2007-05-25 |
FR2893725B1 true FR2893725B1 (fr) | 2009-05-29 |
Family
ID=36390162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0511753A Active FR2893725B1 (fr) | 2005-11-21 | 2005-11-21 | Dispositif et procede d'exposition de lithographie par immersion megasonique |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2893725B1 (fr) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106444292A (zh) * | 2003-04-11 | 2017-02-22 | 株式会社尼康 | 沉浸式光刻装置、清洗方法、器件制造方法及液体沉浸式光刻装置 |
EP1486827B1 (fr) * | 2003-06-11 | 2011-11-02 | ASML Netherlands B.V. | Appareil lithographique et méthode de fabrication d'un dispositif |
US7014966B2 (en) * | 2003-09-02 | 2006-03-21 | Advanced Micro Devices, Inc. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
-
2005
- 2005-11-21 FR FR0511753A patent/FR2893725B1/fr active Active
Also Published As
Publication number | Publication date |
---|---|
FR2893725A1 (fr) | 2007-05-25 |
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Legal Events
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