JP2012164992A5 - - Google Patents

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Publication number
JP2012164992A5
JP2012164992A5 JP2012080199A JP2012080199A JP2012164992A5 JP 2012164992 A5 JP2012164992 A5 JP 2012164992A5 JP 2012080199 A JP2012080199 A JP 2012080199A JP 2012080199 A JP2012080199 A JP 2012080199A JP 2012164992 A5 JP2012164992 A5 JP 2012164992A5
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liquid
substrate
cleaning
substrate stage
exposure apparatus
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JP2012080199A
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JP2012164992A (ja
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Publication of JP2012164992A5 publication Critical patent/JP2012164992A5/ja
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JP2012080199A 2006-05-18 2012-03-30 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法 Pending JP2012164992A (ja)

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JP2012080199A JP2012164992A (ja) 2006-05-18 2012-03-30 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法

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JP2006139614 2006-05-18
JP2006139614 2006-05-18
JP2006140957 2006-05-19
JP2006140957 2006-05-19
JP2007103343 2007-04-10
JP2007103343 2007-04-10
JP2012080199A JP2012164992A (ja) 2006-05-18 2012-03-30 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法

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JP2007132800A Division JP5217239B2 (ja) 2006-05-18 2007-05-18 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法

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JP2012164992A JP2012164992A (ja) 2012-08-30
JP2012164992A5 true JP2012164992A5 (enExample) 2013-07-25

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JP2007132800A Expired - Fee Related JP5217239B2 (ja) 2006-05-18 2007-05-18 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
JP2012080199A Pending JP2012164992A (ja) 2006-05-18 2012-03-30 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法

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JP2007132800A Expired - Fee Related JP5217239B2 (ja) 2006-05-18 2007-05-18 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法

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US (2) US8514366B2 (enExample)
EP (1) EP2037486A4 (enExample)
JP (2) JP5217239B2 (enExample)
KR (1) KR20090018024A (enExample)
CN (2) CN101410948B (enExample)
SG (1) SG175671A1 (enExample)
TW (1) TW200805000A (enExample)
WO (1) WO2007135990A1 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
JP5194799B2 (ja) * 2005-12-06 2013-05-08 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
WO2008001871A1 (en) * 2006-06-30 2008-01-03 Nikon Corporation Maintenance method, exposure method and apparatus and device manufacturing method
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7900641B2 (en) 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US20090025753A1 (en) 2007-07-24 2009-01-29 Asml Netherlands B.V. Lithographic Apparatus And Contamination Removal Or Prevention Method
US7916269B2 (en) 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
SG151198A1 (en) 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
NL1035942A1 (nl) 2007-09-27 2009-03-30 Asml Netherlands Bv Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
NL1036273A1 (nl) 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
NL1036306A1 (nl) 2007-12-20 2009-06-23 Asml Netherlands Bv Lithographic apparatus and in-line cleaning apparatus.
US8339572B2 (en) 2008-01-25 2012-12-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009182110A (ja) * 2008-01-30 2009-08-13 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
JP2009295933A (ja) * 2008-06-09 2009-12-17 Canon Inc ダミー露光基板及びその製造方法、液浸露光装置、並びに、デバイス製造方法
JP2010103363A (ja) * 2008-10-24 2010-05-06 Nec Electronics Corp 液浸露光装置の洗浄方法、ダミーウェハ、及び液浸露光装置
WO2010050240A1 (ja) * 2008-10-31 2010-05-06 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
NL2004540A (en) * 2009-05-14 2010-11-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
JP2010278299A (ja) * 2009-05-29 2010-12-09 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
NL2005167A (en) 2009-10-02 2011-04-05 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
NL2005610A (en) 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and surface cleaning method.
KR101591138B1 (ko) * 2009-12-18 2016-02-02 가부시키가이샤 니콘 기판 처리 장치의 메인터넌스 방법 및 안전 장치
JPWO2012011512A1 (ja) * 2010-07-20 2013-09-09 株式会社ニコン 露光方法、露光装置および洗浄方法
US20120057139A1 (en) * 2010-08-04 2012-03-08 Nikon Corporation Cleaning method, device manufacturing method, cleaning substrate, liquid immersion member, liquid immersion exposure apparatus, and dummy substrate
US20120188521A1 (en) * 2010-12-27 2012-07-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium
NL2008183A (en) * 2011-02-25 2012-08-28 Asml Netherlands Bv A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method.
US20130057837A1 (en) * 2011-04-06 2013-03-07 Nikon Corporation Exposure apparatus, exposure method, device-manufacturing method, program, and recording medium
TWI503553B (zh) * 2011-10-19 2015-10-11 Johnstech Int Corp 用於微電路測試器的導電開爾文接觸件
KR102071873B1 (ko) * 2012-12-27 2020-02-03 삼성디스플레이 주식회사 용매 제거장치 및 이를 포함하는 포토리소그래피 장치
KR101573450B1 (ko) * 2014-07-17 2015-12-11 주식회사 아이에스시 테스트용 소켓
US10261422B2 (en) 2014-08-07 2019-04-16 Asml Netherlands B.V. Lithography apparatus and method of manufacturing a device
CN112965341B (zh) * 2015-11-20 2024-06-28 Asml荷兰有限公司 光刻设备和操作光刻设备的方法
DK3744528T3 (da) 2018-07-13 2023-01-23 Hewlett Packard Development Co Printervæsketilførsel
WO2020013836A1 (en) 2018-07-13 2020-01-16 Hewlett-Packard Development Company, L.P. Print liquid supply
CN112969970B (zh) * 2018-11-09 2024-10-11 Asml控股股份有限公司 用于清洁光刻设备内的支撑件的设备和方法

Family Cites Families (81)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57117238A (en) 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
JPS6144429A (ja) 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JP3200874B2 (ja) 1991-07-10 2001-08-20 株式会社ニコン 投影露光装置
US5243195A (en) 1991-04-25 1993-09-07 Nikon Corporation Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
JPH08313842A (ja) 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
JP4029183B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 投影露光装置及び投影露光方法
CN1144263C (zh) 1996-11-28 2004-03-31 株式会社尼康 曝光装置以及曝光方法
EP0890136B9 (en) 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JPH1116816A (ja) 1997-06-25 1999-01-22 Nikon Corp 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
JPH1123692A (ja) 1997-06-30 1999-01-29 Sekisui Chem Co Ltd 地中探査用アンテナ
JPH1128790A (ja) 1997-07-09 1999-02-02 Asahi Chem Ind Co Ltd 紫外線遮蔽用熱可塑性樹脂板
JP4210871B2 (ja) 1997-10-31 2009-01-21 株式会社ニコン 露光装置
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP4264676B2 (ja) 1998-11-30 2009-05-20 株式会社ニコン 露光装置及び露光方法
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
KR100819239B1 (ko) 1998-03-11 2008-04-03 가부시키가이샤 니콘 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
EP1079223A4 (en) 1998-05-19 2002-11-27 Nikon Corp INSTRUMENT AND METHOD FOR MEASURING ABERATIONS, PROJECTION DEVICE INCLUDING THIS INSTRUMENT AND ITS MANUFACTURING METHOD
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP2002014005A (ja) 2000-04-25 2002-01-18 Nikon Corp 空間像計測方法、結像特性計測方法、空間像計測装置及び露光装置
WO2002069049A2 (en) 2001-02-27 2002-09-06 Asml Us, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US20050059617A1 (en) 2001-09-17 2005-03-17 Takeshi Imanishi Novel anitsense oligonucleotide derivatives against to hepatitis c virus
WO2003040296A2 (en) 2001-11-08 2003-05-15 DeveloGen Aktiengesellschaft für entwicklungsbiologische Forschung Men protein, gst2, rab-rp1, csp, f-box protein lilina/fbl7, abc50, coronin, sec61 alpha, or vhappa1-1, or homologous proteins involved in the regulation of energy homeostasis
JP4214729B2 (ja) 2002-07-25 2009-01-28 コニカミノルタホールディングス株式会社 硬化性白インク組成物
JP2005536775A (ja) 2002-08-23 2005-12-02 株式会社ニコン 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
US6893629B2 (en) 2002-10-30 2005-05-17 Isp Investments Inc. Delivery system for a tooth whitener
KR100585476B1 (ko) 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
AU2003289271A1 (en) * 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
JP4184346B2 (ja) 2002-12-13 2008-11-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 層上のスポットを照射するための方法及び装置における液体除去
USRE46433E1 (en) 2002-12-19 2017-06-13 Asml Netherlands B.V. Method and device for irradiating spots on a layer
WO2004057590A1 (en) 2002-12-19 2004-07-08 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
WO2004086468A1 (ja) 2003-02-26 2004-10-07 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
JP2004304135A (ja) 2003-04-01 2004-10-28 Nikon Corp 露光装置、露光方法及びマイクロデバイスの製造方法
EP2161620A1 (en) 2003-04-11 2010-03-10 Nikon Corporation Cleanup method for optics in immersion lithography
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
TWI503865B (zh) * 2003-05-23 2015-10-11 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
EP2261741A3 (en) * 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101242815B1 (ko) * 2003-06-13 2013-03-12 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조방법
US7370659B2 (en) * 2003-08-06 2008-05-13 Micron Technology, Inc. Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
JP4305095B2 (ja) * 2003-08-29 2009-07-29 株式会社ニコン 光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法
JP4444920B2 (ja) 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
WO2005036623A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
US20050122218A1 (en) 2003-12-06 2005-06-09 Goggin Christopher M. Ranging and warning device using emitted and reflected wave energy
WO2005059617A2 (en) 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
WO2005076323A1 (ja) * 2004-02-10 2005-08-18 Nikon Corporation 露光装置及びデバイス製造方法、メンテナンス方法及び露光方法
US7898642B2 (en) * 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7616383B2 (en) * 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1768169B9 (en) * 2004-06-04 2013-03-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
CN105467775B (zh) * 2004-06-09 2018-04-10 株式会社尼康 曝光装置及元件制造方法
KR101228244B1 (ko) * 2004-06-21 2013-01-31 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조방법
JP2006013806A (ja) 2004-06-24 2006-01-12 Maspro Denkoh Corp 信号処理装置及びｃａｔｖ用ヘッドエンド装置
US7463330B2 (en) * 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006032750A (ja) * 2004-07-20 2006-02-02 Canon Inc 液浸型投影露光装置、及びデバイス製造方法
JP4534651B2 (ja) * 2004-08-03 2010-09-01 株式会社ニコン 露光装置、デバイス製造方法及び液体回収方法
EP2226682A3 (en) 2004-08-03 2014-12-24 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US7224427B2 (en) * 2004-08-03 2007-05-29 Taiwan Semiconductor Manufacturing Company, Ltd. Megasonic immersion lithography exposure apparatus and method
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4772306B2 (ja) * 2004-09-06 2011-09-14 株式会社東芝 液浸光学装置及び洗浄方法
WO2006038952A2 (en) 2004-09-30 2006-04-13 Nikon Corporation Projection optical device and exposure apparatus
CN101866113B (zh) * 2004-10-26 2013-04-24 株式会社尼康 衬底处理方法、曝光装置及器件制造方法
SG157357A1 (en) * 2004-11-01 2009-12-29 Nikon Corp Exposure apparatus and device fabricating method
US7362412B2 (en) * 2004-11-18 2008-04-22 International Business Machines Corporation Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
US7732123B2 (en) * 2004-11-23 2010-06-08 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion photolithography with megasonic rinse
US7804576B2 (en) * 2004-12-06 2010-09-28 Nikon Corporation Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
JP4752473B2 (ja) * 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060250588A1 (en) * 2005-05-03 2006-11-09 Stefan Brandl Immersion exposure tool cleaning system and method
WO2006122578A1 (en) 2005-05-17 2006-11-23 Freescale Semiconductor, Inc. Contaminant removal apparatus and method therefor
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
US8125610B2 (en) * 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US8564759B2 (en) * 2006-06-29 2013-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography

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